EIPBN 2012 Program
To see the conference at a glance with links to all of the session information click here.
The conference runs 4 days: May 29 – Jun 1, 2012. Activities begin on Tuesday afternoon with a special Commercial Session, which features exhibits by companies and organizations that provide tools and services of interest to the technology of the conference. The Welcome Reception will be on Tuesday evening at the Hilton Waikoloa Lagoon Lanai.
TECHNICAL PROGRAM
The Technical Program runs Wednesday, May 30 through Friday, June 1. The opening Plenary Session is on Wednesday morning with outstanding speakers presenting on major themes in advanced nanofabrication. The Plenary Speakers this year are Mark Pinto (Applied Materials), Burn Lin (TSMC) and Matt Nowak (Qualcomm).
The oral session topics include:
| Session1A 3DIC | Session 1B EUV I | Session1C Metrology & Imaging |
| Session 2A Optical Litho | Session 2B EUV II – Masks | Session 2C TIP-Based Nanofabrication |
| Session 3A Graphene I | Session 3B Nanoimprint I | Session 3C Resists |
| Session 4A Graphene II | Session 4B Nanoimprint II | Session 4C Emerging Technologies |
| Session 5A Maskless Lithography | Session 5B Ebeam I | Session 5C Bit Patterned Media & Nanostructures |
| Session 6A Grating Based Lithography | Session 6B Ebeam II | Session 6C Nanostructures & Processing II |
| Session 7A NanoPhotonics I | Session 7B Nanobiology | Session 7C Nanoelectronics |
| Session 8A NanoPhotonics II | Session 8B Self-Assembly I | Session 8C Electron or Ion Sources & Systems |
| Session 9A Nanostructured Solar Cells | Session 9B Self Assembly II | Session 9C MEMs/NEMs |
| Session 10A Nonconventional Electron & Ion Sources | Session 10B Self Assembly III | Session 10C Microfluidics |
For complete information about the EIPBN 2012 Poster Session click here.
Special Sessions
EIPBN 2012 will also feature a number of special sessions on topics of current interest. These include graphene RF Electronics, 3DIC fabrication challenges, grating lithography, and nanostructured organic solar cells.
Find Talks and Posters
You can search topics, authors, and sessions in the table below. You can also browse the entire list. The schedule and locations of the talks can be found by clicking on the session link in the table above. To see the conference at a glance with links to all of the sessions click here.
Paper # Title Authors
1A-1 Monolithic 3D Integration (Invited) Zhiping Zhang, Chien-Yu Chen, Filip Crnogorac, Peter Griffin, Fabian Pease, James Plummer, Simon Wong
1A-2 Overcoming 3DIC Technology Hurdles (Invited) Vyshnavi Suntharalingam, Chenson K. Chen, Chang-Lee Chen, Jeffrey M. Knecht, Donna R. W. Yost, Keith Warner, Craig L. Keast
1A-3 Heterogeneous 3D Integration (Invited) Robert Patti
1B-1 EUV lithography in pre-production mode (Invited) Eric Hendrickx, Jan Hermans, Gian Lorusso, Philippe Foubert, Ivan Pollentier, Rik Jonckheere, Mieke Goethals, Geert Vandenberghe, Kurt Ronse
1B-2 Fundamental Study of EUV Resist Line Edge Roughness: Characterization, Experiment, and Modeling Ramakrishnan Ayothi, Lovejeet Singh, Yoshi Hishiro, Jed Pitera, Linda Sundberg, Martha Sanchez, Kumar Virwani, Karen Petrillo, Luisa Bozano, Gregory Wallraff, Yueming Hua
1B-3 High-resolution patterning with EUV interference lithography Yasin Ekinci, Andreas Langner, Birgit Paivanranta, Bernd Terhalle, Mohamad Hojeij, Li Wang, Michaela Vockenhuber, Eugenie Kirk
1B-4 Defect Tolerant Extreme Ultraviolet Lithography Lukasz Urbanski, Jorge Rocca, Carmen Menoni, Mario Marconi, Artak Isoyan, Aaron Stein
1C-1 Optimization of the Gun, Lenses and and Detectors for High-Vacuum SEM Studies of Non-Conductive Specimens Roger Alvis, Brandon Van Leer, David Wall, Daniel Phifer, Laurent Roussel, Ingo Gestmann, Ozan Urgula
1C-2 Towards Secondary Ion Mass Spectrometry on the Helium Ion Microscope Tom Wirtz, Lex Pillatsch, Nico Vanhove, David Dowsett, Sybren Sijbrandij, John Notte
1C-3 Design and fabrication of micro optical system for multi-optical probe confocal microscopy for large areal measurement Jiseok Lim, Seoyeong Hwang, Myungki Jung, Shinill Kang
1C-4 The contrast mechanisms of LL-BSE electrons from Hybridization & Band Gaps Heiner Jaksch
1C-5 SEM dimensional metrology on sub-15 nm bit-patterned media using model-based analysis Sergey Babin, Justin Hwu, Peter Yushmanov
2A-1 Deep-subwavelength patterning with photoswitchable molecules Precious Cantu, Nicole Brimhall, Trisha Andrews, Rossella Castagna, Chiara Bertarelli, Rajesh Menon
2A-2 Large area optical lithography using cylindrical masks Boris Kobrin, Alfred Renaldo, Mukti Aryal, Ian McMackin
2A-3 Phase shifting mask for high-throughput high-contrast patterning with Displacement Talbot Lithography (DTL) Christian Dais, Francis Clube, Harun Solak, Kimio Itoh, Yukio Taniguchi, Morihisa Hoga
2A-4 Photodeactivatable photoresists for visbile-light nanolithography? Michael Stocker, Zulya Tomova, John Fourkas
2B-1 EUV Mask Challenges, Status & Closing The Remaining Technology Gaps (Invited) Frank Goodwin, Vibhu Jindal, Patrick Kearney, Ranganath Teki, Jenah Harris-Jones, Andy Ma, Arun John Kadaksham, Stefan Wurm
2B-2 Lithographic Performance of EUV Mask using Coherent Scattering Microscopy Jonggul Doh, Sangsul Lee, Jae Uk Lee, Seongchul Hong, Inhwan Lee, Jinho Ahn, Dong Gun Lee, Seong-Sue Kim
2B-3 Development of Standalone Coherent EUV Scatterometry Microscope for EUV Mask Observation Tetsuo Harada, Masato Nakasuji, Takeo Watanabe, Hiroo Kinoshita, Yutaka Nagata
2B-4 At-Wavelength EUV Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors Mitsunori Toyoda, Kenjiro Yamasoe, Tadashi Hatano, Mihiro Yanagihara, Akifumi Tokimasa, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita
2C-1 Probe nanopatterning: Towards a smarter lithography technology (Invited) Michel Despont, Philip Paul, Felix Holzner, James Hedrick, Armin Knoll, Urs Duerig
2C-2 Tip-Based Nanofabrication and Nanometrology of Functional Nanodevices using Heated Cantilever Arrays (Invited) William P. King
2C-3 Determining Tip Position Tolerances for Atomically Precise STM lithography of Si(001):H Justin Alexander, Joshua Ballard, Ehud Fuchs, James Owen, John Randall, Jim Von Her
2C-4 Improved single ion implantation with scanning probe alignment Michael Ilg, Christoph Weis, Ivo Rangelow, Thomas SchenkelÊ
3A-1 Graphene Nanoelectronics (Invited) CY Sung, IBM, Watson
3A-2 Graphene for RF Applications: Opportunities & Challenges (Invited) J. S. Moon, M. Antcliffe, H.C. Seo, S.C. Lin, A. Schmitz, I. Milosavljevic, K. McCalla, D.K. Gaskill, P.M. Campbell, K.-M. Lee, P. Asbeck
3A-3 Graphene-based & Graphene-derived Materials (Invited) Rod Ruoff
3A-4 Scalable Graphene Field Effect Transistors with Boron Nitride Dielectrics (Invited) Nick Petrone, Inanc Meric, Cory Dean, Arend van der Zande, Lei Wang, James Hone, Ken Shepard
3B-1 Nanoscale Manufacturing Using Jet and Flash Imprint Lithography (Invited) SV Sreenivasan
3B-2 High aspect ratio lift-off process and silver optimization for negative index materials in the visible Iris Bergmair, Andreas Rank
3B-3 Demonstration of sub-4 nm nanoimprint lithography using a template fabricated by helium ion beam lithography Wen-Di Li, Wei Wu, R. Stanley Williams
3B-4 High-Resolution Non-Destructive Patterning of Isolated Organic Semiconductors Yi-Chen Lo, Zhenzhong Sun, Shoieb Shaik, Dawen Li, Xing Cheng
3B-5 Sidewall-angle dependent pre-filling of three-dimensional microcavities in thermal nanoimprint Mirco Altana, Arne Schleunitz, Helmut Schift
3C-1 Low Diffusion EUV Resists using Bound PAG Technology (Invited) James Thackeray, James Cameron, Michael Wagner, Owendi Ongayi, Vipul Jain, Paul LaBeaume, Suzanne Coley
3C-2 Effect of molecular weight distribution on e-beam resist polystyrene Ripon Kumar Dey, Raafat Mansour, Bo Cui
3C-3 Measurements of the Latent Image in Chemically-Amplified Resists Ginusha Perera, Yogendra Pandey, Manolis Doxastakis, Gila Stein
