☰ EIPBN

EIPBN 2011 Authors Index


A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z
Name Abstract

A

Adiga, vivekanandaHigh quality factors in graphene and ultra thin Silicon nitride nanomechanical drums
Ahn, Se HyunVibrational Indentation Patterning of Grating Structures with Real-time Period Tunability
Alkemade, PaulHelium ion beam lithography of thick HSQ resists
Altana, MircoSidewall-angle dependent pre-filling of three-dimensional microcavities in thermal nanoimprint
Alvis, RogerOptimization of the Gun, Lenses, and Detectors for High-Vacuum SEM Studies of Non-Conductive Specimens
Amano, TsuyoshiResidual-type mask defect printability for EUV lithography
Appleton, Bill R.Nanofabrication of Graphene on SiC by Multi-Ion Beam Lithography and Low-Temperature Processing
Araki, KoseiMolecular simulation of electron-irradiation damages in resist materials (Invited)
Ashiba, HirokiNanomechanical Tuning Forks Fabricated by Focused-ion-beam Chemical Vapor Deposition
Asayama, YoshikiMolecular dynamics study on structural modifications of graphene by electron beam irradiation
Atasoy, HakanRelease-Optimized UV-NIL Resists
Ayothi, RamakrishnanFundamental Study of EUV Resist Line Edge Roughness: Characterization, Experiment and Modeling

B

Babin, SergeySEM dimensional metrology on sub-15 nm bit-patterned media using model-based analysis
Barton, RobertFabricating Graphene-Silicon Nitride Heterostructures for High-Q Tunable Nanomechanical Resonators
Beck, TJElectron Beam Lithography of Antidot Arrays for the Fabrication of Nanogenerators and Detectors in 2DEG Materials
Bell, DavidNanoscale imaging, analysis and nano-fabrication using Helium Ion Microscope
Bergmair, IrisHigh aspect ratio lift-off process and silver optimization for negative index materials in the visible
Berry, ShaunElectrically Controlled Switchable Adhesion of Dual Nanometer and Micrometer Structured Surfaces
Binh, Vu ThienX-rays and field-emission gun: an intrinsic quasi-monochromatic X-ray source (Invited)
Bishop, JamesA Mechanism for Dendritic Nano-Pillar Growth using EBID
Böttger, RomanTaming Nanostructures: From Sponge to Dot Pattern on Ge Controlled by Heavy-Ion-Deposited Energy
Bresin, M.Liquid phase electron beam induced deposition of CdS
Brodoceanu, Daniel Metal Nanoparticle Arrays by Controlled Decomposition of Polymer Particles
Brown, DevinPoint spread function analysis of dense high resolution nanodots in hydrogen silsesquioxane
Bruccoleri, AlexanderFabrication of Nano-scale, High Throughput, High Aspect Ratio Freestanding Gratings
Bruley, JohnCombining SIMS with GPA of aberration corrected HAADF STEM images for measurement of misfit strain in epitaxial SiGe layers
Burckel, D. BruceInterferometrically Defined 3D Pyrolyzed-Carbon Sensors
Byeon, Kyeong-JaeThermal Imprinting Process using ZnO Nanoparticles-Dispersed Resin for the Improvement of Light Extraction Efficiency of GaN-based LEDs

C

Cadarso, Víctor J.Polymeric freestanding structures by direct write laser without sacrificial layers
Cantu, PreciousDeep-subwavelength patterning with photoswitchable molecules
Chan, Wei MinDirected Patterning for Electronics Using Multiple Block Copolymers Orthogonally
Chang, Jae-ByumComplex self-assembled patterns from a square grid template with restricted geometry
Chang, LongMulti-domain storage in graded bit patterned media (Invited)
Chen, HaoSignificant Enhancement of Colloidal Quantum Dots Fluorescence by 3D Disk-dot Coupled Nanoantenna Array
Chen, LichuanDevelopment of jet rollable nanoimprint process to fabricate bio-polymer nanostructures
Chen, TaoPiezoelectrically Transduced Silicon Carbide MEMS Double-Clamped Beam Resonators
Chen, YifangDry-Release Self-assembling of Microtube Arrays for Catalytic Micropump Application
Chen, YijianNear-Field EUV Imaging for Spatial Frequency Multiplication
Cheng, Yao-TeNanoscale Photoelectron Emission Using C-shaped Nanoapertures with Cesium Bromide Photocathode
Cheng, XingHigh-Resolution Non-Destructive Patterning of Isolated Organic Semiconductors
Choi, ChulminDi-block Copolymer Guided Patterning of Graphene
Choi, DuyoungDi-block Copolymer Guided Patterning of Graphene
Choi, HeonConcentric Ring Metal-Dielectric Structures for Surface Electromagnetic Wave Assisted Compact Photoelectron Source (Invited)
Chun, Sungwoo Fabrication of On-Chip Fluidic Ion Channels using Self-Aligned Double Layer Resist Processing Technique
Con, CelalElectron beam lithography using dry thermal development
Cord, BryanHigh-Speed Patterning of Hexagonal Dot Arrays Using Electron-Beam Lithography
CORDEIRO, Julien3D Capillary Force Assembly : Fabrication of a white light emitter
Crnogorac, FilipMonolithic 3D Integration via Al-Ge Bonding of Single Crystal Islands (Invited)
Cui, AjuanFabrication of Sealed Nano-channels Based on Sacrificial Nanotemplates by Focused-ion-beam Induced Chemical Vapor Deposition
Cui, BoEffect of molecular weight distribution on e-beam resist polystyrene
Czaplewski, DavidVariation of Proximity Effect Correction Parameters with Density

