David S. Bergsman
Assistant Professor, Department of Chemical Engineering, University of Washington
Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography
Julia W.P. Hsu
Texas Instruments Distinguished Chair in Nanoelectronics, Department of Materials Science and Engineering, University of Texas at Dallas
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Robert McLeod
Richard & Joy Dorf Endowed Professor, College of Engineering and Applied Science, University of Colorado Boulder
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Jia Liu
Assistant Professor, School of Engineering and Applied Sciences, Harvard University
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