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Panel Discussion
The 2026 Panel Discussion will explore how to maximize the combined strengths of artificial intelligence and human expertise in advancing precision nanomanufacturing and metrology. This conversation will bring together a group of distinguished and important panelists, listed below, whose insights will help shape this emerging field.
The discussion will take place on Thursday, May 28 at 4:00 p.m.
2026 Panel Discussion Speakers
Martin Wegener
Professor at Institute of Applied Physics of Karlsruhe Institute of Technology (KIT), Department Head at Institute of Nanotechnology (INT)
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Scott Lewis
California Institute of Technology
From Electrons to Photons: Decoding the Secrets of Tomorrow’s Photoresist Design
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From Electrons to Photons: Decoding the Secrets of Tomorrow’s Photoresist Design
J. Alexander LiddleÂ
Vice President, Research and Development, Canon Nanotechnologies
Inkjet Nanoimprint Lithography: Technology and Applications
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Inkjet Nanoimprint Lithography: Technology and Applications
Ralph Nyffenegger
Vice President of Engineering, Electron Beam Products, KLA
Hybrid Inspection and Electron-Beam Massive Metrology for Advanced Semiconductor Manufacturing Technology and Nanofabrication
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Hybrid Inspection and Electron-Beam Massive Metrology for Advanced Semiconductor Manufacturing Technology and Nanofabrication
Robert Wolkow
Physics Professor and iCORE Chair, University of Alberta
Pico Perfect Placement: The Era of Atom Precise Manufacturing Has Begun
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Pico Perfect Placement: The Era of Atom Precise Manufacturing Has Begun