David S. Bergsman
Assistant Professor, Department of Chemical Engineering, University of Washington
Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography
Michael Tsapatsis
Bloomberg Distinguished Professor, Department of Chemical and Biomolecular Engineering, John Hopkins University
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Julia W.P. Hsu
Texas Instruments Distinguished Chair in Nanoelectronics, Department of Materials Science and Engineering, University of Texas at Dallas
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