D

Dai, JunSuperconductivity of tungsten-containing carbon nanowires fabricated by focused-ion-beam chemical vapor deposition
Dai, Q.Optimization of Spatial Dose Distribution for Vertical Sidewall of Resist Profile Minimizing Total Dose in Electron-beam Lithography
Dai, XiaoguangElectron-beam Patterned PEG Microgels for DNA Detection
Dais, ChristianPhase shifting mask for high-throughput high-contrast patterning with Displacement Talbot Lithography (DTL)
de Angelis, FrancescoSurface Chemical Imaging at the Nanoscale (Invited)
de Pablo, JuanDirected Assembly of Symmetric ABA Triblock Copolymers on Chemically Nanopatterned Substrates
DeRose, GuyDetermination of Base Dose and Scattering Coefficients for Proximity Effect Correction in Electron Beam Lithography
Despont, MichelProbe nanopatterning: Towards a smarter lithography technology (Invited)
Dey, Ripon KumarEffect of molecular weight distribution on e-beam resist polystyrene
Dhima, KhalidStudy of defect mechanisms in partly filled stamp cavities for thermal nano imprint control
Dhuey, ScottSingle digit nanoimprint lithography achieved by template modification with atomic layer deposition
Ding, WeiNew Nanoplasmonic Devices and Fabrication for Large Enhancement and Tunability of Second Harmonic Light Generation
Dobisz, ElizabethFabrication of CoCrPt Alloy Bit Patterned Media at 1 Td/in2 for Recording Measurement
Doh, JonggulLithographic Performance of EUV Mask using Coherent Scattering Microscopy
Douglas, EricaInductively Coupled Plasma Etching of Benzocyclobutene with SF6 Chemistry
Du, KeFabrication of Polymer Nanostructures via Maskless O2 Plasma Etching

E

Ekinci, YasinHigh-resolution patterning with EUV interference lithography
Eriksson, TorbjörnHigh Volume Nanoimprint Lithography technology and applications

F

Fan, LiSub-20 nm Metal Gratings by Nanoimprint Lithography
Fan, RongFabrication and Characterization of Field Effect Reconfigurable Nanofluidic Ionic Diodes: Building Blocks Towards Digitally-Programmed Manipulation of Biomolecules
Farshchian, Bahador3-D Nanomolding
Fernandez-Cuesta, Irene30 nm nanochannels with plasmonic bowtie nanoantenna
Fischer, Andreas C.3D Patterning of Si Micro and Nano Structures by Focused Ion Beam Implantation, Si Deposition and Selective Si Etching
Fleischer, MonikaPotential modulation by plasmonic sub-micron structures for the manipulation of ultracold atomic gas clouds

G

Gavagnin, MarcoFocused Electron Beam Induced Deposition as novel nanofabrication approach for magnetic nanosensors and nanomagnet logic
Geiss, ReinhardLithium Niobate Nanowaveguides fabricated by Ion-Beam Enhanced Etching
Ghadarghadr, ShabnamThe Membrane-Alignment Stage in Fabricating 3-Dimensional Nanostructures
Ghassemi, SabaSub-micron scale gold-tipped elastomeric pillar arrays for human T cell activation and culture
Gondarenko, Alexander Fabricating Graphene-Silicon Nitride Heterostructures for High-Q Tunable Nanomechanical Resonators
Goodwin, FrankEUV Mask Challenges, Status & Closing The Remaining Technology Gaps (Invited)
Gorisse, ThereseDirected Self-Assembled Porous Anodic Alumina by NanoImprinting Lithography
Graczyk, MariuszOptimization of a Self-Closing Effect to Produce Bottle-Shaped Nanochannels in Quartz
Grogg, DanielCurved cantilever design for a robust and scalable microelectromechanical switch
Guan, WeihuaFabrication and Characterization of Field Effect Reconfigurable Nanofluidic Ionic Diodes: Building Blocks Towards Digitally-Programmed Manipulation of Biomolecules
Guillorn, MichaelElectron beam lithography-based grating customization strategies for gate level patterning in high density SRAM circuits (Invited)
Guo, L. JayVibrational Indentation Patterning of Grating Structures with Real-time Period Tunability

