A |
| Abashin, M |
(Invited) Electromagnetic Radiation Pressure on Left- and Right-handed Dissipative Media |
| Abramson, Justin |
Selective Biomolecular Nanoarrays for Parallel Single-Molecule Investigations |
| Adam, Kostas |
(Invited) Computational Lithography: Exhausting Optical System Limits Through Intensive Optimization |
| Adato, Ronen |
High-throughput Fabrication of Engineered Plasmonic Nanoantenna Arrays with Nanostencil Lithography |
| Adesida, Ilesanmi |
7-nm-Pitch Gratings Fabricated on Diamond Substrates Using Hydrogen Silsesquioxane Resists and Electron-Beam Lithography |
| Adeyenuwo, Adegboyega Paul |
Density Multiplication of Nanostructures Fabricated by Ultra Low Voltage Electron Beam Lithography Using PMMA as Positive and Negative Tone Resist |
| AG, Eulitha |
Demonstration of Full 4-inch Patterning with Displacement Talbot Lithography
High-Contrast Images Obtained with Displacement Talbot Lithography |
| Agrawal, A |
(Invited) Electromagnetic Radiation Pressure on Left- and Right-handed Dissipative Media |
| Agrawal, Amit |
Electron Beams with Helical Wavefronts and Quantized Angular Momentum |
| Ahn, Sang Jung |
Transmission Electron Microscopy Study of Annealed Platinum Films Made by Ion Beam Induced Deposition |
| Ahn, Se Hyun |
High Aspect-ratio Nanograting Formation on Liquid Resists by a Continuous Mold-assisted Direct-write Process |
| Ahn, Seungjoon |
Advanced Microcolumn with a Quadrupole Electrostatic Lens |
| Ai, Zhongkai |
Direct Patterning of Sub-10 nm Optical Apertures with a Helium Ion Microscope |
| Aida, Yukinori |
Improved Time Dependent Performance of HSQ Resist Using a Spin on Top Coat
E-Beam Writing Strategies for Low-loss Optical Waveguides |
| Aitchison, J. Stewart |
Nanofabrication of Photonic Crystal-Based Devices Using Electron Beam Spot Lithography Technique |
| Akgun, Bulent |
Mapping Resist Flow into Nanoscale Channels During Nanoimprint Lithography |
| Akinwande, Deji |
Nanofabrication Down to 10 nm on a Plastic Substrate |
| Akita, Yasuyuki |
Atomic Step Pattering in Nanoimprint Lithography : Molecular Dynamics Study |
| Aksu, Serap |
High-throughput Fabrication of Engineered Plasmonic Nanoantenna Arrays with Nanostencil Lithography |
| Albers, A. E. |
(Invited) Dynamic Single Particle Probes of Temperature and Viscosity in Aqueous Media |
| Albrecht, Thomas |
Pattern Transfer of Block Copolymer Template from Density Multiplication on Chemically Patterned Surface
Fabrication and Recording Performance of Bit Patterned Media |
| Alden, Jonathan |
Fabricating Arrays of Graphene Mechanical Resonators with High, Size-Dependent Quality Factors |
| Alexander, Justin |
Multiscale Hydrogen Depassivation Lithography Using a Scanning Tunneling Microscope
Patterned Atomic Layer Epitaxy of Si / Si(001):H |
| Alkaisi, Maan M. |
(Invited) Optical Sensors for Spatially-Resolved Measurement of Oxygen in Microfluidic Devices |
| Alkaisi, Maan |
Photo Nanoimprint Lithography of Biological Samples Defined by Microfabricated PDMS Stencils |
| Alkemade, Paul F. A. |
High Growth Efficiencies in Helium Ion Beam Induced Deposition at Short Beam Dwell Times |
| Altissimo, Matteo |
Commissioning of the 20-bit Vistec EBPG5000plus at the Melbourne Centre for Nanofabrication |
| Altug, Hatice |
Plasmonic Nanopillar Arrays for Enhanced Biosensing, Spectroscopy and Optical Trapping
High-throughput Fabrication of Engineered Plasmonic Nanoantenna Arrays with Nanostencil Lithography |
| Amos, Charles |
Patterned Graphene Oxide Films by a Simple Method |
| An, Ho Myoung |
Enhancement of Light Extraction Efficiency in n-GaN Patterned Vertical Light-Emitting Diodes using Nanosphere Lithography |
| Ananth, M. |
Patterning of Graphene on SiC using a He ion Nanobeam |
| Andelman, David |
Diblock Copolymer Ordering by NanoImprint Lithography |
| Anderson, Ian |
Electron Beams with Helical Wavefronts and Quantized Angular Momentum |
| Andreozzi, Andrea |
Block-Copolymer Thin Film Templates for Nanoscale Fabrication Processes: Reactive Ion Etching, E-Beam Deposition and Ion Beam Synthesis |
| Andrews, Trisha |
Breaking the Diffraction Barrier in Nanopatterning with Optical Saturable Transformations |
| Anokhina, Ksenia |
Metal-Assisted Chemical Etching of Si for Fabrication of Nanoimprint Stamps |
| Arai, Osamu |
On-Machine Wavefront Evaluation of the Full-Field Extreme Ultra-Violet Lithography Exposure System |
| Araki, Kosei |
Molecular Dynamics Study on Polymer Filling Process in Nanoimprint Lithography for Multi-Layered Resist |
| Araki, Kousuke |
Novel Nanoimprint Lithography Using Dispersed Molecular Weights |
| Arita, Kazuhito |
Measurement of Surface Potential of Insulating Film on Conductive Substrate in a Scanning Electron Microscope |
| Artar, Alp |
High-throughput Fabrication of Engineered Plasmonic Nanoantenna Arrays with Nanostencil Lithography |
| Arvet, Christian |
Development of a 13 Silicon Suspended Stacked Nanowire Architecture for Gate-All-Around (GAA) Field Effect Transistors |
| Aschenbach, K. |
Patterning of Graphene on SiC using a He ion Nanobeam |
| Ashby, Paul D |
Single Crystal Silicon Nanowires used as Cantilever for Femtonewton Detection |
| Ashby, Paul |
Time-Lapse Imaging of Thermally-Driven Signal Propagation in Nanomagnetic Logic |
| Ashiba, Hiroki |
Quality Factor Enhancement on Nano Mechanical Resonators Utilizing Stiction Phenomena |
| Ashok, S. |
Process-Structure-Property Relationship of Nanocrystalline Vanadium Oxide Thin Films Used in Uncooled Infrared Focal Plane Arrays |
| Atasoy, Hakan |
Combining Nanoimprint Lithography and a Molecular Weight Selective Thermal Reflow for the Generation of Mixed 3-D Structures |
| Awazu, Koichi |
A Gradually Shifted Surface Plasmon Resonance with a Controlled Diameter of a Nano-Hole Structure by Self-Assembly Technique |
B |
| Baac, Hyoung Won |
High Aspect-ratio Nanograting Formation on Liquid Resists by a Continuous Mold-assisted Direct-write Process
Invisibility at Visible Frequency Using Carbon Nanotube Carpet |
| Babin, Sergey |
Digital Planar Holograms Fabricated by Step and Repeat UV Nanoimprint Lithography
Fabrication of Digital Planar Holograms for Brighter Power Laser Diodes
Double Patterning Technology: Process Simulation and Fabrication of Optical Elements |
| Babrzadeh, Farbod |
Optimized Multiplexed Cell Capture Using Parallel Bioactivated Microfluidic Channels |
| Bachtold, Adrian |
(Invited) ElectroMechanical Resonators based on Nanotube and Graphene |
| Back, Tyson |
(Invited) Cold Cathodes of Low Electron Affinity and Negative Electron Affinity Thin Films And Nanoclusters |
| Baehr-Jones, Tom |
E-Beam Writing Strategies for Low-loss Optical Waveguides |
| Bai, Benfeng |
Perfect Matching of Experimental and Simulated Optical Responses of Metallic Nanostructures Obtained Through the Use of Correct Refractive Index |
| Bain, Jim |
Localized Thermal Modification of Surfaces via Electron Bombardment from an STM Tip
High Current Pulse Generation for Thermal Surface Modification Using Standard STM |
| Bakir, Muhannad S |
Nanofabrication of High Aspect Ratio Nanoscale TSVs |
| Ballard, Josh |
Patterned Atomic Layer Epitaxy of Si / Si(001):H |
| Ballard, Joshua |
Multiscale Hydrogen Depassivation Lithography Using a Scanning Tunneling Microscope |
| Bangsaruntip, Sarunya |
(Invited) CMOS Density Scaling in Non-Planar Multi-Gate Silicon on Insulator Devices |
| Baralia, Gabriel |
EUV Mask Repair Using a Combination of Focused-Electron-Beam-Induced Processing and Vacuum AFM |
| Barbastathis, George |
Near-Field 3D Lithography Using Self-Assembled Nanospheres
Fabrication of Subwavelength High Aspect-Ratio Tapered Fused Silica Nanostructures for Transparent Photophilic Material |
| Baron, Thierry |
Direct Top-Down Ordering of Diblock Copolymers Through Nanoimprint Lithography |
| Bartha, J. W. |
Fabrication of Silicon Template With Smooth Tapered Side Wall for Nanoimprint Lithography |
| Barton, Robert |
Fabricating Arrays of Graphene Mechanical Resonators with High, Size-Dependent Quality Factors |
| Bauerdick, Sven |
Novel Nanopatterning Strategies for Focused Ion Beam Lithography of Nanophotonic Structures
Ion Beam Lithography for Sub-50 nm Patterning of Metal Mold Inserts and Replication by Injection Molding |
| Baur, Christof |
EUV Mask Repair Using a Combination of Focused-Electron-Beam-Induced Processing and Vacuum AFM |
| Bayle, Sébastien |
Challenges in Data Treatment and Proximity Effects Correction for Massively Parallel Electron Lithography |
| Bedel-Pereira, Elena |
Wafer Scale Integration Of Oriented Carbon Nanotubes Interconnects |
| Behabtu, Naty |
Single Walled Nanotube (SWNT) Fiber Field Emission Cathodes |
| Beierle, J.M. |
Functionalization of Focused Electron Beam Induced Deposits by Directed Self-Assembly |
| Belledent, Jerome |
Graphoepitaxy of Block Copolymers Using 193nm Lithography: A Process and Defectivity Study |
| Belledent, Jérôme |
Challenges in Data Treatment and Proximity Effects Correction for Massively Parallel Electron Lithography |
| Belova, L.M. |
A New Process for Electron Beam Induced Deposition of Cobalt with Excellent Properties |
| BenAssayag, Gerard |
Block-Copolymer Thin Film Templates for Nanoscale Fabrication Processes: Reactive Ion Etching, E-Beam Deposition and Ion Beam Synthesis |
| Benck, Eric |
Development of a Full-Field Inteference Lithogrpahy System Based on a Long-Coherence-Length Laser Source |
| Bennett, Patrick |
Cryogenic Silicon Process for Etching 15 nm Trenches and Beyond |
| Berggren, Karl K. |
Spatial-Frequency Doubling Below the Block Copolymer Period by Templated Self-Assembly
High Throughput Sub-10-nm Fabrication Based on Templated Self-Assembly of Block Copolymer
Electron-Beam-Induced Deposition of 3.5 nm Half-Pitch Dense Patterns on Bulk Si by Using a Scanning Electron Microscope |
| Berggren, Karl |
Multi-Layer Block Copolymer Self-Assembled Structures Using Tilted Pillar Templates
(Invited) Sub-10-nm Beam-Based Lithography and Applications
Resolution Limits of 200 keV Electron-Beam Lithography Using Aberration-Corrected STEM
Scanning-Neon-Ion-Beam Lithography
In-situ Study of Rate of Hydrogen Silsesquioxane Dissolution in both Alkaline and Electrochemical Systems |
| Berglund, Andrew |
Simultaneous Positioning and Orienting of a Single Nano-object Using Flow Control
Measurement of Acid Induced Blur in Polymer Films by Single-Molecule Fluorescence Microscopy |
| Berro, Adam |
Measurement of Acid Induced Blur in Polymer Films by Single-Molecule Fluorescence Microscopy |
| Bertagnolli, Emmerich |
Removal of FIB-Induced Amorphization and Gallium Contamination by Focused-Electron-Beam-Induced-Etching
Local, Direct-Write, Damage-Free Thinning of Germanium Nanowires
Focused Ion Beam Induced Synthesis of Free-Standing Graphite Nanosheets
Focused Beam Induced Etching - Making the Right Choice Between Ions and Electrons
Etching of Germanium by Chlorine Gas using a Focused Electron Beam |
| Bertsche, Kirk |
Beam-Based Measurements in Electron Microscopy |
| Berwald, Frans |
Electron-Beam-Induced Deposition of 3.5 nm Half-Pitch Dense Patterns on Bulk Si by Using a Scanning Electron Microscope |
| Bevis, Chris |
Resistivity Changes Due to Environmental Contamination In Films Used For Charge Reduction in Electrostatic Electron Optics |
| Bharadwaja, Srowthi |
Process-Structure-Property Relationship of Nanocrystalline Vanadium Oxide Thin Films Used in Uncooled Infrared Focal Plane Arrays |
| Bhatia, Ritwik |
Resistivity Changes Due to Environmental Contamination In Films Used For Charge Reduction in Electrostatic Electron Optics |
| Bianchi, Davide |
Impact of EUV Lithography Line Edge Roughness on 16 nm Memory Generation |
| Bibee, Matt |
Resistivity Changes Due to Environmental Contamination In Films Used For Charge Reduction in Electrostatic Electron Optics |
| Binh, Vu Thien |
(Invited) Cold Cathodes of Low Electron Affinity and Negative Electron Affinity Thin Films And Nanoclusters |