3C-4 High Resolution Negative Tone Resists via Controlled Polymerization Richard Lawson, Laren Tolbert, Clifford Henderson
3C-5 Study of Line-Edge Roughness in ZEP Resist Nanopatterns from Electron Beam Lithography by Numerical Modeling Kirill Koshelev, Steve Dew, Maria Stepanova
4A-1 Graphene transistors with record mobilities on polyimide for high-performance flexible nanoelectronics Jongho Lee, Li Tao, Deji Akinwande
4A-2 1 nm Thick Chemically Functionalized Carbon Nanomembranes (CNMs): Two-dimensional Materials for Nanoengineering Andrey Turchanin, Andr Beyer, Xianhui Zhang, Polina Angelova, Armin Glzhuser
4A-3 Nanofabrication of Graphene on SiC by Multi-Ion Beam Lithography and Low-Temperature Processing Bill R. Appleton, Sefaattin Tongay, Maxime Lemaitre, Arthur F. Hebard, Brent Gila, Joel Fridmann, Fan Ren, Xiaotie Wang, Dinesh K. Venkatachalam, Robert G. Elliman
4A-4 Fabricating Graphene-Silicon Nitride Heterostructures for High-Q Tunable Nanomechanical Resonators Sunwoo Lee, Robert Barton, Arend van der Zande, Gwan-Hyoung Lee, Alexander Gondarenko, Jeevak Parpia, Harold Craighead, James Hone
4A-5 Superconductivity of tungsten-containing carbon nanowires fabricated by focused-ion-beam chemical vapor deposition Jun Dai, Reo Kometani, Shin'ichi Warisawa, Sunao Ishihara, Koji Onomitsu, Yoshiharu Krockenberger, Hiroshi Yamaguchi
4B-1 Study of defect mechanisms in partly filled stamp cavities for thermal nano imprint control Andre Mayer, Jyunji Sakamoto, Saskia Mllenbeck, Khalid Dhima, Si Wang, Hella-Christin Scheer, Yoshihiko Hirai
4B-2 Cleaning Induced Imprint Template Erosion Zhaoning Yu, Nobuo Kurataka, Hieu Tran, Gene Gauzner, Hongying Wang, Henry Yang, Yautzong Hsu, Kim Lee, David Kuo
4B-3 3-D microfabrication based on a glass transition temperature selective thermal reflow - towards optical applications Arne Schleunitz, Vitaliy Guzenko, Christian Spreu, Helmut Schift, Martin Messerschmidt, Hakan Atasoy, Marko Vogler
4B-4 Single digit nanoimprint lithography achieved by template modification with atomic layer deposition Scott Dhuey, Christophe Peroz, Deirdre Olynick, Marko Vogler, Marion Cornet, Stephano Cabrini
4B-5 Sub-20 nm Metal Gratings by Nanoimprint Lithography Leo Varghese, Li Fan, Yi Xuan, Minghao Qi
4C-1 Patterning of Sub-10 nm Optical Apertures on Single Crystal Metallic Films with the Helium Ion Microscope (Invited) Daniel Pickard, Vignesh Viswanathan, Michel Bosman, Jens Dorfmller, Harald Giessen, Zhongkai Ai, Hanfang Hao, Masoud Mahmoudi, Yue Wang, Chao Fang
4C-2 The Membrane-Alignment Stage in Fabricating 3-Dimensional Nanostructures Shabnam Ghadarghadr, Corey Fucetola, Lin Lee Cheong, Euclid Moon, Henry I. Smith
4C-3 Diamond nitrogen-vacancy centers created by scanning focused helium ion beam and annealing Zhihong Huang, Wen-Di Li, Charles Santori, Victor M. Acosta, Andrei Faraon, Wei Wu, Toyofumi Ishikawa, R. Stanley Williams, Raymond. G. Beausoleil
4C-4 Sub-10-nm Lithography with Light-Ion Beams: Exposure Efficiency and Applications Donald Winston, John Paul Strachan, Brenton Knuffman, Adam V. Steele, Vitor R. Manfrinato, Samuel M. Nicaise, Lin Lee Cheong, John Notte, Jabez J. McClelland, R. Stanley Williams, Karl K. Berggren
4C-5 First lithography results obtained with the 2nd generation MeV proton beam writing facility Jeroen Anton van Kan, Yong Yao, Pattabiraman Santhana Raman, Benjamin Teo
5A-1 REBL: A Lithography Solution for High Volume Manufacturing at 16 nm (Invited) Paul Petric, Chris Bevis, Upendra Ummethala, Mark McCord, Allen Carroll, Jeff Sun, Francoise Kidwingira, Anthony Cheung, Joshua Clyne, Thomas Gubiotti
5A-2 Sub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens liang pan, Yi Xiong, Yongshik Park, Yuan Wang, Ziliang Ye, Xiaobo Yin, Erick Ulin-Avila, Shaomin Xiong, Junsuk Rho, Cheng Sun, David Bogy, Xiang ZhangÊ
5A-3 Ultra-high-Numerical Aperture Interference Lithography at High Aspect Ratios using Surface States on Effective Gain Media Prateek Mehrotra, Chris Mack, Richard Blaikie
5A-4 An FPGA-based Pattern Generator for Massive Parallel High-Speed Nanolithography System Erick Ulin-Avila, Liang Pan, Shaomin Xiong, Yongshik Park, Yi Xiong, Yuan Wang, Chen Sun, David Bogy, Xiang Zhang
5A-5 Multi-axis and Multi-beam technology for high throughput maskless E-beam lithography Hiroshi Yasuda, Takeshi Haraguchi, Hidebumi Yabara, Kouji Takahata, Hidekazu Murata, Eiji Rokuta, Hiroshi Shimoyama
5B-1 High Resolution Patterning on Non-Planar Substrates with Large Height Variation Using Electron-Beam Lithography Vishva Ray, Yukinori Aida, Ryo Funakoshi, Stella Pang
5B-2 Measurement of fogging electron current in scanning electron microscope Yasuhiro Ohara, Akira Osada, Masaru Otani, Masatoshi Kotera
5B-3 Measurement of Surface Potential Distribution at an Insulating Film Produced by Fogging Electrons in a Scanning Electron Microscope Masaru Otani, Akira Osada, Yasuhiro Ohara, Masatoshi Kotera
5B-4 Arbitrarily Shaped High-Coherence Electron and Ion Bunches from Laser-Cooled Atoms Robert Scholten, Andrew McCulloch, Daniel Thompson, Dene Murphy, Sebastian Saliba, Keith Nugent, Corey Putkunz, David Sheludko
5B-5 High Aspect Ratio SML Resist Patterning using 30 keV Electron Beam Lithography Mohammad Ali Mohammad, Steven K. Dew, Maria Stepanova
5C-1 Progress and Challenges in Bit Patterned Media Nanofabrication (Invited) XiaoMin Yang, Shuaigang Xiao, Kim Lee, Gene Gauzner, Koichi Wago, Rene van de Veerdonk, David Kuo
5C-2 Fabrication of 5 Tb/in2 Bit Patterned Media with Servo Pattern using Directed Self-Assembly Naoko Kihara, Ryousuke Yamamoto, Norikatsu Sasao, Takuya Shimada, Akiko Yuzawa, Takeshi Okino, Yasuaki Ootera, Yoshiyuki Kamata, Akira Kikitsu
5C-3 System to Measure the Shear Modulus of Iron at high temperature and pressure using Transverse Displacement Interferometry Fabricated by Electron Beam Lithography Richard TIberio, Arianna Gleason, Wendy Mao
5C-4 Taming Nanostructures: From Sponge to Dot Pattern on Ge Controlled by Heavy-Ion-Deposited Energy Roman Bttger, Lothar Bischoff, Karl-Heinz Heinig, Bernd Schmidt
5C-5 Nanofabrication of high aspect ratio (~50:1) sub-10 nm silicon nanowires using plasma etch technologies Muhammad Mirza, Haiping Zhou, Xu Li, Philippe Velha, Kevin Docherty, Antonio Samarelli, Gary Ternent, Douglas Paul
6A-1 Electron beam lithography-based grating customization strategies for gate level patterning in high density SRAM circuits (Invited) Michael Guillorn, Josephine Chang, Sebastian Engelmann, David Klaus, James Bucchignano, James Tornello, William Graham, Nicholas Fuller, Ernst Kratschmer
6A-2 Sub-20nm Hybrid Lithography enabled by Highly Regular Layout, Pitch Division and e-Beam Exposure (Invited), Michael Smayling, David Lam
6A-3 An all-optical process for extending GRATE to the 11nm (20nm hp) Technology Node (Invited) Rudi Hendel, John Petersen, David Markle, Alex Raub, Robert Greenway
6A-4 Optical lithography method for generation of sub-35nm line/space patterns for use in complementary lithography Harun Solak, Christian Dais, Francis Clube
6A-5 Vibrational Indentation Patterning of Grating Structures with Real-time Period Tunability Se Hyun Ahn, Jong G. Ok, Moon Kyu Kwak, L. Jay Guo
6B-1 Liquid phase electron beam induced deposition of CdS M. Bresin, N. Reddy, V. Singh, J. T. Hastings
6B-2 Cold Field, Thermal-Field, and Schottky Emission from HfC(310) Sources William Mackie, Josh Lovell, Gerald Magera
6B-3 Focused Electron Beam Induced Deposition as novel nanofabrication approach for magnetic nanosensors and nanomagnet logic Marco Gavagnin, Heinz D. Wanzenboeck, Simon Waid, Emmerich Bertagnolli
6B-4 Low-Energy Electron Diffraction Microscopy Based on a Single-Atom Electron Source Ing-Shouh Hwang, Mu-Tung Chang, Wei-Tse Chang, Wei-Hao Hsu, Hong-Shi Kuo, Che-Cheng Chang, Tien T. Tsong
6B-5 New Technique of Three-Dimensional Nanofabrication in Semiconductors by Using Electron Beam Lithography Kenji Yamazaki, Hiroshi Yamaguchi
