Conference

David S. Bergsman

Assistant Professor, Department of Chemical Engineering, University of Washington

Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography

David S. Bergsman
Ricardo Ruiz

Ricardo Ruiz

Staff Scientist at Lawrence Berkeley National Laboratory
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Robert Mcleod

Robert McLeod

Richard & Joy Dorf Endowed Professor, College of Engineering and Applied Science, University of Colorado Boulder
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Michael Tsapatsis

Michael Tsapatsis

Bloomberg Distinguished Professor, Department of Chemical and Biomolecular Engineering, John Hopkins University
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Murat Yessenov

Murat Yessenov

Postdoctoral Fellow, Harvard John A. Paulson School of Engineering and Applied Sciences, Harvard University
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