David S. Bergsman
Assistant Professor, Department of Chemical Engineering, University of Washington
Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography
Mona Jarrahi
Professor of Electrical & Computer Engineering, University of California Los Angeles
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Murat Yessenov
Postdoctoral Fellow, Harvard John A. Paulson School of Engineering and Applied Sciences, Harvard University
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