| Bishop, James |
Growth of SiOx Nano-Pillars Using Electron Beam Induced Deposition in an Environmental SEM |
| Blaikie, Richard J. |
(Invited) Optical Sensors for Spatially-Resolved Measurement of Oxygen in Microfluidic Devices |
| Blaikie, Richard |
A Comparative Study on Absorbance-Modulated Interference Lithography
Solid-Immersion Interference Lithography Using a Lloyd’s Mirror
Flexible PDMS Support Layers for the Evanescent Characterization of Near-Field Lithography Systems |
| Blomme, Pieter |
Impact of EUV Lithography Line Edge Roughness on 16 nm Memory Generation |
| Boeckl, John |
Single Walled Nanotube (SWNT) Fiber Field Emission Cathodes |
| Bogdanov, Alexei L. |
Electron-Beam Lithography of Photonic Waveguides: Measurement of the Effect of Field Stitching Errors on Optical Performance and Evaluation of a New Compensation Method |
| Boggild, P |
High Precision FIB Fabrication of Customizable AFM Probes |
| Bojko, Richard |
E-Beam Writing Strategies for Low-loss Optical Waveguides |
| Bokor, Jeff |
Cryogenic Silicon Process for Etching 15 nm Trenches and Beyond |
| Bokor, Jeffrey |
Time-Lapse Imaging of Thermally-Driven Signal Propagation in Nanomagnetic Logic |
| Boschker, S |
Towards a 100 wph e-Beam Direct Write Cluster |
| Bosman, Michel |
Direct-Write Lithography of Sub-10nm Features on Metallorganic Resists Using a Helium Ion Microscope
Plasmonics On Lithographically-Defined Nanostructures as Studied in Electron Energy-Loss Spectroscopy |
| Bosse, August |
Characterization of Cross Sectional Profile of Epitaxially Assembled Block Copolymer Domains using Transmission Small Angle X-Ray Scattering
Fluctuations in Lamellar Diblock Copolymer Resists |
| Bosworth, Joan |
Directed Self-assembly with Density Multiplication of POSS-Containing Block Copolymer via Controlled Solvent Annealing |
| Boukany, Pouyan |
Cell Electroporation – A Diffusion Process or a Drive-In Process? |
| Bourque, Frédéric |
Top-Down Approaches for the Fabrication of Titanium Nanostructures |
| Boussey, Jumana |
Direct Top-Down Ordering of Diblock Copolymers Through Nanoimprint Lithography |
| Bove, Nadine |
Development of a 13 Silicon Suspended Stacked Nanowire Architecture for Gate-All-Around (GAA) Field Effect Transistors |
| Bozano, Luisa |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Brau, Charles |
Extreme Brightness: Reaching the Ultimate Limits of the Electron Beam |
| Breese, Mark |
Direct-Write Lithography of Sub-10nm Features on Metallorganic Resists Using a Helium Ion Microscope |
| Brener, I. |
Fabrication of Multilayer 3D Micron-Scale Metamaterials |
| Brennecka, Geoff |
Evolution of Critical Dimension and Line Edge Roughness During Block-Copolymer Nano-Patterning |
| Bresin, Matthew |
Investigation of Inter-Diffusion Between Layers in Cryogenic Enhanced Electron Beam-Induced-Deposition |
| Bret, Tristan |
EUV Mask Repair Using a Combination of Focused-Electron-Beam-Induced Processing and Vacuum AFM |
| Brianceau, Pierre |
Development of a 13 Silicon Suspended Stacked Nanowire Architecture for Gate-All-Around (GAA) Field Effect Transistors
Metallic Color Filtering Arrays Manufactured by Nanoimprint Lithography |
| Brimhall, Nicole |
Breaking the Diffraction Barrier in Nanopatterning with Optical Saturable Transformations |
| Brink, Marcus |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Brodie, Alan D. |
Resistivity Changes Due to Environmental Contamination In Films Used For Charge Reduction in Electrostatic Electron Optics |
| Brown, Devin K |
Nanofabrication of High Aspect Ratio Nanoscale TSVs |
| Bruce, Robert L. |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Brueck, Steven R.J. |
Evolution of Critical Dimension and Line Edge Roughness During Block-Copolymer Nano-Patterning |
| Brueck, Steven |
Large Area 3D Helical Photonic Crystals |
| Brugger, Juergen |
Drawing with Nanostencils on Flexible Substrates |
| Bucchignano, Jim |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Budach, Michael |
EUV Mask Repair Using a Combination of Focused-Electron-Beam-Induced Processing and Vacuum AFM |
| Burcham, Kevin |
Dimensional Characterization Of Waveguide Coupling Device Structures Fabricated By The Fixed Beam Moving Stage (FBMS) Electron Beam Lithography
Novel Nanopatterning Strategies for Focused Ion Beam Lithography of Nanophotonic Structures
Chip Scale Focussed Electron Beam Induced Etching of a Silicon Nitride Membrane with Unique Beam Writing Strategies. |
| Burckel, D. B. |
Structural Influence of 3D Pyrolyzed Carbon Electrodes on Electrochemical Behavior |
| Burckel, D. Bruce |
Evolution of Critical Dimension and Line Edge Roughness During Block-Copolymer Nano-Patterning |
| Burckel, D.B. |
Fabrication of Multilayer 3D Micron-Scale Metamaterials |
| Buriak, Jillian |
Block Copolymers for High-Resolution Nanopatterning |
| Burkhalter, Gregory |
Commissioning of the 20-bit Vistec EBPG5000plus at the Melbourne Centre for Nanofabrication |
| Burnett, John |
Development of a Full-Field Inteference Lithogrpahy System Based on a Long-Coherence-Length Laser Source |
| Businaro, Luca |
Fabrication of Nanoparticles Deposited Photonic Crystals |
| Busnaina, Ahmed |
Plasmonic Nanopillar Arrays for Enhanced Biosensing, Spectroscopy and Optical Trapping |
| Buswell, Steve |
Nano-Patterning of PMMA on Insulating Surfaces With Various Anti-Charging Schemes Using 30 Kev Electron Beam Lithography |
C |
| Cabrini, Stefano |
Digital Planar Holograms Fabricated by Step and Repeat UV Nanoimprint Lithography
Fabrication of Nanoparticles Deposited Photonic Crystals
Plasmonic Light Trapping in Nanostructural Metal Surfaces
Elucidating Effects of Nanoscale Structural Variations on Local Plasmonic Modes via Photon Localization Microscopy
Fabrication of Sub-20nm Nanochannels Integrated with Bowtie Nanoantenna
Fabrication of Digital Planar Holograms for Brighter Power Laser Diodes
Cryogenic Silicon Process for Etching 15 nm Trenches and Beyond |
| Cacao, Eliedonna |
Suspended, Micron-scale Corner Cube Retroreflectors as Ultra-bright Optical Labels |
| Cahay, Marc |
(Invited) Cold Cathodes of Low Electron Affinity and Negative Electron Affinity Thin Films And Nanoclusters |
| Camino, Fernando E. |
Focused ion Beam Milling Directed by BASIC-Like Code |
| Cantu, Precious |
Breaking the Diffraction Barrier in Nanopatterning with Optical Saturable Transformations |
| Carbacos, Orlando |
Process-Structure-Property Relationship of Nanocrystalline Vanadium Oxide Thin Films Used in Uncooled Infrared Focal Plane Arrays |
| Carlton, David |
Time-Lapse Imaging of Thermally-Driven Signal Propagation in Nanomagnetic Logic |
| Carmichael, Peter |
Simultaneous Positioning and Orienting of a Single Nano-object Using Flow Control
Measurement of Acid Induced Blur in Polymer Films by Single-Molecule Fluorescence Microscopy |
| Carpentiero, Alessandro |
Fabrication of Nickel Diffractive Phase Elements for X-Ray Microscopy at 8 keV Photon Energy |
| Carter, David |
MEMS Process Compatibility of Multiwall Carbon Nanotubes |
| Cech, Jiri |
Fabrication of Nanostructures on Double-Curved PMMA Surfaces by Thermal Imprint with PDMS Stamp |
| Cetin, Arif Engin |
Plasmonic Nanopillar Arrays for Enhanced Biosensing, Spectroscopy and Optical Trapping |
| Chaix, Nicolas |
Diblock Copolymer Ordering by NanoImprint Lithography
Metallic Color Filtering Arrays Manufactured by Nanoimprint Lithography |
| Chamberlain, Adam |
Electron-Beam Induced Deposition of Transition Metals from Bulk Liquids: Ag, Cr, and Ni |
| Chan, David |
Native Blank Defect Analysis for the Study of Printability |
| Chan, Emory |
Fabrication of Nanoparticles Deposited Photonic Crystals |
| Chandhok, Manish |
Sub-millisecond Post-Exposure and Hard Bake of Chemically Amplified Photoresists |
| Chandler, Clive |
A Comparison of Xe+ Plasma FIB Technology with Conventional Gallium LMIS FIB |
| Chang, Chih-Hao |
Near-Field 3D Lithography Using Self-Assembled Nanospheres
Fabrication of Subwavelength High Aspect-Ratio Tapered Fused Silica Nanostructures for Transparent Photophilic Material |
| Chang, Jae Byum |
Multi-Layer Block Copolymer Self-Assembled Structures Using Tilted Pillar Templates |
| Chang, Jae-Byum |
Spatial-Frequency Doubling Below the Block Copolymer Period by Templated Self-Assembly
High Throughput Sub-10-nm Fabrication Based on Templated Self-Assembly of Block Copolymer |
| Chang, Josephine |
(Invited) CMOS Density Scaling in Non-Planar Multi-Gate Silicon on Insulator Devices |
| Chang, Long |
Graded Bit Patterned Media via Helium Ion Irradiation |
| Chang, Y.J. |
Studies in Synthetic Antiferromagnetically Coupled Ring Array Magnets via Hysteresis Loops |
| Chau, K |
(Invited) Electromagnetic Radiation Pressure on Left- and Right-handed Dissipative Media |
| Chen, C. C. |
Studies in Synthetic Antiferromagnetically Coupled Ring Array Magnets via Hysteresis Loops |
| Chen, Chen |
Addressing the Fabrication of Titanium Oxide Nanostructures by Electron Beam Induced Deposition |
| Chen, Guo-Ping |
Selective Photochemical Reduction of Silver on Nanoembossed Ferroelectric Nanowires |
| Chen, Hao |
Design and Fabrication of High Enhancement Yet Wafer-Scale Uniform SERS/Plasmonic Structures Based on Nanoimprint Lithography and Self-Assembly
Extraction Efficiency Improvement of GaN-based Light-emitting Diodes Using Sub-wavelength Nanoimprinted Patterns on Sapphire Substrates |
| Chen, Hsing-Hong |
Lithography-Patterning-Fidelity-Aware Electron-Optical System Design Optimization |
| Chen, Hsuen-Li |
Use of Nanoimprint Lithography to Prepare Metallic Corrugated Structure Exhibiting Ultrasensitive Refractive Index Sensing
Using Intruded Gold Nanoclusters as Highly Active Catalysts to Fabricate Silicon Nano-Stalactite Structures |
| Chen, Li-Han |
Geometry Controlled Periodic Si Nanopillar Arrays by Dry Oxidation and Wet Etching |
| Chen, Robert |
(Invited) Challenges and Progress in Extreme Ultraviolet Mask Development |
| Chen, Sheng-Yung |
Lithography-Patterning-Fidelity-Aware Electron-Optical System Design Optimization |
| Chen, Xing |
Investigation of Graphene Piezoresistor for Use as Strain Gauge Sensors |
| Chen, Yan |
Nanofluidic Single DNA Sorter and Analyzer Fabricated by Nanoimprint and Wafer Bonding |
| Chen, Yifang |
Fabrication of Complex Nanostructures of P(VDF-TrFE) by Dual Step Hot-embossing
Selective Photochemical Reduction of Silver on Nanoembossed Ferroelectric Nanowires
Large Area Fast Patterning in High Resolution by a Combined Near-Field Exposure and Reversal Imprint Lithography |
| Chen, Yijian |
Double-Surrounding-Gate MOSFET: Enabling Robust Process Control at Deep Nanoscale |
| Cheng, Joy |
(Invited) Block Copolymer Self-assembly as an Extension of Lithography: Status, Applications, Current Research and Future Directions |
| Cheng, Xing |
Template-Assisted Growth of ZnO Nanorod Arrays
EWOD-Based Droplet Actuation by Active-Matrix Electrode Array |
| Cheng, Yao-Te |
Crisp, High Aspect-Ratio, C-Shaped Nanoapertures Fabricated in Evaporated Aluminum Using Focused Helium Ions |
| Cheong, Lin |
3D Nanostructures by Stacking Pre-Patterned, Fluid-Supported Single-Crystal Si Membranes
Secondary-Electron Signal Levels of Self-Assembled Monolayers for Spatial-Phase-Locked Electron-Beam Lithography |
| Cheong, Linlee |
Scanning-Neon-Ion-Beam Lithography |
| Cheung, Rebecca |
Tantalum Electro-Mechanical Systems For Low Frequency Sensing In Biomimetical Applications |
| Chevalier, Xavier |
Graphoepitaxy of Block Copolymers Using 193nm Lithography: A Process and Defectivity Study |
| Chevolleau, Thierry |
Graphoepitaxy of Block Copolymers Using 193nm Lithography: A Process and Defectivity Study |
| Chew, Xiong Yew |
Plasmonics On Lithographically-Defined Nanostructures as Studied in Electron Energy-Loss Spectroscopy |
| Chew, Xiongyeu |
Fabrication of Sub-10-Nm-Gapped Gold Structures For Plasmonic Applications |
| Chhim, Bophan |
