Conference

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David S. Bergsman

Assistant Professor, Department of Chemical Engineering, University of Washington

Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography

David S. Bergsman

Invited Speakers & Topics

Anuja De Silva

Anuja De Silva

Technical Director at Lam Research 
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Steven Randolph

Steven Randolph

Group Leader for the Nanofabrication Research Laboratory, Center for Nanophase Materials Sciences, Oak Ridge National Laboratory
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Sourabh K. Saha

Sourabh K. Saha

Assistant Professor and Woodruff Faculty Fellow, George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology
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Marta Fernandez-Regulez

Marta Fernandez-Regulez

Researcher in NanoNEMS Group, IMB-CNM-CSIC
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