EIPBN

EIPBN 2023 Table of Contents


Section Abstract and Authors
Wednesday, May 31, 2023
8:30 am – 11:00 am PST
Plenary Speakers
Plenary 1
What's Next in Computing: Scaling with Classical + Quantum Information, Darío Gil (IBM)

A new paradigm is emerging, quantum computing, with the potential to solve problems intractable for classical computers. The intersection of quantum and classical computation will bring unprecedented computing power and efficiency. In this plenary, we will discuss this future of computing, its implications, and how we could fulfill it.

Plenary 2 Scalable Nanofabrication for Functional Nanophotonics, Teri Odom (Northwestern University)

This talk will describe how metal nanoparticle lattices can function as a powerful platform for smart nanoscale materials. Advances in the design and fabrication of plasmonic lattices based on surface engineering and their expanded applications, from nanoscale lasing to strong coupling to photo-electrocatalysis to auto-regulatory materials, will be discussed.

Plenary 3 Wearable Sweat Sensors - Towards Big Data for Human Health, Ali Javey (University of California, Berkeley)

Wearable sensor technologies play a significant role in realizing personalized medicine through continuously monitoring an individual's health state. Human sweat is an excellent candidate for non-invasive monitoring. I will present our recent advancements on fully-integrated perspiration analysis systems that can simultaneously measure sweat rate, metabolites, electrolytes, drugs and heavy metals.

Wednesday, May 31, 2023
1:20 pm – 3:10 pm PST
Session 1A – Nanoelectronics/Nanomagnetics
Session Chairs: Henry Smith (Massachusetts Institute of Technology), Dan Ward (HRL labs)
1A-1 (Invited)
Nanoelectronics/Nanomagnetics
Picosecond Spintronics for On-Chip Memory Applications, Jeffrey Bokor (University of California at Berkeley)

We have demonstrated that picosecond charge current pulses are effective at initiating ultrafast magnetization switching. These purely electrical ps magnetic switching mechanisms are suitable for on-chip integration with CMOS, opening up the possibility of ultrafast, embedded, high density nonvolatile magnetic memory, with greatly increased energy efficiency compared to existing SRAM.

1A-2
Nanoelectronics/Nanomagnetics

Multiplexing Rubbing-Induced Site-Selective (RISS) Production of Bi2Se3 Based Memristive Devices,Mingze Chen, Xiaogan Liang (University of Michigan)

We report our recent progress in leveraging the RISS technology to realize site-selective growth of Bi2Se3 features. We further report the memrsitive switching behavior observed from the resistors made from such RISS-produced Bi2Se3 channels, which reveals the potential of RISS-produced Bi2Se3 in the application fields related to neuromorphic devices.

1A-3
Nanoelectronics/Nanomagnetics

Dielectric Engineering Using High-k BaTiO3 and in-situ SiN for Breakdown Enhancement and Current Dispersion Suppression in AlN/GaN HEMTs, Junao Cheng, Can Cao, Mohammad Wahidur, Rahman Siddharth Rajan, Wu Lu (The Ohio State University)

In this work, we report a high-k BaTiO3 (BTO)/Al2O3/in-situ SiN dielectric structure underneath the gate for passivation and field management for breakdown voltage enhancement and suppression of current dispersion.

1A-4
Nanoelectronics/Nanomagnetics

Hybrid Tuning of Sub-filaments to Improve Analog Switching Performance in Memristive Devices, Pan Hu; Sushmit Hossain, Zerui Liu, Deming Meng, Yunxiang Wang, Tse-Hsien Ou, Zhi Cai, Yudi Shi (University of Southern California); Mark Barnell, Qing Wu (Air Force Research Laboratory, Information Directorate); Stephen B. Cronin, Wei Wu (University of Southern California)

We report a method to improve the analog switching performance of memristors through a hybrid tuning of two sub- filaments. One sub-filament takes charge of a coarse adjustment, and the other is responsible for a fine adjustment. The hybrid tuning results in a dynamic range from 600 Ω to 50 kΩ.

1A-5
Nanoelectronics/Nanomagnetics

Robust Ferroelectricity with Suppressed Leakage Current in Ultrathin HfO2/ZrO2 nanolaminates, Guan Feng, Xiaodong Wang (Fudan University); Yize Sun (University of Science and Technology of China); Hao Jiang, Yingfen Wei (Fudan University)

We systematically studied ultrathin ferroelectric HfO2/ZrO2 nanolaminate (NL) films. The capacitors based on 4 nm NL film demonstrated high ferroelectricity (double remnant polarization (2Pr) ~ 20 μC/cm2), low coercive voltage (Vc ~ 0.5 V), >50 X decrease in leakage current when compared with the conventional Hf0.5Zr0.5O2 solid solution (SS) film.

Wednesday, May 31, 2023
1:20 pm – 2:50 pm PST

Session 1B – Optical and Direct-Write Lithography
Session Chairs: Todd Hastings (University of Kentucky), Li Jiang (Tuskegee University)

1B-1 (Invited)
Optical and Direct-Write Lithography

Additive Manufacturing of Structures and Electronics: Robotic metamaterials that walk, talk and listen, Xiaoyu (Rayne) Zheng (University of California at Berkeley)

In this talk, I will present a suite of new multi-material additive manufacturing processes and design methodologies to create electronic materials with prescribed structural and functional behaviors. I will present the manufacturing and synthesis of these robotic materials, as well as their mechanics and design methods underpinning their novel behaviors.

1B-2
Optical and Direct-Write Lithography

Direct laser writing of tapered polymer probes for flexible fiber-to-device coupling and wafer-scale optical probing, Edgar Perez, Tahmid Sami Rahman (University of Maryland); Kartik Srinivasan (National Institute of Standards and Technology)

Direct laser writing is used to fabricate 3-dimensional tapered polymer probes with diameters of approximately 1 micron to evanescently couple to on-chip nanophotonic devices for flexible, non-destructive, and wafer-scale optical characterization. Probes utilize suspended waveguides longer than 30 microns, and surface tension is alleviated with auxiliary structures and low-tension solvents.

1B-3
Optical and Direct-Write Lithography

Direct writing immersion laser lithography on graphene monolayers using 2-photon absorption, Jianran Zhang, Johanna Reif, Shouzhuo Yang, Carsten Strobel, Thomas Mikolajick, Robert Kirchner (Technische Universitt Dresden, Center for Advancing Electronics Dresden)

In previous studies, immersion oil is sometimes applied for Two-photon absorption direct laser writing. Our experiments showed that while the immersion time is too long, oil would probably interact with the photoresist and create new and difficult-to-remove compounds with the photoresist. The changed photoresist can neither be exposed nor developed.

1B-4
Optical and Direct-Write Lithography

Localized Electrochemical Deposition of Multi- Metal Structures by Hydrodynamic Flow Confinement, Daniel Widerker, Moran Bercovici (Technion, Israel Institute of Technology); Govind Kaigala (University of British Columbia)

Localized electrochemical deposition is an established approach for direct writing of microscale metal structures. However, to date this method is limited to single materials. We here present a device and method that leverages hydrodynamic flow confinements to enable localized electrochemical deposition of microscale multi-metal structures.

Wednesday, May 31, 2023
1:20 pm – 3:10 pm PST
Session 1C – Nanobiology
Session Chairs: Stella Pang (City University of Hong Kong), Regina Luttge (Eindhoven University of Technology)
1C-1 (Invited)
Nanobiology

Window to the Rhizosphere: Creating Engineered Habitats to Understand Plant and Microbial Community Development Underground, Scott Retterer (Oak Ridge National Laboratory)

Methods for systematically varying the complexity of engineered habitats with soil-like microfluidic networks have been refined to explore the impact of spatial confinement and network complexity on the growth, migration, and development of plants, bacteria, and fungi in soil-like environments.

1C-2
Nanobiology

Molecular Scale Spatio-Chemical Control of the Activating-Inhibitory Signal Integration in NK Cells, Esti Toledo; Guillaume Le Saux; Avishay, Maor Rosenberg, Viraj Bhingardive, Uzi Hadad, Olga Radinsky, (Ben-Gurion University of the Negev); Ana-Sunana Smith, (IZNF, FAU Erlangen-Nrnberg); Angel Porgado,r Mark Schvartzman (Ben-Gurion University of the Negev)

Here we produced a multifunctional platform with molecular scale spatial control of ligands. This platform was fabricated by an "out-of-the-box” fabrication approach, which included nanoimprint lithography with double-angle evaporation. This platform was conceived by bimetallic nanodot patterning with a molecular-scale registry, followed by ternary functionalization with distinct moieties.

1C-3
Nanobiology

Micro-patterned surface for Phaeobacter inhibens biofilm growth in a flow-cell system for biosynthetic production of the antibacterial compound TDA, Yuyan Liu, Droumpali Ariadni, Xavier Ferrer Florensa, Claus Sternberg, Paul Kempen, Lone Gram, Rafael Taboryski (Technical University of Denmark)

Growing probiotic bacteria in the aquaculture, to biosynthesize antibacterial compounds, has become a promising way to control the infections. In our research, a polymeric microfluidic chamber, incorporated with three different surfaces of planar, pit, and pillar arrays was studied. The result indicates the enhancement of the antibacterial effect by micropatterns.

1C-4
Nanobiology

A workflow for nanoscale imaging of cardiomyocytes differentiated from pluripotent stem cells, Leeya Engel (Technion - Israel Institute of Technology); Richard G. Held (Stanford University); Alison K. Vander Roest (University of Michigan); Magda Zaoralova (Stanford University); Daniel Bernstein (Stanford University); William I. Weis (Stanford University); Alexander R. Dunn (Stanford University)

We present a workflow for imaging pluripotent stem cell induced cardiomyocytes at the nanoscale using cryo-electron tomography together with maskless photo-micropatterning of electron microscopy grids and cryo-focused ion beam milling. This workflow will enable us to resolve structural differences between normal cardiomyocytes and those bearing disease-causing mutations.

1C-5
Nanobiology

Rapid Bacteria Extraction from Whole Blood Using a Pneumatically-Regulated Nano-Sieve Device, Xinye Chen (Rochester Institute of Technology); Ke Du (University of California Riverside)

This pneumatic-regulated and micro-beads patterned nano-sieve device is able to purify the bacteria from whole blood by combining with a solid phase immunoassay. The pneumatic chamber allows the bacteria capture at high flow rate without leaking issues, meanwhile reaching a very high capture efficiency of target bacteria.

Wednesday, May 31, 2023
3:30 pm – 5:20 pm PST
Session 2A – Electron Beam Lithography 1
Session Chairs: Dieter Kern (University of Tuebingen), Gerald Lopez (University of Pennsylvania)
2A-1 (Invited)
Electron Beam Lithography 1

Additive Nano Manufacturing of Insulators and Semiconductors Grown by Direct-Write 3D Nanoprinting, Scott Lewis, Guy A. Derose (California Institute of Technology)

We present new materials that can be transformed into insulators and semiconductors when exposed with an electron beam. These materials can be sublimed onto a substrate and exposed to an electron beam which writes the pattern into the material. This process is repeated to produce 3D nanostructures.

2A-2
Electron Beam Lithography 1

Fabrication of shallow, ultra-smooth 2.5D profiles in Silicon by HSQ grayscale lithography and through-mask oxidation, Vitaliy Guzenko, Nazanin Samadi, Christian David (Paul Scherrer Institute)

We present a novel patterning technique, utilizing hydrogen silsesquioxane (HSQ) as a resist for grayscale EBL and subsequent transfer of the 2.5D profile into Silicon by dry thermal oxidation. This method allows for fabricating high efficiency reflective X-ray optical elements with complex functionalities.

2A-3
Electron Beam Lithography 1

Optimizations on the conductive electron beam coating Electra 92 and the HSQ-alternative Medusa 82, Mandy Sendel, Harry Biller, Maik Gerngro (Allresist GmbH); Matthias Schirmer (CEO); Daniel Langheinrich (Fraunhofer Institute for Electronic Nanosystems); Susanne Hartmann (Chemnitz University of Technology, Center for Microtechnologies,); Georg Heldt, Christian Helke (Fraunhofer Institute for Electronic Nanosystems ENAS)

Allresist and the Fraunhofer Institute for Electronic Nanosystems (ENAS) report on our HSQ alternative, the Medusa 82, and present the first results of our current Electra 92 variant, the AR-PC 5092.02, which is a protective electron beam coating used to minimize charging.

2A-4
Electron Beam Lithography 1

Electron-beam patterning of photoluminescent structures in polystyrene using water vapor, Deepak Kumar, Todd Hastings (University of Kentucky)

It is known that electron-irradiation transforms polystyrene (PS) from a non-luminescent polymer into a luminescent material. For example, photoluminescence (PL) from irradiated PS results from formation of polycyclic-aromatic-hydrocarbons (PAH) or carbon dots. Prior efforts motivated us to study the effect of water-vapor on e-beam induced synthesis of fluorophores in polystyrene.