H

Harada, TetsuoDevelopment of Standalone Coherent EUV Scatterometry Microscope for EUV Mask Observation
Harris-Jones, JenahEUV Mask Challenges, Status & Closing The Remaining Technology Gaps (Invited)
hendrickx, ericEUV lithography in pre-production mode (Invited)
Hendel, RudiAn all-optical process for extending GRATE to the 11nm (20nm hp) Technology Node (Invited)
Henderson, CliffordHigh Resolution Negative Tone Resists via Controlled Polymerization
Hoffman, GalenElectron Beam Direct Write of Chalcogenide Glass Integrated Optics
Hojeij, MohamadResonant Dielectric Nanostructures for biosensor applications (Invited)
Hornung, MichaelMask Aligner Process Simulation for Advanced Lithography and Resolution Enhancement Techniques
Hu, WalterNanoimprinted Polymer Solar Cell
Hu, WeihuaSPM Local Oxidation and In-situ Characterization Using AFM Probes in Multiple Modes
Huang, ZhihongDiamond nitrogen-vacancy centers created by scanning focused helium ion beam and annealing
Hwang, Ing-ShouhLow-Energy Electron Diffraction Microscopy Based on a Single-Atom Electron Source

I

Iida, SusumuDependence of Image Characteristics Dependece on Incident Electron Beam Energy for EUV Mask inspection using Monte Carlo simulation
Ilg, MichaelImproved single ion implantation with scanning probe alignment
Inomata, NaokiVacuum-packaged Resonant Thermal Sensor for Biological Cell in liquid (MNC Paper)
Itani, ToshiroAn In situ Analysis of EUV Resist Film Inhomogeneity during the Dissolution Process
Ito, ShunyaRelease Layer Free Acrylate Resins for Ultraviolet Nanoimprinting Prepared by Adding Segregation Auxiliary Agents
Iwase, TakuEtching Process for Patten Transfer from Sphere-type PMMA-b-PMAPOSS Block Copolymer
Iyoshi, ShusoStudy of demolding Characteristics in continuous UV nanoimprinting

J

Jaksch, HeinerThe contrast mechanisms of LL-BSE electrons from Hybridization & Band Gaps
Jarnagin, NathanProduction of sub-20nm Pitch Features from Directed Self Assembly of High Chi Polymers via a Selective Block Removal Process Utilizing Atomic Layer Deposition (Invited)
Jarro, Carlos AndresPatterning Silver Using an Atomic Force Microscope and Laser-induced Deposition from Liquids (Invited)
Jin, ChongjunNon-planar nano-arc-gap arrays fabricated via colloidal lithography
Jin, PengModel of Curing Shrinkage and Kinetics Parameters of Acrylate-based UV-embossing Resist Based on Free Volume Theory
Joy, DavidModeling for Multi-Beam Ion Imaging and Analysis
Jugessur, AjuNanolithography and pattern transfer of dense sub-10 nm lines
Jun, DavidEnergy Spread Measurement of an Electron Impact Gas Ion Source Equipped with a Miniaturized Gas Chamber
Jung, YunbumDual-Layer Thermal Nanoimprint Lithography without Dry Etching

K

Kadowaki, TakuyaStrain characteristics of free-standing graphene induced by low-energy electron beam irradiation
Kanwal, AlokikBio-Fuel Cell Operational Enhancements using Nanoscale Electrodes
Kaplan, AlexHigh aspect-ratio doped Si nanostructures for plasmonics induced light funneling applications
Karbasian, GolnazHigh Aspect Ratio Features in PMGI using Electron Beam Lithography and Solvent Developers
Kawata, Hiroaki Filling Characteristics of Imprint Process for Concave Pattern Molds
Kearney, Patrick Understanding the sources of unwanted etch in ion beam sputter deposition production of EUV mask blanks
Kehagias, NikolaosSub-100 nm three dimensional diffractive optical elements fabricated by UV light assisted roll-to-roll nanoimprint lithography
Khaira, GurdamanDefect Evolution in Thin Films of Self-Assembling Lamella Forming Block Copolymers on a Neutral Surface
Kihara, NaokoFabrication of 5 Tb/in2 Bit Patterned Media with Servo Pattern using Directed Self-Assembly
Kim, Kang YujiCharacteristics of mechanical vibration in imprinted nanostructures
Kim, Min-ChulImage Compensation of Mask Misalignment in Aerial Image Microscope System
Kim, Sang-KonElectric Field Induced Patterning in Computational Lithography
Knapp, Jeffrey M.Overcoming 3DIC Technology Hurdles (Invited)
Knuffman, BrentonFocused Ion Beam Implantation of Li+ in WO3 Using A Magneto-Optical Trap Ion Source (Invited)
Kobrin, BorisLarge area optical lithography using cylindrical masks
Kolacek, KarelDirect nano-structuring of solid surface by extreme ultraviolet Ar8+ laser
Kometani, ReoSuperconductivity of tungsten-containing carbon nanowires fabricated by focused-ion-beam chemical vapor deposition
Kong, Seong DeokThe Blood-Brain-Barrier Crossing in vivo using Magnetic Nanocapsules
Koshelev, KirillStudy of Line-Edge Roughness in ZEP Resist Nanopatterns from Electron Beam Lithography by Numerical Modeling
Kotera, MasatoshiMeasurement of fogging electron current in scanning electron microscope
Kravchenko, IvanFabrication of a band-limited mask for PHARO
Kumar, KarthikLithographically-Defined Nanostructures for Color Plasmonic Printing
Kwak, Moon KyuVibrational Indentation Patterning of Grating Structures with Real-time Period Tunability