6C-1 Interferometrically Defined 3D Pyrolyzed-Carbon Sensors D. Bruce Burckel
6C-2 Capped carbon hard mask an innovative route to nanoscale device fabrication Sbastien Pauliac-Vaujour, Pierre Brianceau, Corinne Comboroure
6C-3 Fabrication of Nano-scale, High Throughput, High Aspect Ratio Freestanding Gratings Alexander Bruccoleri, Pran Mukherjee, Ralf Heilmann, Jonathan Yam, Mark Schattenburg, Frank DiPiazza
6C-4 Taming of Ga droplets on DLC layers Ð Size tuning and local arrangement with nm accuracy Peter Philipp, Lothar Bischoff, Bernd Schmidt
6C-5 The three-dimensional nanostructure fabrication from HSQ by FIB/EB dual-beam lithography Reo Kometani, Kouhei Kuroda, Shin'ichi Warisawa, Sunao Ishihara
7A-1 Plasmonics At The Single-Nanometer Scale (Invited) Joel Yang, Huigao Duan, Karthik Kumar, Michel Bosman, Antonio Fernandez-Dominguez, Stefan Maier
7A-2 Hyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of ÒCampanileÓ Tips Mauro Melli, Wei Bao, Patrick Bennett, Jeff Bokor, D. Frank Ogletree, P. James Schuck, Stefano Cabrini, Francesca Intonti, Francesco Riboli, Diederik Wiersma, Alexander Weber-Bargioni
7A-3 New Nanoplasmonic Devices and Fabrication for Large Enhancement and Tunability of Second Harmonic Light Generation Wei Ding, Liangcheng Zhou, Stephen Y. Chou
7A-4 Towards the holy grail of near field optics via reproducibly fabricated optical nano antennae on Scanning Probe Tips Wei Bao, Mauro Melli, Francesca Intonti, Francesco Riboli, Diederik Wiersma, Frank Ogletree, Jim Schuck, Stefano Cabrini, Alexander Weber-Bargioni
7A-5 30 nm nanochannels with plasmonic bowtie nanoantenna Irene Fernandez-Cuesta, Scott Dhuey, Deirdre Olynick, Daniel Gargas, P. James Schuck, Stefano Cabrini
7B-1 Arrays of Topographically and Peptide-Functionalized Hydrogels for Analysis of Biomimetic Extracellular Matrix Properties (Invited) Michelle J. Wilson, Bernardo Yanez-Soto, Sara J. Liliensiek, Paul F. Nealey
7B-2 Electron-beam Patterned PEG Microgels for DNA Detection Xiaoguang Dai, Wei Yang, Emre Firlar, Salvatore Marras, Matthew Libera
7B-3 Sub-micron scale gold-tipped elastomeric pillar arrays for human T cell activation and culture Saba Ghassemi, Roddy O'Connor, Alexander Gondarenko, Shalom Wind, James Hone, Michael Milone
7B-4 H+-type and OH--type Polysaccharide Bioprotonic Field Effect Transistors Marco Rolandi, Yingxin Deng, Chao Zhong, Brett Helms
7B-5 Vacuum-packaged Resonant Thermal Sensor for Biological Cell in liquid (MNC Paper) Naoki Inomata, Masaya Toda, Takahito Ono
7C-1 Strain Assisted Self Lift-Off Process for the Fabrication Ultra Low Capacitive Antenna Coupled MIM Tunnel Diodes for the Application of Infrared Detection and Energy Harvesting Filiz Yesilkoy, Neil Goldsman, Mario Dagenais, Martin Peckerar
7C-2 Combining high depth resolution SIMS with GPA of aberration corrected HAADF STEM images for measurement of misfit strain in epitaxial SiGe layers John Bruley, Marinus Hopstaken, Hong He
7C-3 Horizontal Growth of Silicon Nanowire Arrays for Large-Scale Circuit Applications Chookiat Tansarawiput, Sung Hwan Chung, Yi Xuan, Leo T. Varghese, Lin Zhao, Xianfan Xu, Chen Yang, Minghao Qi
7C-4 Magneto-optical and X-ray microscopy of nanomagnetic logic components with shape-induced biaxial anisotropy Brian Lambson, Zheng Gu, David Carlton, Jeffrey Bokor, Scott Dhuey, Andreas Scholl, Andrew Doran, Anthony Young
7C-5 Electron Beam Lithography of Antidot Arrays for the Fabrication of Nanogenerators and Detectors in 2DEG Materials TJ Beck, Raghu Murali, Isabelle Bisotto, Ethirajulu Kannan, Jean -Claude Portal
8A-1 Potential modulation by plasmonic sub-micron structures for the manipulation of ultracold atomic gas clouds Monika Fleischer, Dieter P. Kern, Christian Stehle, Helmar Bender, Claus Zimmermann, Sebastian Slama
8A-2 Giant and Uniform Fluorescence Enhancement of Organic Dye by 3D Plasmonic NanoCavity Array Weihua Zhang, Fei Ding, Stephen Y. Chou
8A-3 Fabrication of Photonic Devices on Flexible Platform Li Fan, Leo Varghese, Yi Xuan, Ben Niu, Jian Wang, Minghao Qi
8A-4 Significant Enhancement of Colloidal Quantum Dots Fluorescence by 3D Disk-dot Coupled Nanoantenna Array Hao Chen, Weihua Zhang, Yuxuan Wang, Liangcheng Zhou, Stephen Chou
8A-5 Fabrication of High Resolution Digital Spectrometers-on-Chip Christophe Peroz, Sergey Babin, Scott Dhuey, Stefano Cabrini, Alexander Goltsov, Igor Ivonin, Alexandr Koshelev, Vladimir Yankov
8B-1 Directed Self-Assembly for the Semiconductor Industry (Invited) H.-S. Philip Wong, Christopher Bencher, He Yi, Xin-Yu Bao, Li-Wen Chang
8B-2 Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films Amir Tavakkoli K. G., Kevin W. Gotrik, Adam F. Hannon, Alfredo Alexander-Katz, Caroline A. Ross, Karl K. Berggren
8B-3 Directed Assembly of Symmetric ABA Triblock Copolymers on Chemically Nanopatterned Substrates Shengxiang Ji, Umang Nagpal, Guoliang Liu, Sean Delcambre, Marcus Mller, Juan de Pablo, Paul Nealey
8B-4 Complex self-assembled patterns from a square grid template with restricted geometry Jae-Byum Chang, Hong Kyoon Choi, Adam F. Hannon, Caroline A. Ross, Karl K. Berggren
8B-5 Sub-20 nm fabrication on polyimide plastics enabled by directed self-assembly Li Tao, Hsiao-Yu Chang, Kevin Gotrik, Jeong Gon Son, Caroline A. Ross, Deji Akinwande
8C-1 X-rays and field-emission gun: an intrinsic quasi-monochromatic X-ray source (Invited) Vu Thien Binh, Babacar Diop
8C-2 Stable Field Emission from Nanoporous Silicon Carbide Tips Patterned by a Focused Ion Beam(Invited) H.J. Lezec, R.L. Kallaher, Fred Sharifi , M.-G. Kang
8C-3 Energy Spread Measurement of an Electron Impact Gas Ion Source Equipped with a Miniaturized Gas Chamber David Jun, Pieter Kruit
8C-4 Reproducibility of Drift Tolerant Focused Ion Beam Lithography Method R. M¿ller-Nilsen, D. H. Petersen, A. Savenko, P. B¿ggild
8C-5 Patterning nitrogen-vacancy color centers in diamond using scanning focused helium ion beam Wen-Di Li, Zhihong Huang, Charles Santori, Wei Wu, R. Stanley Williams
9A-1 Nanowire device concepts for thin film photovoltaics (Invited) Silke Christiansen
9A-2 Controlling Nanostructures in Organic Photovoltaic Cells (Invited) Hui Joon Park, L. Jay Guo
9A-3 Nanoimprinted Polymer Solar Cell Walter Hu
9A-4 Solar Electron Source and Thermionic Solar Cell Parham Yaghoobi, Mehran Vahdani Moghaddam, Alireza Nojeh
9A-5 Via-Hole Fabrication for III-V Triple-Junction Solar Cells Yuning Zhao, Patrick Fay, Andree Wibowo, Jianhong Liu, Chris Youtsey
9B-1 A Molecular View of Block Copolymer Directed Assembly and its Application to Sub-Lithographic Patterning (Invited) Juan de Pablo
9B-2 Directed Self-Assembly of Perpendicularly Oriented Nano-Cylinders with Liquid Crystalline Block Copolymer Hiroshi Yoshida, Yasuhiko Tada, Kouhei Aida, Motonori Komura, Tomokazu Iyoda
9B-3 3D Capillary Force Assembly : Fabrication of a white light emitter Julien CORDEIRO, Olivier LECARME, Guilherme OSVALDO DIAS, David PEYRADE
9B-4 Templated Placement of Colloidal Quantum Dots Vitor Manfrinato, Darcy Wanger, David Strasfeld, Francesco Marsili, Hee-Sun Han, Lihua Zhang, Dong Su, Jose Arrieta, Eric Stach, Moungi Bawendi, Karl Berggren
9B-5 Directed assembly of one-dimensional functional nanostructures Erika Penzo, Matteo Palma, Risheng Wang, Shalom Wind
9C-1 CMOS Compatible RF MEMs Technology (Invited) Stephen Luce, Anthony Stamper
9C-2 Development of MEMS electron-optics bonded on electron emitter array for Massively Parallel EB Lithography System Akira Kojima, Hideyuki Ohyi, Naokatsu Ikegami, Toshiyuki Ohta, Nobuyoshi Koshida, Takashi Yoshida, Masayoshi Esashi
9C-3 Piezoelectrically Transduced Silicon Carbide MEMS Double-Clamped Beam Resonators Boris Svili_i_, Enrico Mastropaolo, Tao Chen, Rebecca Cheung
9C-4 Quality factor improvement of graphene resonator by SU-8 shrinkage-induced strain Yuta Oshidari, Taiki Hatakeyama, Reo Kometani, Shin'ichi Warisawa, Sunao Ishihara