2A-5
Electron Beam Lithography 1

Plasmonic Nano-Disks Arrays made with EBL using the Dots-On-The-Fly Method, Marc Christophersen (Naval Research Laboratory)

Plasmonics and metamaterials have attracted considerable attention over the past decade; these structures are routinely patterned by EBL. For practical application, a large surface area coverage by uniform nanostructures is required. Therefore, accelerating EBL patterning speed for these structures will pave the way towards more practical applications.

Wednesday, May 31, 2023
3:30 pm – 5:00 pm PST
Session 2B – Metasurface/Meta-Optics
Session Chairs: Wei Wu (University of Southern California), David Czaplewski (Argonne National Lab)
2B-1 (Invited)
Metasurface/Meta-Optics

Subwavelength Moiré Index Lens-Array – Flat, Ultra-Thin, Large NA, and Patterned by Large Area Nanoimprint Using a Mold Formed by Multiple-Double-Nanoimprint, Stephen Chou (Princeton University)

The structure, fabrication, and demonstration of a new micro-lens-array, termed "subwavelength Moiré Index lens- array” (SMIL), that has a gradient optical index, in a ultra-thin (~100 nm) flat material layer, created by a subwavelength Moiré pattern resulted from superpositions of two or more periodic structures (e.g., grating or grid).

2B-2
Metasurface/Meta-Optics

Scalable Nanoimprint Manufacturing of Multi-layer Metasurfaces for Compact Polarimetric Imaging System, Shinhyuk Choi, Jiawei Zuo, Nabasindhu Das, Yu Yao, Chao Wang (Arizona State University)

Metasurface structures are attractive in broad optical applications. Conventional nanofabrication based electron beam lithography (EBL) is very expensive for scalable production and faces challenges for multi-layer integration. Here we propose and demonstrate a multi-functional-direct-NIL (MFD-NIL) process to integrate multiple layers of metasurfaces for high-performance on-chip polarimetric imaging.

2B-3
Metasurface/Meta-Optics

Enhancement of Transmission and Wavelength Selectivity of Spiral Bull's Eye Structure by Spiral-shaped Bragg Reflector, Tatsunori Oiwa, Shin'ichi Warisawa, Reo Kometani (The University of Tokyo)

OWe proposed spiral Bragg reflector, which encircles spiral bull's eye structure (SBE). It was demonstrated that spiral reflectors enhance both peak transmission and wavelength selectivity of SBE. This result shows that spiral Bragg reflector reflects outward propagating surface plasmon polariton and alters transmission characteristics of encircled SBE.

2B-4 (Invited)
Metasurface/Meta-Optics

Inverse Designed Volumetric Metaoptics for Sorting Light by Color, Polarization, and Spatial Mode, Gregory Roberts, Conner Ballew, Tianzhe Zheng, Ian Foo, Phillippe Pearson, Andrei Faraon (California Institute of Technology)

Volumetric metaoptics are refractive index distributions patterned at subwavelength scales. This represents a vast design space for creating multifunctional optical devices. We present optimized nanophotonic scattering structures capable of sorting light based on its color, polarization, and spatial mode. Further, experimental results of multilayer structures are shown for mid-infrared wavelengths.

Wednesday, May 31, 2023
3:30 pm – 5:20 pm PST
Session 2C - Directed Self-Assembly
Session Chairs: Alex Liddle (National Institute of Standards and Technology), James Watkins (University of Massachusetts Amherst)
2C-1 (Invited)
Directed Self-Assembly

Directed Self-assembly of Bottlebrush, Rod-Coil, and Multiblock Copolymers, Caroline Ross (MIT)

We will describe block copolymer morphologies, including zigzags, bends, junctions, tiling patterns and hierarchical structures with two independently tunable periods, and their application to nanolithography and nanofabrication. Combinations of novel polymers, templating approaches, and processing techniques yield an extensive array of rectilinear and 3D pattern geometries, expanding current DSA capabilities.

2C-2
Directed Self-Assembly

Autonomous discovery of emergent morphologies in directed self-assembly of block copolymer blends, Aaron Stein (Brookhaven National Laboratory)

We demonstrate machine-guided discovery of emergent morphologies from cylinder/lamellae BCP blend, conducted without human intervention. This approach maps the morphology-template phase space in a fraction of the time required by manual characterization, highlighting regions deserving detailed investigation. These studies reveal localized, template-directed partitioning of coexisting subdomains manifesting as new morphologies.

2C-3
Directed Self-Assembly

Fabricating ultrathin isoporous membranes as a platform to understand nanoscale aqueous transport behavior, Wen Chen (University of Chicago); Feng Gao, Seth Darling (Argonne National Laboratory); Paul Nealey (University of Chicago)

The use of block copolymer nanolithography to fabricate free-standing ultrathin isoporous silicon nitride membranes.The membrane fabrication satisfies the requirements for uniformity, qunatative strcustural analysis, mechanical stability, porosity and reproducibility at wafer-level. It allows us to establish an ideal platform to study fundamental transport processes.

2C-4
Directed Self-Assembly

Nanofabrication via Force Engineering for Extreme Nanodevices, Weikun Zhu, Patricia Jastrzebska-Perfect, Farnaz Niroui (Massachusetts Institute of Technology)

We present a fabrication platform where nanoscale forces, including van der Waals and capillary, are engineered to guide scalable and deterministic integration of colloidal nanoparticles into active devices with single-particle resolution and sub-50 nm placement precision. Example applications in developing on-chip nanoscale light-emitting diodes, nanoactuators, and plasmonics will be discussed.

Thursday, June 1, 2023
8:00 am – 9:50 am PST
Session 3A – Electron and Ion Beam Sources
Session Chairs: Carla Perez Martinez (University College London), Vitaliy Guzenko (Paul Scherrer Institute)
3A-1 (Invited)
Electron and Ion Beam Sources

Recent Advances and Applications of Spindt Field Emitters, Christopher Holland, Paul R. Schwoebel, Sterling E. McBride (SRI International)

Spindt field emitter array cathodes have demonstrated unsurpassed emission performance. Each different application places different demands on the array. We discuss three applications under development: mm-wave TWTs, magnet free ion pumps, and mercury ion based atomic clock and the requirements on the cathode array and the status of development.

3A-2
Electron and Ion Beam Sources

Ion Microscopy, Machining, and Elemental Analysis with the Cesium Low Temperature Ion Source (LoTIS), Adam Steele, Andrew Schwarzkopf, Brenton Knuffman (zeroK NanoTech)

We present FIB and SIMS instruments that include the Cs+ low Temperature Ion Source. The systems are best suited for high-resolution nanofabrication, microscopy, and elemental analysis.

3A-3
Electron and Ion Beam Sources

Low temperature Caesiums ion source in a standalone FIB system used for imaging and milling processes, Thomas Loeber, Bert Laegel, Georg von Freymann (RPTU)

In this work we show our first results with a new kind of Cs FIB made by ZeroK. All of the results are compared with measurements achieved with a standard FEI Helios Ga FIB. Beside imaging the Cs FIB is also used for structuring of different materials.

3A-4
Electron and Ion Beam Sources

Focused Ion Beam Milling with Cold Rubidium, Kaih Mitchell, Rory Speirs, Christopher Billington, Andrew McCulloch, Robert Scholten (The University of Melbourne)

To achieve a high-brightness focused ion beam (FIB) for nanofabrication and imaging, we have developed a laser- cooled rubidium FIB. Our apparatus aims to achieve a higher beam brightness and a smaller focus spot size than existing state of the art gallium FIB systems and can be adapted for unique capabilities.

3A-5
Electron and Ion Beam Sources

Fabrication of high-resolution x-ray source with carbon nanotube emitters based electron beam(C-beam), YiYin Yu, Ketan Bhokkar, Kyu Chang Park (Kyung Hee University at Seoul)

We developed high-resolution x-ray source with CNT based electron sources. With optimized design C-beam design and one focusing electrode, we could obtain focal spot size less than 100 um and higher dose geration at fixed mAs . Dtail of the C-beam electron emitter design, FSS, dose relationship would present.

Thursday, June 1, 2023
8:00 am – 9:30 am PST
Session 3B – Metrology and Characterization 1
Session Chairs: Larry Muray (KLA), Chih-Hao Chang (University of Texas at Austin)
3B-1 (Invited)
Metrology and Characterization 2

Continuous inline metrology of roll-to-roll micro-contact print process, Xian Du, Jingyang Yan, Rui Ma (University of Massachussets Amherst)

To solve inline metrology problems in quality monitoring and controlling the R2R micro-contact print process, we proposed a real-time imaging technique based on controlled condensation figures and closed-loop feedback image registration. Our experimental results showed that the method can achieve high-precision pattern metrology for a continuous R2R print process.

3B-2
Metrology and Characterization 1

Complete Compressed Sensing System for Scanning Probe Microscopy, Ed Principe (Synchrotron Research, Inc.); Jeffery J. Hagen, Brian W. Kempshall, Kirk M. Scammon (PanoScientific, LLC)

An approach to overcome barriers to practical Compressed Sensing (CS) implementation in scanning probe instruments is presented which integrates scan generator hardware specifically developed for CS, a novel and generalized CS sparse sampling strategy, and an ultra-fast reconstruction method, to form a complete CS system for electron microscopy.

3B-3
Metrology and Characterization 1

Modeling and Algorithm in Three-dimensional Metrology with Critical Dimension Scanning Electron Microscope, Jielin Zhou, Zhuming Liu (Institute of Semiconductors, Guangdong Academy of Sciences)

In this study, a novel model and algorithm based on 3D version of CASINO software was proposed to investigate height, SWA measurements of trapezoid and inverted trapezoid structures which can be achieved with high accuracy from modeling and simulation results.

3B-4
Metrology and Characterization 1

Construction of an Imaging Measurement System for Material Property Change under Controlled Mechanical Stress, Akinobu Yamaguchi, Shunya Saegusa (University of Hyogo)

We have created a tensile tester that is embedded in a synchrotron radiation photoelectron spectroscopy microscope and a micro-Raman spectroscopy imaging system. One is a miniaturized version of an existing tensile tester, and the other is an ultra-compact one using MEMS. Both were successfully tested and evaluated.

Thursday, June 1, 2023
8:00 am – 9:30 am PST
Session 3C – Industrial Highlights
Session Chairs: Aimee Price (The Ohio State University), Guy DeRose (California Institute of Technology)
3C-1
Industrial Highlights

ZL-1: An STM-based Atomic-Precision Lithography Tool, James Owen, Joshua B. Ballard, Ehud Fuchs, Moutaz Haq, Robin Santini, John Randall (Zyvex Labs)

We have previously developed ZyVector, an STM lithography control system, designed to convert a conventional STM into a lithography tool. Now, we have designed a complete UHV STM system, with ZyVector and the necessary additional capabilities, such as gas dosing and Si epitaxy, to form a complete STM lithography tool.

3C-2
Industrial Highlights

Nanofabrication with 3 different Beams and its Verification by automated SEM Imaging and Metrology, Frank Nouvertne, Torsten Richter, Viacheslav Vlasenko (Raith GmbH)

In this talk, recent highlights spanning the entire Raith product portfolio will be presented. Advanced EBL solutions for specific photonic applications, minimum invasive ion beam microscopy and 3D tomography by new LMAIS empowered GaBiLi source for FIB, and fully automated large area SEM imaging and metrology will be in focus.

3C-3
Industrial Highlights

Patterning with the fourth beam: Advances in thermal lithography with the NanoFrazor, Emine Cagin (Heidelberg Instruments Nano AG)

The NanoFrazor combines thermal scanning probe lithography and direct laser sublimation to create nano and microstructures rapidly and repeatably. Advances in the technology continue to open new application areas and enable novel research in a wide range of material systems. Examples of active stitching, atuomated overlay will be shown.

3C-4
Industrial Highlights

Holographic photolithography tools for industrial-scale nanomanufacturing, Joseph Geddes (Photia Incorporated)

We developed holographic photolithography tools for industrial-scale manufacturing of nanostructured materials with one-, two-, and three- dimensional morphologies. These materials have a variety of applications, including optical coatings and metamaterials, filtration and separations, batteries and electrochemistry, and template patterning.

3C-5
Industrial Highlights

A new tool for single ion implantation and nanoscale materials engineering: System design and source development, Gianfranco Aresta (Ionoptika Ltd)

3C-6
Industrial Highlights

Automation of FIBSEM process and open access control of microscopes, Milo Hrabovsk, Jiri Dluhos (Tescan Orsay Holding); Alena Siudova, Miroslav Jurasek (Tescan Brno)

One of the main challenges of full utilization of FIBSEM in current Nanoprototyping environment is automation of the process, to reduce downtime. Current portfolio of Tescan Essence software modules offer large variety for lamella prep, 3D tomography, automatic imaging, nanopatterning and depositions.