High Acceleration Voltage Characterization of SML Electron Beam Resist for Ultra High Aspect Ratio Nano-Lithographic Applications |
| Chihara, Yoshinori |
Computational Study of Electron-Irradiation Effects in Carbon Nanomaterials on Substrates |
| Chikkamaranahalli, Sumanth |
Fabrication of Nanoscale Structures on Micro Patterned Silicon (100) Surfaces |
| Chinen, Mika |
Effect Evaluation of Pentafluoropropane Gas for UV Nanoimprint Resin By Using Contact Angle Meter |
| Cho, Han-Ku |
Three-Dimensional Proximity Effect Correction for Large-Scale Uniform Patterns
Enhancement of Spatial Resolution in Generating Point Spread Functions by Monte Carlo Simulation in Electron-beam Lithography |
| Cho, Kyoungah |
Resistive Switching Characteristics of Hafnium Oxide Nano-Films on Flexible Plastic Substrates
Memory Characteristics of MOS Capacitors With Pt-Nanoparticles-Embedded Gate Layers |
| Choi, Chang-hwan |
Large-Area Pattern Transfer of Metal Nanostructures via Interference Lithography
Single-Step Interferometric Patterning of High-Aspect-Ratio Three-Dimensional Nanostructures |
| Choi, Chulmin |
Geometry Controlled Periodic Si Nanopillar Arrays by Dry Oxidation and Wet Etching
Multi-Tip AFM Lithography System for High Throughput Nano-patterning |
| Choi, Chumlin |
Di-block Copolymer Directed Anodization of Hexagonally Ordered Nanoporous Aluminum Oxide |
| Choi, Dae Keun |
Investigation of Deposition Profile For Metal Structure Using Focused Ion Beam |
| Choi, Dae-geun |
Mass Fabrication of Resistive Random Access Crossbar Array by UV-NIL |
| Choi, Hyungryul Johnny |
Fabrication of Subwavelength High Aspect-Ratio Tapered Fused Silica Nanostructures for Transparent Photophilic Material |
| Choi, Hyungryul |
Near-Field 3D Lithography Using Self-Assembled Nanospheres |
| Choi, Keebong |
The Effect of Cylindrically Inflated Substrate to Improve the Pressure Distribution in UV Nanoimprint |
| Choi, Kwangsik |
Zero-bias Rectifying Performance Enhancement of MIM Tunneling Diodes by Geometric Field Enhancement and Boiling Water Oxidation
Improving the Zero Bias Performance of MIM Tunneling Diodes by Introducing Traps in the Barrier |
| Choi, Seong Soo |
Fabrication of Plasmonic Nano-Pore Array for Nanobio Sensor |
| Choi, Yang-kyu |
Mass Fabrication of Resistive Random Access Crossbar Array by UV-NIL |
| Chou, Stephen |
Design and Fabrication of High Enhancement Yet Wafer-Scale Uniform SERS/Plasmonic Structures Based on Nanoimprint Lithography and Self-Assembly
Extraction Efficiency Improvement of GaN-based Light-emitting Diodes Using Sub-wavelength Nanoimprinted Patterns on Sapphire Substrates
Nanofluidic Single DNA Sorter and Analyzer Fabricated by Nanoimprint and Wafer Bonding
(Invited) Self Perfection of Nanostructures – A New Frontier in Nanofabrication
Fabrication of Large-area Plasmonic Nano-cavity Antenna Array for High Efficiency Mid-and-Far Infrared Sensing
Large-area Patterning of Au Nano-particles Self-aligned to Fluidic Channels for Enhancement of Molecule Detection |
| Chouik, Mustapha |
Tailored Synthesized Silsesquioxane Based Resists For UV-Assisted Nanoimprint Lithography |
| Christiansen, Alexander Bruun |
Fabrication of Nanostructures on Double-Curved PMMA Surfaces by Thermal Imprint with PDMS Stamp |
| Chuang, Shang-Yu |
Use of Nanoimprint Lithography to Prepare Metallic Corrugated Structure Exhibiting Ultrasensitive Refractive Index Sensing |
| Clube, Francis |
Demonstration of Full 4-inch Patterning with Displacement Talbot Lithography
High-Contrast Images Obtained with Displacement Talbot Lithography |
| Collet, Maéva |
Wafer Scale Integration Of Oriented Carbon Nanotubes Interconnects |
| Collins, John |
Tip Based Lithography for Biocompatible Materials |
| Comboroure, Corinne |
Development of a 13 Silicon Suspended Stacked Nanowire Architecture for Gate-All-Around (GAA) Field Effect Transistors |
| Con, Celal |
High Resolution Electron Beam Lithography Using Polystyrene Negative Resist |
| Constancias, Christophe |
5kV Multi Electron Beam Lithography MAPPER Tool: From 32nm to 22nm Resolution Capability |
| Conway, James |
Hard Stamp Processes for the EVG 620 Full Field Nanoimprint System |
| Cook, Ben |
The Influence of Gun Design on Coulomb-Interactions in a Field Emission Gun
Statistical Coulomb Forces in Photo-Field Emitters for Ultrafast Microscopy |
| Cook, Eugene |
MEMS Process Compatibility of Multiwall Carbon Nanotubes |
| Cooke, Simon |
High Accuracy Charged Beam Modeling in MICHELLE–eBEAM |
| Corbalan, Miguel |
Impact of EUV Lithography Line Edge Roughness on 16 nm Memory Generation |
| Cord, Bryan |
Nanoimprint Induced Block Copolymer Self-Assembly |
| Couderc, Christophe |
Graphoepitaxy of Block Copolymers Using 193nm Lithography: A Process and Defectivity Study |
| Craighead, Harold |
Fabricating Arrays of Graphene Mechanical Resonators with High, Size-Dependent Quality Factors |
| Crendal, Richard |
Growth of SiOx Nano-Pillars Using Electron Beam Induced Deposition in an Environmental SEM |
| Croffie, Ebo |
Process Window Modeling Using Focus Balancing Technique |
| Cui, Bo |
High Resolution Electron Beam Lithography Using Polystyrene Negative Resist
High Sensitivity Electron Beam Lithography Using ZEP Resist and MEK:MIBK Developer |
| Cui, Dehu |
EWOD-Based Droplet Actuation by Active-Matrix Electrode Array |
| Cumming, David |
Micro-Fabrication of Terahertz Metamaterial Absorbers |
| Cunge, Gilles |
Graphoepitaxy of Block Copolymers Using 193nm Lithography: A Process and Defectivity Study |
| Curtin, Alexandra |
Patterning of Graphene on SiC using a He ion Nanobeam |
| Czaplewski, David |
Improving PMMA Etch Resistance using Sequential Infiltration Synthesis |
| Czepl, Peter |
Ion Beam Lithography for Sub-50 nm Patterning of Metal Mold Inserts and Replication by Injection Molding |
D |
| Dagenais, Mario |
Zero-bias Rectifying Performance Enhancement of MIM Tunneling Diodes by Geometric Field Enhancement and Boiling Water Oxidation
Improving the Zero Bias Performance of MIM Tunneling Diodes by Introducing Traps in the Barrier |
| Dahal, Promise |
Nanocomposite-Beam Based Microresonator Fabricated by Combining Microlithography And Layer-By-Layer Nanoassembly |
| Dahlin, Andreas |
Nanomenhirs for Surface-based Biosensing of Lipid Structures |
| Dai, Bing |
Optimizing the Performance of Keyhole Diffraction Microscopy |
| Dai, Qing |
Three-Dimensional Proximity Effect Correction for Large-Scale Uniform Patterns
Enhancement of Spatial Resolution in Generating Point Spread Functions by Monte Carlo Simulation in Electron-beam Lithography |
| Daillant, Jean |
Diblock Copolymer Ordering by NanoImprint Lithography |
| Dais, Christian |
Demonstration of Full 4-inch Patterning with Displacement Talbot Lithography
High-Contrast Images Obtained with Displacement Talbot Lithography |
| Dal'zotto, Bernard |
5kV Multi Electron Beam Lithography MAPPER Tool: From 32nm to 22nm Resolution Capability |
| Darling, Seth |
Improving PMMA Etch Resistance using Sequential Infiltration Synthesis |
| David, Christian |
3D Nanostructuring of Hydrogen Silsesquioxane Resist by 100 keV Electron Beam Lithography |
| David, Tim |
(Invited) Optical Sensors for Spatially-Resolved Measurement of Oxygen in Microfluidic Devices |
| Davidson, Jimmy |
Extreme Brightness: Reaching the Ultimate Limits of the Electron Beam |
| Davis, Ronald |
Optimized Multiplexed Cell Capture Using Parallel Bioactivated Microfluidic Channels |
| Davoust, Laurent |
Viscoelastic Properties Measurements of Thin Polymer Films from Reflow of Nanoimprinted Patterns |
| Davydova, Natalia |
(Invited) Creative Metrology Development for EUVL: Flare and Out-of-Band Qualification |
| de Boer, G. |
Towards a 100 wph e-Beam Direct Write Cluster |
| de Boer, S.K. |
Functionalization of Focused Electron Beam Induced Deposits by Directed Self-Assembly |
| de Hosson, J.T.M. |
Functionalization of Focused Electron Beam Induced Deposits by Directed Self-Assembly |
| Dehaene, Wim |
Impact of EUV Lithography Line Edge Roughness on 16 nm Memory Generation |
| Delft, TU |
Deposition and Structuring of Ag/AgCl Electrodes into a Closed Polymeric Microfluidic System for Electroosmotic Pumping |
| Delgadillo, Paulina Rincon |
Towards an All-Track Process for DSA |
| Dembla, Ashish |
Nanofabrication of High Aspect Ratio Nanoscale TSVs |
| DeRose, Guy |
High Acceleration Voltage Characterization of SML Electron Beam Resist for Ultra High Aspect Ratio Nano-Lithographic Applications |
| Désières, Yohan |
Metallic Color Filtering Arrays Manufactured by Nanoimprint Lithography |
| Despont, Michel |
Thermo-Mechanical Probe Lithography at 500 kHz Pixel Rate |
| Dew, Steven K. |
Developer-Free Direct Patterning on PMMA by Low Voltage Electron Beam Lithography
Density Multiplication of Nanostructures Fabricated by Ultra Low Voltage Electron Beam Lithography Using PMMA as Positive and Negative Tone Resist
Comparison Between ZEP and PMMA Resists for Nanoscale Electron Beam Lithography Experimentally and by Numeric Modeling
Nanofabrication of Silicon Carbon Nitride Cantilevers – Comparison of PMMA and HSQ Based Processes |
| Dew, Steven |
Nano-Patterning of PMMA on Insulating Surfaces With Various Anti-Charging Schemes Using 30 Kev Electron Beam Lithography |
| Dhima, Khalid |
Experimental Analysis For Process Control In Hybrid Lithography (T-NIL + UV-L)
Low Temperature Thermal Imprint via Frequency Assistance |
| Dhuey, Scott |
Digital Planar Holograms Fabricated by Step and Repeat UV Nanoimprint Lithography
Fabrication of Nanoparticles Deposited Photonic Crystals
Plasmonic Light Trapping in Nanostructural Metal Surfaces
Time-Lapse Imaging of Thermally-Driven Signal Propagation in Nanomagnetic Logic
Fabrication of Sub-20nm Nanochannels Integrated with Bowtie Nanoantenna
Fabrication of Digital Planar Holograms for Brighter Power Laser Diodes
Cryogenic Silicon Process for Etching 15 nm Trenches and Beyond |
| Diego, San |
Geometry Controlled Periodic Si Nanopillar Arrays by Dry Oxidation and Wet Etching |
| Dielissen, Bas |
Direct Local Deposition of High-Purity Pt and Pd Nanostructures by a Novel Combination of EBID and ALD |
| Diez, Javier |
The Directed Assembly of Metallic Nanoparticle Chains by Pulsed Laser Induced Dewetting and Nanolithography |
| DiNatale, William |
Focused Ion Beam Enabled Characterization of Nanostructured Polymeric Materials |
| Ding, Fei |
Design and Fabrication of High Enhancement Yet Wafer-Scale Uniform SERS/Plasmonic Structures Based on Nanoimprint Lithography and Self-Assembly |
| Divan, Ralu |
High Aspect Ratio Zone Plate Fabrication Using a Bilayer Mold
Fabrication of High-Aspect-Ratio Nanopores by Interference Lithography |
| Dobisz, Elizabeth |
Directed Self-assembly with Density Multiplication of POSS-Containing Block Copolymer via Controlled Solvent Annealing |
| Dobisz, Elizabeth |
Pattern Transfer of Block Copolymer Template from Density Multiplication on Chemically Patterned Surface
Fabrication and Recording Performance of Bit Patterned Media |
| Doi, Toshiro |
Negative-tone E-beam Resist Patterning for more than 1 Tbit/in2 Bit-patterned Media NIL Mold |
| Donev, Eugene |
Electron-Beam Induced Deposition of Transition Metals from Bulk Liquids: Ag, Cr, and Ni |
| Dowsett, David |
High-Resolution High-Sensitivity Characterization Of Nanoscale Structures in a New Combined SIMS-SPM Instrument: Correction of Topography Artifacts |
| Drew, H.D. |
Patterning of Graphene on SiC using a He ion Nanobeam |
| Drouin, Dominique |
Top-Down Approaches for the Fabrication of Titanium Nanostructures |
| Du, Ke |
Large-Area Pattern Transfer of Metal Nanostructures via Interference Lithography |
| Duan, Huigao |
Fabrication of Sub-10-Nm-Gapped Gold Structures For Plasmonic Applications
Plasmonics On Lithographically-Defined Nanostructures as Studied in Electron Energy-Loss Spectroscopy
In-situ Study of Rate of Hydrogen Silsesquioxane Dissolution in both Alkaline and Electrochemical Systems |
| Duan, Huigo |