9C-5 Combined SIMS-SPM instrument for high sensitivity and high resolution elemental 3D analysis Tom Wirtz, Yves Fleming, Urs Gysin, Thilo Glatzel, Ernst Meyer, Urs Maier, Urs Wegmann
10A-1 Electron emission from carbon nanotubes S. R. P. Silva
10A-2 Nanoscale Photoelectron Emission Using C-shaped Nanoapertures with Cesium Bromide Photocathode Yao-Te Cheng, Juan R. Maldonado, Yuzuru Takashima, Chuong Huynh, Larry Scipioni, Lambertus Hesselink, R. Fabian Pease
10A-3 Progress Towards a Commercial Neon Gas Field Ion Source FHM Rahman, Sybren Sijbrandij, Louis Farkas, Randal Percival, John Notte
10A-4 Visualization of Ion Beams from IonicLiquid Ion Sources for Focused Ion Beam Applications C. Perez-Martinez, P. Lozano
10B-1 Sub-30 nm pitch circuit relevant patterning in Si, SiO2 and SiN using directed self assembly based pattern generation (Invited) Hsin-Yu Tsai, Sebastian Engelmann, Hiroyuki Miyazoe, Michael Guillorn, Chi-Chun Liu, Joy Cheng
10B-2 Directed Patterning for Electronics Using Multiple Block Copolymers Orthogonally Wei Min Chan, Sandip Tiwari, Evan Schwartz, Christopher Ober
10B-3 Sub-10 nm area-selective ALD using block copolymer lithography Deirdre Olynick, Nobuya Hiroshiba, Zuwei Liu, Thomas Lehmann, Dominik Stenger, Scott Dhuey, Bruce Harteneck, Stefano Cabrini, Adam Schwartzberg
10B-4 Electron Beam Lithography by Using Self-Assembled Block Copolymer Thin Films as Positive/Negative Tone Combined Resist Hiroyuki Suzuki, Reo Kometani, Sunao Ishihara, Shin'ichi Warisawa
10B-5 Design Space for One-hole Pattern using Block Copolymer Directed Self-Assembly He Yi, Xin-Yu Bao, Christopher Bencher, Huixiong Dai, Yongmei Chen, H.-S. Philip Wong
10C-1 Microfluidics Beyond Basic Biology- From Fertility Monitoring to Artificial Respiration (Invited) Todd Thorsen
10C-2 Fabrication and Characterization of Field Effect Reconfigurable Nanofluidic Ionic Diodes: Building Blocks Towards Digitally-Programmed Manipulation of Biomolecules Weihua Guan, Rong Fan, Mark Reed
10C-3 Electrically Controlled Switchable Adhesion of Dual Nanometer and Micrometer Structured Surfaces Shaun Berry, Theodore Fedynyshyn, Lalitha Parameswaran, Alberto Cabral
10C-4 High Aspect Ratio, Triangular Silicon Pillars for Bump Array Concentration of Pathogenic Bacteria Keith Morton, Maxence Mounier, Liviu Clime, Xuyen Hoa, Christian Luebbert, Nathalie Corneau, Teodor Veres, Sabah Bidawid, Jeff Farber
10C-5 Fabrication of On-Chip Fluidic Ion Channels using Self-Aligned Double Layer Resist Processing Technique Bongho Kim, Jihun Kwon, Daehong Kim, Sungwoo Chun, Hyungyu Lee, Seonjun Choi, Seung-Back Lee
P01-01 Monolithic 3D Integration via Al-Ge Bonding of Single Crystal Islands (Invited) Filip Crnogorac, Ryan Birringer, Reinhold Dauskardt, Fabian Pease
P01-02 Transfer Processes of Silicon Nanomembranes for Three Dimensional Integration of Photonics and Electronics J Provine, Filip Crnogorac, David Kwong, Ray Chen, Fabian Pease
P01-03 Fabrication of an 18-layer 3D Woodpile Photonic Crystal via Stacking of Pre-Patterned Free-Standing Membranes Chunghun Lee, Yi Xuan, Leo Varghese, Li Fan, Minghao Qi
P02-01 Bio-Fuel Cell Operational Enhancements using Nanoscale Electrodes Alokik Kanwal, Shiunchin Wang, Ross Cohen, Shanmugamurthy Lakshmanan, Gordon Thomas, Zafar Iqbal, Reginald Farrow
P02-02 Diameter Dependence of the Effect of Light Polarization on Interband Transitions in Zigzag Carbon Nanotubes Saloome Motavas, Andre Ivanov, Alireza Nojeh
P02-03 Two-photon Photoemission from Carbon Nanotube Arrays under Low-power Ultraviolet Illumination Mehran Vahdani Moghaddam, Parham Yaghoobi, Alireza Nojeh
P02-04 The Effect of Field Frequency and Solution Conductivity on Dielectrophoretic Deposition of Carbon Nanotubes Ali Kashefian Naieni, Alireza Nojeh
P02-05 Di-block Copolymer Guided Patterning of Graphene Duyoung Choi, Cihan Kuru, Chulmin Choi, Kunbae Noh, Sungho Jin
P02-06 Optimization the visibility of graphene on poly-Si film by thin-film optics engineering Tao Chen, Rebecca Cheung
P02-07 Strain characteristics of free-standing graphene induced by low-energy electron beam irradiation Takuya Kadowaki, Ryuichi Ueki, Takuya Nishijima, Jun-ichi Fujita
P02-08 Micro- and Nanostructuring of Graphene on various Substrates using UV-NIL Iris Bergmair, Wolfgang Hackl, Andreas Rank, Michael Muehlberger, Maria Losurdo, Maria Giangregorio, Giovanni Bruno, Christian Helgert, Thomas Pertsch, Ernst-Bernhard Kley, Thomas Mueller
P02-09 High quality factors in graphene and ultra thin Silicon nitride nanomechanical drums vivekananda adiga, Rob Barton, Chris Wallin, Harold Craighead, Rob Ilic, Jeevak Parpia
P02-10 Molecular dynamics study on structural modifications of graphene by electron beam irradiation Yoshiki Asayama, Yoshinori Chihara, Masaaki Yasuda, Hiroaki Kawata, Yoshihiko Hirai
P03-01 Production of sub-20nm Pitch Features from Directed Self Assembly of High Chi Polymers via a Selective Block Removal Process Utilizing Atomic Layer Deposition (Invited) Nathan Jarnagin, Andrew Peters, Clifford Henderson
P03-02 Electric Field Induced Patterning in Computational Lithography Sang-Kon Kim
P03-03 Control of the PS-b-PDMS directed self-assembly by silsesquioxane-based graphoepitaxial substrate engineering Mathieu Salan, Marc Zelsmann, Olivier Lorret, Bernt Diettert, Dipu Borah, Barbara Kosmala, Mick Morris
P03-04 Image quality and pattern transfer in block copolymer directed assembly with block-selective atomic layer deposition Ricardo Ruiz, Lei Wan, Jeffrey Lille, Kanaiyalal C. Patel, Elizabeth Dobisz, Danvers E. Johnston, Charles T. Black
P03-05 Investigation of Templated Self-assembly of High-_ Diblock Copolymer Samuel Nicaise, Karl Berggren, Russell Goodman, Richard Kingsborough, Theodore Fedynyshyn, William Farnham, Hoang Tran, Michael Sheehan
P03-06 Block Copolymer Self-Assembly Using Sacrificial Template Amir Tavakkoli K. G., Sam M. Nicaise, Kevin W. Gotrik, Adam F. Hannon, Caroline A. Ross, Karl K. Berggren
P03-07 Molecular Transfer Printing Using Silicon Membrane for the Fabrication of Large Area Chemical Patterns on Highly Flexible Substrates Lei Wan, Paul Nealey, Hongyi Mi, Zhengqiang Ma
P03-08 Directed Self-assembly with Density Multiplication of 6 tera-dot/in2 Pattern by POSS-Containing Block Copolymer Yasuhiko Tada, Hiroshi Yoshida, Yoshihito Ishida, Haruka Mikami, Mizuki Sato, Ricardo Ruiz, Elizabeth Dobisz, Teruaki Hayakawa, Mikihito Takenaka, Hirokazu Hasegawa
P03-09 Spin on Glass as an Orientation Control Layer for Block Copolymer Direct Self-Assembly Hiroko Nakamura, Satoshi Mikoshiba, Atsushi Hieno, Koji Asakawa
P03-10 Defect Evolution in Thin Films of Self-Assembling Lamella Forming Block Copolymers on a Neutral Surface Gurdaman Khaira, Marco Bedolla, Paul Nealey, Juan de Pablo, Prabu Ravindran, Nicola Ferrier
P03-11 Super selective silicon cryo-etching for nanoscale pattern transfer with block copolymer lithogrpahy Zuwei Liu, Scott Dhuey, Bruce Harteneck, Stefano Cabrini, Deirdre Olynick, Xiaodan Gu, Thomas Russell
P03-12 Achieving Ordered Nanoholes and Other Non-bulk Morphologies by Directed Self-Assembly of a Block Copolymer Amir Tavakkoli K. G., Sam M. Nicaise, Adam F. Hannon, Kevin W. Gotrik, Caroline A. Ross, Karl K. Berggren
P03-13 Fast random copolymers grafting for directed self-assembly of block copolymer integration in lithographics processes: new grafting rules for defectivity improvement Xavier Chevalier, Raluca Tiron, Christophe Couderc, Stephanie Magnet, Guillaume Fleury, Georges Hadziiannou, Christophe Navarro
P03-14 A chitin nanofiber ink for replica molding and microcontact printing of self-assembled biocompatible nanostructures Marco Rolandi, Chao Zhong, Yingxin Deng, Adnan Kapetanovic
P03-15 Probing Nanostructures of Aged Active Layer Materials for Organic Solar Cells Muruganathan Ramanathan, Michael S Kilbey II, Jose Alonzo Calderon
P03-16 Directed Self-Assembled Porous Anodic Alumina by NanoImprinting Lithography Therese Gorisse, Ludovic Dupr, Pascal Gentile, Marc Zelsmann, Mickael Martin, Denis Buttard