L

Lawson, RichardHigh Resolution Negative Tone Resists via Controlled Polymerization
Lee, Chookiat Fabrication of an 18-layer 3D Woodpile Photonic Crystal via Stacking of Pre-Patterned Free-Standing Membranes
Lee, JaeJongFabrication of Adhesion-free Transparent Roll Stamp for Large Area Patterning using UV-typed Roller Nanoimprint Lithography
Lee, JonghoGraphene transistors with record mobilities on polyimide for high-performance flexible nanoelectronics
Lee, SunwooFabricating Graphene-Silicon Nitride Heterostructures for High-Q Tunable Nanomechanical Resonators
Lee, Tao-HuaTemplate-Assisted Self-Assembly and Alignment of ZnO Nanowires with Post-Deposition Growth
Lezec, H.J.Stable Field Emission from Nanoporous Silicon Carbide Tips Patterned by a Focused Ion Beam(Invited)
Li, Jiseok Design and fabrication of micro optical system for multi-optical probe confocal microscopy for large areal measurement
Li, JinxingDry-Release Self-assembling of Microtube Arrays for Catalytic Micropump Application
Li, shuhongStudy of nanospheres lithography technology with super-lens for fabricating nano holes
Li, Wen-DiDemonstration of sub-4 nm nanoimprint lithography using a template fabricated by helium ion beam lithography
Liang, YixingA Tri-layer Method to Fabricate Wafer Scale Nanoimprint Mold by Copolymer Lithography
Likhanskii, AlexModeling of defect transport in EUVL plasma chambers
Lin, BurnNew Era of Electron Beam Lithography
Liu, ChangzhiFabrication of Sealed Nano-channels Based on Sacrificial Nanotemplates by Focused-ion-beam Induced Chemical Vapor Deposition
Liu, NannanElectron impact gas ion source development; evaluation of different electron injection sources (Invited)
Liu, ShiyuanFast Aerial Image Simulation for Partially Coherent Systems by TCC Decomposition with Analytical Kernels (Invited)
Liu, WenhanPatterning of porous silicon nitride membrane by CsCl self assembly
Liu, Yi-ChenHigh-Resolution Non-Destructive Patterning of Isolated Organic Semiconductors
Liu, YuyangFabrication of Polymer Nanostructures via Maskless O2 Plasma Etching
Liu, ZuweiSub-10 nm area-selective ALD using block copolymer lithography
Loeffler, RonnyPyramid Array Substrates for Biomedical Studies
Luce, StephenCMOS Compatible RF MEMs Technology (Invited)
Luttge, ReginaMicro-nanofabricated platform technology for cell seeding experiments in neuro-nanobiology