(Invited) Sub-10-nm Beam-Based Lithography and Applications |
| Duerig, Urs |
Thermo-Mechanical Probe Lithography at 500 kHz Pixel Rate |
| Dunn, Kathleen |
Investigation of Inter-Diffusion Between Layers in Cryogenic Enhanced Electron Beam-Induced-Deposition |
| Dzurak, Andrew |
(Invited) Spin-based Quantum Information Processing in Silicon
Fabrication of Sub-15nm Nanostructures via Metal Lift-Off or Silicon Etching |
E |
| Ecoffey, Serge |
Top-Down Approaches for the Fabrication of Titanium Nanostructures |
| Economou, Nicholas P. |
History and Development of the Helium Ion Microscope |
| Eddy, C.R. |
Patterning of Graphene on SiC using a He ion Nanobeam |
| Edinger, Klaus |
EUV Mask Repair Using a Combination of Focused-Electron-Beam-Induced Processing and Vacuum AFM |
| Elam, Jeffrey |
Improving PMMA Etch Resistance using Sequential Infiltration Synthesis |
| Endo, Ayako |
Adhesive Forces of Fluorinated Silica Surfaces Affected by Surface Coverage of Tridecafluoro-1,1,2,2-Tetrahydrooctyltrimethoxysilane |
| Engelmann, Sebastian |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Entesari, Kamran |
EWOD-Based Droplet Actuation by Active-Matrix Electrode Array |
| Erlangen-Nurnberg, Universitat |
Focused Electron Beam Induced Surface Activation: A Novel Lithographic Method to Fabricate Nanostructures
Addressing the Fabrication of Titanium Oxide Nanostructures by Electron Beam Induced Deposition |
| Ernst, Thomas |
Development of a 13 Silicon Suspended Stacked Nanowire Architecture for Gate-All-Around (GAA) Field Effect Transistors |
| Eurlings, Mark |
(Invited) Creative Metrology Development for EUVL: Flare and Out-of-Band Qualification |
| Evans, John |
Photo Nanoimprint Lithography of Biological Samples Defined by Microfabricated PDMS Stencils |
| Evoy, Stephane |
Nanofabrication of Silicon Carbon Nitride Cantilevers – Comparison of PMMA and HSQ Based Processes |
F |
| Fairchild, Steve |
(Invited) Cold Cathodes of Low Electron Affinity and Negative Electron Affinity Thin Films And Nanoclusters |
| Fairchild, Steven |
Single Walled Nanotube (SWNT) Fiber Field Emission Cathodes |
| Faivre, Marie-Emmanuelle |
Development of a 13 Silicon Suspended Stacked Nanowire Architecture for Gate-All-Around (GAA) Field Effect Transistors |
| Fang, Chao |
Direct-Write Lithography of Sub-10nm Features on Metallorganic Resists Using a Helium Ion Microscope
Direct Patterning of Sub-10 nm Optical Apertures with a Helium Ion Microscope |
| Farah, Abdi |
Challenges in Data Treatment and Proximity Effects Correction for Massively Parallel Electron Lithography |
| Farrow, Reginald |
A Parametric Study of Electrophoretic Deposition of Single Wall Nanotubes In Nanoscale Windows |
| Fazio, Teresa |
DNA Arrays with Site-Specific Labels |
| Feenstra, Kees |
(Invited) Creative Metrology Development for EUVL: Flare and Out-of-Band Qualification |
| Feldman, Martin |
Design of Micro-scale Transmission Light Valve Arrays |
| Fenger, Germain |
Image-Based EUVL Aberration Metrology
Image Invariant and Information Content Comparisons across Sub-32nm Technologies |
| Feringa, B.L. |
Functionalization of Focused Electron Beam Induced Deposits by Directed Self-Assembly |
| Fernandez-Cuesta, Irene |
Fabrication of Sub-20nm Nanochannels Integrated with Bowtie Nanoantenna |
| Fernandez-Dominguez, Antonio |
Plasmonics On Lithographically-Defined Nanostructures as Studied in Electron Energy-Loss Spectroscopy |
| Ferranti, David |
Fabrication of Nanopores Using a Helium Ion Microscope
Crisp, High Aspect-Ratio, C-Shaped Nanoapertures Fabricated in Evaporated Aluminum Using Focused Helium Ions
Scanning-Neon-Ion-Beam Lithography
Comparative Study of Nano-Pillar Growth by Helium Ion and Gallium Ion Focused Beams |
| Fian, Alexander |
Replication Of Undercut Trenches for Water Based Lift-Off Process by Residue-Free UV-NIL |
| Field, Christopher |
Gas Sensors Based on Vertically Aligned Nanowire Arrays |
| Fieldhouse, Nickolas |
Process-Structure-Property Relationship of Nanocrystalline Vanadium Oxide Thin Films Used in Uncooled Infrared Focal Plane Arrays |
| Figuiero, Thiago |
Comparison of PSF for non CAR and CAR Resists in E-Beam Lithography |
| Fischer, Clóvis |
FIB Cross-Sections for Morphological Analysis of Ni-P Hard-Mask Transformation During Plasma Etching |
| Fito, Taras |
Comparison Between ZEP and PMMA Resists for Nanoscale Electron Beam Lithography Experimentally and by Numeric Modeling |
| Flacker, Aleksander |
FIB Cross-Sections for Morphological Analysis of Ni-P Hard-Mask Transformation During Plasma Etching |
| Flahaut, Emmanuel |
Wafer Scale Integration Of Oriented Carbon Nanotubes Interconnects |
| Fleischer, Monika |
Fabrication of Plasmonic Nanostructures by Etch Mask Transfer |
| Flemming, Yves |
High-Resolution High-Sensitivity Characterization Of Nanoscale Structures in a New Combined SIMS-SPM Instrument: Correction of Topography Artifacts |
| Fleury, Guilleaume |
Graphoepitaxy of Block Copolymers Using 193nm Lithography: A Process and Defectivity Study |
| Foulkes, John |
A Comparative Study on Absorbance-Modulated Interference Lithography |
| Fowlkes, Jason |
The Directed Assembly of Metallic Nanoparticle Chains by Pulsed Laser Induced Dewetting and Nanolithography
In situ Optical Imaging and Laser Processing in the SEM/FIB: A True EIPBN System |
| Frank, Andreas |
Self-Actuated Piezoresistive 512-Cantilever Arrays for Large-Area Imaging and Manipulation |
| Franz, German |
A Comparison of Xe+ Plasma FIB Technology with Conventional Gallium LMIS FIB |
| Fridmann, Joel |
Novel Nanopatterning Strategies for Focused Ion Beam Lithography of Nanophotonic Structures
Chip Scale Focussed Electron Beam Induced Etching of a Silicon Nitride Membrane with Unique Beam Writing Strategies. |
| Fu, Joe |
Fabrication of Nanoscale Structures on Micro Patterned Silicon (100) Surfaces |
| Fucetola, Corey |
3D Fabrication by Stacking Pre-patterned, Rigidly-held Membranes
3D Nanostructures by Stacking Pre-Patterned, Fluid-Supported Single-Crystal Si Membranes |
| Fuhrer, M.S. |
Patterning of Graphene on SiC using a He ion Nanobeam |
| Fujikawa, Norihiro |
High Aspect Ratio Fine Pattern Transfer Using Novel Mold by Nanoimprint Lithography |
| Fujinawa, Tadashi |
Negative-tone E-beam Resist Patterning for more than 1 Tbit/in2 Bit-patterned Media NIL Mold |
| Fukushige, Akinori |
Dwell Time Adjustment for Focused Ion Beam Machining
Surface Deformation Of Ga+ Ion Collision Process via Molecular Dynamics Simulation |
| Fukushima, Yasuyuki |
Extreme Ultraviolet Interference Lithography toward 1X nm Nodes |
| Fuller, Nicholas C. M. |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Fulmes, Yuliya |
Fabrication of Plasmonic Nanostructures by Etch Mask Transfer |
G |
| G., Amir Tavakkoli K. |
Spatial-Frequency Doubling Below the Block Copolymer Period by Templated Self-Assembly |
| Gallatin, Gregg M. |
Towards Reliable Fabrications of Qdot-Nanopatterns on DNA Origami |
| Gang, Oleg |
DNA Arrays with Site-Specific Labels |
| Gao, Hanhong |
Near-Field 3D Lithography Using Self-Assembled Nanospheres |
| Gaskill, D.K. |
Patterning of Graphene on SiC using a He ion Nanobeam |
| Gaugiran, Stephanie |
Graphoepitaxy of Block Copolymers Using 193nm Lithography: A Process and Defectivity Study |
| Gauntt, Bryan |
Process-Structure-Property Relationship of Nanocrystalline Vanadium Oxide Thin Films Used in Uncooled Infrared Focal Plane Arrays |
| Gautsch, Sebastian |
Self Aligned Concentric Nanostructures Formed by E-beam Overexposure of PMMA and Single Post Processing Steps |
| Gauzner, Gene |
Study of Spin-coated Resist Coverage on Nanoscale Topography Using Spectroscopic Ellipsometry |
| George, Hubert C. |
Novel method for Fabrication of Nanoscale Single-Electron Transistors: Electron Beam Induced Deposition of Pt and Atomic Layer Deposition of Tunnel Barriers |
| George, Matthew |
Evolution of Critical Dimension and Line Edge Roughness During Block-Copolymer Nano-Patterning |
| Ghadarghadr, Shabnam |
3D Nanostructures by Stacking Pre-Patterned, Fluid-Supported Single-Crystal Si Membranes |
| Ghosh, Nikkon |
Extreme Brightness: Reaching the Ultimate Limits of the Electron Beam |
| Gierak, Jacques |
Ionic Liquid Ion Sources as a Unique and Versatile Option in Focused Ion Beam Applications
Filtering and Energy Characterization of Ion Species from Ionic Liquid Ion Sources for Focused Ion Beam Applications
Fine-Focused Beams of Highly Charged Ions |
| Ginn, J.C. |
Fabrication of Multilayer 3D Micron-Scale Metamaterials |
| Glaser, Markus |
Focused Ion Beam Induced Synthesis of Free-Standing Graphite Nanosheets |
| Glatzel, Thilo |
High-Resolution High-Sensitivity Characterization Of Nanoscale Structures in a New Combined SIMS-SPM Instrument: Correction of Topography Artifacts |
| Glinsner, Thomas |
Hybrid Tri-Layer Stamps for Step and Repeat Imprint Lithography |
| Glodde, Martin |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Glushenko, Gennady |
Double Patterning Technology: Process Simulation and Fabrication of Optical Elements |
| Goehring, Nadine |
The Influence of Surface Patterning on Bacterial Growth Behavior |
| Gold, Herbert |
Replication Of Undercut Trenches for Water Based Lift-Off Process by Residue-Free UV-NIL |
| Goldberg, Kenneth A. |
Native Blank Defect Analysis for the Study of Printability |
| Goldberg, Kenneth |
(Invited) Challenges and Progress in Extreme Ultraviolet Mask Development
Actinic Characterization of EUV Bump-Type Phase Defects |
| Gollmer, Dominik |
Fabrication of Plasmonic Nanostructures by Etch Mask Transfer |
| Goltsov, Alexander |
Digital Planar Holograms Fabricated by Step and Repeat UV Nanoimprint Lithography
Fabrication of Digital Planar Holograms for Brighter Power Laser Diodes |
| Gondarenko, Alexander |
Micro and Nano Pillar Assay for T cell Activation |
| Gong, Zhongcheng |
Fabrication of Carbon Nanotube Film-Piezoelectric (CNF-PZT) Microcantilevers for Energy Harvesting Application
Nanocomposite-Beam Based Microresonator Fabricated by Combining Microlithography And Layer-By-Layer Nanoassembly |
| Goodwin, Frank |
Native Blank Defect Analysis for the Study of Printability |
| Goodyear, Andy |
Cryogenic Silicon Process for Etching 15 nm Trenches and Beyond |
| Gorelick, Sergey |
3D Nanostructuring of Hydrogen Silsesquioxane Resist by 100 keV Electron Beam Lithography |
| Gorodetsky, Alon |
Selective Biomolecular Nanoarrays for Parallel Single-Molecule Investigations |
| Goto, Hiroshi |
Soft Patterning on Cylindrical Surface of Plastic Optical Fiber by Sliding Roller-Imprinting |
| Gotrik, Kevin |
Spatial-Frequency Doubling Below the Block Copolymer Period by Templated Self-Assembly |
| Gotszalk, T. |
Self-Actuated Piezoresistive 512-Cantilever Arrays for Large-Area Imaging and Manipulation |
| Gottfried, Hochleitner |
Focused Beam Induced Etching - Making the Right Choice Between Ions and Electrons |
| Graczyk, Mariusz |
Metal-Assisted Chemical Etching of Si for Fabrication of Nanoimprint Stamps |
| Graham, William |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Grant, James |
Micro-Fabrication of Terahertz Metamaterial Absorbers |
| Graupera, Theresa |
A Comparison of Xe+ Plasma FIB Technology with Conventional Gallium LMIS FIB |
| Grenci, Gianluca |
Fabrication of Nickel Diffractive Phase Elements for X-Ray Microscopy at 8 keV Photon Energy |
| Grewal, Heim Kirin |
The Fabrication of Shallow Co-axial P-N Junctions on Silicon Micro/Nanopillars for Solar Cell Applications |
| Grobis, Michael |
Fabrication and Recording Performance of Bit Patterned Media |
| Gronheid, Roel |
Towards an All-Track Process for DSA
Impact of EUV Lithography Line Edge Roughness on 16 nm Memory Generation |
| Guenoun, Patrick |
Diblock Copolymer Ordering by NanoImprint Lithography |
| Guilet, Stephane |
Ionic Liquid Ion Sources as a Unique and Versatile Option in Focused Ion Beam Applications
Filtering and Energy Characterization of Ion Species from Ionic Liquid Ion Sources for Focused Ion Beam Applications |