3C-7
Industrial Highlights

Correlative Microscopy: State-of-the-art Imaging Automation Combined with Artificial Intelligence for Efficient Workflows, Sandip Basu (Carl Zeiss Microscopy)

In microscopy, imaging is only the first step. Image segmentation and object classification are still a challenge, while being the foundation for all subsequent image analysis steps. Correlative microscopy solutions from ZEISS enables AI- based means to organize and analyze data and images from multiple modalities in a sample centric workspace.

3C-8
Industrial Highlights

News from the Lab14 Group, Niels Wijnaendts van Resandt (Lab14)

This talk will present a short overview the Lab14 group and new product and application highlights from the LAB14- affiliated members including Heidelberg-instruments, Genisys, Focus group, Specsgroup, 40-30, Notion-Systems, Osiris International and its newest member Nanosurf.

3C-9
Industrial Highlights

The Maskless Aligner – A Success Story, Steffen Diez (Heidelberg Instruments)

The Maskless Aligner is a laser lithography system dedicated to creating microstructures through Maskless laser Lithography, a technology which offers many advantages in micro-fabrication research. This presentation outlines the milestones from concept creation to initial market introduction, and the continuing development of the MLA series for R&D and industry applications.

3C-10
Industrial Highlights

Metrology and Layout-based Automation for SEM Process Monitoring, S. Bauerdick, K. Reuther, K. Gieb, U. Hofmann (GenISys GmbH, Germany); R. McCay (GenISys Inc.)

Nanofabrication and lithography require SEM investigation for improvements and monitoring. While sophisticated lithography instrumentation is standard, conventional SEMs still are used to measure structures. Nowaday's applications ask for acquiring and analyzing many SEM images. We will present a software package for advanced SEM metrology and layout-based automated image acquisition.

Thursday, June 1, 2023
10:10 am – 11:50 am PST
Session 4A – Electron Beam Lithography 2: Optics
Session Chairs: Ivan Kravchenko (Oak Ridge National Lab), Adam Steele (ZeroK Nanotech)
4A-1
Electron Beam Lithography 2: Optics

Visualizing the transient response of the local potential on photoconductive antennas using time-resolved SEM, Kohei Kawasaki, Samuel Jeong, Yuga Emoto, Yuki Yamamoto, Yoshiya Kishibe, Yusuke Arashida, Keishi Akada, Shoji Yoshida, Jun-ichi Fujita (University of Tsukuba)

We demonstrated ultra-fast visualizing of the time-resolved potential variation on gold electrodes and GaAs substrates with scanning electron microscopy. Where the femto-second-pulse laser induced the moduration of surface conductance of the GaAs.We estimated the potencial relaxation of the GaAs surface was 47 ps.

4A-2
Electron Beam Lithography 2: Optics

A Low-Energy Counting Electron Spectrometer Integrated into a Scanning Electron Microscope, John Simonaitis, Maurice Krielaart (Massachusetts Institute of Technology); Benjamin Slayton (Wentworth Institute of Technology); Joseph Alongi (Massachusetts Institute of Technology); Yugu Yang-Keathley (Wentworth Institute of Technology); Karl Berggren, Phillip D. Keathley (Massachusetts Institute of Technology)

In this work, we detail the development of a 10 keV electrostatic electron spectrometer for use in a modified scanning electron microscope. This spectrometer is capable of single electron detection with sub-eV energy and nanosecond temporal resolution, and is designed to study low-energy electron photon interactions.

4A-3
Electron Beam Lithography 2: Optics

Shift happens: submilliradian goniometry of an electron beam, Andrew Madison, John Villarrubia, Daron Westly, Ronald G. Dixson, Craig Copeland (National Institute of Standards and Technology); John D. Gerling, Katherine A. Cochrane, Alan Brodie, Lawrence Muray (KLA-Tencor); James Liddle, Samuel Stavis (National Institute of Standards and Technology)

Shift happens due to electron beam tilt in scanning electron microscopy. To measure this aberration effect with submilliradian uncertainty, and to calibrate scale factor and correct scanfield distortion, we introduce conical frustrum arrays as multifunctional reference structures. Our concept shows promise for new accuracy in scanning electron microscopy.

4A-4
Electron Beam Lithography 2: Optics

Modification of electrons trajectory using dielectrics, Esteban Irribarra, Ramn Xulvi, Jhon Chilliquinga (Escuela Politcnica Nacional)

The guiding effect is used to modify the trajectory electrons (0.5 keV – 7 keV) with a 10 cm square borosilicate plate. The results show that changes in the energy of the incident particles do not alter the direction of the deflected beam.

4A-5
Electron Beam Lithography 2: Optics

Rapid prototyping of etch test structures for hard mask development using electron beam lithography, Barbara Kazanowska, Han Wang Gene Lee, Luisa Bozano (Applied Materials)

Here, electron beam lithography (EBL) is used as a proxy for EUV to generate nanoscale patterns in a maskless, direct write manner that mimic sub 50nm EUV features for expedited material screening and development.

Thursday, June 1, 2023
10:10 am – 12:00 pm PST
Session 4B – Nanophotonics and Plasmonics 1
Session Chairs: Chao Wang (Arizona State University), Wen-Di Li (Hong Kong University)
4B-1 (Invited)
Nanophotonics and Plasmonics 1

Nanotechnology for Biosensing, Meta Devices, and THz Devices, Stella Pang (City University of Hong Kong)

Nanotechnology is applied to generate various nanostructures for high-performance biosensors, meta devices, and THz devices. 3D plasmonic biosensors will be shown to monitor cells and biomolecules with high sensitivity. Multiple- layer metasurfaces with twist angles will be developed using nanoimprint to form chiral magic angles for light manipulation.

4B-2
Nanophotonics and Plasmonics 1

On target – accurate integration of quantum dots and bullseye cavities, Craig Copeland, Adam L. Pintar, Ronald G. Dixson, Ashish Chanana, Kartik Srinivasan, Daron Westly, Rob Ilic, Marcelo Davanco, Samuel Stavis (National Institute of Standards and Technology)

We develop a comprehensive calibration of a cryogenic localization microscope, enabling accurate localization of quantum dots to improve subsequent integration into photonic cavities. The result is a significant improvement in the magnitude and distribution of theoretical Purcell factor across a wide field, enabling dramatic increases of process yield.

4B-3
Nanophotonics and Plasmonics 1

The plasmonic nano-grating device for photocatalytic water splitting reaction, Samuel Jeong, Gang Yang, Yusuke Arashida, Keisuke Akada, Yoshikazu Ito, Jun-ichi Fujita (University of Tsukuba)

We present an enhancement of photocatalytic reaction using surface plasmon resonance devices. The formation of a photoreaction field using nanograting devices increased the photocatalytic activity with visible light by more than 20- fold. Our approach can provide novel design guidelines of the photocatalytic reaction field.

4B-4
Nanophotonics and Plasmonics 1

Plasmonic cavities and individual quantum emitters in the strong coupling limit, Ora Bitton (Weizmann Institute of Sciences)

We observe strong coupling to both dark and bright plasmonic modes, in the limit of a single quantum emitter positioned within a plasmonic cavity. Spectroscopic observables point to the involvement of a dark excitonic state of the QD and to complex dynamics.

4B-5 (Invited)
Nanophotonics and Plasmonics 1

Sensing and Spectroscopy of Single Molecules on Optoplasmonic Microcavities, Frank Vollmer (University of Exeter)

Optical microcavities show greatly enhanced sensitivity when modified with plasmonic nano particles, enabling the sensing of molecules and atomic ions in aqueous solutions. I will present most recent advances in Optoplasmonic single molecule sensing: detection of absorption cross section of molecules attached to plasmonic nano particles from a thermo-optical approach.

Thursday, June 1, 2023
10:10 am – 12:00 pm PST
Session 4C – Bioinspired Nanostructures
Session Chairs: Nichole Cates (Smart Material Solutions), Saba Ghassemi (University of Pennsylvania)
4C-1 (Invited)
Bioinspired Nanostructures

Micro and Nanomanufacturing of Synthetic Brochosomes, Tak Sing Wong (The Pennsylvania State University)

Considered as one of the most sophisticated natural structures, brochosomes are three-dimensional, soccer ball-like microscopic granules with distributed nanoscale cavities produced by leafhoppers. In this talk, I will discuss the micro- and nanofabrication strategies of synthetic brochosomes, as well as their optical characterizations and potential applications.

4C-2
Bioinspired Nanostructures

Bioinspired, Sequence-Defined Polymer Brushes as Patternable Surface Modification Monolayers for Semiconductor/Bio Interfaces, Beihang Yu (Lawrence Berkeley National Laboratory); Boyce Chang (Iowa State University); Whitney Loo (University of Wisconsin Madison); Scott Dhuey (Lawrence Berkeley National Laboratory); Padraic O'Reilly (Molecular Vista); Paul Ashby, Michael Connolly (Lawrence Berkeley National Laboratory); Kathleen Ryan, Grigory Tikhomirov (University of California Berkeley); Ronald Zuckermann, Ricardo Ruiz (Lawrence Berkeley National Laboratory)

Control and manipulation of semiconductor/bio interfaces is key to enable biological nanofabrication pathways and new applications at the intersection of semiconductor technology and synthetic biology. Here we demonstrate a new platform using bioinspired, sequence-defined polymers as surface modification monolayers that are functional, patternable, and compatible with semiconductor/bio interfaces.

4C-3
Bioinspired Nanostructures

Electrospun Surfaces for Anti-Biofouling Functionalized by Anti-Quorum Sensing Molecules, Amos Taiswa, Jessica Andriolo, Jack Skinner (Montana Technological University)

Electrospun fibrous coatings provide texture and slow release of molecules that interrupt bacterial signaling. Quorum sensing plays an important role in biofilm formation. In this work, polymer blends (polycaprolactone-polyethylene glycol) were used to provide slow release of anti-QS molecules (Urolithin A) to prevent biofilm formation on a nanofiltration membrane.

4C-4
Bioinspired Nanostructures

Investigation of Particle Aggregation Behavior in Anti-Dust Nanostructures, Andrew Tunell, Chih-Hao Chang (University of Texas at Austin); Lauren Micklow, Stephen Furst, Nichole Cates (Smart Material Solutions)

Periodic nanostructures fabricated on polycarbonate substrates using a scalable nanocoining and thermal nanoimprint process minimize adhesion forces of particulates and result in dust-mitigation properties. This work will investigate the particle aggregation behaviors and effectiveness of removal mechanisms based on particle density and coating methods.

4C-5
Bioinspired Nanostructures

Antireflection Sapphire Nanostructures Fabricated by Low RF Power ICP-RIE, Kun-Chieh Chien, Chih-Hao Chang (University of Texas at Austin)

Biomimic taper or antireflection nanostructures reduce the reflectance and enhance the transmittance by gradually matching refractive indices of two media across the interface. We present a simple technique to fabricate high aspect ratio antireflection nanostructures to enhance transmittance for single-crystal sapphire based on the low RF power ICP- RIE.

Thursday, June 1, 2023
1:40 pm – 3:40 pm PST
Session 5A – Neuromorphic Computing
Session Chairs: John Randall (Zyvex Labs), Gina Adam (George Washington University)
5A-1 (Invited)
Neuromorphic Computing

Electron Beam Lithography Patterning of Magnetic Nanostructures for Neuromorphic and In-Memory Computing, Jean Anne Incorvia, Thomas Leonard, Samuel Liu, Harrison Jin, Can Cui (University of Texas at Austin); Tianyao P. Xiao, Christopher H. Bennett, Matthew J. Marinella (Sandia National Laboratories); Mahshid Alamdar (University of Texas at Austin)

We will present our results showing how stochastic domain walls integrated into magnetic tunnel junctions can act as logic elements as well as artificial synapses and neurons. We will show that leveraging these dynamical behaviors can benefit many areas of unconventional computing. Challenges in fabricating the devices will be analyzed.

5A-2
Neuromorphic Computing

Analog content-addressable memories with 2D floating-gate memory transistor, Guoyun Gao, Bo Wen, Can Li (The University of Hong Kong)

We propose and build analog CAM based on two-dimensional (2D) floating gate field-effect transistors (FGFET) to tackle bottlenecks imposed by silicon transistors. We expect large-scale 2D FGFET-based analog CAM to be a promising build block for a near-sensor explainable tree-based machine learning accelerator.
5A-3
Neuromorphic Computing

Fabrication and Characterization of MoS2 Memristive Devices with Short and Long-Term Memory Behaviors, Seungjun Ki, Mingze Chen, Xiaogan Liang (University of Michigan)

We fabricated MoS2-based memristors and investigated the pulse-programmed response behaviors of such devices. This work indicates that MoS2 memristors exhibit a relatively low threshold field for initiating memristive switching in comparison with oxide-based memristors and exhibit both STP and LTP effects that can be modulated through varying programming pulse parameters.