M

Mackie, WilliamCold Field, Thermal-Field, and Schottky Emission from HfC(310) Sources
Mankos, MarianProgress Towards An Aberration-Corrected Low Energy Electron Microscope for DNA Sequencing and Surface Analysis
Manfrinato, Vitor R.Templated Placement of Colloidal Quantum Dots
Martin, AidenElectron Beam Etching Kinetics of Diamond and Graphite
Martin, FrederickA Large-Aperture Ion-Beam Lens Corrected For Both Chromatic And Spherical Aberration
Martinez-Perdiguero, JosuEnhanced Transmission through Gold Nanohole Arrays Fabricated by Thermal Nanoimprint Lithography for Surface Plasmon Based Biological Sensing
Mastropaolo, EnricoPiezoelectrically Transduced Silicon Carbide MEMS Double-Clamped Beam Resonators
Mayer, AndreStudy of defect mechanisms in partly filled stamp cavities for thermal nano imprint control
McMorran, BenjaminSculpting Electron Beam Profile and Phase with Nanofabricated Diffractive Optics
Mehrotra, PrateekUltra-high-Numerical Aperture Interference Lithography at High Aspect Ratios using Surface States on Effective Gain Media
Mekaru, HarutakaControl of Inclined Angle of Glass-like Carbon Mold by Defocus UV Exposure on Si Containing Photoresist
Melli, MauroHyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of “Campanile” Tips
Menon, RajeshDeep-subwavelength patterning with photoswitchable molecules
Michels, ThomasUltrafast Cantilever for High Speed Scanning Force Microscopy
Mirza, MuhammadNanofabrication of high aspect ratio (~50:1) sub-10 nm silicon nanowires using plasma etch technologies
Møller-Nilsen, R.Reproducibility of Drift Tolerant Focused Ion Beam Lithography Method
Mohammad, Mohammad AliHigh Aspect Ratio SML Resist Patterning using 30 keV Electron Beam Lithography
Moldovan, NicolaieNanofabrication with Si(311)
Moon, J. S.Graphene for RF Applications: Opportunities & Challenges (Invited)
Morton, KeithHigh Aspect Ratio, Triangular Silicon Pillars for Bump Array Concentration of Pathogenic Bacteria
Motavas, SaloomeDiameter Dependence of the Effect of Light Polarization on Interband Transitions in Zigzag Carbon Nanotubes
Muhammad, MustafaNano-Patterning of PMMA on Insulating Surfaces With Various Anti-Charging Schemes Using 30 Kev Electron Beam Lithography
Murray, Lynn M.Polymeric Substrates with Bioimprinted Micro- and Nanoscale Topography for Regulation of Chondrocyte Re-Differentiation

N

Nagato, KeisukeLarge-Area Nanostructures by Laser-Scanning Imprinting (Invited)
Nakamura, HirokoSpin on Glass as an Orientation Control Layer for Block Copolymer Direct Self-Assembly
Nakagawa, MasaruRelease Layer Free Acrylate Resins for Ultraviolet Nanoimprinting Prepared by Adding Segregation Auxiliary Agents
Namboodiri, PradeepFabrication of nano structures for Dimensional Metrology and Device Applications
Nealey, Michelle J.Arrays of Topographically and Peptide-Functionalized Hydrogels for Analysis of Biomimetic Extracellular Matrix Properties (Invited)
Nemutudi, RudzaniMultiple phase-formation in Ni-Ge system monitored by SEM, AFM and PIXE analytical techniques
Nicaise, SamuelInvestigation of Templated Self-assembly of High-χ Diblock Copolymer
Nilsson, BengtDose to clear in EBL: comparison of Monte Carlo predictions with experiment
Nishino, TomokiImpact of Mold-Resist Roughness on Friction and Adhesion Properties by Nano Tribological Inspection
Noh, KunbaeDi-block Copolymer Directed Anodization of Hexagonally Ordered Nanoporous Aluminum Oxide
Nojeh, AlirezaSolar Electron Source and Thermionic Solar Cell
Notte, JohnProgress Towards a Commercial Neon Gas Field Ion Source
Nowak, MattHigh Density 3D Through Silicon Stacking (TSS) – Game Changing Technology?

O

Ocola, Leonidas ErnestoGrowth Characterization of Electron Beam Induced Silver Deposition from Liquid Precursor
Ocypa, ŁukaszImpact of Mold-Resist Roughness on Friction and Adhesion Properties by Nano Tribological Inspection
Oh, YoungMulti-Tip AFM Lithography System for High Throughput Nano-patterning
Ohara, YasuhiroMeasurement of fogging electron current in scanning electron microscope
Ohki, HirofumiThe New Method of Electron-Beam Lithography on HSQ at Overlay Writing
Ohtomo, AkihiroFast and Continuous Patterning on the Surface of Plastic Fiber by Using Thermal Roller Imprint
Okai, NobuhiroElectron scattering simulation for subsurface metrology in scanning electron microscope
Okada, MakotoPattern-size Effect of Reorientation of Photoinduced Liquid Crystalline Polymer by Thermal Nanoimprinting
Ok, Jong G.Continuous fabrication of polymer waveguides with smooth sidewalls by Dynamic Nano-Inscribing (DNI) and NanoChannel-guided Lithography (NCL) processes (Invited)
Olynick, DeirdreSub-10 nm area-selective ALD using block copolymer lithography
Omoto, ShinyaEvaluation of SiOx Containing UV Nanoimprint Resin
Oshidari, YutaQuality factor improvement of graphene resonator by SU-8 shrinkage-induced strain
Otaki, KatsuraOn-Machine Wavefront Evaluation of the Full-Field Extreme Ultra-Violet Lithography Exposure System
Otani, MasaruMeasurement of Surface Potential Distribution at an Insulating Film Produced by Fogging Electrons in a Scanning Electron Microscope
Otis, CharlesA Mass Filtered Plasma FIB
Ovtchinnikov, SergueiModeling of Counter Streaming Charged Beams in MICHELLE–eBEAM
Owen, JamesDetermining Tip Position Tolerances for Atomically Precise STM lithography of Si(001):H