| Guillorn, Michael A. |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Guillorn, Michael |
(Invited) CMOS Density Scaling in Non-Planar Multi-Gate Silicon on Insulator Devices |
| Guilmain, Marc |
Top-Down Approaches for the Fabrication of Titanium Nanostructures |
| Gullikson, Eric |
(Invited) Challenges and Progress in Extreme Ultraviolet Mask Development |
| Gunasekaran, Alfred |
Nanocomposite-Beam Based Microresonator Fabricated by Combining Microlithography And Layer-By-Layer Nanoassembly |
| Guo, Jack |
Detection and Characterization of Buried Structures by Exploring Patterns in Angle- and Energy- Filtered Back-Scattered Electrons |
| Guo, L. Jay |
High Efficiency Plasmonic Color Filters Fabricated Using Imprint Lithography
High Aspect-ratio Nanograting Formation on Liquid Resists by a Continuous Mold-assisted Direct-write Process
Invisibility at Visible Frequency Using Carbon Nanotube Carpet
Solar Energy Harvesting Photonic Color Filters |
| Gupta, Shilpi |
Development of Metal Etch Mask by Single Layer Lift-Off for Silicon Nitride Photonic Crystals |
| Guzenko, Vitaliy A. |
3D Nanostructuring of Hydrogen Silsesquioxane Resist by 100 keV Electron Beam Lithography |
| Guzenko, Vitaliy |
Selective Profile Transformation of Electron-Beam Exposed Multilevel Resist Structures Based on a Molecular Weight Dependent Thermal Reflow |
| Gysin, Urs |
High-Resolution High-Sensitivity Characterization Of Nanoscale Structures in a New Combined SIMS-SPM Instrument: Correction of Topography Artifacts |
H |
| Hadjimichael, Evangelos |
Subwavelength Optical Lithography of Complex Nanopatterns by Diffraction |
| Hadziioannou, Georges |
Graphoepitaxy of Block Copolymers Using 193nm Lithography: A Process and Defectivity Study |
| Haensch, Wilfried |
(Invited) CMOS Density Scaling in Non-Planar Multi-Gate Silicon on Insulator Devices |
| Hagen, C.W. |
Parallel Electron-Beam-Induced Deposition using a Multi- Beam Scanning Electron Microscope |
| Hagen, Cornelis W. |
Electron-Beam-Induced Deposition of 3.5 nm Half-Pitch Dense Patterns on Bulk Si by Using a Scanning Electron Microscope |
| Hagen, Kees |
Individual Beam Control for MEMS Multi Electron Beam Systems
Statistical Coulomb Forces in Photo-Field Emitters for Ultrafast Microscopy |
| Hagopian, John |
Fabrication of an Optical Magnetic Mirror by E-Beam Writing |
| Hainberger, Rainer |
Ion Beam Lithography for Sub-50 nm Patterning of Metal Mold Inserts and Replication by Injection Molding |
| Hakkennes, E.A. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Hall, Adam |
Fabrication of Nanopores Using a Helium Ion Microscope |
| Hallstein, Roy |
Neon GFIS Nanomachining Applications –A Study Of The Machining Properties of Neon for Semiconductor FA and Circuit Edit |
| Hamaguchi, Tetsuya |
Copper Oxide Nanowire Arrays Synthesized from Sputtered Cu Thin Film
Injection Compression Molding of High-Aspect-Ratio Nanostructures |
| Hamilton, Alister |
Tantalum Electro-Mechanical Systems For Low Frequency Sensing In Biomimetical Applications |
| Han, Yong |
Resistive Switching Characteristics of Hafnium Oxide Nano-Films on Flexible Plastic Substrates |
| Hannon, Adam Floyd |
Spatial-Frequency Doubling Below the Block Copolymer Period by Templated Self-Assembly |
| Hao, Hanfang |
Direct-Write Lithography of Sub-10nm Features on Metallorganic Resists Using a Helium Ion Microscope
Direct Patterning of Sub-10 nm Optical Apertures with a Helium Ion Microscope |
| Hao, Yufeng |
Patterned Graphene Oxide Films by a Simple Method |
| Harada, T. |
Generation of Highly Coherent, Bright 13 nm Light with Phase-Matched High-Order Harmonics for Coherent Scatterometry Microscope |
| Harada, Tetsuo |
EUV-Mask Pattern Imaging by the Coherent Scatterometry Microscope
Extreme Ultraviolet Interference Lithography toward 1X nm Nodes |
| Harris-Jones, Jenah |
Native Blank Defect Analysis for the Study of Printability
Advanced Metrology For Extreme Ultraviolet (EUV) Mask Blank Defect Reduction |
| Harris, Kenneth |
Block Copolymers for High-Resolution Nanopatterning |
| Harry, Katherine |
(Invited) Sub-10-nm Beam-Based Lithography and Applications
In-situ Study of Rate of Hydrogen Silsesquioxane Dissolution in both Alkaline and Electrochemical Systems |
| Harteneck, Bruce |
Digital Planar Holograms Fabricated by Step and Repeat UV Nanoimprint Lithography
Fabrication of Nanoparticles Deposited Photonic Crystals
Plasmonic Light Trapping in Nanostructural Metal Surfaces
Nanoimprint Induced Block Copolymer Self-Assembly
Fabrication of Digital Planar Holograms for Brighter Power Laser Diodes
Cryogenic Silicon Process for Etching 15 nm Trenches and Beyond |
| Hartfield, Cheryl |
In situ Optical Imaging and Laser Processing in the SEM/FIB: A True EIPBN System |
| Hartley, John |
Electron Beam Lithography Tools for Low Cost Inspection of Extreme Ultraviolet Lithography Masks
Liftoff Lithography of Chrome for Extreme Ultraviolet Lithography Mask Absorber Layer Patterning |
| Hartmann, Jean-Michel |
Development of a 13 Silicon Suspended Stacked Nanowire Architecture for Gate-All-Around (GAA) Field Effect Transistors |
| Haruyama, Y. |
Room-Temperature Nanoimprint Using Spin-Coated HSQ with High Boiling -Point Solvent |
| Haruyama, Yuichi |
Mechanical Characteristics Of Nanostructures Fabricated By Nanoimprint
Annealing Dependence of Deposit Morphology for Fe-Ga Contained DLC Film Formed by FIB-CVD with Ferrocene Source Gas
Evaluation of Effect of Fluorine Additive Agent for Cationic UV-Nanoimprint Resin
Evaluation of PDMS Thin Layer as Antisticking Layer for UV Nanoimprinting
Evaluation of SiOx Containing UV Nanoimprint Resin
Effect Evaluation of Pentafluoropropane Gas for UV Nanoimprint Resin By Using Contact Angle Meter
Comparison of Surface Condition of Nanoimprint Antisticking Layers Formed by CVD And Dip-Coat Methods
Evaluation of Curing Process of UV Resin in PFP Gas Ambient by Photo-Differential Scanning Calorimetry
Adhesion and Frictional Forces Measurement by Scanning Probe Microscopy Under Pentafluoropropane Gas Atmosphere |
| Hasegawa, Hirokazu |
Directed Self-assembly with Density Multiplication of POSS-Containing Block Copolymer via Controlled Solvent Annealing |
| Hastings, J. Todd |
Electron-Beam Induced Deposition of Transition Metals from Bulk Liquids: Ag, Cr, and Ni |
| Hastings, Todd |
Real-time Dose Control for Electron-Beam Lithography
Secondary-Electron Signal Levels of Self-Assembled Monolayers for Spatial-Phase-Locked Electron-Beam Lithography |
| Hatakeyama, Taiki |
Carbon Nanomechanical Resonator Fabrication from PMMA by FIB/EB Dual-Beam Lithography
Selective Graphene Growth from DLC Thin Film Patterned by Focused-ion-beam Chemical Vapor Deposition |
| Hauguth, Maik |
Integrated Tool and Feature 2D Plasma Processing Simulator, Used for a Modeling of Cryogenic Plasma Etching of Silicon |
| Hayakawa, Teruaki |
Directed Self-assembly with Density Multiplication of POSS-Containing Block Copolymer via Controlled Solvent Annealing |
| He, Jian |
Fabrication of Silicon Template With Smooth Tapered Side Wall for Nanoimprint Lithography |
| He, Li |
E-Beam Writing Strategies for Low-loss Optical Waveguides |
| He, Yuan |
Fabrication of Carbon Nanotube Film-Piezoelectric (CNF-PZT) Microcantilevers for Energy Harvesting Application
Nanocomposite-Beam Based Microresonator Fabricated by Combining Microlithography And Layer-By-Layer Nanoassembly |
| Hedrick, James L. |
Thermo-Mechanical Probe Lithography at 500 kHz Pixel Rate |
| Heerkens, Carel Th. C. |
Individual Beam Control for MEMS Multi Electron Beam Systems |
| Heinz, Wanzenboeck |
Focused Beam Induced Etching - Making the Right Choice Between Ions and Electrons |
| Heitkamp, Bernd |
Ion Beam Lithography for Sub-50 nm Patterning of Metal Mold Inserts and Replication by Injection Molding |
| Hellwig, Olav |
Fabrication and Recording Performance of Bit Patterned Media
Fabrication and Testing of 1.5 Terabit/in2 Bit-Patterned Media for Thermally-Assisted Magnetic Recording. |
| Helms, Brett A |
(Invited) Dynamic Single Particle Probes of Temperature and Viscosity in Aqueous Media |
| Helms, Brett |
Nanoimprint Induced Block Copolymer Self-Assembly |
| Hendrickx, Eric |
(Invited) Creative Metrology Development for EUVL: Flare and Out-of-Band Qualification |
| Henslee, Brian E. |
Cell Electroporation – A Diffusion Process or a Drive-In Process? |
| Hertz, Hans M. |
Towards High-Resolution High-Diffraction-Efficiency Soft X-Ray Zone Plate Lenses: Sub-15 Nm Pattern Transfer to Tungsten Using HSQ and Cryogenic RIE |
| Hertz, Hans |
A New High-Aspect-Ratio Diamond Dry-Etch Process for Hard X-Ray FEL Radiation Zone Plates |
| Herzing, Andrew |
Electron Beams with Helical Wavefronts and Quantized Angular Momentum |
| Hesse, William |
Near-Field 3D Lithography Using Self-Assembled Nanospheres |
| Hesselink, Lambertus |
Crisp, High Aspect-Ratio, C-Shaped Nanoapertures Fabricated in Evaporated Aluminum Using Focused Helium Ions |
| Heuck, Friedjof |
Deposition and Structuring of Ag/AgCl Electrodes into a Closed Polymeric Microfluidic System for Electroosmotic Pumping |
| Hill, Ray |
Scanning Transmission Ion Microscopy with the Helium Ion Microscope – Modeling and Selected Applications |
| Hinsberg, Bill |
(Invited) Block Copolymer Self-assembly as an Extension of Lithography: Status, Applications, Current Research and Future Directions |
| Hirai, Yoshihiko |
Molecular Dynamics Study on Polymer Filling Process in Nanoimprint Lithography for Multi-Layered Resist
Shrinkage Pattern Correction (SPC) in Nanoimprint Lithography
High Aspect Ratio Fine Pattern Transfer Using Novel Mold by Nanoimprint Lithography
Novel Nanoimprint Lithography Using Dispersed Molecular Weights
Evaluation of Curing Process of UV Resin in PFP Gas Ambient by Photo-Differential Scanning Calorimetry
Atomic Step Pattering in Nanoimprint Lithography : Molecular Dynamics Study
Computational Study of Electron-Irradiation Effects in Carbon Nanomaterials on Substrates |
| Hiroshima, Hiroshi |
Evaluation of Curing Process of UV Resin in PFP Gas Ambient by Photo-Differential Scanning Calorimetry |
| Hiroshima, Hiroshi |
Anisotropic Filling Phenomenon of Trenches in UV Nanoimprint
Impact of Hydrofluoroether on Contact Force of Thermal Nanoimprint
Effect Evaluation of Pentafluoropropane Gas for UV Nanoimprint Resin By Using Contact Angle Meter
Adhesion and Frictional Forces Measurement by Scanning Probe Microscopy Under Pentafluoropropane Gas Atmosphere |
| Hitzman, Charles J. |
Resistivity Changes Due to Environmental Contamination In Films Used For Charge Reduction in Electrostatic Electron Optics |
| Ho, Kuan-Hung |
Use of Nanoimprint Lithography to Prepare Metallic Corrugated Structure Exhibiting Ultrasensitive Refractive Index Sensing |
| Hochberg, Michael |
E-Beam Writing Strategies for Low-loss Optical Waveguides |
| Hochleitner, Gottfried |
Removal of FIB-Induced Amorphization and Gallium Contamination by Focused-Electron-Beam-Induced-Etching
Local, Direct-Write, Damage-Free Thinning of Germanium Nanowires
Etching of Germanium by Chlorine Gas using a Focused Electron Beam |
| Hofer, Manuel |
Micromachined Video Rate AFM Silicon Cantilever
Single Crystal Silicon Nanowires used as Cantilever for Femtonewton Detection |
| Hofmann, Thorsten |
EUV Mask Repair Using a Combination of Focused-Electron-Beam-Induced Processing and Vacuum AFM |
| Hoga, Morihisa |
Demonstration of Full 4-inch Patterning with Displacement Talbot Lithography
Negative-tone E-beam Resist Patterning for more than 1 Tbit/in2 Bit-patterned Media NIL Mold
Master Pattern Formation of Bit-Patterned Media by E-Beam Direct Drawing |
| Holmberg, Anders |
A New High-Aspect-Ratio Diamond Dry-Etch Process for Hard X-Ray FEL Radiation Zone Plates
Towards High-Resolution High-Diffraction-Efficiency Soft X-Ray Zone Plate Lenses: Sub-15 Nm Pattern Transfer to Tungsten Using HSQ and Cryogenic RIE |
| Holzner, Felix |
