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David S. Bergsman

Assistant Professor, Department of Chemical Engineering, University of Washington

Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography

David S. Bergsman

Invited Speakers & Topics

Michael Tsapatsis

Michael Tsapatsis

Bloomberg Distinguished Professor, Department of Chemical and Biomolecular Engineering, John Hopkins University
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Steven George

Steven George

Professor, University of Colorado Boulder
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Maddison Coke

Maddison Coke

Senior Technical Specialist, University of Manchester
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Mathieu Durand

Mathieu Durand

Director of Engineering, Canadian Bank Note Nanotechnologies
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