David S. Bergsman
Assistant Professor, Department of Chemical Engineering, University of Washington
Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography
Katja Höflich
Head of the Joint Lab for Photonic Quantum Technologies, Ferdinand-Braun-Institut (FBH) in Berlin, Germany
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Mona Jarrahi
Professor of Electrical & Computer Engineering, University of California Los Angeles
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