David S. Bergsman
Assistant Professor, Department of Chemical Engineering, University of Washington
Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography
Luca Basso
Researcher at the Center for Integrated Nanotechnologies, Sandia National Labs
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Sourabh K. Saha
Assistant Professor and Woodruff Faculty Fellow, George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology
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