David S. Bergsman
Assistant Professor, Department of Chemical Engineering, University of Washington
Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography
Robert McLeod
Richard & Joy Dorf Endowed Professor, College of Engineering and Applied Science, University of Colorado Boulder
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Lisa McElwee-White
Colonel Allen R. and Margaret G. Crow Professor of Chemistry, University of Florida
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Julia W.P. Hsu
Texas Instruments Distinguished Chair in Nanoelectronics, Department of Materials Science and Engineering, University of Texas at Dallas
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Elena Pinilla Cienfuegos
Researcher, Nanophotonics Technology Center, Universitat Politècnica de València
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