Conference

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David S. Bergsman

Assistant Professor, Department of Chemical Engineering, University of Washington

Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography

David S. Bergsman

Invited Speakers & Topics

Luca Basso

Luca Basso

Researcher at the Center for Integrated Nanotechnologies, Sandia National Labs
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Daniel Sunday

Daniel “Fed” Sunday

Staff Scientist, National Institute of Standards and Technology
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Mooseok Jang

Mooseok Jang

Department of Bio and Brain Engineering, Korea Advanced Institute of Science and Technology (KAIST), South Korea
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Maddison Coke

Maddison Coke

Senior Technical Specialist, University of Manchester
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