5A-4
Neuromorphic Computing

Error-feedback-based auto-tuning algorithm for faster memristor programming, Sushmit Hossain, Buyun Chen, Zerui Liu, Yunxiang Wang, Ryan Bena, Hsiang-chun Cheng, Quan Nguyen, Mike Shuo-Wei Chen, Wei Wu (University of Southern California)

Computing applications and the backpropagation algorithm used in NNs require memristors to be tuned to specific conductance levels in short times. The algorithm mostly used in programming the memristor is the "write-verify algorithm”. Here we present a modified version of this algorithm which shows significant improvement over the traditional one.

5A-5
Neuromorphic Computing

A Memristor-Based Edge Computing System for Accelerating Support Vector Machine, Zerui Liu, Sushmit Hossain, Yudi Shi, Hsiang-Chun Cheng, Pan Hu, Deming Meng, Buyun Chen, Hao Yang, Yunxiang Wang, Boxiang Song, Bofan Zhao, Tse-Hsien Ou, Cai Zhi (University of Southern California); Mark Barnell, Qing Wu (Air Force Research Laboratory); Stephen Cronin, Wei Wu, Mike Shuo-Wei Chen (University of Southern California)

In this study, a high-performance support vector machine (SVM)-based edge computing system is implemented using memristors to demonstrate the feasibility to revolutionize the field of computation, optimization, and decision-making.

Thursday, June 1, 2023
1:40 pm – 3:30 pm PST
Session 5B – EUV/X-ray Lithography and Optics
Session Chairs: Alain Diebold (SUNY Polytechnic Institute), Martha Sanchez (Applied Materials)
5B-1 (Invited)
EUV/X-ray Lithography and Optics

Extreme ultraviolet interference lithography towards high- and hyper-NA lithography, Yasin Ekinci, Iacopo Mochi, Dimitrios Kazazis (PSI)

We discuss the progress in EUV lithography and discuss the challenges towards 6 nm half-pitch. We demonstrate using EUV interference lithography that this is feasible and show novel approaches to overcome the limitations of the photoresists.

5B-2
EUV/X-ray Lithography and Optics

Development of Monolithic X-ray Achromats, Joan Vila-Comamala, Peng Qi, Umut T. Sanli, Ana Diaz, Christian David (Paul Scherrer Institut); Georg Schulz, Griffin Rodgers, Bert Mueller (University of Basel)

We report the development of a monolithic X-ray achromat by combining several nanofabrication techniques. It is composed of a diffractive and refractive part. The diffractive elements is made by high resolution electron beam lithography and electroplating. The refractive lens was produced by two-photon polymerization 3D printing.

5B-3
EUV/X-ray Lithography and Optics

Progress in fabrication of free-standing gold gratings for phase contrast X-ray microscopy, Olga V. Makarova (Creatv MicroTech, Inc.); Ralu Divan (ANL); Nicolaie Moldovan (Alcorix Co.); David A. Czaplewski (Argonne National Laboratory); Michela Esposito (University College London); Cha-Mei Tang (Creatv MicroTech, Inc.); Joseph D. Ferrara (Rigaku Americas Corp.); Alesandro Olivo (University College London)

We present the progress towards a refined process allowing to obtain gratings with submicron aperture slits (700 nm) and to substantially improve gold grating flatness (bellow 200 nm over the entire 4 mm x 4 mm area) for higher X-ray phase contrast imaging resolution and accuracy.

5B-4
EUV/X-ray Lithography and Optics

EUV lighting technology with carbon nanotube based cold cathode electron beam(C-beam) irradiation technique, Bishwa Chandra Adhikari, Kyu Chang Park (Kyung Hee University at Seoul)

We present novel EUV ligting source fabrication technique with electron beam irradation technique. CNTs based cold cathode electron beam(C-beam) is used for excitation of anode target. With moderate irradiation of C-beam on Sn anode, we could obtain EUV lighting. The lighting depend on the irradiation, such as bias and current.

5B-5
EUV/X-ray Lithography and Optics

Creation of X-ray multi-scale microfabrication system, Akinobu Yamaguchi (University of Hyogo)

We have created a beamline for multiscale X-ray microfabrication. This system enables a process that can simultaneously fabricate micrometer-scale high-aspect-ratio fabrication and sub-micrometer-scale microstructures.

Thursday, June 1, 2023
1:40 pm – 3:30 pm PST
Session 5C – Nanoimprint Lithography
Session Chairs: Stephen Chou (Princeton University), Bruno Azeredo (Arizona State University)
5C-1 (Invited)
Nanoimprint Lithography

Scalable Fabrication of High Performance, All-Inorganic Metalenses, Waveguides and Diffractive Optics via Nanoimprint Lithography, Dae Eon Jung, Vincent J. Einck, Lucas Verrastro, Amir Arbabi, James Watkins (University of Massachusetts)

All-inorganic visible wavelength metalenses with absolute efficiencies of 75% (>90% design efficiency) were fabricated using nanoimprint lithography (NIL) with cycle times of 2 minutes. Atomic layer deposition (ALD) as a post-imprint treatment enabled tuning of the refractive index from 1.9 to 2.2 using a small number of cycles.

5C-2
Nanoimprint Lithography

Scalable Nanofabrication of High Index Optical Components Using Nanoimprint Lithography, Parth Pandya, Shrawan Singhal, S.V. Sreenivasan (The University of Texas at Austin)

In this paper, we have introduced a scalable process of fabricating of high index inorganic nanostructures with complex geometries using nanoimprint lithography. This can be used to fabricate optical components for applications such as AR/MR waveguides and metalenses while meeting the requirements of high manufacturing throughput and optical performance simultaneously.

5C-3
Nanoimprint Lithography

Antireflective structures directly imprinted on chalcogenide glasses, Sivan Tzadka (Ben Gurion university)

Thermal nanoimprint is the most attractive method for surface patterning of chalcogenide glasses due to the low their low Tg. Still, one major challenge remains, direct imprint of ChG without deforming its shape. Here, we present three novel approaches for a direct imprint of ChG without deforming the substrate's shape.

5C-4
Nanoimprint Lithography

Study on induced strain during releasing process for slanted grating structure in nanoimprint process, Yuusei Kunitou, Yoshihiko Hirai, Masaaki Yasuda (Osaka Metropolitan University)

We discuss the induced strain caused by the release process of the slanted structure using numerical simulation for various peel \ing release in nanoimprint.

5C-5 (Invited)
Nanoimprint Lithography

Large-Area Nanopatterning with Focused Ion Beam Milling, Nanocoining, and Roll-to-Roll Thermal Embossing, Nichole Cates, Lauren Micklow, Stephen Furst (Smart Material Solutions, Inc.)

Scalable nanopatterning processes are needed for industrial-scale manufacturing of nanotechnologies that have been proven in the lab. Here, we present high-throughput nanopatterning by rapidly replicating and stitching together small- area patterns to seamlessly nanopattern hundreds of square feet using focused ion beam (FIB) milling, nanocoining, and roll-to-roll (R2R) processes.

Friday, June 2, 2023
8:00 am – 9:50 am PST
Session 6A – Atomically Precise Fabrication
Session Chairs: Joris Keizer (University of New South Wales), Richard Silver (National Institute of Standards and Technology)
6A-1 (Invited)
Atomically Precise Fabrication

APAM 2D bipolar device fabrication, James Owen, Robin Santini, Ehud Fuchs, John Randall (Zyvex Labs)

We continue to develop sample designs and patterning technology to improve the precision and throughput of atomic- scale STM lithography. A new sample design allows for rapid location of the device area, while software improvements allow for more precise alignment of new patterns to existing atomic-scale structures.

6A-2
Atomically Precise Fabrication

Low-Temperature Contacts for Atomically Precise Delta-Doped Silicon Microelectronics, Ramyapriya Krishnasamy, Alexandra Joshi-Imre (Univerisity of Texas at Dallas); John Randall, Robin Santini (Zyvex labs); Wiley P. Kirk, Jeffrey B. Murphy (3D Epitaxial Technologies, LLC); Walter Voit (University of Texas at Dallas); James Owen (Zyvex Labs)

This research will discuss the challenges and importance of good electrical contacts to atomically precise devices. In addition, it will explore the ways to overcome those challenges in achieving electrical contacts to delta-doped atomically precise devices.

6A-3
Atomically Precise Fabrication

Fabrication of Donor-based Quantum Devices in Silicon using Scanning Tunneling Microscopy, Pradeep Namboodiri, Jonathan Wyrick, Fan Fei, FNU Utsav (National Institute of Standards and Technology); Xiqiao Wang (Rigetti Computing); Joseph Fox, Rick Silver (National Institute of Standards and Technology)

We will present the fabrication of atomic scale quantum devices using hydrogen-based scanning probe lithography. We will discuss the design, fabrication, and use of surface top gates to address individual components individually or globally in few-donor/quantum dot devices as well as arrayed 2x2 devices.

6A-4
Atomically Precise Fabrication

Direct integration of atomic precision devices with CMOS, Shashank Misra (Sandia National Laboratories)

We have integrated atomic precision advanced fabrication with CMOS manufacturing in the middle-end-of-line, which leaves the parent CMOS intact, and permits the integration of novel devices. Potential applications include TFETs for energy-efficient digital, single electron transistors that work at room temperature for sensing, and CMOS contacts with improved contact resistance.

6A-5
Atomically Precise Fabrication

Atomically Precise Fabrication Templated by Hydrogen and Halogen Monolayer Resists, Robert Butera, Esther Frederick, Scott Schmucker, Quinn Campbell, David R. Wheeler, Shashank Misra (Sandia National Laboratories)

We utilize halogen adatoms to passivate and protect lithographically defined patterns while maintaining the integrity and difference in chemical reactivity of the patterned region. We discuss the identification of selective chemistries that target attachment to the halogenated regions and function as effective growth inhibitors for area-selective, atomic layer deposition processes.

Friday, June 2, 2023
8:00 am – 9:30 am PST
Session 6B – Scalable Nanomanufacturing
Session Chairs: Jack Skinner (Montana Technological University), Ke Du (University of California at Riverside)
6B-1 (Invited)
Scalable Nanomanufacturing

Wafer-scale structural coloration using interference lithography and grayscale-patterned secondary exposure, Zhuofei Gan, Hongtao Feng, Chuwei Liang, Wen-Di Li (The University of Hong Kong)

A high-throughput and wafer-scale nanopatterning method of interference lithography and grayscale-patterned secondary exposure is proposed that could spatially modulate nanostructure feature sizes on large scale while maintaining sufficiently high resolution. The method is demonstrated in the fabrication of wafer-scale structural color paintings.

6B-2
Scalable Nanomanufacturing

Design and roll-to-roll nanofabrication of plasmonic solar light absorbers, Maria Serra Gonzlez, Matthias Keil (DTU); Nastasia Okulova (Inmold A/S); Rafael J. Taboryski (DTU)

A large scale fabrication of a plasmonic metasurface for solar light absorption is presented. A novel combination of resolution enhancement techniques on a DUV Stepper allowed the fabrication of a hexagonal array of nanopillars, later replicated to the large scale using a roll-to-roll method.

6B-3
Scalable Nanomanufacturing

Patterned Wettability Induced Growth of Perovskite Nanowire Arrays, Guannan Zhang, Zhao Sun, Chuiwei Liang, Liyang Chen, Wen-Di Li (The University of Hong Kong)

A template-free fabrication method to realize the controllable growth of perovskite nanowire arrays via the inducement of patterned wettability is demonstrated. The strategy shows a facile method to fabricate perovskite nanowire arrays, paving the way to low-cost, large-area, and rapid fabrication of high-performance perovskite optoelectronic devices.

6B-4
Scalable Nanomanufacturing

Metalized ceramic corrugated films as lightweight space-based microwave reflectors, Victoria Fethke, Mohsen Azadi, Matthew F. Campbell, Igor Bargatin (University of Pennsylvania)

We report metalized mechanical metamaterial reflectors that are made of few-100 nm thick aluminum oxide covered by ~ 10 nm thick metal films, such as aluminum. These films' corrugated design prevents them from wrinkling or tearing relative to traditional planar membranes. Areal density of reflectors is less than 2 g/m2.

Friday, June 2, 2023
8:00 am – 9:50 am PST
Session 6C – MEMS/NEMS
Session Chairs: Rebecca Cheung (University of Edinburgh), Leeya Engel (Technion - Israel Institute of Technology)
6C-1 (Invited)
MEMS/NEMS

Nanopore-Integrated Microwave Sensors for Capacitive Detection of Single Nanoparticles inside Liquid, Arda Secme (Bilkent University, and Caltech); Berk Kucukoglu (Bilkent University, and EPFL); Hadi Sedaghat Pisheh, Hatice Dilara Uslu, Selim Hanay (Bilkent University)

We will first discuss microwave capacitive sensors enhanced with micro/nanofabricated sensing region and compare them their mechanical MEMS/NEMS counterparts. Then we will present an entirely-electronic system for the capacitive detection of nanoparticles in liquid. Beyond sizing nanoparticles, the proposed paradigm can open the way for dielectric- based classification of nanoparticles.