P03-17 Metal Nanoparticle Arrays by Controlled Decomposition of Polymer Particles Daniel Brodoceanu, Christina Huber, Anne Wonn, Philip Born, Elmar Kroner, Tobias Kraus, Cheng Fang, Nico Voelcker, Matthias Karg
P03-18 Placement error study of cylindrical phase self-assembly guided by graphoepitaxy Sander Wuister, Tamara Druzhinina, Jo Finders, Eddy van der Heijden
P04-01 Thermionic Electron Gun with Small Virtual Source Size for Electron Beam Lithography Applications (Invited) Paul Tesch, Noel Smith, Noel Martin, Bud Magera
P04-02 Calculation of high order aberrations of practical multi-pole type electron optical aberration correctors using a differential algebraic method Yongfeng Kang, Jingyi Zhao, Tiantong Tang
P04-03 Variation of Proximity Effect Correction Parameters with Density David Czaplewski, Leonidas Ocola
P04-04 Magnetic reversal of iron nanowires deposited by Focused Electron Beam Induced Deposition for nanomagnet logic application Marco Gavagnin, Heinz D. Wanzenboeck, Simon Waid, Emmerich Bertagnolli
P04-05 Fabrication of high resolution computer-generated holograms using 3D electron beam lithography. Joanna Szymanska, Fay Hudson, Elfi Van Zeijl, Daniel Barry, Masa Takatsuka, Hiroshi Yoshikawa, Paula Dawson, Andrew Dzurak
P04-06 A Mechanism for Dendritic Nano-Pillar Growth using EBID James Bishop, Richard Crendal, Jared Cullen, Charlene Lobo, Michael Ford, Matthew Phillips, Milos Toth
P04-07 Electron Beam Etching Kinetics of Diamond and Graphite Aiden Martin, Matthew Phillips, Milos Toth
P04-08 High aspect ratio (~25:1) sub-10 nm HSQ lines using electron beam lithography Muhammad Mirza, Haiping Zhou, Kevin Docherty, Douglas Paul, Stephen Thoms, Douglas Macintyre
P04-09 High Aspect Ratio Features in PMGI using Electron Beam Lithography and Solvent Developers Golnaz Karbasian, Alexei Orlov, Patrick Fay, Huili Xing, Debdeep Jena, Gregory Snider
P04-10 High-Speed Patterning of Hexagonal Dot Arrays Using Electron-Beam Lithography Bryan Cord, Hans Romijn, Marc Wijnands
P04-11 Long Narrow Gaps for III-V Transistors Fabricated by Electron Beam Lithography Stephen Thoms, Douglas Macintyre
P04-12 An Enhanced E-beam Pattern Writing for Nano-Optics Based on Character Projection Ernst - Bernhard Kley
P04-13 Optimization of Spatial Dose Distribution for Vertical Sidewall of Resist Profile Minimizing Total Dose in Electron-beam Lithography Q. Dai, S.-Y. Lee, S.-H. Lee, B.-G. Kim, H.-K. Cho
P04-14 Computer Modeling of the Schottky Electron Source G.A. Schwind, L.W. Swanson, S. Kellogg
P04-15 Electron Beam Direct Write of Chalcogenide Glass Integrated Optics Galen Hoffman, Ronald Reano
P04-16 Sculpting Electron Beam Profile and Phase with Nanofabricated Diffractive Optics Benjamin McMorran, Tyler Harvey, Jonathan Perry-Houts, Stefano Cabrini, Amit Agrawal, Henri Lezec
P04-17 Periodic tilted Au structure fabrication by electron beam exposure Jian Zhang, Babak Shokouhi, Bo Cui
P04-18 Electron beam lithography using dry thermal development Celal Con, Bo Cui
P04-19 Dose to clear in EBL: comparison of Monte Carlo predictions with experiment Bengt Nilsson
P04-20 Electron beam lithography with evaporated resist Jian Zhang, Bo Cui
P05-1 Electron impact gas ion source development; evaluation of different electron injection sources (Invited) Nannan Liu, Jeroen Anton van Kan, David Jun, Cornelis W. Hagen, Pieter Kruit
P05-2 Deposition and Characterization of Platinum Wires Deposited by a Neon Gas Field Ion Source Lewis Stern, David Ferranti, Humeng Wu, John Notte, Larry Scipioni, Thompson William, Philip Rack, Mike Phaneuf
P05-3 Tip shaping of gas field ion sources for optimal ion beam generation Jason Pitters, Radovan Urban, Robert Wolkow
P05-4 Progress Towards An Aberration-Corrected Low Energy Electron Microscope for DNA Sequencing and Surface Analysis Marian Mankos, Alpha NÕDiaye, Andreas Schmid, Henrik Persson, Khashadyar Shadman, Ron Davis
P05-5 Continuous roller photolithography and application to large area IR metamaterial fabrication Moon Kyu Kwak, Jong G. Ok, L. Jay Guo
P05-6 Stencil-nanopatterned back reflector increases efficiency of thin-film solar cells Veronica Savu, Cline Pahud, Mona Klein, Oscar Vazquez-Mena, Franz-Josef Haug, Christophe Ballif, Juergen Brugger
P05-7 Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration David Tanenbaum, Martin Hermenau, Eszter Voroshazi, Matthew Lloyd, Yulia Galagan, Birger Zimmermann, Markus Hsel, Henrik Dam, Mikkel J¿rgensen, Suren Gevorgyan, Laurence Lutsen+, Dirk Vanderzande+, Agns Rivaton, Gl_ah Uzuno_lu, Uli Wrfel, Monica Lira-Cantu, Roland Rsch, Harald Hoppe, Kion Norrman, Frederik Krebs
P05-8 Imprint-Templated Nanocoaxial Array Architecture Binod Rizal, Michelle Archibald, Jeffrey R. Naughton, Michael J. Burns, Stephen Shepard, Gregory McMahon, Thomas C. Chiles, Michael J. Naughton
P06-1 Optical Performance of Binary Mask with a Tantalum Telluride Absorber Layer for Extreme Ultraviolet Lithography (Invited) Hee Young Kang, Pazhanisami Peranantham, Chang Kwon Hwangbo, Hwan-Seok Seo, Seong-Su Kim
P06-2 Residual-type mask defect printability for EUV lithography Tsuyoshi Amano, Susumu Iida, Ryoichi Hirano, Tsuneo Terasawa, Hidehiro Watanabe, Yuichi Inazuki
P06-3 Dependence of Image Characteristics Dependece on Incident Electron Beam Energy for EUV Mask inspection using Monte Carlo simulation Susumu Iida, Tsuyoshi Amano, Ryoichi Hirano, Tsuneo Terasawa, Hidehiro Watanabe
P06-4 Image Compensation of Mask Misalignment in Aerial Image Microscope System Min-Chul Park, Young Min Jhon, Yong Tae Kim
P06-5 Modeling of defect transport in EUVL plasma chambers Alex Likhanskii, Chuandong Zhou, Peter Stoltz, Vibhu Jindal, Patrick Kearney, Arun John
P06-6 Direct nano-structuring of solid surface by extreme ultraviolet Ar8+ laser Karel Kolacek, Jaroslav Straus, Jiri Schmidt, Olexandr Frolov, Vaclav Prukner, Radek Melich, Andrei Choukourov, Jaroslav Sobota, Tomas Fort
P06-7 Understanding the sources of unwanted etch in ion beam sputter deposition production of EUV mask blanks Patrick Kearney, Vibhu Jindal, Alin Antohe, Frank Goodwin, Al Weaver, Pat Teora, John Sporre, David Ruzic, Peter Stoltz, Alex Likhanskii, Chuandong Zhou
P07-1 Focused Ion Beam Implantation of Li+ in WO3 Using A Magneto-Optical Trap Ion Source (Invited) Brenton Knuffman, Adam Steele, J. Brent Allen, Dmitri Ruzmentov, Alec Talin, Jabez McClelland
P07-2 Surface-Finishing of Focused Ion Beam Milled Features by Pulsed Electron Irradiation Nikola Vladov, James Murray, Adam Clare, Joel Segal, Svetan Ratchev
P07-3 Modeling for Multi-Beam Ion Imaging and Analysis David Joy, Ranjan Ramachandra
P07-4 A Mass Filtered Plasma FIB Charles Otis, Anthony Graupera
P07-5 A Quantitative Probe Current Distribution Characterization Technique for Focused Ion Beam Shida Tan, Richard Livengood, Yuval Greenzweig, Yariv Drezner, Darryl Shima
P07-6 Fabrication of Sealed Nano-channels Based on Sacrificial Nanotemplates by Focused-ion-beam Induced Chemical Vapor Deposition Ajuan Cui, Wuxia Li, Qiang Luo, Zhe Liu, Junjie Li, Changzhi Gu
P07-7 Focused-Ion-Beam Introduced Bidirectional Bending for Complex Three-Dimensional Structures Can Li, Zonggang Xu, Wengang Wu, Jun Xu
P07-8 A LARGE-APERTURE ION-BEAM LENS CORRECTED FOR BOTH CHROMATIC AND SPHERICAL ABERRATION Frederick Martin
P07-9 Helium ion beam lithography of thick HSQ resists Paul Alkemade, Anja van Langen-Suurling, Emile van der Drift, Emile van Veldhoven, Diederik Maas
P08-1 Study of nanospheres lithography technology with super-lens for fabricating nano holes Li shuhong, Du jinglei, Houi yidong
P08-2 Polymeric freestanding structures by direct write laser without sacrificial layers Vctor J. Cadarso, Karl Pfeiffer, Ute Ostrzinski, Jean-Baptiste Bureau, Georges-Andre Racine, Anja Voigt, Gabi Gruetzner, Jrgen Brugger
P08-3 Thermal control extends heated stencil's life-time Shenqi Xie, Veronica Savu, Juergen Brugger
