Steven George
Professor, University of Colorado Boulder
Electron-Enhanced Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE)
Electrons can be employed to enhance atomic layer deposition (ALD) and atomic layer etching (ALE). Titanium carbonitride EE-ALD will be described using sequential exposures of tetrakis(dimethylamino) titanium (TDMAT) and low energy electrons. Molybdenum EE-ALE will be discussed using alternating O2 and HCl pressures with simultaneous electron exposures.
Steven M. George is Professor in the Dept. of Chemistry at the University of Colorado at Boulder. He is directing a research effort focusing on atomic layer deposition (ALD) and atomic layer etching (ALE). This research is examining new surface chemistry, measuring thin film growth and etching rates, and characterizing the properties of films. Dr. George is also exploring the electron enhancement (EE) of thin film processing including EE-ALD and EE-ALE. Dr. George is a Fellow of the AVS (2000) and the APS (1997). Dr. George has received a number of awards including the ALD Innovation Award from the AVS International Conference on Atomic Layer Deposition (2013), the John A. Thornton Memorial Award from the AVS (2017), and the DPS Nishizawa Award from the Dry Process Symposium (2024).
Lisa McElwee-White