6C-2
MEMS/NEMS

Integration of mode localized coupled resonators with ZnO nanowires for ammonia gas detection, Dexiang Zhang, Graham S. Wood, Andreas Tsiamis, Camelia Dunare, Peter Lomax, Rebecca Cheung (University of Edinburgh); Yuk Sim Tang, Neil Mullinger, Eiko Nemitz (UK Centre for Ecology & Hydrology)

We report the fabrication and integration processes of mode localized coupled resonators (MLCRs) with zinc oxide nanowires (ZnO NWs) for ammonia gas detection.

6C-3
MEMS/NEMS

Effects of Cobalt-60 Irradiation on the Performance of AlN-Transduced Microelectromechanical Resonators, David D. Lynes, Hengky Chandrahalim (The U.S. Air Force Institute of Technology)

This work presents the effects of gamma ray radiation on piezoelectrically transduced resonators. Two AlN-transduced resonators are designed and fabricated, with and without a silicon dioxide thin film.The AlN-transduced microelectromechanical resonators are exposed to 1 Mrad(Si) using Cobalt-60 (Co-60) Underwater Irradiator and systematically characterized in-situ.

6C-4
MEMS/NEMS

Development of a dual-compartment microelectrode array for investigation of neuronal network media exchange, Victoria Ravel, Imtiaz Hossen, Olivia Ladriscina, Omar Sbaih, Rhonda Dzakpasu, Gina Adam (The George Washington University)

Dual-compartment microelectrode arrays are needed to assess the impact of cell culture media exchange between two initially isolated neuronal networks. This work presents the development of microelectrode electrode arrays integrated with autoclavable biocompatible resin rings with removable silicon plugs. The developed structures can be used for various studies in neurophysiology.

6C-5
MEMS/NEMS

Nanoscale Strain Gauges on Flexible Polymer Substrates, Devin Brown, Isha Lodhi, Biya D. Haile, Oliver Brand (Georgia Institute of Technology); David R. Myers, Wilbur A. Lam (Emory University, Georgia Institute of Technology)

Nanometer scale strain gauges are presented for high throughput measurement of cell forces on flexible and soft polymer substrates. The strain gauges were characterized and demonstrated successful transduction of mechanical strain to electrical resistance change.

Friday, June 2, 2023
10:20 am – 11:50 am PST
Session 7A – Ion Beam Lithography
Session Chairs: Christopher Holland (SRI International), James Spallas (KLA)
7A-1
Ion Beam Lithography

Multiple ions from a single source for nanofabrication with top-down FIB on a lithography platform, Torsten Richter, Achim Nadzeyka, Paul Mazarov, Lars Bruchhaus, Fabian Meyer (Raith GmbH)

Liquid Metal Alloy Ion Source (LMAIS) is a versatile FIB source technology delivering various ion species from a single source. Combined with a lithography platform unlimited process pathways become possible. We present latest advances in LMAIS source technology with related applications such as Lithium ion beam lithography and ion microscopy.

7A-2
Ion Beam Lithography

Understanding and Controlling the Beam Energy Spread of Ionic Liquid Ion Sources for Focused Ion Beam Applications, Nazli Turan, Szymon Dworski, Euan Donovan-Hill, Charles N. Ryan (University of Southampton)

A beam source capable of working with different ionic liquid (IL) compositions in each polarity provides flexibility in surface processing. We aim to demonstrate the potential of ILISs for FIB applications while addressing the inherent challenges of the implementation and investigating the effects of electric field via simulations and experiments.

7A-3
Ion Beam Lithography

Large area Si-FIB patterning of SiO2 hard mask on 3D crystallographic nanostructures, Erwin Berenschot, Yves Janssens, Yasser Pordeli, Niels Tas (University of Twente, MESA+ Institute, Faculty of Science and Technology); Achim Nadzeyka, Torsten Richter, Otto Carel (Raith Group)

We report about the use of a Si-ion beam from a vertical FIB to selectively open an 8 nm silicon dioxide hard mask on top of silicon nano "wedges”. This resistless approach enables relative high resolution patterning on top of 3D nanostructures. Subsequent selective etching of silicon nanostructures is demonstrated.

7A-4
Ion Beam Lithography

Enhancement of thermal and photo-thermal carbonization of polymers by focused ion beam implantation of gold, Nickolay Lavrik, Ivan Kravchenko, Dale K. Hensley (ORNL)

Ion implantation of metals is a promising approach to catalytic synthesis of carbon nanomaterials. Here we explore ion implantation of gold into polymer to enable carbonization of polymer precursors without exceeding the temperature range compatible with CMOS processing and to make it potentially compatible with flexible electronics MEMS technology.

Friday, June 2, 2023
10:20 am – 11:50 am PST
Session 7B – Nanophotonics and Plasmonics 2
Session Chairs: Rajesh Menon (University of Utah), Frank Vollmer (University of Exeter)
7B-1 (Invited)
Nanophotonics and Plasmonics 2

Higher-Efficiency Microlenses for Zone-Plate-Array Lithography, Henry Smith, Mark K. Mondol (MIT); Feng Zhang, Timothy Savas, Michael E. Walsh (LumArray, Inc.)

Improvement to Zone-Plate-Array maskless photolithography performance via diffractive-optical simulation and nanofabrication

7B-2

Nanophotonics and Plasmonics 2

Multi-Level Diffractive Lens (MDL) for extended-depth-of-focus over 50 mm fabricated by Grayscale Lithography, Tina Hayward, Apratim Majumder (The University of Utah); Ryan R. Ahern (VideoJet Technologies, Inc.); Rajesh Menon (University of Utah)

This project used an optimization-based inverse multi-level diffractive lens design – with an extended-depth-of-focus of 50 mm, fabricated the design using grayscale lithography, and experimentally characterized the lens. Experiments found an extended-depth-of-focus of 58.8 mm and an efficiency of about 78.86%.

7B-3
Nanophotonics and Plasmonics 2

Three-Dimensional Periodic Nanolattices with Precisely Controlled Refractive Index, Vijay Anirudh Premnath, Chih-Hao Chang (University of Texas at Austin)

The research focuses on the fabrication of precise engineered structures using Directed Self Assembly, UV Lithography and Atomic Layer Deposition with a focus of achieving control in effective refractive indices to the scale of 0.0004. The project finds applications in emerging display technologies as in developing 3D light field displays.

7B-4 (Invited)
Nanophotonics and Plasmonics 2

Three Dimensional Optical Metasurfaces using Two-Photon Lithography, F. Balli, M. Sultan, S. Lami, D. Kumar, A. Thuringer, and J. Todd Hastings (University of Kentucky)

We review recent developments in 2.5 and 3D optical metasurfaces fabricated using two-photon lithography. Optical system of interest include achromatic metalenses, varifocal metalens, and focusing filters. We also present novel results in wide-color gamut imaging using arrays of focusing metafilters.

Friday, June 2, 2023
10:20 am – 11:50 am PST
Session 7C – Micro/Nanofluidics
Session Chairs: Scott Retterer (Oak Ridge National Lab), Selim Hanay (Bilkent University)
7C-1 (Invited)
Micro/Nanofluidics

Micro-/nano-scale platforms for the controlled ex-vivo mechano-stimulation of cells, Mark Schvartzman (Ben- Gurion University of the Negev)

We engineered micro/-nano- engineered platforms for cell stimulation of lymphocyte activation. The platforms were based on nanoimprinted molecular patterns of signaling ligands and mechanoresponsive nanowires. We also engineered micropatterns with varied stiffness and used them to reveal a new mechanism of cell mechano-sensing.

7C-2
Micro/Nanofluidics

Silicon-based microfluidic grating for neutron phase imaging, Sarah Robinson, Ryan P. Murphy, Youngju Kim, M. LaManna, Caitlyn M. Wolf, Katie M. Weigandt, Daniel S. Hussey, Klimov (PML, National Institute of Standards and Technology)

The development of a dynamic source grating is a first step to realizing a neutron analog of a spatial light modular. We will present progress towards fabrication and sealing of over 2,000 microfluidic channels and infilling with a neutron absorbing fluid for far-field neutron interferometry.

7C-3
Micro/Nanofluidics

Micro fluidic device with SERS active nanostructure fabricated on boehmite, Shunya Saegusa, Taku Tanaka (University of Hyogo); Masayuki Naya (Keio University); Takao Fukuoka, Sho Amano, Yuichi Utsumi, Akinobu Yamaguchi (University of Hyogo)

We have studied on a method to fabricate SERS-active structures of gold nanofève using the boehmite structure due to its advantage of easy fabrication on a wide range of substrates. In this study, microfluidic devices incorporating the above SERS structures were fabricated and evaluated for detection processes.

7C-4 (Invited)
Micro/Nanofluidics

Development of novel microfluidic devices for scalable manufacturing for point-of-care diagnostics., Keith Morton (National Research Council Canada)

Microfluidic-based devices will enable precise and personalized health monitoring and care at the point-of-need. I will present microfluidic device design and manufacturing approaches for scalable fabrication of novel, all-plastic, bio- diagnostic devices that automate extraction and analysis of cells, RNA, DNA and protein biomarkers from complex biological samples.

Friday, June 2, 2023
1:30 pm – 3:20 pm PST
Session 8A – Quantum Electronics and Emerging Architecture
Session Chairs: James Owen (Zyvex Labs), Xiaogan Liang (University of Michigan)
8A-1 (Invited)
Quantum Electronics and Emerging Architecture

End-to-end Platform to Support the Democratization of System-scale Prototyping based on Emerging Devices, Gina Adam (George Washington University), Imtiaz Hossen, Osama Yousuf, Brian Hoskins, Advait Madhavan, Martin Lueker-Boden, Patrick Braganca, Vasileia Georgiou and Tiffany Santos

8A-2
Quantum Electronics and Emerging Architecture

Solid State, Atom-based Devices for Analog Quantum Simulation and Quantum Manipulation, Rick Silver, Fan Fei, Pradeep Namboodiri, Jon Wyrick (National Institute of Standards and Technology); Xiqiao Wang (Rigetti); FNU Utsav (National Institute of Standards and Technology); Joseph Fox (University of Maryland)

NIST is using atomically precise fabrication to make few-donor/quantum dot devices and arrayed few-donor devices for analog quantum simulation (AQS). The AQS experiments are used to explore the Hubbard phase space using atomically engineered materials whose properties, such as magnetic ordering or Mott insulating phase, depend on the atomic configurations.

8A-3
Quantum Electronics and Emerging Architecture

New method of fabrication of suspended metallic Single Electron Transistor (SET), Mohammad Istiaque Rahaman, Gergo P. Szakmany, Alexei O. Orlov, Gregory L. Snider (University of Notre Dame)

We have done fabrication of suspended metallic Single Electron Transistor (SET) by a new method. The performance of our SET is better than the reported works on suspended SETs. This device would be a gateway for better understanding of the source of the noise in the SETs.

8A-4
Quantum Electronics and Emerging Architecture

Improving AlOx based Single Electron Transistors for Quantum Charge Sensing, Runze Li (University of Maryland); Pradeep Namboodiri (National Institute of Standards and Technology); Zachary Barcikowski (University of Maryland); Yanxue Hong, Joshua Pomeroy (National Institute of Standards and Technology)

The resistance of aluminum oxide (AlOx) thin films is explored by varying the plasma oxidation duration, which can reduce the RC (resistance*capacitance) time constant and improve the bandwidth of charge sensors.

8A-5
Quantum Electronics and Emerging Architecture

Reducing Losses in Superconducting Qubits, EBethany Niedzielski Huffman (MIT Lincoln Laboratory)

Superconducting qubits for quantum computing are electronic circuits that can be fabricated using similar tools and processes as classical computer chips. However, careful choices are needed during the fabrication process to minimize performance losses, including the superconducting materials and substrates that are used, and reducing surface oxides or process residuals.

Friday, June 2, 2023
1:30 pm – 3:00 pm PST
Session 8B – Scanning Probe Lithography
Session Chairs: Rob Ilic (National Institute of Standards and Technology), Michael Cullinan (University of Texas at Austin)
8B-1 (Invited)
Scanning Probe Lithography

Towards Femtogram-Scale Materials Discovery using Scanning Probe Lithography, Keith Brown (Boston University)

This work explores recent progress in transforming scanning probe systems into platforms for combinatorial materials discovery studying samples approaching the femtogram scale. We focus on innovations in the area of closed-loop nanopatterning and controlled mixing of fluid samples using scanning probes.