P08-4 Scanning Probe Nanostructure Direct-Write: Serial and Parallel Patterning via High Field Chemistry Stephanie Vasko, Hideki Sato, Haoyu Lai, Wenjun Jiang, Scott Dunham, Marco Rolandi
P9-1 Electron scattering simulation for subsurface metrology in scanning electron microscope Nobuhiro Okai, Yasunari Sohda
P9-2 On Clean Samples and High-Resolution Quantitative Charged Particle Microscopy Andras Vladar, Kavuri Purushotham, Michael Postek
P9-3 Multiple phase-formation in Ni-Ge system monitored by SEM AFM, PIXE analytical techniques, Rudzani Nemutudi, Carlos Pineda-Vargas, Daniel Chilukusha, Craig Comrie, Adriaan Habanyama
P9-4 Nanoscale imaging, analysis and nano-fabrication using Helium Ion Microscope David Bell
P9-5 Near-Field EUV Imaging for Spatial Frequency Multiplication Yijian Chen, Yashesh Shroff
P10-1 Dry-Release Self-assembling of Microtube Arrays for Catalytic Micropump Application Jinxing Li, Zhaoqian Liu, Gaoshan Huang, Bing-Rui Lu, Yifang Chen, Yongfeng Mei, Ran Liu
P10-2 Bonding of PMMA nanofluidic devices and its effect on DNA behavior in nanochannels Jiahao Wu, Alborz Amirsadeghi, Bahador Farshchian, Franklin Uba, Steven Soper, Jinsoo Kim, Sunggook Park
P10-3 A superhydrophobic surface made from hydrophilic materials with micro-umbrella structures Qian Feng Xu, Bikash Mondal, Zhantong Mao, Alan M. Lyons, George Pat Watson
P10-4 Electrophoretic and electroosmotic flow through carbon nanotube membranes as chemical pumps Ji Wu, Bruce Hinds
P11-1 Molecular simulation of electron-irradiation damages in resist materials (Invited) Masaaki Yasuda, Kosei Araki, Hirofumi Sakai, Hiroaki Kawata, Yoshihiko Hirai
P11-2 Modeling of Counter Streaming Charged Beams in MICHELLEÐeBEAM Serguei Ovtchinnikov, Simon Cooke, Masis Mkrtchyan, Roman Shtokhamer, John Petillo, Alexander Vlasov, Baruch Levush
P11-3 Study of the Interaction of Polymethylmethacrylate Fragments with Methyl Isobutyl Ketone Mohammad Ali Mohammad, Kolattukudy Poulose Santo, Steven K. Dew, Maria Stepanova
P11-4 Charging process simulation of a resist film on Si substrate under electron beam irradiation Masatoshi Kotera, Akira Osada, Masaru Otani, Yasuhiro Ohara
P11-5 Fast Simulation of Stochastic Exposure Distribution in Electron-beam Lithography X. Zhao, S.-Y. Lee, S.-H. Lee, B.-G. Kim, H.-K. Cho
P12-1 Polymeric Substrates with Bioimprinted Micro- and Nanoscale Topography for Regulation of Chondrocyte Re-Differentiation Lynn M. Murray, Volker Nock, Maan M. Alkaisi, Joanne J. M. Lee, Tim B. F. Woodfield
P12-2 The Blood-Brain-Barrier Crossing in vivo using Magnetic Nanocapsules Seong Deok Kong, Jisook Lee, Chulmin Choi, Jirapon Khamwannah, Brian Eliceiri, Sungho Jin
P12-3 Nanometer Size Protein Patterning using nCP for the Investigation of Protein-Protein Interactions in Live Cells Andreas Rank, Iris Bergmair, Bernd Dittert, Michael Muehlberger, Stefan Sunzenauer, Gerhard Schuetz
P12-4 Nanoimprinted Electrodes for Highly Efficient and Stable Bio-Fuel Cells Richard Sundberg, Dmitry Suyatin, Ivan Maximov, Lars Montelius, Dmitrii Pankratov, Vladimir Popov, Sergey Shleev
P12-5 Screening T-Cell Activation with Nanostructured Substrates Alexander Gondarenko, Junqiang Hu, James Hone, Erdem Tabdanov, Edward Judokusumo, Lance Kam, Anastasia Liapis, Michael Dustin
P12-6 Microfluidic Axon-Isolation Device fabricated by Nanoimprint lithography Heinz D. Wanzenboeck, Andreas Amon, Johann Mika, Emmerich Bertagnollo
P12-7 Nanostructured and Active Electrostatic Trap for Confining Nanometric Objects in a Fluid: mimicking DNA-Protein interactions in a synthetic system Ashwin Panday, Brandon D. Lucas, Long Chen, L. Jay Guo
P12-8 Micro-nanofabricated platform technology for cell seeding experiments in neuro-nanobiology Regina Luttge
P13-1 Experimental Investigation on the Short Channel Effect of Nano-Imprinted Organic Field Effect Transistors (Invited) Lichao Teng, Robert Kirchner, Matthias Pltner, Andreas Jahn, Alexander Trke, Jian He, Yang Ge, Falk Hagemann, Wolf-Joachim Fischer
P13-2 Employing Nano Imprint to Fabricate Space-Charge-Limited Transistors (SCLTs) Lon Wang, Yang-Kai Wu, Hsiao-Wen Zan, Hsin-Fei Meng, Jian-Hao Huang, Wu-Wei Tsai
P14-1 Curved cantilever design for a robust and scalable microelectromechanical switch Daniel Grogg, Ute Drechsler, Armin Knoll, Yu Pu, Christoph Hagleitner, Michel Despont
P14-2 Nanomechanical Tuning Forks Fabricated by Focused-ion-beam Chemical Vapor Deposition Hiroki Ashiba, Reo Kometani, Shin'ichi Warisawa, Sunao Ishihara
P14-3 Bimaterial electro-mechanical systems for audio frequency applications Enrico Mastropaolo, Rhonira Latif, Thomas Koickal, Alister Hamilton, Rebecca Cheung, Michael Newton, Leslie Smith
P15-01 Full area real time monitoring of filling process by dark field illumination in UV nanoimprint lithography (Invited) Qing Wang, Hiroshi Hiroshima, Kenta Suzuki, Sung-Won Youn
P15-02 Large-Area Nanostructures by Laser-Scanning Imprinting (Invited) Toshimi Sato, Keisuke Nagato, Junho Choi, Tetsuya Hamaguchi, Masayuki Nakao
P15-03 Sub-100 nm three dimensional diffractive optical elements fabricated by UV light assisted roll-to-roll nanoimprint lithography Nikolaos Kehagias, Achille Francone, Clivia Sotomayor Torres
P15-04 A Tri-layer Method to Fabricate Wafer Scale Nanoimprint Mold by Copolymer Lithography Yixing Liang, Shoham Bhadra, Stephen Chou
P15-05 Control of Inclined Angle of Glass-like Carbon Mold by Defocus UV Exposure on Si Containing Photoresist Harutaka Mekaru, Chieko Okuyama, Akihisa Ueno
P15-06 Replacement of Trapped Air by Fluoride Liquid in Thermal Nanoimprint Harutaka Mekaru, Hiroshi Hiroshima
P15-07 Dual-Layer Thermal Nanoimprint Lithography without Dry Etching Yunbum Jung, Xing Cheng
P15-08 Characteristics of mechanical vibration in imprinted nanostructures Yuji Kang, Yasuki Nakai, Makoto Okada, Yuichi Haruyama, Shinji MatsuiÊ
P15-09 Pattern-size Effect of Reorientation of Photoinduced Liquid Crystalline Polymer by Thermal Nanoimprinting Makoto Okada, Mami Kurita, Emi Nishioka, Mizuho Kondo, Yuichi Haruyama, Akira Emoto, Hiroshi Ono, Nobuhiro Kawatsuki, Shinji Matsui
P15-10 High Volume Nanoimprint Lithography technology and applications Torbjrn Eriksson, Johan Ring, Gang Luo, Prasanna Venkatesh Krishnan, Babak Heidari
P15-11 Fast and Continuous Patterning on the Surface of Plastic Fiber by Using Thermal Roller Imprint Akihiro Ohtomo, Mitsunori Kokubo, Hiroshi Goto, Harutaka Mekaru, Hideki Takagi
P15-12 Au Nanorods and Nanogap Split-Ring Structures Fabricated by Reactive-Monolayer-Assisted Thermal Nanoimprinting and Electrodeposition Tatsuya Tomioka, Shoichi Kubo, Koichi Nagase, Morihisa Hoga, Masaru Nakagawa
P15-13 Release Layer Free Acrylate Resins for Ultraviolet Nanoimprinting Prepared by Adding Segregation Auxiliary Agents Shunya Ito, Cheol Min Yun, Kei Kobayashi, Masaru Nakagawa
P15-14 Fluoroalkyl-Containing Surfactants to Reduce Release Energy of UV-Cured Acrylate Resin Masaru Nakagawa, Yoshitaka Tsukidate
P15-15 High Density Pattern Transfer via Roll to Roll Ultraviolet Nanoimprint Lithograpy using Replica Mold Jun Taniguchi, Noriyuki Unno, Hiroki Maruyama, Masashi Saito, Hiroshi Yoshikawa, Go Tazaki, Toshiyuki Zento
P15-16 Development of continuous phase lithography and application to transparent conductor fabrication Moon Kyu Kwak, Jong G. Ok, L. Jay Guo
P15-17 Model of Curing Shrinkage and Kinetics Parameters of Acrylate-based UV-embossing Resist Based on Free Volume Theory Peng Jin, Nan Liu, Jie Lin, Philips Prewett
P15-18 Cleaning Defects of Soft UV-Nanoimprint Molds for High Aspect-Ratio Features Andreas Finn, Bo Lu, Robert Kirchner, Xaver Thrun, Karola Richter, Wolf-Joachim Fische
P15-19 Flow behaviors of a polymer according to the imprint velocity during pressing step in NIL JiHyeong Ryu, HyungJun Lim, Hyun-Ha Park, JaeJong Lee
P15-20 Release Agent Properties in Ultraviolet Nanoimprint Lithography using High-Aspect-Ratio Nanoscale Molds Jun Taniguchi, Junki Takahashi