P

Panday, AshwinNanostructured, Active Electrostatic Trap for Confining Nanometric Objects in a Fluid: mimicking DNA-Protein interactions in a synthetic system
Park, Hui JoonControlling Nanostructures in Organic Photovoltaic Cells (Invited)
Park, Kyung JinFabrication of Plasmonic Nano-Pore Array for Nanobio Sensor
Park, Min-ChulImage Compensation of Mask Misalignment in Aerial Image Microscope System
Patti, RobertHeterogeneous 3D Integration (Invited)
Pauliac-Vaujour, SébastienCapped carbon hard mask an innovative route to nanoscale device fabrication
Penzo, ErikaDirected assembly of one-dimensional functional nanostructures
Peng, ZhenNon-periodic sub-wavelength gratings fabricated by helium ion beam lithography
Perera, GinushaMeasurements of the Latent Image in Chemically-Amplified Resists
Perez-Martinez, C.Visualization of Ion Beams from IonicLiquid Ion Sources for Focused Ion Beam Applications
Peroz, ChristopheFabrication of High Resolution Digital Spectrometers-on-Chip
Petric, PaulREBL: A Lithography Solution for High Volume Manufacturing at 16 nm (Invited)
Petrone, NickScalable Graphene Field Effect Transistors with Boron Nitride Dielectrics (Invited)
Philipp, PeterTaming of Ga droplets on DLC layers – Size tuning and local arrangement with nm accuracy
Phillips, MatthewGrowth of SiOx Nano-Pillars Using Electron Beam Induced Deposition in an Environmental SEM
Pina-Hernandez, CarlosDirect Nanoimprinting of Functional Inorganic Layers for Nanophotonic Chip Devices
Pinto, MarkSilicon Photovoltaics: Accelerating To Grid Parity
Pitters, JasonTip shaping of gas field ion sources for optimal ion beam generation
Polyakov, AleksandrTunable Plasmonic Light Trapping Metal Structures
Probst, JürgenEmbedding and Combining Plasmonic Elements and Photonic Crystal Structures
Provine, JTransfer Processes of Silicon Nanomembranes for Three Dimensional Integration of Photonics and Electronics

Q

Quan, BaogangThe Sensing Properties of IR Nanostructed Plasmonic Crystals Fabricatied by Electron Beam Lithography and Argon Ion Milling

R

Rahman, FHMProgress Towards a Commercial Neon Gas Field Ion Source
Ramanathan, MuruganathanProbing Nanostructures of Aged Active Layer Materials for Organic Solar Cells
Rank, AndreasNanometer Size Protein Patterning using nCP for the Investigation of Protein-Protein Interactions in Live Cells
Raub, AlexAn all-optical process for extending GRATE to the 11nm (20nm hp) Technology Node (Invited)
Ray, VishvaHigh Resolution Patterning on Non-Planar Substrates with Large Height Variation Using Electron-Beam Lithography
Rizal, BinodImprint-Templated Nanocoaxial Array Architecture
Roberts, KevinE-Beam Patterning of Nanoparticle Filled Sucrose Resist
Ruiz, RicardoImage quality and pattern transfer in block copolymer directed assembly with block-selective atomic layer deposition
Ruoff, RodGraphene-based & Graphene-derived Materials (Invited)
Ryu, JiHyeongFlow behaviors of a polymer according to the imprint velocity during pressing step in NIL