8B-2
Scanning Probe Lithography

Improving Current On/Off Ratio of Oxygen-Doped WSe2 transistors by Selective Scanning Probe Lithography, Sihan Chen, Yue Zhang, William P. King, Arend M. van der Zande, Rashid Bashir (University of Illinois Urbana- Champaign)

WOx degenerately p-dopes WSe2, leading to in high on-current but low on/off ratio in transistors. In this work, we use a scanning probe to selectively remove monolayer WOx on a bilayer WSe2 channel, which significantly improves the current on/off ratio of oxygen-doped WSe2 transistors while preserving their high on-current.

8B-3
Scanning Probe Lithography

Image reversal through NanoFrazor patterning and pattern transfer processes: from nanoholes to nanopillars, Jana Chaaban, Myriam Kppeli (Heidelberg Instruments Nano AG); Ute Drechsler (IBM Research Europe); Emine Cagin (Heidelberg Instruments Nano AG)

NanoFrazor uses thermal scanning probe lithography for the simultaneous patterning and inspection of nanoscale structures. Here, we discuss a complete NanoFrazor patterning and pattern-transfer solution that allows for the image reversal of any written design. In particular, we showcase how this process creates sub-100 nm diameter nanopillars from nanoholes.

8B-4
Scanning Probe Lithography

3D nanolithography by means of Scanning Probe Lithography, Eider Berganza (Karlsruhe Institute of Technology)

Following a bioinspired approach that relies on the ink spreading inhibition, we present a process to build 3D metallic structures, by coating the substrate with Serum Albumin protein and patterning with Phospholipid ink.

Friday, June 2, 2023
1:23 pm – 3:10 pm PST
Session 8C – Advanced Pattern Transfer
Session Chairs: Mark Schattenburg (Massachusetts Institute of Technology), Dimitrios Kazazis (Paul Scherrer Institute)
8C-1 (Invited)
Advanced Pattern Transfer

Conformal Electrochemical Nanoimprinting of Silicon: Towards Bio-Inspired Infrared Meta-Optics, Aliaksandr Sharstniou (Arizona State University); Shouhong Fan (University of Colorado at Boulder); Emmanuel Dasinor (Arizona State University); Yifu Ding (University of Colorado Boulder); Bruno Azeredo (Arizona State University)

Due to the incompatibility of semiconductor micromachining with non-planar substrates, multifunctional optical meta- surfaces have only been demonstrated in polymeric lenses. In this presentation, a new method of conformal electrochemical nanoimprinting is presented to directly micromachine a nature-inspired sharklet pattern onto a silicon lens as both an anti-reflective and anti-fouling surface.

8C-2
Advanced Pattern Transfer

Metal assisted chemical etching: towards CMOS compatible catalyst for high aspect ratio nanostructures, Lucia Romano, Craig Lawley (ETH Zurich & Paul Scherrer Institute); Marius Mahlum Halvosen (Univ. of Oslo & CERN EP-LBD); Konstantins Jefimovs, Vitaliy Guzenko (Paul Scherrer Institute); Marco Stampanoni (ETH Zurich & Paul Scherrer Institute)

MacEtch is a plasma free, anisotropic chemical etching that uniquely defies the isotropic nature of conventional wet etching, through local catalyzed electrochemistry. Here a new milestone for a CMOS compatible MacEtch process for high aspect ratio Si nanostructures using Ru as a very reactive catalyst for oxygen based gas-phase etching.

8C-3
Advanced Pattern Transfer

High Aspect Ratio Structures for Meta-surface Optics, Bruce Burckel, Katherine M. Musick, Travis R. Young, Loren Gastian, John Mudrick (Sandia National Laboratories)

High aspect ratio etching in silicon and gallium arsenide for metasurface optics is demonstrated. Interferometric lithography is used as a rapid prototyping solution to provide patterns with relevant dimensions for studying etch dynamics. The final patterns are created using e-beam lithography.

8C-4
Advanced Pattern Transfer

Large area fabrication of high aspect ratio sub-micrometer Si structures by displacement Talbot lithography and deep reactive ion etching, Konstantins Jefimovs, Lucia Romano, Mehdi Heydari (Paul Scherrer Institute)

We report on wafer scale nanofabrication utilizing displacement Talbot lithography and Si deep reactive ion etching. Si grating structures with lines and spaces of 325 nm and the depth of ~21 μm are demonstrated. Such structures have application in X-ray and neutron optics, MEMS, photonics and structured biointerfaces.

8C-5
Advanced Pattern Transfer

Understanding mechanical behavior of porous polymeric stamps during large-area metal-assisted chemical imprinting of silicon, Emmanuel Dasinor, Aliaksandr Sharstniou, Bruno Azeredo (Arizona State University); Yifu Ding (University of Colorado)

This work aims to understand the changes in the polymeric stamp's morphology during Mac-Imprinting both experimentally and numerically.

Friday, June 2, 2023
3:40 pm – 5:00 pm PST
Session 9A – Electron Beam Lithography 3: Processes and Materials
Session Chairs: Leonidas Ocola (IBM), Scott Lewis (California Institute of Technology)
9A-1
Electron Beam Lithography 3: Processes and Materials

Measurement of Placement Accuracy and Overlay in E-beam Lithography with 2-D Vernier Arrays, Robyn Seils, Sean Branagan (Raith America, Inc); Akhil Dodda (Western Digital Research Center); Amanda Wscieklica (Raith B.V.); Alexei L. Bogdanov (Western Digital Research Center)

A new method that employs 2-D overlaid Vernier arrays to measure field stitching, placement, and overlay errors using simple SEM image processing is presented. As compared to the preceding methods, overlaid 2-D Vernier arrays can provide the measurements with sub-1 nm accuracy directly on resist after e-beam lithography step.

9A-2
Electron Beam Lithography 3: Processes and Materials

Direct Writing of Tris(xanthato)Bi(III) Precursors for use in Future Optoelectronic Devices, James Mann (The University of Manchester); Scott Lewis (California Institute of Technology); Richard Winpenny (The University of Manchester)

Tris(xanthato)Bi(III) resists have been shown to produce 30 nm half pitch structures after exposure to an electron beam. Monte Carlo simulations and experimental dose requirements show a close relation, indicating changing the ligand affects sensitivity of the resist. Future applications are for thermoelectric, memory, and photodetector devices.

9A-3
Electron Beam Lithography 3: Processes and Materials

Direct Writing of Metal-Organic Resists for Alignment Marker Fabrication in Electron Beam Lithography, Guy DeRose, Scott M. Lewis (California Institute of Technology); Hayden Alty, Ahmad Chaker (School of Chemistry and Photon Science Institute, The University of Manchester)

We have found that chromium pivalate and zinc acetate can be decomposed under an electron beam for use as lithographic resists. A fabrication method is presented, along with Monte Carlo simulations and XPS data, that show these resists can be used to make direct-write alignment markers for Electron Beam Lithography.

9A-4
Electron Beam Lithography 3: Processes and Materials

Assessment of Gaussian Beam Shape in E-beam Lithography with 2-D Vernier Arrays, Amanda Wscieklica, Sean Branagan (Raith America, Inc); Akhil Dodda (Western Digital Research Center); Robyn Seils (Raith America, Inc); Alexei Bogdanov (Western Digital)

E-beam writing with the highest throughput requires tight control of the beam spot size and roundness across the scanning field of the tool. Here we present a method to determine the shape and size of the e-beam spot after exposure, based on two-dimensional Vernier arrays and agnostic of SEM artifacts.

Friday, June 2, 2023
3:40 pm – 5:10 pm PST
Session 9B – Metrology and Characterization 2
Session Chairs: Keith Brown (Boston University), Xian Du (University of Massachusetts at Amherst)
9B-1
Metrology and Characterization 2

Towards Quasi-real-time, Tip-based Process Control in Roll-to-Roll Nanomanufacturing, Michael Cullinan (The University of Texas at Austin); Liam Connolly (National Institute of Standards and Technology); Barbara Groh (The University of Texas at Austin)

This work presents a proof-of-concept prototype tool to perform tip-based measurements on flexible, nanopatterend substrates in a R2R manner. The goal of this tool is to facilitate quasicontinuous scanning of R2R substrates using atomic force microscope sampling without the need to halt the web.

9B-2
Metrology and Characterization 2

Metrology of Periodic 3D Nanostructures using Spectroscopic Scatterometry, Kwon Sang Lee, Kun-Chieh Chien, Michael Cullinan, Chih-Hao Chang, Barbara Groh (The University of Texas at Austin)

In this work we demonstrate a non-destructive, high-throughput method for 3D metrology of periodic nanostructures using spectroscopic scatterometry. This approach is based on measuring the reflectance spectra of nanostructures and comparing them with optical simulations. Initial results show distinct spectral responses depending on exposure conditions and porosity.

9B-3
Metrology and Characterization 2

A "Dual-Field” Illumination Schema for Enhanced Contrast in Automated Optical Defect and Debris Detection, Zach Russell, Mathieu Therezien, Tomas J. McIntee (Ion Innovations); Vivian Hsu, Missy Thompson, Oyku Demirel, Sonny Vo (LeiaInc)

Ion Innovations, in collaboration with Leia Inc., has developed a hardware-assisted computer vision system for automated defect detection that readily and simply acquires "dual-field” images using simultaneous dark-field and bright-field illumination without losing the information collected by either type of illumination alone and without requiring advanced post-processing.

Friday, June 2, 2023
3:40 pm – 5:20 pm PST
Session 9C – Biomedical and Emerging Devices
Session Chairs: Keith Morton (National Research Council of Canada), Mark Schvartzman (Ben-Gurion University of the Negev)
9C-1
Biomedical and Emerging Devices

Conductive Electrospun Fibers for Photovoltaic Applications, Luke Suttey, Ellie L. Ostermiller, Jessica Andriolo, Jack Skinner (Montana Technological University); Dennis J. Moritz, John J. Borkowski (Montana State University)

Conductive electrospun polycarbonate/multiwall carbon nanotube/hydroxyl functionalized multiwall carbon nanotube composite fibers are being fabricated for use in a electrospun fiber based solar cell. Conductive fiber composites fabricated will be used as the central electrode in a three layer triaxially spun photovoltaic fiber.

9C-2
Biomedical and Emerging Devices

Rapid Quantification of SARS-COV-2 Neutralizing Antibodies Using Electronic Nanoparticle Sensors, Md Ashif Ikbal, Seyedsina Mirjalili, Maziyar Kalateh Mohammadi, Yeji Choi, Mohammad Altarfa, Jose Solano (Arizona State University); Laura A. VanBlargan (the National Institutes of Health); Ching-Wen Hou (Arizona State University); Michael S. Diamond (Washington University School of Medicine); Vel Murugan, Chao Wang (Arizona State University)

Natural infection or vaccination triggers an immune response comprising the expression of neutralizing antibodies in the bloodstream against the Severe Accurate Respiratory Syndrome Coronavirus 2 (SARS-COV-2) virus.The proposed methodology shows great promise in low-cost, rapid (<20 min) screening for the assessment of therapeutic antibodies and individual immunity against uprising variants.

9C-3
Biomedical and Emerging Devices

Aerosol Jet Printing Enabled Dual-Function Electrochemical and Colorimetric Biosensor for SARS-CoV-2 Detection, Li Liu (University of California Riverside); Zhiheng Xu, Adrian Moises Molina Vargas (University of Rochester); Stephen J. Dollery (Biological Mimetics, Inc.); Michael G. Schrlau, Denis Cormier (Rochester Institute of Technology); Mitchell R. O'Connell (University of Rochester); Gregory J. Tobin (Biological Mimetics, Inc.); Ke Du (University of California Riverside)

A dual-function electrochemical and colorimetric sensing platform using graphene electrodes for detecting acute SARS- CoV-2 is developed with a high sensitivity, selectivity, acceptable rapidity, and excellent extensibility. In addition, the aerosol jet printing electrodes make the biosensor inexpensive and adaptable for detecting viral infections in point-of- care settings.

9C-4
Biomedical and Emerging Devices

Photocatalysis and Light Scattering by Sensitized Nanofibers for Denitrification, Jessica M. Andriolo (Montana Technological University); Emma K. Orcutt (Montana State University); Erik M. Grumstrup (Montana State University); Alec Talin (Sandia National Labs); Jack Skinner (Montana Technological University)

Nitrogen-based fertilizers are critical to the production of successful crops for farmers, yet use of these supplements has led to nitrate contamination of surface and ground waters. In this work, a catalytic electrospun filter was designed to use photons from natural sunlight to promote reduction of aqueous nitrate.

9C-5
Biomedical and Emerging Devices

Molybdenum disulfide/ sodium dodecyl sulfate thin films deposited on APTES functionalized silicon using electrophoretic deposition, Alex Young, Chris O'Loughlin, Theda Daniels-Race : Louisiana State University

This report presents the fabrication of MoS2/ sodium dodecyl sulfide (SDS) thin films onto 3-aminopropyl-triethoxysilane (APTES) functionalized semiconductor (silicon) substrates by electrophoretic deposition (EPD). We present how the MoS2/ SDS solutions used in this work facilitated significant improvement in the resultant EPD driven thin films compared to depositions without SDS.