Thermo-Mechanical Probe Lithography at 500 kHz Pixel Rate |
| Holzwarth, Charles |
A Comparative Study on Absorbance-Modulated Interference Lithography |
| Hone, James |
Micro and Nano Pillar Assay for T cell Activation
A New Approach for Measuring Protrusive Forces in Cells
Selective Biomolecular Nanoarrays for Parallel Single-Molecule Investigations |
| Hoogenboom, J.P. |
Functionalization of Focused Electron Beam Induced Deposits by Directed Self-Assembly |
| Horiba, Akira |
Molecular Dynamics Study on Polymer Filling Process in Nanoimprint Lithography for Multi-Layered Resist
Shrinkage Pattern Correction (SPC) in Nanoimprint Lithography
Novel Nanoimprint Lithography Using Dispersed Molecular Weights |
| Horn, Mark |
Process-Structure-Property Relationship of Nanocrystalline Vanadium Oxide Thin Films Used in Uncooled Infrared Focal Plane Arrays |
| Horng, Lance |
Coupling of Surface Plasmons in Au Nanorings with Subwavelength Holes Array |
| Horrer, Andreas |
Fabrication of Plasmonic Nanostructures by Etch Mask Transfer |
| Houdt, Jan Van |
Impact of EUV Lithography Line Edge Roughness on 16 nm Memory Generation |
| Houston, Brian |
Tuning Graphene Nanomechanical Resonators |
| Hoving, M. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Howe, Roger |
Atomic Layer Deposition Encapsulation of Carbon Nanotubes with Al2O3 |
| Howitz, Steffen |
Fabrication of Silicon Template With Smooth Tapered Side Wall for Nanoimprint Lithography |
| Hu, Hailong |
Fabrication of Sub-10-Nm-Gapped Gold Structures For Plasmonic Applications |
| Hu, Jonathan |
Design and Fabrication of High Enhancement Yet Wafer-Scale Uniform SERS/Plasmonic Structures Based on Nanoimprint Lithography and Self-Assembly |
| Hu, Min |
A Molecule Trapping and SERS Sensing Device by 3-D Nanoimprint |
| Hu, Walter |
Dehydration Assisted Nanoimprint Of PEDOT:PSS Nanogratings To Improve Organic Photovoltaics |
| Hu, Weihua |
High Current Pulse Generation for Thermal Surface Modification Using Standard STM |
| Huang, Jason |
Fabrication of Nanopores Using a Helium Ion Microscope
New Applications of XeF2 Chemistry with Focused Ion Beam |
| Huang, Jie |
Selective Area ALD Deposition with Nanolithography using SAM as a Resist |
| Huang, Min |
High-throughput Fabrication of Engineered Plasmonic Nanoantenna Arrays with Nanostencil Lithography |
| Hubert, Alexandre |
Development of a 13 Silicon Suspended Stacked Nanowire Architecture for Gate-All-Around (GAA) Field Effect Transistors |
| Hudson, Fay |
Fabrication of Sub-15nm Nanostructures via Metal Lift-Off or Silicon Etching |
| Husain, Michelle |
Microstructural Investigations Using Correlative Microscopy in Materials Analysis |
| Huynh, C. |
Patterning of Graphene on SiC using a He ion Nanobeam |
| Hwu, Justin |
Integration of Directed Block Copolymer Self-Assembly with Nanoimprint Lithography for Addressable Nanoarray Fabrication over Large Area
Study of Spin-coated Resist Coverage on Nanoscale Topography Using Spectroscopic Ellipsometry |
I |
| Icard, Béatrice |
5kV Multi Electron Beam Lithography MAPPER Tool: From 32nm to 22nm Resolution Capability |
| Ichiahshi, Testuya |
Annealing Dependence of Deposit Morphology for Fe-Ga Contained DLC Film Formed by FIB-CVD with Ferrocene Source Gas |
| Iida, Tetsuya |
Negative-tone E-beam Resist Patterning for more than 1 Tbit/in2 Bit-patterned Media NIL Mold
Master Pattern Formation of Bit-Patterned Media by E-Beam Direct Drawing |
| Ilic, B |
Fabricating Arrays of Graphene Mechanical Resonators with High, Size-Dependent Quality Factors |
| Ilmenau, TU |
Micromachined Video Rate AFM Silicon Cantilever
Single Crystal Silicon Nanowires used as Cantilever for Femtonewton Detection |
| In, Hyun Jin |
Gas Sensors Based on Vertically Aligned Nanowire Arrays |
| Iqbal, Zafar |
A Parametric Study of Electrophoretic Deposition of Single Wall Nanotubes In Nanoscale Windows |
| Ishchuk, Valentyn |
Integrated Tool and Feature 2D Plasma Processing Simulator, Used for a Modeling of Cryogenic Plasma Etching of Silicon |
| Ishida, Yoshihito |
Directed Self-assembly with Density Multiplication of POSS-Containing Block Copolymer via Controlled Solvent Annealing |
| Ishihara, Sunao |
Carbon Nanomechanical Resonator Fabrication from PMMA by FIB/EB Dual-Beam Lithography
A Gradually Shifted Surface Plasmon Resonance with a Controlled Diameter of a Nano-Hole Structure by Self-Assembly Technique
Quality Factor Enhancement on Nano Mechanical Resonators Utilizing Stiction Phenomena
Dynamic Characteristics Control of DLC Nano-Resonator Fabricated by Focused-Ion-Beam Chemical Vapor Deposition
Selective Graphene Growth from DLC Thin Film Patterned by Focused-ion-beam Chemical Vapor Deposition |
| Ishikawa, Kiyoshi |
Fabrication of the Seamless Roll Mold Using Inorganic Electron Beam Resist with Post Exposure Bake |
| Ishikawa, Mikio |
Negative-tone E-beam Resist Patterning for more than 1 Tbit/in2 Bit-patterned Media NIL Mold
Master Pattern Formation of Bit-Patterned Media by E-Beam Direct Drawing |
| Islam, M. Saif |
The Fabrication of Shallow Co-axial P-N Junctions on Silicon Micro/Nanopillars for Solar Cell Applications |
| Isobe, Hideaki |
Multi Column Cell Writer Architecture and a Correction Technique for Consistent CD Uniformity Between Column Cells |
| Isoyan, Artak |
Table Top Nanopatterning by De-Magnified Talbot Effect
Chemically Amplified Resist Modeling in High Compact Model Format for Photolithography Process Simulation
Process Window Modeling Using Focus Balancing Technique |
| Itoh, Kimio |
Demonstration of Full 4-inch Patterning with Displacement Talbot Lithography
Negative-tone E-beam Resist Patterning for more than 1 Tbit/in2 Bit-patterned Media NIL Mold |
| Ivanov, Borislav |
Extreme Brightness: Reaching the Ultimate Limits of the Electron Beam |
| Ivanov, Tzvetan |
Self-Actuated Piezoresistive 512-Cantilever Arrays for Large-Area Imaging and Manipulation
Ultrafast Cantilever for High Speed Scanning Force Microscopy |
| Ivonin, Igor |
Digital Planar Holograms Fabricated by Step and Repeat UV Nanoimprint Lithography
Fabrication of Digital Planar Holograms for Brighter Power Laser Diodes |
| Iwasa, Masayuki |
Adhesion and Frictional Forces Measurement by Scanning Probe Microscopy Under Pentafluoropropane Gas Atmosphere |
| Iyoshi, Syuso |
Evaluation of Effect of Fluorine Additive Agent for Cationic UV-Nanoimprint Resin |
J |
| Jackson, Tom |
Process-Structure-Property Relationship of Nanocrystalline Vanadium Oxide Thin Films Used in Uncooled Infrared Focal Plane Arrays |
| Jacob, James |
Development of a Full-Field Inteference Lithogrpahy System Based on a Long-Coherence-Length Laser Source |
| Jaesun, Lee |
7-nm-Pitch Gratings Fabricated on Diamond Substrates Using Hydrogen Silsesquioxane Resists and Electron-Beam Lithography |
| Jager, R. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Jang, Jae-Won |
Tip Based Lithography for Biocompatible Materials |
| Jarvis, Jonathan |
Extreme Brightness: Reaching the Ultimate Limits of the Electron Beam |
| Javanmard, Mehdi |
Optimized Multiplexed Cell Capture Using Parallel Bioactivated Microfluidic Channels |
| Jeanmaire, Damien |
High Acceleration Voltage Characterization of SML Electron Beam Resist for Ultra High Aspect Ratio Nano-Lithographic Applications |
| Jeong, Jun-ho |
Mass Fabrication of Resistive Random Access Crossbar Array by UV-NIL |
| Ji, Hengxing |
Patterned Graphene Oxide Films by a Simple Method |
| Jiang, Jing |
Sub-millisecond Post-Exposure and Hard Bake of Chemically Amplified Photoresists |
| Jiang, Jiong |
(Invited) Creative Metrology Development for EUVL: Flare and Out-of-Band Qualification |
| Jiang, Li |
Design of Micro-scale Transmission Light Valve Arrays |
| Jin, Sungho |
Di-block Copolymer Directed Anodization of Hexagonally Ordered Nanoporous Aluminum Oxide
Geometry Controlled Periodic Si Nanopillar Arrays by Dry Oxidation and Wet Etching
Multi-Tip AFM Lithography System for High Throughput Nano-patterning |
| Jindal, Vibhu |
Native Blank Defect Analysis for the Study of Printability
Advanced Metrology For Extreme Ultraviolet (EUV) Mask Blank Defect Reduction |
| Johnson, Stephen C. |
Progress in Jet and Flash Imprint Defectivity Reduction Towards Semiconductor Manufacturing Requirements |
| Joseph, Eric A. |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Judokusumo, Edward |
Micro and Nano Pillar Assay for T cell Activation |
| Jugessur, Aju |
Nanofabrication of Photonic Crystal-Based Devices Using Electron Beam Spot Lithography Technique |
| Jun, David |
Ion Beams in SEM: An Experiment towards a High Brightness Low Energy Spread Electron Impact Gas Ionization Source |
| Jung, Byungki |
Sub-millisecond Post-Exposure and Hard Bake of Chemically Amplified Photoresists |
| Jung, Hyunchul |
Cell Electroporation – A Diffusion Process or a Drive-In Process? |
| Jung, Jae Won |
Extensive Tunability of Self-Assembled Block Copolymer Patterns for Nanolithography |
| Jung, Yeon Sik |
Extensive Tunability of Self-Assembled Block Copolymer Patterns for Nanolithography |
| Jung, Yeonwoong |
Subwavelength Optical Lithography of Complex Nanopatterns by Diffraction |
K |
| Kaestner, Marcus |
Scanning Proximal Probe Lithography (SPPL) with Sub-10nm Resolution on Calix[4]resorcinarene |
| Kageyama, Junichi |
Advanced Metrology For Extreme Ultraviolet (EUV) Mask Blank Defect Reduction |
| Kahl, Michael |
Chip Scale Focussed Electron Beam Induced Etching of a Silicon Nitride Membrane with Unique Beam Writing Strategies. |
| Kaiblinger, Kurt |
Ion Beam Lithography for Sub-50 nm Patterning of Metal Mold Inserts and Replication by Injection Molding |
| Kam, Lance |
Micro and Nano Pillar Assay for T cell Activation |
| Kampherbeek, B.J. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Kanda, Kazuhiro |
Evaluation of PDMS Thin Layer as Antisticking Layer for UV Nanoimprinting
Evaluation of Curing Process of UV Resin in PFP Gas Ambient by Photo-Differential Scanning Calorimetry
Adhesion and Frictional Forces Measurement by Scanning Probe Microscopy Under Pentafluoropropane Gas Atmosphere |
| Kang, Weng Poo |
Extreme Brightness: Reaching the Ultimate Limits of the Electron Beam |
| Kang, Yuji |
Mechanical Characteristics Of Nanostructures Fabricated By Nanoimprint
Room-Temperature Nanoimprint Using Spin-Coated HSQ with High Boiling -Point Solvent |
| Kanwal, Alokik |
A Parametric Study of Electrophoretic Deposition of Single Wall Nanotubes In Nanoscale Windows |
| Kaplan, Alex |
High Efficiency Plasmonic Color Filters Fabricated Using Imprint Lithography |
| Katine, Jordan |
Fabrication and Testing of 1.5 Terabit/in2 Bit-Patterned Media for Thermally-Assisted Magnetic Recording. |
| Katsap, Victor |
E-beam Energy Dissipation in Complex Solid Targets
Emission Imaging of a LaB6 Emitter |
| Katsumura, Masahiro |
Master Pattern Formation of Bit-Patterned Media by E-Beam Direct Drawing |
| Kawamura, Takeshi |
Measurement of Surface Potential of Insulating Film on Conductive Substrate in a Scanning Electron Microscope |
| Kawata, Hiroaki |
Molecular Dynamics Study on Polymer Filling Process in Nanoimprint Lithography for Multi-Layered Resist
Shrinkage Pattern Correction (SPC) in Nanoimprint Lithography
High Aspect Ratio Fine Pattern Transfer Using Novel Mold by Nanoimprint Lithography
Novel Nanoimprint Lithography Using Dispersed Molecular Weights
Atomic Step Pattering in Nanoimprint Lithography : Molecular Dynamics Study
Computational Study of Electron-Irradiation Effects in Carbon Nanomaterials on Substrates |
| Keasebier, Thomas |
Double Patterning Technology: Process Simulation and Fabrication of Optical Elements |
| Kehagias, Nikolaos |
Direct Top-Down Ordering of Diblock Copolymers Through Nanoimprint Lithography
Characterisation of Optical Diffraction Metrology Templates for Self-Assembled Block Co-Polymers Fabricated by Nanoimprint Lithography
Tailored Synthesized Silsesquioxane Based Resists For UV-Assisted Nanoimprint Lithography |