S

Sanabia, JasonStitch-Error Free Electron Beam Lithography of Periodic Structures
Sato, TakashiTalbot effect immersion lithography by self-imaging of very fine grating pattern
Sato, ToshimiLarge-Area Nanostructures by Laser-Scanning Imprinting (Invited)
Savu, VeronicaStencil-nanopatterned back reflector increases efficiency of thin-film solar cells
Schleunitz, ArneSidewall-angle dependent pre-filling of three-dimensional microcavities in thermal nanoimprint
Scholten, RobertArbitrarily Shaped High-Coherence Electron and Ion Bunches from Laser-Cooled Atoms
Schwartzberg, AdamHigh resolution dry photo-ablation development (Invited)
Schwind, G.A.Computer Modeling of the Schottky Electron Source
Scipioni, LarryNanoscale Photoelectron Emission Using C-shaped Nanoapertures with Cesium Bromide Photocathode
Shulaker, MaxAtomic Layer Deposition Encapsulation of Carbon Nanotubes with Al2O3
Silva, S. R. P.Electron emission from carbon nanotubes
Simao, ClaudiaDirected self-assembly of PS-PEO using solvent vapors assisted nanoimprint lithography
Smayling, MichaelSub-20nm Hybrid Lithography enabled by Highly Regular Layout,Pitch Division, and e-Beam Exposure (Invited)
Smith, Henry I.The Membrane-Alignment Stage in Fabricating 3-Dimensional Nanostructures
Sreenivasan, SVNanoscale Manufacturing Using Jet and Flash Imprint Lithography (Invited)
Stocker, MichaelPhotodeactivatable photoresists for visbile-light nanolithography?
Strobel, SebastianIn-situ Study of Rate of Hydrogen Silsesquioxane Dissolution in both Alkaline and Electrochemical Systems
Sung, CYGraphene Nanoelectronics (Invited)
Suntharalingam, VyshnaviOvercoming 3DIC Technology Hurdles (Invited)
Sundberg, RichardNanoimprinted Electrodes for Highly Efficient and Stable Bio-Fuel Cells
Sviličić, BorisPiezoelectrically Transduced Silicon Carbide MEMS Double-Clamped Beam Resonators
Szymanska, JoannaFabrication of high resolution computer-generated holograms using 3D electron beam lithography.

T

Tada, YasuhikoDirected Self-Assembly of Perpendicularly Oriented Nano-Cylinders with Liquid Crystalline Block Copolymer
Tan, ShidaA Quantitative Probe Current Distribution Characterization Technique for Focused Ion Beam
Tanenbaum, DavidStability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration
Taniguchi, JunHigh Density Pattern Transfer via Roll to Roll Ultraviolet Nanoimprint Lithograpy using Replica Mold
Tansarawiput, ChookiatHorizontal Growth of Silicon Nanowire Arrays for Large-Scale Circuit Applications
Tao, LiGraphene transistors with record mobilities on polyimide for high-performance flexible nanoelectronics
Teng, LichaoExperimental Investigation on the Short Channel Effect of Nano-Imprinted Organic Field Effect Transistors (Invited)
Tesch, PaulThermionic Electron Gun with Small Virtual Source Size for Electron Beam Lithography Applications (Invited)
Thackeray, JamesLow Diffusion EUV Resists using Bound PAG Technology (Invited)
Thoms, StephenLong Narrow Gaps for III-V Transistors Fabricated by Electron Beam Lithography
Thorsen, ToddMicrofluidics Beyond Basic Biology- From Fertility Monitoring to Artificial Respiration (Invited)
TIberio, RichardSystem to Measure the Shear Modulus of Iron at high temperature and pressure using Transverse Displacement Interferometry Fabricated by Electron Beam Lithography
Tomioka, TatsuyaAu Nanorods and Nanogap Split-Ring Structures Fabricated by Reactive-Monolayer-Assisted Thermal Nanoimprinting and Electrodeposition
Toyoda, MitsunoriAt-Wavelength EUV Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors
Tsai, Hsin-YuSub-30 nm pitch circuit relevant patterning in Si, SiO2 and SiN using directed self assembly based pattern generation (Invited)
Tseng, Ching-TungFabrication of a Binary Phase Grating on a Fiber End by Utilizing Interference Lithography
Tseng, Yu-ChihEnhancing the Etch Resistance of PMMA-Based Photoresist to Meet ITRS Target from Year 2022
Turchanin, Andrey1 nm Thick Chemically Functionalized Carbon Nanomembranes (CNMs): Two-dimensional Materials for Nanoengineering

U

Ulin-Avila, ErickSub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens
Unno, NoriyukiFast and Continuous Patterning on the Surface of Plastic Fiber by Using Thermal Roller Imprint
Urbanski, LukaszDefect Tolerant Extreme Ultraviolet Lithography

V

Vahdani Moghaddam, MehranSolar Electron Source and Thermionic Solar Cell
Varghese, Leo T.Horizontal Growth of Silicon Nanowire Arrays for Large-Scale Circuit Applications
Vasko, StephanieScanning Probe Nanostructure Direct-Write: Serial and Parallel Patterning via High Field Chemistry
Vartiainen, IsmoSurface-Relief Polarization Gratings for Visible Light
Veres, TeodorHigh Aspect Ratio, Triangular Silicon Pillars for Bump Array Concentration of Pathogenic Bacteria
Viswanathan, VigneshPatterning of Sub-10 nm Optical Apertures on Single Crystal Metallic Films with the Helium Ion Microscope (Invited)
Vladar, AndrasOn Clean Samples and High-Resolution Quantitative Charged Particle Microscopy
Vladov, NikolaSurface-Finishing of Focused Ion Beam Milled Features by Pulsed Electron Irradiation