P15-21 Impact of Mold-Resist Roughness on Friction and Adhesion Properties by Nano Tribological Inspection _ukasz Ocypa, Tomoki Nishino, Hiroaki Kawata, Yoshihiko Hirai, Zygmunt Rymuza
P15-22 Reorientation Evaluation of Bidirectional Line Pattern on Photoinduced Liquid Crystalline Polymer Fabricated by Thermal Nanoimprinting Makoto Okada, Mami Kurita, Emi Nishioka, Mizuho Kondo, Yuichi Haruyama, Akira Emoto, Hiroshi Ono, Nobuhiro Kawatsuki, Shinji Matsui
P15-23 Position control of MOVPE grown GaN nanorods using nanoimprint lithography Torbjrn Eriksson, Ki Dong Lee, Babak Heidari, Patrick Rode, Werner Bergbauer, Martin Strassburg
P15-24 Study on De-molding Kinetics of Peeling and Perpendicular Releasing in NIL process Tomoki Nishino, Hiroaki Kawata, Yoshihiko Hirai
P15-25 Release-Optimized UV-NIL Resists Hakan Atasoy, Marko Vogler, Freimut Reuther, Gabi Gruetzner
P15-26 Filling Characteristics of Imprint Process for Concave Pattern Molds Hiroaki Kawata, Yuuta Watanabe, Masaaki Yasuda, Yoshihiko Hirai
P15-27 Crosslinking control during imprint for hybrid lithography (T-NIL + UV-L) Khalid Dhima, Christian Steinberg, Andre Mayer, Saskia Mllenbeck, Si Wang, Hella-Christin Scheer
P15-28 Enhanced Transmission through Gold Nanohole Arrays Fabricated by Thermal Nanoimprint Lithography for Surface Plasmon Based Biological Sensing Josu Martinez-Perdiguero, Aritz Retolaza, Deitze Otaduy, Aritz Juarros, Santos Merino
P15-29 Injection compression molding of replica molds for nanoimprint lithography Keisuke Nagato, Tetsuya Hamaguchi, Masayuki Nakao
P15-30 Direct Nanoimprinting of Functional Inorganic Layers for Nanophotonic Chip Devices Carlos Pina-Hernandez, Christophe Peroz, Stefano Cabrini, Cosimo Calo, Scott Dhuey, Sergey Babin
P15-31 Directed self-assembly of PS-PEO using solvent vapors assisted nanoimprint lithography Claudia Simao, Achille Francone, Nikolaos Kehagias, Clivia Sotomayor-Torres, Dipu Borah, Parvaneh Mokarian-Tabari, Michael Morris
P15-32 Wire-Grid Polarizer by Nanoimprint Lithography Using Epoxysilsesquioxane Young Jae Shin, Carlos Pina-Hernandez, Hui Joon Park, L. Jay Guo, Moon Kyu Kwak, Jong G. Ok, Peng-Fei Fu
P15-33 Study of demolding Characteristics in continuous UV nanoimprinting Shuso Iyoshi, Makoto Okada, Yuichi Haruyama, Shinji Matsui, Kei Kobayashi, Shu Kaneko, Masaru Nakagawa, Hiroshi Hiroshima
P15-34 Development of jet rollable nanoimprint process to fabricate bio-polymer nanostructures Lichuan Chen, Gyu Kim, Hongbing Lu, Jinming Gao, Walter Hu
P15-35 Fabrication of Adhesion-free Transparent Roll Stamp for Large Area Patterning using UV-typed Roller Nanoimprint Lithography JaeJong Lee
P15-36 Fabrication of 3-dimensional Nanoimprint Stamps - A comparison of 4 approaches using FIB Heinz D. Wanzenboeck, Simon Waid, Emmerich Bertagnolli
P15-37 3-D Nanomolding Bahador Farshchian, Sooyeon Park, Jaejong Lee, Jinsoo Kim, Sunggook Park
P15-38 Thermal Imprinting Process using ZnO Nanoparticles-Dispersed Resin for the Improvement of Light Extraction Efficiency of GaN-based LEDs Kyeong-Jae Byeon, Han-Byeol Jo, Joong-Yeon Cho, Jin-Seung Kim, Moo-Hyun Kwon, Hyuk-Jin Cha, Heon Lee
P15-39 Reduction of proximity effects using high-contrast developer in fabricating large-area nanoimprint molds Minjun Yan, Jaesun Lee, Yujiao Sun, Ilesanmi Adesida, Debashis Chanda, John Rogers
P15-40 Effect of offset temperature on replication of laser-assisted imprinting Keisuke Nagato, Toshimi Sato, Tetsuya Hamaguchi, Masayuki Nakao
P16-01 Resonant Dielectric Nanostructures for biosensor applications (Invited) Mohamad Hojeij, Yasin Ekinci, Li Wang, Benedikt Oswald, Vitaliy Guzenko, Andreas Lieb, Jens Gobrecht
P16-02 Surface Chemical Imaging at the Nanoscale (Invited) Francesco de Angelis
P16-03 Tunable Plasmonic Light Trapping Metal Structures Aleksandr Polyakov, Kevin Thompson, Howard Padmore, Scott Dhuey, Deirdre Olynick, Stefano Cabrini, Peter Schuck
P16-04 Plasmonic Nanostructures Fabricated using Helium and Gallium Ion Beam Instruments. N.J. Zaluzec, D.J. Miller, J.M. Hiller, C. Huynh, L. Scipioni, M. Ananth
P16-05 Fabrication of nano metallic holes for color filter based on a controllable polystyrene spheres self-assemble Li shuhong, Du jinglei, Ren liangke
P16-06 Putting Plasmonic Probes in Perspective: The Case for the Campanile Tip Wei Bao, Stefano Cabrini, Alex Weber-Bargioni, P. James Schuck
P16-07 High aspect-ratio doped Si nanostructures for plasmonics induced light funneling applications Alex Kaplan, Haofei Shi, Lingjie Guo
P16-08 Embedding and Combining Plasmonic Elements and Photonic Crystal Structures Jrgen Probst, Max Schoengen, Nils Nsse, Janik Wolters, Bernd Lchel, Oliver Benson
P16-09 Lithium Niobate Nanowaveguides fabricated by Ion-Beam Enhanced Etching Reinhard Geiss, Holger Hartung, Frank Schrempel, Ernst-Bernhard Kley, Thomas Pertsch, Andreas Tnnermann
P16-10 Stitch-Error Free Electron Beam Lithography of Periodic Structures Jason Sanabia, Kevin Burcham, Michael Kahl, Ralf Jede
P16-11 Lithographically-Defined Nanostructures for Color Plasmonic Printing Karthik Kumar, Huigao Duan, Ravi S. Hegde, Samuel C.W. Koh, Jennifer Wei, Joel K.W. Yang
P16-12 Surface plasmon resonance coupling assisted optical transmission through Ag/SiN /Ag photonic crystal slabs Jia-Hong Shyu, Yu-chen Huang, Neil Ou, Huang-Ming Lee, Jong-Ching Wu
P16-13 The Sensing Properties of IR Nanostructed Plasmonic Crystals Fabricatied by Electron Beam Lithography and Argon Ion Milling Baogang Quan, Weijie Sun, Zhe Liu, Xiaoxiang Xia, Junjie Li, Changzhi Gu
P16-14 Non-periodic sub-wavelength gratings fabricated by helium ion beam lithography Zhen Peng, Wen-di Li, David Fattal, Ray Beausoleil
P16-15 A Novel Grating-Apodization Technique in Equivalent-Chirped Sampled-Bragg Gratings Jie Sun, Henry Smith
P16-16 Breaking the diffusion limit of nanosensors through super hydrophobic and nano plasmonic structures Francesco De Angelis
P16-17 Immersion Optics for Excitation of Surface Plasmons in a Transmission Mode Photoemission Electron Microscope Vignesh Viswanathan, Zhongkai Ai, Daniel Pickard
P16-18 Enhancement of Light-Emitting Efficiency for GaN-based Light-Emitting Diodes by Nanoscale Bump and Pit ITO Surface Zhe Liu, Gang Wang, Haifang Yang, Xiaoxiang Xia, Baoli Liu, Changzhi Gu
P16-19 Angle Independent Reflective Color Filters by Plasmonic-induced Light Funneling Effect Yi-Kuei Wu, Cheng Zhang, Jay Guo
P17-01 Lithographically Designed Porous Plasmonic Nanostructures (Invited) Jung-Sub Wi, Satoshi Tominaka, Kohei Uosaki, Tadaaki Nagao
P17-02 Preparation of surfaces with patterned roughness for sensing application Si Wang, Khlid Dhima, Andre Meyer, Saskia Mllenbeck, Hella-Christin Scheer
P17-03 Template-Assisted Self-Assembly and Alignment of ZnO Nanowires with Post-Deposition Growth Tao-Hua Lee, Xing Cheng
P17-04 Pyramid Array Substrates for Biomedical Studies Ronny Loeffler, Monika Fleischer, Dieter Kern, Claudia Matschegewski, Susanne Staehlke, Barbara Nebe
P17-05 Etching Process for Patten Transfer from Sphere-type PMMA-b-PMAPOSS Block Copolymer Taku Iwase, Masaru Kurihara, Yoshiyuki Hirayama, Yasuhiko Tada, Hiroshi Yoshida
P17-06 Continuous Electron Beam Lithography Writing Modes for Optical Waveguide Nanofabrication Frank Nouvertne, Guido Piaszenski, Michael Kahl, Ruud Schmits, Pavol Bodis
P17-07 Fabrication of Polymer Nanostructures via Maskless O2 Plasma Etching Ke Du, Yuyang Liu, Ishan Wathuthanthri, Wei Xu, Chang-Hwan Choi
P17-08 Nanolithography and pattern transfer of dense sub-10 nm lines Aju Jugessur, Mariya Yagnyukova, J. Stewart Aitchison
P17-09 Fabrication of Hollow-Shell Nano-volcanoes from Mie Scattering of Colloidal Nanospheres Xu A. Zhang, Jonathan Elek, Chih-Hao Chang
P17-10 Fabrication of omniphobic surfaces using deposited silicon dioxide layer and dry etching process Chulmin Choi, Jirapon Khamwannah, Duyoung Choi, Chin-Hung Liu, Seong-Deok Kong, Sungho Jin
