Conference

David S. Bergsman

Assistant Professor, Department of Chemical Engineering, University of Washington

Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography

David S. Bergsman
Marta Fernandez-Regulez

Marta Fernandez-Regulez

Researcher in NanoNEMS Group, IMB-CNM-CSIC
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Sourabh K. Saha

Sourabh K. Saha

Assistant Professor and Woodruff Faculty Fellow, George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology
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Katja Höflich

Katja Höflich

Head of the Joint Lab for Photonic Quantum Technologies, Ferdinand-Braun-Institut (FBH) in Berlin, Germany
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George Barbastathis

George Barbastathis

Ralph E. and Eloise F. Cross Professor in Manufacturing, Professor of Mechanical Engineering, Area Head for Micro and Nanoengineering, MIT
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