W

Wang, LonEmploying Nano Imprint to Fabricate Space-Charge-Limited Transistors (SCLTs)
Wang, QingFull area real time monitoring of filling process by dark field illumination in UV nanoimprint lithography (Invited)
Wang, SiStudy of defect mechanisms in partly filled stamp cavities for thermal nano imprint control
Wan, LeiImage quality and pattern transfer in block copolymer directed assembly with block-selective atomic layer deposition
Wanzenboeck, Heinz D.Focused Electron Beam Induced Deposition as novel nanofabrication approach for magnetic nanosensors and nanomagnet logic
Wathuthanthri, Ishan Fabrication of Polymer Nanostructures via Maskless O2 Plasma Etching
Wi, Jung-SubLithographically Designed Porous Plasmonic Nanostructures (Invited)
Wilson, Michelle J.Arrays of Topographically and Peptide-Functionalized Hydrogels for Analysis of Biomimetic Extracellular Matrix Properties (Invited)
Wirtz, TomTowards Secondary Ion Mass Spectrometry on the Helium Ion Microscope
Wong, H.-S. PhilipDirected Self-Assembly for the Semiconductor Industry (Invited)
Winroth, GustafRelationship between Film Thickness Loss and Polymer Deprotection for EUV and ArF Photoresists
Wu, JiElectrophoretic and electroosmotic flow through carbon nanotube membranes as chemical pumps
Wu, JiahaoBonding of PMMA nanofluidic devices and its effect on DNA behavior in nanochannels
Wu, Yi-KueiAngle Independent Reflective Color Filters by Plasmonic-induced Light Funneling Effect

X

Xiao, ShuaigangProgress and Challenges in Bit Patterned Media Nanofabrication (Invited)
Xu, Qian FengA superhydrophobic surface made from hydrophilic materials with micro-umbrella structures
Xu, ShuangSensitivity Analysis for Lens Aberration Measurement in Lithographic Tools Using CTC-Based Quadratic Aberration Model
Xu, Xu A.Fabrication of Hollow-Shell Nano-volcanoes from Mie Scattering of Colloidal Nanospheres

Y

Yaghoobi, ParhamSolar Electron Source and Thermionic Solar Cell
Yamada, AkioMulti Column Cell Writer Architecture and a Correction Technique for Consistent CD Uniformity Between Column Cells
Yang, ChangHorizontal Growth of Silicon Nanowire Arrays for Large-Scale Circuit Applications
Yang, JoelPlasmonics At The Single-Nanometer Scale (Invited)
Yang, XiaoMinProgress and Challenges in Bit Patterned Media Nanofabrication (Invited)
Yamazaki, KenjiNew Technique of Three-Dimensional Nanofabrication in Semiconductors by Using Electron Beam Lithography
Yasuda, HiroshiMulti-axis and Multi-beam technology for high throughput maskless E-beam lithography
Yasuda, MasaakiMolecular simulation of electron-irradiation damages in resist materials (Invited)
Ye, ZiliangSub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens
Yesilkoy, FilizStrain Assisted Self Lift-Off Process for the Fabrication Ultra Low Capacitive Antenna Coupled MIM Tunnel Diodes for the Application of Infrared Detection and Energy Harvesting
Yi, HeDesign Space for One-hole Pattern using Block Copolymer Directed Self-Assembly
Yoshida, HiroshiDirected Self-Assembly of Perpendicularly Oriented Nano-Cylinders with Liquid Crystalline Block Copolymer
Yu, HangFabrication of Nanostructured Hydrophobic Surfaces with Laser Interference Lithography
Yu, ZhaoningCleaning Induced Imprint Template Erosion

Z

Zaluzec, N.J.Plasmonic Nanostructures Fabricated using Helium and Gallium Ion Beam Instruments.
Zelsmann, MarcControl of the PS-b-PDMS directed self-assembly by silsesquioxane-based graphoepitaxial substrate engineering
Zhang, WeihuaGiant and Uniform Fluorescence Enhancement of Organic Dye by 3D Plasmonic NanoCavity Array
Zhang, WenjunTunable silver nano-pillar arrays as a surface-enhanced Raman scattering sensor by a self-aligned nanofabrication process
Zhang, ZhipingMonolithic 3D Integration (Invited)
Zhao, YuningVia-Hole Fabrication for III-V Triple-Junction Solar Cells
Zheng, ZhenFabrication of dense non-circular nanomagnetic device arrarys using self-limiting low-energy glow-discharge processing
Zhou, LiangchengNew Nanoplasmonic Devices and Fabrication for Large Enhancement and Tunability of Second Harmonic Light Generation

EIPBN Abstracts