David S. Bergsman
Assistant Professor, Department of Chemical Engineering, University of Washington
Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography
Sourabh K. Saha
Assistant Professor and Woodruff Faculty Fellow, George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology
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Robert McLeod
Richard & Joy Dorf Endowed Professor, College of Engineering and Applied Science, University of Colorado Boulder
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