P17-11 Optical and Electrical Sensing application of High-Aspect-Ratio Nanoholes Formed by Etching of Latent Tracks Makoto Fujimaki, Ken-ichi Nomura, Koichi Awazu, Kouta Yamashita, Seigo Mizuno, Yoshimichi Ohki
P17-12 Negative electron-beam resist hard mask ion-beam etching process for the fabrication of nanoscale magnetic tunnel junctions Sungwoo Chun, Daehong Kim, Jihun Kwon, Bongho Kim, Hyungyu Lee, Seonjun Choi, Seung-Beck Lee
P17-13 Non-planar nano-arc-gap arrays fabricated via colloidal lithography Chongjun Jin, Yang Shen
P17-14 Optimization of a Self-Closing Effect to Produce Bottle-Shaped Nanochannels in Quartz Mariusz Graczyk, Martina Balaz, Heiner Linke, Ivan Maximov
P17-15 E-Beam Patterning of Nanoparticle Filled Sucrose Resist Kevin Roberts, Bryan Cord, Greg Cibuzar
P17-16 Nanowires with controlled location and direction by surface-guided growth from patterned catalyst Mark Schvartzman, David Tsivion, Ernesto Joselevich
P17-17 From Nanocone to Nanodisk: Structural Transformation of Nanoarrays via Mechanical Stresses Yuyang Liu, Ke Du, Ishan Wathuthanthri, Chang-Hwan Choi
P17-18 Fresnel zone plates as X-ray lenses by electron beam lithography with HSQ resist Yifang Chen, Yingtao Tian, Adnan Malik, Derek Jenkins, Graham Arthur
P17-19 Withdrawn
P17-20 Growth Characterization of Electron Beam Induced Silver Deposition from Liquid Precursor Leonidas Ernesto Ocola, Cynthia Kessel, Brian Chen, Alexandra Joshi-Imre, Johnathan Park, Ralu Divan
P17-21 Nanopatterning of ÒDisconnectedÓ Metal Nanostructures on Polydimethylsiloxane (PDMS) Substrate by Using Free-Standing Photoresist Film as Stencil Lithography Mask Ke Du, Yuyang Liu, Ishan Wathuthanthri, Wei Xu, Chang-Hwan Choi
P17-22 Nanofabrication with Si(311) Nicolaie Moldovan, Ralu Divan
P17-23 Tunable silver nano-pillar arrays as a surface-enhanced Raman scattering sensor by a self-aligned nanofabrication process Wenjun Zhang, Xin-Ping Qu, Bing-Rui Lu, Yifang Chen
P17-24 Novel techniques for modifying microtube surface with various periodic structures ranging from nano to micro scale Zhaoqian Liu, Jinxing Li, Gaoshan Huang, Bingrui Lu, Yifang Chen, Yongfeng Mei, Ran Liu
P17-25 3D Patterning of Si Micro and Nano Structures by Focused Ion Beam Implantation, Si Deposition and Selective Si Etching Andreas C. Fischer, Kristinn B. Gylfason, Lyubov M. Belova, B. Gunnar Malm, Mohammadreza Kolahdouz, Gran Stemme, Yuri G.M. Rikers, Frank Niklaus
P17-26 Fabrication of Nanostructured Hydrophobic Surfaces with Laser Interference Lithography Hang Yu, Bing-Rui Lu, Hui Li, Jianying Li, Zhaoqian Liu, Ran Liu, Yifang Chen
P17-27 Fabrication and magnetic properties of hundred-nanometer-scaled permalloy cylinders arrays Y. C. Huang, C. Y. Kuo, Jia-Hong Shyu, C. M. Lee, Lance Horng, J. C. Wu
P17-28 Patterning of porous silicon nitride membrane by CsCl self assembly Wenhan Liu, Mark Ferguson, Mustafa Yavuz, Bo Cui
P17-29 Inductively Coupled Plasma Etching of Benzocyclobutene with SF6 Chemistry Erica Douglas, Jeffrey Stevens, Randy Shul, Stephen Pearton
P17-30 Engineering electrical properties of Silicon nanowires by focused electron beam induced processing with Chlorine Heinz D. Wanzenboeck, Bassem Ismail, Peter Roediger, Johannes Greil, Martin Hetzel, Alois Lugstein, Emmerich Bertagnolli
P18-01 Fast Aerial Image Simulation for Partially Coherent Systems by TCC Decomposition with Analytical Kernels (Invited) Peng Gong, Wen Lv, Xinjiang Zhou, Shiyuan Liu
P18-02 Talbot effect immersion lithography by self-imaging of very fine grating pattern Takashi Sato
P18-03 Fabrication of a Binary Phase Grating on a Fiber End by Utilizing Interference Lithography Ching-Tung Tseng, Shih-Chieh Lin, Yung-Pin Chen, Yang-Kai Wu, Yi-Chuan Tseng, Lon A. Wang
P18-04 Analysis on probe-sample interaction for scanning near-field photolithography (snp) zhuming liu, Clive Roberts, Yuan Zhang, John Weaver, Graham Leggett
P18-05 Sensitivity Analysis for Lens Aberration Measurement in Lithographic Tools Using CTC-Based Quadratic Aberration Model Shuang Xu, Xiaofei Wu, Tielin Shi, Zirong Tang, Shiyuan Liu
P18-06 Mask Aligner Process Simulation for Advanced Lithography and Resolution Enhancement Techniques Michael Hornung, Ulrich Hofmann, Nezih nal, Uwe Vogler, Arianna Bramati, Tina Weichelt, Reinhard Voelkel
P19-01 Continuous fabrication of polymer waveguides with smooth sidewalls by Dynamic Nano-Inscribing (DNI) and NanoChannel-guided Lithography (NCL) processes (Invited) Jong G. Ok, Cheng Zhang, Tao Ling, L. Jay Guo
P19-02 Vibrant color transmission under cross-polarization through gold-coated gratings nanoimprinted in polymer foils Keith Morton, Teodor Veres
P19-03 Fabrication of a band-limited mask for PHARO Ivan Kravchenko, Justin Crepp
P19-04 Continuous fabrication of large-area flexible metamaterial via Roll-to-Roll nanopatterning for IR filter applications Jong G. Ok, Hong Seok Youn, Moon Kyu Kwak, Myung-Gyu Kang, L. Jay Guo, Anton Greenwald, Y Liu, S Radhakrishnan
P20-1 Multi-domain storage in graded bit patterned media (Invited) Long Chang, Paul Ruchhoeft, Sakhrat Khizroev, Dmitri Litvinov
P20-2 Fabrication of dense non-circular nanomagnetic device arrarys using self-limiting low-energy glow-discharge processing ZHEN ZHENG, LONG CHANG, PAUL RUCHHOEFT, SAKHRAT KHIZROEV, DMITRI LITVINOV
P20-3 Fabrication of CoCrPt Alloy Bit Patterned Media at 1 Td/in2 for Recording Measurement Elizabeth Dobisz, Dan Kercher, Michael Grobis, Jordan Katine, Olav Hellwig, Ernesto Marinero, Dieter Weller, Neil Robertson, Thomas Albrecht
P20-4 Development of a large areal metallic nano stamp fabrication process using UV nanoimprinting and pulse reverse current electroforming for discrete track media with pattern width of 35nm Jiseok Lim, Jungjin Han, Eikhyun Cho, Young-joo Kim, Shinill Kang, Jinbeyung Lee, Hiroshi Hatano, Norikazu Arai
P21-1 High resolution dry photo-ablation development (Invited) Adam Schwartzberg, Pradeep Perera, Dimas Garcia de Oteyza, Martin Schmidt, Scott Dhuey, Bruce Harteneck, Rolf Falch, James Schuck, Stefano Cabrini, Deirdre Olynick
P21-2 An In situ Analysis of EUV Resist Film Inhomogeneity during the Dissolution Process Toshiro Itani, Julius Joseph Santillan
P21-3 Relationship between Film Thickness Loss and Polymer Deprotection for EUV and ArF Photoresists Gustaf Winroth, Roel Gronheid
P21-4 Point spread function analysis of dense high resolution nanodots in hydrogen silsesquioxane Devin Brown, Caitlin Chapin, Ezra Kim, Gerald Lopez, Nezih Unal, Ulrich Hoffman
P21-5 Determination of Base Dose and Scattering Coefficients for Proximity Effect Correction in Electron Beam Lithography Guy DeRose, Bophan Chhim, Axel Scherer, Scott Lewis, Damien Jeanmaire, Lucio Piccirillo
P21-6 High resolution patterning of Hafnium oxide based resist by EUV and Electron beam lithography Mohamad Hojeij, Michaela Vockenhubera, Wang lI, Vitaliy Guezenko, Jens Gobrecht, Yasin Ekinci
P21-7 Resolution improvement for positive tone poly(methyl methacrylate) resist Jose P. Arrieta, Vitor R. Manfrinato, Karl K. Berggren
P21-8 Enhancing the Etch Resistance of PMMA-Based Photoresist to Meet ITRS Target from Year 2022 Yu-Chih Tseng, Anil Mane, Junling Lu, Jeffrey Elam, Seth Darling
P22-1 Patterning Silver Using an Atomic Force Microscope and Laser-induced Deposition from Liquids (Invited) Carlos Andres Jarro, Eugene U. Donev, Greg Schardein, J. Todd Hastings
P22-2 Additional and correction patterning of resist layer using scanning probe lithography Jun Taniguchi, Takao Inoue, Toshihiko Ochi
P22-3 Automated position corrections for Atomically Precise STM lithography of Si(001):H Justin Alexander, Joshua Ballard, Ehud Fuchs, James H. G. Owen, John N. Randall, James R. Von Ehr
P22-4 SPM Local Oxidation and In-situ Characterization Using AFM Probes in Multiple Modes Weihua Hu, James Bain, David Ricketts
P22-5 Fabrication of nano structures for Dimensional Metrology and Device Applications Pradeep Namboodiri, Kai Li, Joseph Fu, Gheorghe Stan, Richard Silver