Wednesday, May 31, 2023, 10:30 am - 1 pm, 5:45 - 7 pm
& Thursday, June 1, 2023, 8 am - 1 pm
Poster Sessions
P1-1
Advanced Pattern Transfer (Invited)

High aspect ratio etching of sub-300nm resolution oxide transmission gratings using design of experiment (DoE), Marc Bernet, Chantal M. Silvestre, Bettina Wissmann, Kristian J. Buchwald, Rafael Taboryski (DTU Nanolab)

In the presented project we optimize reactive-ion etching (RIE) parameters for the fabrication of oxide transmission gratings. A statistical method using design of experiment (DOE) is used to find the optimum values for the reaction in order to maximize the etch rate, the uniformity and the selectivity for industrial scalability.

P1-2
Advanced Pattern Transfer

Influence of water background on the etching rates of silicon and photoresist of a broad reactive ion beam,, Peter Birtel, Felix Linß, Frank Frost (Leibniz Institute of Surface Engineering (IOM))

For different water background pressures, the spatially resolved removals of silicon and photoresist as well as the resulting selectivity were investigated on a large area. It was shown that the reproducibility of the broad reactive ion beam etching process can be improved by adjusting the water background pressure.

P1-3
Advanced Pattern Transfer

High aspect ratio arrays of silicon nanostructures with controllable tapered sidewall by non-ICP plasma DRIE, Ripon K. Dey (metamaterial)

High aspect ratio (HAR) nanostructures with smoother and angled sidewall profiles have gained significant interest due to their versatile applications in nano-optics. We here demonstrated the HAR arrays of silicon nanostructures with smoother and controllable tapered sidewall by non-ICP plasma DRIE.

P1-4
Advanced Pattern Transfer

Characterization of a broad reactive ion beam for the processing of optical relevant materials, Erik Rohkamm, Frank Scholze, Daniel Spemann, Frank Frost (Leibniz Institute of Surface Engineering (IOM))

For a variation of the applied RF-power, a reactive broad ion beam was investigated regarding its current density, ion energy and mass distributions. It was shown that the interaction of the extracted ions with background particles leads to a fragmentation relevant for the ultra-precise processing of surfaces.

P2-1
Electron and Ion Beam Lithography (Invited)

Apparatus for studying low energy electron-photon interactions inside a Scanning Electron Microscope, John Simonaitis, Maurice Krielaart, J. Alongi, Karl Berggren, P. D. Keathley (Massachusetts Institute of Technology)

We present an apparatus for studying nanostructure-mediated electron-photon interactions at low electron energies. Central to our approach is the patterning of nano-sized structures directly onto the tip of a fiber optical core that acts as an electron-photon interaction region.

P2-2
Electron and Ion Beam Lithography

Challenges and Possibilities of Aberration-Corrected Electron-Beam Lithography on non-Electron- Transparent Substrates, Fernando Camino, Nikhil Tiwale, Sooyeon Hwang, Judith C. Yang (Brookhaven National Laboratory); Xu Du (Stony Brook University)

We present the point spread function (PSF) of aberration-corrected electron-beam lithography (ACEBL) in PMMA spin- coated on thick SiO2/Si substrates. We also printed hole arrays in PMMA (pitches around 26 nm) coated over SiNx/Si substrates with incrementally increasing Si layer thickness to study the effect of the substrate on the patterns.

P2-3
Electron and Ion Beam Lithography

An Analytic Study of Exposure Contrast over Feature Edge in Electron Beam Lithography, Soo-Young Lee (Auburn University)

The dependency of exposure contrast on electron-beam lithographic and PEC (proximity effect correction) parameters is investigated using an analytic model. The analytic results (mathematical expressions) from this study allow us to see the behaviors of exposure contrast explicitly and clearly without a time-consuming simulation for each individual case.

P2-4
Electron and Ion Beam Lithography

Geometric Control of Cell Behavior by Biomolecule Nanodistribution, Milo Hrabovsk (Tescan Orsay Holding); Miroslav Jurasek (Tescan Brno); Jakub Pospisil (Masaryk University); Josef Jaros (St. Anne's University Hospital)

Many dynamic interactions within the cell microenvironment modulate cell behavior and cell fate. However, the pathways and mechanisms behind cell−cell or cell−extracellular matrix interactions remain understudied, as they occur at a nanoscale level. Recent progress in nanotechnology allows for mimicking of the microenvironment at nanoscale in vitro using EBL technique.

P2-5
Electron and Ion Beam Lithography

Abrupt pattern transitions in argon ion bombarded swinging Si., Rakhi, Subhendu Sarkar (IIT Ropar)

Performed experiments on Ar+ irradiated swinging Si surfaces with different azimuthal angles at 67◦ ion projection and swing speeds from 1 to 16 RPM. Current surface evolution models do not adequately predict the findings that show that a multitude of ion-induced effects can drive the system into instability.

P2-6
Electron and Ion Beam Lithography

Effects of Highly Charged Ions bombardments on film-Coated Glassy Carbon, Audu Innocent (Federal University of Health Sciences)

Gassy carbons coated with thin films of tungsten were bombarded with highly charged Xe40+ ions. Samples were characterized by Raman spectroscopy and atomic force microscopy and SEM. Virgin glassy carbon has a crystalline size of 2.91 nm, which reduced in size with ion energies. AFM results indicate hillocks formation.

P2-7
Electron and Ion Beam Lithography

Interferometrically Evaluating Patterning Accuracy of EBL/KOH Ultraviolet Gratings for Astronomy, Jared Termini, Keri Hoadley, Casey DeRoo, Cecilia Fasano (University of Iowa); Erika Hamden, Jessica Li (University of Arizona)

We have used EBL patterning and KOH wet etching to create a prototype UV grating and measured it interferometrically to empirically determine the patterning accuracy. These measurements will provide vital feedback about the quality of our grating fabrication processes and inform us of potential areas of improvement.

P2-8
Electron and Ion Beam Lithography

Designing Hydrogen Silsesquioxane: Control Over Particle Size, Shelf-Life, and Sensitivity. Part II, R. T. Endean, D. E. Scott, D. M. Antoniuk, J. G. C. Veinot, Applied Quantum Materials Inc.

Applied Quantum Materials Inc. (AQM) is a supplier of hydrogen silsesquioxane (HSQ). The shelf-life of HSQ variants in methyl isobutyl ketone has been studied. Light scattering methods were employed to determine the variant's particle diameters. The shelf-life of AQM's standard HSQ in various organic solvents will be presented.

P2-9
Electron and Ion Beam Lithography

Experimental Studying of CNT Field Emission Array with Double Insulator, A. Burtsev, I. Navrotsky, K. Shumikhin, Kotelnikov Institute of Radio Engineering and Electronics RAS.

We present the results of experimental investigations of cathode-gate structure containing carbon nanotubes in double insulator. Experimental specimens of the electron gun, containing 2 μm diameter of cells with vertical CNTs, produce the cylindric electron beam of 0.8 mm and current up to 14 mA.

P3-1
Flexible Devices

Flexible Piezoelectric Pressure Sensors with In-Memory Computing Capabilities For Intelligent Electronic Skin, Sayani Majumdar, Tapio Makela, Tapio Pernu (VTT Technical Research Centre of Finland); Wuyu Zhao, Qiangfei Xia (University of Massachusetts Amherst)

We report arrays of polymeric ferroelectric sensors, capable of sensing static and dynamic touch and their integration with memristor crossbar array-based in-memory computing hardware for classification of touch, similar to human skin. These near-sensor computing platforms, capable of computing at the edge, will substantially reduce data communication, increasing computing efficiency.

P3-2
Flexible Devices

A novel method to manufacture ultra-thin 2D flexible devices, Elham Easy, Xian Zhang (Stevens Institute of Technology)

This study successfully transferred angstrom scale 2D materials onto flexible substrates using liquid polydimethylsiloxane as a medium. It represents a significant step forward in addressing the challenges associated with the fabrication of 2D flexible devices. This successful manufacturing method shed light on the next-generation wearable electronics.
P3-3
Flexible Devices

A novel wet transfer technology for manufacturing flexible 2D material devices, Yingtao Wang (Stevens Institute of Technology); Xian Zhang (Stevens Institute of Technology)

In this work, we invented a Poly(methyl methacrylate) (PMMA)-sacrifice wet transfer method to precisely and easily transfer two-dimensional (2D) materials onto a flexible substrate, Polydimethylsiloxane (PDMS). 2D materials can also suspend stably on flexible substrates with trenches of ~10 μm. This shed light on flexible electronics.

P4-1
MEMS/NEMS and Microfluidics (Invited)

Self-focusing Nanomechanical Sensors for High-throughput Detection of Single Viruses and Nanoparticles, Mohammed Alkhaled, Batuhan Kaynak, R. Tufan Erdogan, Hashim Alhmoud, Hadi Sadaghat Pisheh, Mehmet Kelleci, Ilbey Karakurt (Bilkent University); Cenk Yanik (Sabanc University); Z. Betul Sen (Bilkent University); Burak Sari (Sabanc University); Ahmet Murat Yagci (METU MEMS Center); Aykut zkul (Ankara University); M. Selim Hanay (Bilkent University)

We increased the throughput of nanoelectromechanical systems-based mass spectrometry (NEMS-MS) by integrating a polymeric ion lens to focus particles electrostatically to the NEMS resonator. This integration allowed for the first operation of NEMS-MS entirely under atmospheric conditions, leading to the successful detection and weighing of nanoparticles and single SARS-CoV-2 viruses.

P4-2
MEMS/NEMS and Microfluidics

Design and Simulation of a Planar Resonance Pull-in Microshutter Array, Jason V. Clark (Oregon State University); Yingsong Han (Auburn University); Li Jiang, Naga S. Korivi (Tuskegee University); Huafeng Liu (Huazhong University of Science and Technology)

We propose a new type of microshutter array that can open and close in-plane instead of out-of-plane as all others. Our in-plane shutter opens at a much smaller voltage than out-of-plane by one to two orders of magnitude. A tradeoff with our in-plane design is a reduction in light throughput.

P4-3
MEMS/NEMS and Microfluidics

Numerical study on the impact of the geometric shape of micropillar array electrodes on the performance of a microfluidic biosensor, Maliheh Azimi Roueini, Amal Kabalan (Bucknell University)

We studied and compared the effects of different shapes of micropillar array electrodes on the operation of microfluidic biosensors numerically with COMSOL Multiphysics in order to design a microfluidic biosensor with an ideal sensitivity.

P4-4
MEMS/NEMS and Microfluidics

Amorphous WNx Metal the Best candidate for Accelerometers and Gyroscope, Abdulilah Mayet (King Khalid University)

Nanoelectromecahnical (NEM) switches and devices are getting more attention for their higher resonant frequency ƒo, low power consumption and lower threshold voltage, thanks to their nano scale size. These unique characteristics give NEM switches the preference and vantage against classical and larger in size switches microelectromechanical switches (MEMS).

P4-5
MEMS/NEMS and Microfluidics

Quantum dots Enhanced IMPACT Chip for Viral Nucleic Acid Detection, Mengdi Bao, Yu Chang (University of California, Riverside; Rochester Institute of Technology,); FNU Yuqing (Rochester Institute of Technology); Ke Du (University of California, Riverside; Rochester Institute of Technology)

To eliminate end-point signal measurement and achieve visualized readout, we coupled quantum dots (Qdots), single- stranded DNA, and gold nanoparticles (AuNPs) to form a Förster resonance energy transfer (FRET) assay for viral detection. In this work, we switched from organic quenchers to AuNPs in an effort to obtain straightforward visual readouts.

P4-6
MEMS/NEMS and Microfluidics

Design of MEMS vibration sensor for harsh environment, Narendra Lakal, Xian Du (University of Massachusetts); Ali H. Alshehri, Keith W. Brashler, Mohammad Ba'adani, Doru C. Turcan (Saudi Arabian Oil Company); Kamal Youcef- Toumi (Massachusetts Institute of Technology)

This article presents the design, analysis, and proposed fabrication process of a piezoelectric (AlN) MEMS (Si substrate) vibration sensor with parylene encapsulation for long-duration applications in an oil environment. The proposed sensor is designed to work at a temperature of up to 150C with a frequency range of 10 kHz.