| Kehoe, Timothy |
Characterisation of Optical Diffraction Metrology Templates for Self-Assembled Block Co-Polymers Fabricated by Nanoimprint Lithography |
| Kercher, Dan |
Fabrication and Recording Performance of Bit Patterned Media |
| Kern, Dieter P. |
Fabrication of Plasmonic Nanostructures by Etch Mask Transfer
The Influence of Surface Patterning on Bacterial Growth Behavior |
| Kessels, Erwin |
Direct Local Deposition of High-Purity Pt and Pd Nanostructures by a Novel Combination of EBID and ALD |
| Khalid, Ata |
Micro-Fabrication of Terahertz Metamaterial Absorbers |
| Khater, Marwan |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Khizroev, Sakrat |
Graded Bit Patterned Media via Helium Ion Irradiation |
| Kholmanov, Iskandar |
Patterned Graphene Oxide Films by a Simple Method |
| Kidwingira, Francoise |
Resistivity Changes Due to Environmental Contamination In Films Used For Charge Reduction in Electrostatic Electron Optics |
| Kim, Byung-Guk |
Three-Dimensional Proximity Effect Correction for Large-Scale Uniform Patterns
Enhancement of Spatial Resolution in Generating Point Spread Functions by Monte Carlo Simulation in Electron-beam Lithography |
| Kim, Dae-Wook |
Advanced Microcolumn with a Quadrupole Electrostatic Lens |
| Kim, Daisik |
Fabrication of Plasmonic Nano-Pore Array for Nanobio Sensor |
| Kim, Dong Ho |
Enhancement of Light Extraction Efficiency in n-GaN Patterned Vertical Light-Emitting Diodes using Nanosphere Lithography |
| Kim, Ganghun |
Design and Fabrication of Broadband Diffractive Optics |
| Kim, Geehong |
The Effect of Cylindrically Inflated Substrate to Improve the Pressure Distribution in UV Nanoimprint |
| Kim, Ho Soeb |
Advanced Microcolumn with a Quadrupole Electrostatic Lens |
| Kim, Hyun-Mi |
The Mechanism of Nano-Sculpturing by Focused Electron Beam for DNA Translocation Control
Fabrication and Characterization of Metal Electrode Embedded Nanopore Device |
| Kim, Hyunsu |
Di-block Copolymer Directed Anodization of Hexagonally Ordered Nanoporous Aluminum Oxide |
| Kim, Jeong-gil |
Near-Field 3D Lithography Using Self-Assembled Nanospheres |
| Kim, Ji-Kwan |
Investigation of Graphene Piezoresistor for Use as Strain Gauge Sensors |
| Kim, Jin-Yeol |
Di-block Copolymer Directed Anodization of Hexagonally Ordered Nanoporous Aluminum Oxide |
| Kim, Jiyoung |
Selective Area ALD Deposition with Nanolithography using SAM as a Resist |
| Kim, Jung Wuk |
Liquid Transfer Imprint Lithography: A New Route to Residual Layer Thickness Control |
| Kim, Ki-Bum |
The Mechanism of Nano-Sculpturing by Focused Electron Beam for DNA Translocation Control
Fabrication and Characterization of Metal Electrode Embedded Nanopore Device |
| Kim, Ki-don |
Mass Fabrication of Resistive Random Access Crossbar Array by UV-NIL |
| Kim, Sang-Kon |
Process Simulation of Block Copolymer Nanofabrication |
| Kim, Sangsig |
Resistive Switching Characteristics of Hafnium Oxide Nano-Films on Flexible Plastic Substrates
Memory Characteristics of MOS Capacitors With Pt-Nanoparticles-Embedded Gate Layers |
| Kim, Sungho |
Mass Fabrication of Resistive Random Access Crossbar Array by UV-NIL |
| Kim, Sungsu |
Memory Characteristics of MOS Capacitors With Pt-Nanoparticles-Embedded Gate Layers |
| Kim, Tae Geun |
Enhancement of Light Extraction Efficiency in n-GaN Patterned Vertical Light-Emitting Diodes using Nanosphere Lithography |
| Kim, Young Chul |
Advanced Microcolumn with a Quadrupole Electrostatic Lens |
| Kimura, Teruhiko |
EUV-Mask Pattern Imaging by the Coherent Scatterometry Microscope |
| Kinoshita, H. |
Generation of Highly Coherent, Bright 13 nm Light with Phase-Matched High-Order Harmonics for Coherent Scatterometry Microscope |
| Kinoshita, Hiroo |
EUV-Mask Pattern Imaging by the Coherent Scatterometry Microscope
Extreme Ultraviolet Interference Lithography toward 1X nm Nodes |
| Kishimoto, Masahiro |
Native Blank Defect Analysis for the Study of Printability |
| Kitahara, Hiroaki |
Negative-tone E-beam Resist Patterning for more than 1 Tbit/in2 Bit-patterned Media NIL Mold
Master Pattern Formation of Bit-Patterned Media by E-Beam Direct Drawing |
| Kleinschmidt, Jason |
Design and Fabrication of Broadband Diffractive Optics |
| Kley, Ernst-Bernhard |
Double Patterning Technology: Process Simulation and Fabrication of Optical Elements |
| Klimpel, Thomas |
A Model Based Hybrid Proximity Effect Correction Scheme Combining Dose Modulation and Shape Adjustments |
| Kline, Joseph |
Characterization of Cross Sectional Profile of Epitaxially Assembled Block Copolymer Domains using Transmission Small Angle X-Ray Scattering |
| Klingfus, Joe |
Chip Scale Focussed Electron Beam Induced Etching of a Silicon Nitride Membrane with Unique Beam Writing Strategies. |
| Klingfus, Joseph |
Dimensional Characterization Of Waveguide Coupling Device Structures Fabricated By The Fixed Beam Moving Stage (FBMS) Electron Beam Lithography
Novel Nanopatterning Strategies for Focused Ion Beam Lithography of Nanophotonic Structures |
| Knada, Kazuhiro |
Annealing Dependence of Deposit Morphology for Fe-Ga Contained DLC Film Formed by FIB-CVD with Ferrocene Source Gas |
| Knoll, Armin W. |
Thermo-Mechanical Probe Lithography at 500 kHz Pixel Rate |
| Knoop, Jennifer |
Suspended, Micron-scale Corner Cube Retroreflectors as Ultra-bright Optical Labels |
| Knuffman, Brenton |
(Invited) MOTIS: Focused Ion Beams from Laser-Cooled Atoms
MOTIS-Based Focused Ion Beams in Two Flavors |
| Ko, Seung Hyeon |
Towards Reliable Fabrications of Qdot-Nanopatterns on DNA Origami |
| Kobayashi, Kei |
Adhesive Forces of Fluorinated Silica Surfaces Affected by Surface Coverage of Tridecafluoro-1,1,2,2-Tetrahydrooctyltrimethoxysilane |
| Kobayashi, Masaki |
Master Pattern Formation of Bit-Patterned Media by E-Beam Direct Drawing |
| Koeck, Anton |
Direct Hard Mask Patterning by Focused Ion Beam (FIB)
Ion Beam Lithography for Sub-50 nm Patterning of Metal Mold Inserts and Replication by Injection Molding |
| Kogo, Yasuo |
Dwell Time Adjustment for Focused Ion Beam Machining
Surface Deformation Of Ga+ Ion Collision Process via Molecular Dynamics Simulation |
| Koh, Ai Leen |
Plasmonics On Lithographically-Defined Nanostructures as Studied in Electron Energy-Loss Spectroscopy |
| Kohama, Yoshiaki |
On-Machine Wavefront Evaluation of the Full-Field Extreme Ultra-Violet Lithography Exposure System |
| Kohayase, Atsushi |
Deterioration Evaluation of Release Coated Surface for Nanoimprint by Macro Optical Inspection Method |
| Kohler, Jonathan |
Extreme Brightness: Reaching the Ultimate Limits of the Electron Beam |
| Koickal, Thomas |
Tantalum Electro-Mechanical Systems For Low Frequency Sensing In Biomimetical Applications |
| Koirala, Ashutosh |
Nanocomposite-Beam Based Microresonator Fabricated by Combining Microlithography And Layer-By-Layer Nanoassembly |
| Kojima, Akira |
Surface Electron Emission Lithography with Electron Source of High Emission Efficiency |
| Kokubo, Mitsunori |
Soft Patterning on Cylindrical Surface of Plastic Optical Fiber by Sliding Roller-Imprinting |
| Kometani, Reo |
Carbon Nanomechanical Resonator Fabrication from PMMA by FIB/EB Dual-Beam Lithography
A Gradually Shifted Surface Plasmon Resonance with a Controlled Diameter of a Nano-Hole Structure by Self-Assembly Technique
Quality Factor Enhancement on Nano Mechanical Resonators Utilizing Stiction Phenomena
Dynamic Characteristics Control of DLC Nano-Resonator Fabricated by Focused-Ion-Beam Chemical Vapor Deposition
Selective Graphene Growth from DLC Thin Film Patterned by Focused-ion-beam Chemical Vapor Deposition |
| Kondic, Lou |
The Directed Assembly of Metallic Nanoparticle Chains by Pulsed Laser Induced Dewetting and Nanolithography |
| Koning, J.J. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Koo, Namil |
Liquid Transfer Imprint Lithography: A New Route to Residual Layer Thickness Control |
| Kooi, Steven |
Focused Ion Beam Enabled Characterization of Nanostructured Polymeric Materials |
| Koshelev, Kirill |
Comparison Between ZEP and PMMA Resists for Nanoscale Electron Beam Lithography Experimentally and by Numeric Modeling |
| Koshida, Nobuyoshi |
Surface Electron Emission Lithography with Electron Source of High Emission Efficiency |
| Kostas, Christopher |
High Accuracy Charged Beam Modeling in MICHELLE–eBEAM |
| Kotaki, Kenichi |
Deterioration Evaluation of Release Coated Surface for Nanoimprint by Macro Optical Inspection Method |
| Kotera, Masatoshi |
Measurement of Surface Potential of Insulating Film on Conductive Substrate in a Scanning Electron Microscope |
| Kotipalli, Venu |
Fabrication of Carbon Nanotube Film-Piezoelectric (CNF-PZT) Microcantilevers for Energy Harvesting Application |
| Kratschmer, Ernst |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Kreindl, Gerald |
Hybrid Tri-Layer Stamps for Step and Repeat Imprint Lithography |
| Kristensen, Anders |
Fabrication of Sub-20nm Nanochannels Integrated with Bowtie Nanoantenna
Fabrication of Nanostructures on Double-Curved PMMA Surfaces by Thermal Imprint with PDMS Stamp |
| Kruger, James |
Hard Stamp Processes for the EVG 620 Full Field Nanoimprint System |
| Kruit, P. |
Parallel Electron-Beam-Induced Deposition using a Multi- Beam Scanning Electron Microscope |
| Kruit, Pieter |
The Influence of Gun Design on Coulomb-Interactions in a Field Emission Gun
Individual Beam Control for MEMS Multi Electron Beam Systems
Electron-Beam-Induced Deposition of 3.5 nm Half-Pitch Dense Patterns on Bulk Si by Using a Scanning Electron Microscope
Ion Beams in SEM: An Experiment towards a High Brightness Low Energy Spread Electron Impact Gas Ionization Source
Statistical Coulomb Forces in Photo-Field Emitters for Ultrafast Microscopy |
| Kudernac, T. |
Functionalization of Focused Electron Beam Induced Deposits by Directed Self-Assembly |
| Kuiper, V. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Kuittinen, Markku |
Surface-Relief Polarization Gratings for Visible Light |
| Kumar, Karthik |
Fabrication of Sub-10-Nm-Gapped Gold Structures For Plasmonic Applications
Nanomenhirs for Surface-based Biosensing of Lipid Structures |
| Kuo, David |
Integration of Directed Block Copolymer Self-Assembly with Nanoimprint Lithography for Addressable Nanoarray Fabrication over Large Area
Study of Spin-coated Resist Coverage on Nanoscale Topography Using Spectroscopic Ellipsometry
Solvent Annealing Conbined with Surface Resconstruction towards the Fabrication of Silicon Nanodots with Areal Density beyond 1 Teradots/Inch2 |
| Kurihara, Kazuma |
A Gradually Shifted Surface Plasmon Resonance with a Controlled Diameter of a Nano-Hole Structure by Self-Assembly Technique |
| Kurokawa, Masaki |
Multi Column Cell Writer Architecture and a Correction Technique for Consistent CD Uniformity Between Column Cells |
| Kurokawa, Syuhei |
Negative-tone E-beam Resist Patterning for more than 1 Tbit/in2 Bit-patterned Media NIL Mold |
| Kuru, Cihan |
Geometry Controlled Periodic Si Nanopillar Arrays by Dry Oxidation and Wet Etching |
| Kurz, Heinrich |
Liquid Transfer Imprint Lithography: A New Route to Residual Layer Thickness Control
Replication Of Undercut Trenches for Water Based Lift-Off Process by Residue-Free UV-NIL |
| Kvennefors, Anders |
Metal-Assisted Chemical Etching of Si for Fabrication of Nanoimprint Stamps |
| Kwon, Gwangmin |
Multi-Tip AFM Lithography System for High Throughput Nano-patterning |
| Kwon, Hyuk Joo |
Native Blank Defect Analysis for the Study of Printability |
L |
| Labs, Zyvex |
Multiscale Hydrogen Depassivation Lithography Using a Scanning Tunneling Microscope
Patterned Atomic Layer Epitaxy of Si / Si(001):H |
| Lai, Chising |
Emission Imaging of a LaB6 Emitter |
| Lai, Yu-Sheng |
Using Intruded Gold Nanoclusters as Highly Active Catalysts to Fabricate Silicon Nano-Stalactite Structures |
| Lakshmanan, Shanmugamurthy |
A Parametric Study of Electrophoretic Deposition of Single Wall Nanotubes In Nanoscale Windows |
