David S. Bergsman
Assistant Professor, Department of Chemical Engineering, University of Washington
Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography
Robert McLeod
Richard & Joy Dorf Endowed Professor, College of Engineering and Applied Science, University of Colorado Boulder
More About Speaker
Michael Tsapatsis
Bloomberg Distinguished Professor, Department of Chemical and Biomolecular Engineering, John Hopkins University
More About Speaker
Murat Yessenov
Postdoctoral Fellow, Harvard John A. Paulson School of Engineering and Applied Sciences, Harvard University
More About Speaker