P5-1
Nanofabrication for Energy Applications

Effects of doping on the power factor and efficiency of nano-materials for thermoelectric generator, Wiqar SHAH (International Islamic University)

This work related the waste heat conversion in electrical energy through nano-materials

P5-2
Nanofabrication for Energy Applications

Photocatalytic performances of electrospun Cu-doped TiO2 nanofibers depending on Cu content and electron beam irradiation, So-Hyeon Lee, Jae-Yoon Kim, Han-Sol Yoon, Kyeong-Han Na, Won-Youl Choi (Gangneung-Wonju National University)

Cu-doped TiO2 nanofibers were fabricated using the electrospinning method. Electron beams of 5-20 kGy were irradiated on the nanofibers to enhance photoactivity. It was observed that the photodegradation performance of electron beam treated Cu-doped TiO2 nanofibers to methylene blue and methylene orange was improved compared to pure TiO2 nanofibers.

P5-3
Nanofabrication for Energy Applications

Adhesion and Excitation Lifetime of Perovskites on Modified Substrates, Xavier Vorhies, Jack Skinner (Montana Technological University); David F. Bahr (Purdue University); Jessica Andriolo (Montana Technological University); Erik M. Grumstrup (Montana State University)

Using a modified nanoindentation method we quantify the adhesion of perovskites on TiO2 substrates. The excited state lifetimes and optoelectronic properties are determined using ultrafast pump-probe microscopy and time-resolved photoluminescence spectroscopy. We hypothesize that improved adhesion at the perovskite-substrate interface will correlate to more efficient electron transfer into the ETL.

P5-4
Nanofabrication for Energy Applications

Pulsed Laser Assisted Fabrication of 2D Chalcogenides for Energy Conversion Devices, Arulraj Arunachalam (Universidad Tecnolgica Metropolitana)

2D Molybdenum disulphide (MoS2) thin films were fabricated by pulsed laser ablation technique using a KrF excimer laser, with controlled temperature and thickness under in-situ conditions. With increase in temperature, an improvement in crystallinity is observed leading to the enhancement of active sites in MoS2.

P6-1
Nanophotonics and Plasmonics

Fabrication of Nanoscale T-Structures for the Realization of Metasurfaces with Double-Peak Absorbance, Jacob Waitkus, Ke Du (University of California at Riverside); Shuai Feng, Theodore Ndukaife, Sui Yang (Arizona State University)

The combination of nanostructures here forms a unique metasurface capable of biological and chemical sensing. From the 20 nm gap between the T-structures, a unique double-peak transmission spectrum is obtained that is sensitive to minor changes in the surrounding refractive index due to the presence of chemicals or biological components.

P6-2
Nanophotonics and Plasmonics

Plasmonic-Enhanced Carbon Dioxide Photo-Reduction using Collapsible Nano-fingers, Tse Hsien Ou, Pan Hu, Zerui Liu, Yunxiang Wang, Sushmit Hossain, Sonia Zhang, Deming Meng, Boxin Zhang, Stephen Cronin, Wei Wu (University of Southern California)

Collapsible nano-fingers to do CO2 photo-reduction. A high-intensity hot spot generate a great number of electron-hole pairs inside the TiO2 spacer that can facilitate the chemical reduction and oxidation reaction. Higher hydrocarbons were generated in the CO2-saturated deionized water when nano-fingers existing.

P6-3
Nanophotonics and Plasmonics

Coupling nano-electronics and photonics through precise alignment with silicon color centers, Nikki Ebadollahi (NIST/University of Maryland); Vijin K. Veetil, Matthew A. Pelton, Marcelo I. Davanco, Kartik A. Srinivasan, Pradeep N. Namboodiri, Joshua M. Pomeroy (NIST)

Realizing an efficient link between silicon spin qubits and telecommunication photons using silicon color centers (CCs) requires precise overlay between photoluminescence maps of the CCs and lithographic design patterns of quantum dot structures.

P6-4
Nanophotonics and Plasmonics

Measured and Simulated Optical Transmission Through Nanoholes in a Bilayer of Gold and Vanadium Dioxide, Zachary Givens, Eugenii Donev (Austin Peay State University)

We investigate optical transmission through nanohole arrays with plasmonic and phase-switching functionalities. We fabricated previously simulated Au+VO2 arrays and measured their transmission spectra to determine if large computed peak ratios survive real-world conditions. Incomplete milling of the VO2 layer may explain why measured ratios are lower than predictions for thru-holes.

P6-5
Nanophotonics and Plasmonics

Implementation and Characterization of Tunable Reconfiguration and Actuation in Microbowls using atomic force microscopy, Yue Liu, Yan Nie (Helmholtz-Zentrum Hereon)

In our work we enhance the programmability of temperature-memory micro-objects using atomic force microscopy to achieve a sequential shape reconfiguration or actuation at different geometrical levels on demand.

P7-1
Optical Lithography (Invited)

In-Situ Metrology of Direct Write Laser Ablation using Optical Emission Spectroscopy, Briana Cuero, Kun-Chieh Chien, Chih-Hao Chang (University of Texas at Austin)

In this work we aim to study the emitted spectral information during direct-write laser ablation and use data-driven approaches to identify and monitor the key wavelength in real time. The initial results show a strong correlation between a key wavelength of 790 nm and the morphological change in glass.

P7-2
Optical Lithography

Direct-Write Lithography and Etch of Images by Dithering Process, Thomas Mittelbrun, Francisco Saldana Fernandez, Gyuseok Kim (University of Pennsylvania)

We demonstrate a pattern transfer process of images by conduction dithering. This work details the data preparation and fabrication of images into a SiO2 thin film using Heidelberg direct-write lithography and reactive ion etching (RIE). The optimal image process method, pixel size, and exposure dose are proposed.

P7-3
Optical Lithography

Sequential Infiltration on Two-Photon Polymerized IP-L 780 3D Microstructures for Photonic Applications, Anuj Singhal (The University of Illinois at Chicago); Ralu Nana Divan (Center for Nanoscale Materials, Argonne National Laboratory); Jack Lachowicz (The University of Illinois at Chicago); Liliana Stan (Center for Nanoscale Materials, Argonne National Laboratory); Igor Paprotny (The University of Illinois at Chicago)

Sequential infiltration synthesis(SIS) can be used to infuse metals and metal oxides deep into polymers. In this work, mechanical, temperature degradation, and SEM analysis are performed on ZnO-infused IP-L-780 resin based 2-photon polymerized structures. SIS to achieve enhanced refractive index in photonic crystals for spectroscopic sensing applications is also shown.

P7-4
Optical Lithography

Sub-50 nm EUV Lithography using Colloidal Nanoparticles, Saurav Mohanty, Ethan Flores and Chih-Hao Chang (University of Texas at Austin)

We propose using colloidal nanosphere lithography coupled with a 30 nm EUV light source to pattern periodic geometric patterns with sub 50 nm feature sizes.

P8-1
Scalable Micro/Nanomanufacturing (Invited)

Fabrication of Hierarchical Nanostructures using Binary Colloidal Nanosphere Assembly, Ethan Flores (University of Texas at Austin); Saurav Mohanty (The University of Texas at Austin); Andrew Tunell (University of Texas at Austin); Chih-Hao Chang (University of Texas at Austin)

In this work we present the fabrication of hierarchical nanostrucures using binary colloidal assembly. Using a two-step coating process, we seek to create sub-50 nm features by depositing smaller nanoparticles into the voids of an array of larger polystyrene (PS) nanoparticles with hexagonal closed packed assembly.

P8-2
Scalable Micro/Nanomanufacturing

Electrospun Ethylcellulose Nanofibers for Dental Resin Modified Glass Ionomer Cement, Kyeong-Han Na, (Gangneung-Wonju National University); Moo-Hyun Seo (Spident Co.); So-Hyeon Lee, Jae-Yoon Kim, Han-Sol Yoon, Won-Youl Choi (Gangneung-Wonju National University)

Ethylcellulose nanofibers were fabricated using electrospinning. It was pulverized using cryogenic milling and mixed with dental resin-modified glass ionomer cement. The mechanical properties and working time were improved by the nanofiber network dispersed in the resin.

P8-3
Scalable Micro/Nanomanufacturing

Portable Electrospinner with Ionized Airflow to Improve Performance in Humid Environments, Harold Pearson, Isaac Gilfeather, Jack Skinner, Jessica Andriolo (Montana Technological University)

Here we aim to achieve higher precision during fiber deposition in humid environments to improve reliability of electronic or photovoltaic devices or medical bandages fabricated on-demand in the field. We have modified the portable electrospinner to include ionized airflow to remove charge buildup in the device caused by changing humidity.

P8-4
Scalable Micro/Nanomanufacturing

Measuring the Patterning Precision of Large Area Advanced Lithography with Interferometry, Cecilia Fasano, Casey DeRoo (University of Iowa); Fabian Grise (Pennsylvania State University); Keri Hoadley, Jared Termini (University of Iowa); Chad Eichfeld, Jake McCoy, Randall McEntaffer (Pennsylvania State University)

We adapt a classic technique from diffractive optics which, when applied to lithographic patterning, allows researchers to assess the characteristic errors of patterns produced via lithography over large-areas non-destructively.This presentation is an outgrowth of our efforts to integrate electron-beam lithography and nanoimprint lithography into a process for fabricating astronomical gratings.

P9-1
Metrology and Simulation

Thermal Analysis with High Accuracy of Multi-beam Mask Fabrication, Yanjun Zhang, (Zhuming Liu (Guangdong Academy of Sciences)

In this study, the thermal effect of the electron beam on photoresist and substrate during lithography was simulated with a finite element numerical method. The numerical research shows that the thermal analysis method in the study provides a guide to optimize process parameters of mask fabrication.

P9-2
Metrology and Simulation

Particle-based simulation and experimental validation of the beam properties in electron beam physical vapor deposition, Paul Nizenkov, Stephen Copplestone, Asim Mirza (boltzplatz - numerical plasma dynamics GmbH); Andreas Jendrzey, Neil Morrison (Applied Materials Web Coating GmbH)

As a first step in an effort to optimize the hardware for electron beam physical vapor deposition, we compare numerical simulations of the electron beam propagation using the open-source plasma simulation software PICLas with experimental measurements. Good agreement between the simulations and experiment was achieved.

P9-3
Metrology and Simulation

A magnetostatic Boundary Element Method (BEM) solver for the General Particle Tracer (GPT) code, Sebastiaan van der Geer, Marieke de Loos (Pulsar Physics)

Here we present a new extension to the well-established GPT simulation code that allows for the calculation of magnetostatic fields in complex 3D geometries using a hierarchical Boundary Element Method (BEM) solver. The extension incorporates parametric coil modelling, relativistic particle tracking and aberration analysis up to 7th order.

P9-4
Metrology and Simulation

A Universal Atomic Probe: integrating digital and analog lithography and Near Field Spectroscopy, Tito Busani, Isaac Stricklin (University of New Mexico)

We propose a multi-functional lithography and metrology systems. A Multipurpose Atomic Force Microscopy (MAFM) probe that integrates UV lithography, field emission lithography and digital lithography in a single system that allows patterning generation with atomic accuracy, real time inspection with atomic resolution and nano meter Raman Spectroscopy.

P9-5
Metrology and Simulation

Characterization of Nano-grating Profiles using Standard Ellipsometry and Deep Neural Networks, Zijie Jiang, Wen-Di Li (The University of Hong Kong)

In this research, we propose a new method based on deep neural networks and gradient descent method to fully reconstruct the profile of nano-gratings using standard ellipsometry data (i.e., ψ and Δ). This method is compatible with various kinds of patterning techniques and different resists.

Poster Start-up
P10-1
Startup Contest

OG Sense submission for Startup contest - EIPBN 2023, Valters Slava

Our team has developed a new technology for NH3 measurements. OG Sense uses a passive optical sensor that absorbs gas and detects it through light interaction with absorbing media. A single device will consist of multiple sensors to ensure both concentration and gas-type detection.
P10-2
Startup Contest

High-Sensitivity Point-of-Care Cardiac Troponin Testing Device for Non-ST-Elevation Myocardial Infraction Diagnosis, Seungjun Ki, Mingze Chen, Xiaogan Liang (University of Michigan)

Our target is to develop point-of-care (POC) cTn testing module with comparable sensitivity and specificity to the CLT for the prehospital NSTEMI diagnosis.

P10-3
Startup Contest

Holographic photolithography tools for industrial-scale nanomanufacturing, Joseph Geddes (Photia Incorporated)

Photia Incorporated is developing methods based on holographic photolithography for industrial-scale manufacturing of micro- and nano-structured materials. These materials have a variety of applications, including optical coatings and metamaterials, filtration and separations, batteries and electrochemistry, and template patterning (molds and shims).

P10-4
Startup Contest

Fabrication of Ultra-low refractive index nano-lattice material, Saurav Mohanty, Chih-Hao Chang (University of Texas at Austin)
3D Nanotech proposes a scalable, airgap-based 3D multi-layer porous nanolattice structure that can be integrated into AR/VR hardware, exhibiting a refractive index as low as 1.025, with precise index tuning, and high structural stiffness in the GPa range. Applications of this include efficient photonic waveguides, and optical sensing technologies.

EIPBN 2022