David S. Bergsman
Assistant Professor, Department of Chemical Engineering, University of Washington
Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography
Sourabh K. Saha
Assistant Professor and Woodruff Faculty Fellow, George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology
More About Speaker
Katja Höflich
Head of the Joint Lab for Photonic Quantum Technologies, Ferdinand-Braun-Institut (FBH) in Berlin, Germany
More About Speaker
George Barbastathis
Ralph E. and Eloise F. Cross Professor in Manufacturing, Professor of Mechanical Engineering, Area Head for Micro and Nanoengineering, MIT
More About Speaker