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David S. Bergsman

Assistant Professor, Department of Chemical Engineering, University of Washington

Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography

David S. Bergsman

Invited Speakers & Topics

Marta Fernandez-Regulez

Marta Fernandez-Regulez

Researcher in NanoNEMS Group, IMB-CNM-CSIC
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Elena Pinilla Cienfuegos

Elena Pinilla Cienfuegos

Researcher, Nanophotonics Technology Center, Universitat Politècnica de València
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Steven George

Steven George

Professor, University of Colorado Boulder
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Uros Jagodic

Uroš Jagodič

Research Scientist, Jožef Stefan Institute, Slovenia
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