| Lam, Ruby |
Tip Based Lithography for Biocompatible Materials |
| Lambson, Brian |
Time-Lapse Imaging of Thermally-Driven Signal Propagation in Nanomagnetic Logic |
| Landis, Stefan |
Diblock Copolymer Ordering by NanoImprint Lithography
Metallic Color Filtering Arrays Manufactured by Nanoimprint Lithography
Viscoelastic Properties Measurements of Thin Polymer Films from Reflow of Nanoimprinted Patterns |
| Langegger, Rupert |
Focused Ion Beam Induced Synthesis of Free-Standing Graphite Nanosheets |
| Langridge, Sean |
Long Range Magnetic Ordering in Nanofabricated Artificial Spin-Ice Arrays |
| Lapeyre, Celine |
Graphoepitaxy of Block Copolymers Using 193nm Lithography: A Process and Defectivity Study |
| Lapointe, Jean |
Electron-Beam Lithography of Photonic Waveguides: Measurement of the Effect of Field Stitching Errors on Optical Performance and Evaluation of a New Compensation Method |
| Latif, Rhonira |
Tantalum Electro-Mechanical Systems For Low Frequency Sensing In Biomimetical Applications |
| Laukkanen, Janne |
Perfect Matching of Experimental and Simulated Optical Responses of Metallic Nanostructures Obtained Through the Use of Correct Refractive Index |
| Lausanne, Ecole Polytechnique Federale de |
Self Aligned Concentric Nanostructures Formed by E-beam Overexposure of PMMA and Single Post Processing Steps |
| Lee, C.M. |
Studies in Synthetic Antiferromagnetically Coupled Ring Array Magnets via Hysteresis Loops |
| Lee, Dong-Weon |
Investigation of Graphene Piezoresistor for Use as Strain Gauge Sensors |
| Lee, Eung-sug |
Mass Fabrication of Resistive Random Access Crossbar Array by UV-NIL |
| Lee, Haiwaon |
Multi-Tip AFM Lithography System for High Throughput Nano-patterning |
| Lee, HM |
Study of Optical Transmittance Through Tack-Typed and Goblet-Typed Dielectric Pillar Arrays |
| Lee, Huang-Ming |
Tunable Waveguide-Plasmon Coupling in Silicon-Nitride Photonic Crystal Slabs with Double-coated Silver Films
Coupling of Surface Plasmons in Au Nanorings with Subwavelength Holes Array |
| Lee, Hunag-Ming |
Investigation of Surface Plasmons Coupling via Guided Modes in Metal/Dielectric/Metal Photonic Crystal Slabs |
| Lee, Hwack Joo |
Transmission Electron Microscopy Study of Annealed Platinum Films Made by Ion Beam Induced Deposition |
| Lee, Jaejong |
The Effect of Cylindrically Inflated Substrate to Improve the Pressure Distribution in UV Nanoimprint |
| Lee, Ji-hye |
Mass Fabrication of Resistive Random Access Crossbar Array by UV-NIL |
| Lee, Jongho |
Nanofabrication Down to 10 nm on a Plastic Substrate |
| Lee, Ki-joong |
Mass Fabrication of Resistive Random Access Crossbar Array by UV-NIL |
| Lee, Kim |
Integration of Directed Block Copolymer Self-Assembly with Nanoimprint Lithography for Addressable Nanoarray Fabrication over Large Area
Study of Spin-coated Resist Coverage on Nanoscale Topography Using Spectroscopic Ellipsometry
Solvent Annealing Conbined with Surface Resconstruction towards the Fabrication of Silicon Nanodots with Areal Density beyond 1 Teradots/Inch2 |
| Lee, Koyau |
Dehydration Assisted Nanoimprint Of PEDOT:PSS Nanogratings To Improve Organic Photovoltaics |
| Lee, L. James |
Cell Electroporation – A Diffusion Process or a Drive-In Process? |
| Lee, Min-Hyun |
The Mechanism of Nano-Sculpturing by Focused Electron Beam for DNA Translocation Control
Fabrication and Characterization of Metal Electrode Embedded Nanopore Device |
| Lee, Mingun |
Selective Area ALD Deposition with Nanolithography using SAM as a Resist |
| Lee, Myung Yoon |
Process-Structure-Property Relationship of Nanocrystalline Vanadium Oxide Thin Films Used in Uncooled Infrared Focal Plane Arrays |
| Lee, Sang Hoon |
Investigation of Deposition Profile For Metal Structure Using Focused Ion Beam |
| Lee, Sang-Hee |
Three-Dimensional Proximity Effect Correction for Large-Scale Uniform Patterns
Enhancement of Spatial Resolution in Generating Point Spread Functions by Monte Carlo Simulation in Electron-beam Lithography |
| Lee, Soo-Young |
Three-Dimensional Proximity Effect Correction for Large-Scale Uniform Patterns
Enhancement of Spatial Resolution in Generating Point Spread Functions by Monte Carlo Simulation in Electron-beam Lithography |
| Lee, Tao-Hua |
Template-Assisted Growth of ZnO Nanorod Arrays |
| Lee, YC |
Study of Optical Transmittance Through Tack-Typed and Goblet-Typed Dielectric Pillar Arrays |
| Lee, Yen-Chun |
Fabrication of Hybrid Silicon/Metal Island Single Electron Transistors |
| Lehmuskero, Anni |
Perfect Matching of Experimental and Simulated Optical Responses of Metallic Nanostructures Obtained Through the Use of Correct Refractive Index |
| LETI-MINATEC, CEA |
5kV Multi Electron Beam Lithography MAPPER Tool: From 32nm to 22nm Resolution Capability |
| Levush, Baruch |
High Accuracy Charged Beam Modeling in MICHELLE–eBEAM |
| Lewis, Scott |
High Acceleration Voltage Characterization of SML Electron Beam Resist for Ultra High Aspect Ratio Nano-Lithographic Applications |
| Lezec, Henri |
Electron Beams with Helical Wavefronts and Quantized Angular Momentum
(Invited) Electromagnetic Radiation Pressure on Left- and Right-handed Dissipative Media |
| Li, Huifeng |
Patterned Graphene Oxide Films by a Simple Method |
| Li, Jing |
E-Beam Writing Strategies for Low-loss Optical Waveguides
Process-Structure-Property Relationship of Nanocrystalline Vanadium Oxide Thin Films Used in Uncooled Infrared Focal Plane Arrays |
| Li, Kai |
Fabrication of Nanoscale Structures on Micro Patterned Silicon (100) Surfaces |
| Li, Siran |
Nanofluidic Single DNA Sorter and Analyzer Fabricated by Nanoimprint and Wafer Bonding |
| Li, Wen-Di |
Design and Fabrication of High Enhancement Yet Wafer-Scale Uniform SERS/Plasmonic Structures Based on Nanoimprint Lithography and Self-Assembly |
| Li, Xinxin |
Investigation of Graphene Piezoresistor for Use as Strain Gauge Sensors |
| Li, Zhiyoung |
A Molecule Trapping and SERS Sensing Device by 3-D Nanoimprint |
| Liang, Ted |
(Invited) Challenges and Progress in Extreme Ultraviolet Mask Development
Actinic Characterization of EUV Bump-Type Phase Defects |
| Liang, Xiaogan |
Fabrication of Nanoparticles Deposited Photonic Crystals
Plasmonic Light Trapping in Nanostructural Metal Surfaces
Nanoimprint Induced Block Copolymer Self-Assembly
Fabrication of Sub-20nm Nanochannels Integrated with Bowtie Nanoantenna |
| Liang, Yixing |
Design and Fabrication of High Enhancement Yet Wafer-Scale Uniform SERS/Plasmonic Structures Based on Nanoimprint Lithography and Self-Assembly |
| Liao, Wei-Chiang |
Cell Electroporation – A Diffusion Process or a Drive-In Process? |
| Liddle, Alexander |
Simultaneous Positioning and Orienting of a Single Nano-object Using Flow Control
Measurement of Acid Induced Blur in Polymer Films by Single-Molecule Fluorescence Microscopy |
| Liddle, J. Alexander |
Towards Reliable Fabrications of Qdot-Nanopatterns on DNA Origami |
| Lim, Hyungjun |
The Effect of Cylindrically Inflated Substrate to Improve the Pressure Distribution in UV Nanoimprint |
| Lim, Kangmook |
Development of Metal Etch Mask by Single Layer Lift-Off for Silicon Nitride Photonic Crystals |
| Lin, C.C. |
Advanced Metrology For Extreme Ultraviolet (EUV) Mask Blank Defect Reduction |
| Lin, Chung-Hsun |
(Invited) CMOS Density Scaling in Non-Planar Multi-Gate Silicon on Insulator Devices |
| Lin, Qinghuang |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Lin, Ta-Chun |
The Fabrication of Shallow Co-axial P-N Junctions on Silicon Micro/Nanopillars for Solar Cell Applications |
| Lin, Y.C. |
Studies in Synthetic Antiferromagnetically Coupled Ring Array Magnets via Hysteresis Loops |
| Lin, Yu-Chun |
Tunable Waveguide-Plasmon Coupling in Silicon-Nitride Photonic Crystal Slabs with Double-coated Silver Films |
| Lippmann, Gabriel |
High-Resolution High-Sensitivity Characterization Of Nanoscale Structures in a New Combined SIMS-SPM Instrument: Correction of Topography Artifacts |
| Lithography, MAPPER |
Towards a 100 wph e-Beam Direct Write Cluster |
| Litt, Lloyd C. |
Progress in Jet and Flash Imprint Defectivity Reduction Towards Semiconductor Manufacturing Requirements |
| Litvinov, Dmitri |
Graded Bit Patterned Media via Helium Ion Irradiation |
| Litvinov, Julia |
Suspended, Micron-scale Corner Cube Retroreflectors as Ultra-bright Optical Labels |
| Liu, Charlie C. |
Coupled Planar-Localized Surface Plasmon Resonance Device by Block-Copolymer and Nanoimprint Lithography Fabrication Methods |
| Liu, Chi-Chun |
Towards an All-Track Process for DSA
Evolution of Critical Dimension and Line Edge Roughness During Block-Copolymer Nano-Patterning
Patterning of Poly(N-Isopropylacrylamide) Hydrogel Nano Structures Using Soft X-Ray and EUV Lithography |
| Liu, Fei |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Liu, Guoliang |
Pattern Transfer of Block Copolymer Template from Density Multiplication on Chemically Patterned Surface |
| Liu, Ran |
Fabrication of Complex Nanostructures of P(VDF-TrFE) by Dual Step Hot-embossing
Selective Photochemical Reduction of Silver on Nanoembossed Ferroelectric Nanowires
Large Area Fast Patterning in High Resolution by a Combined Near-Field Exposure and Reversal Imprint Lithography |
| Liu, Shiyuan |
Fast Aerial Image Simulations Using One Basis Mask for Optical Proximity Correction
Kernel Based Parametric Analytical Model of Source Intensity Distributions in Lithographic Tools |
| Liu, Wei |
Fast Aerial Image Simulations Using One Basis Mask for Optical Proximity Correction
Kernel Based Parametric Analytical Model of Source Intensity Distributions in Lithographic Tools |
| Liu, Yongdong |
Study of Spin-coated Resist Coverage on Nanoscale Topography Using Spectroscopic Ellipsometry |
| Livengood, Richard |
Neon GFIS Nanomachining Applications –A Study Of The Machining Properties of Neon for Semiconductor FA and Circuit Edit |
| Lobez, Jose |
Secondary-Electron Signal Levels of Self-Assembled Monolayers for Spatial-Phase-Locked Electron-Beam Lithography |
| Lockwood, David |
(Invited) Cold Cathodes of Low Electron Affinity and Negative Electron Affinity Thin Films And Nanoclusters |
| Lockwood, Nathaniel |
Single Walled Nanotube (SWNT) Fiber Field Emission Cathodes |
| Logan, David |
Pitfalls in the Measurement of FIB Beam Size |
| Lok, Lai Bun |
Micro-Fabrication of Terahertz Metamaterial Absorbers |
| lorusso, Gian |
(Invited) Creative Metrology Development for EUVL: Flare and Out-of-Band Qualification |
| Lovell, Douglas J. Dave |
Progress in Jet and Flash Imprint Defectivity Reduction Towards Semiconductor Manufacturing Requirements |
| Lozano, Paulo |
Ionic Liquid Ion Sources as a Unique and Versatile Option in Focused Ion Beam Applications
Filtering and Energy Characterization of Ion Species from Ionic Liquid Ion Sources for Focused Ion Beam Applications |
| Ltd., JEOL |
The New Method of Electron-Beam Lithography on HSQ at Overlay Writing |
| Lu, Bing-Rui |
Large Area Fast Patterning in High Resolution by a Combined Near-Field Exposure and Reversal Imprint Lithography |
| Lu, Ming |
Fabrication of High-Aspect-Ratio Nanostructures to Characterize High-resolution Hard X-ray Nano-probe
High Aspect Ratio Zone Plate Fabrication Using a Bilayer Mold |
| Lu, Wu |
Cell Electroporation – A Diffusion Process or a Drive-In Process? |
| Lugstein, Alois |
Local, Direct-Write, Damage-Free Thinning of Germanium Nanowires
Focused Ion Beam Induced Synthesis of Free-Standing Graphite Nanosheets |
| Lukasczyk, Thomas |
Focused Electron Beam Induced Surface Activation: A Novel Lithographic Method to Fabricate Nanostructures
Addressing the Fabrication of Titanium Oxide Nanostructures by Electron Beam Induced Deposition |
| Lvov, Yuri |
Nanocomposite-Beam Based Microresonator Fabricated by Combining Microlithography And Layer-By-Layer Nanoassembly |
| Lyons, Adam |
Electron Beam Lithography Tools for Low Cost Inspection of Extreme Ultraviolet Lithography Masks
Liftoff Lithography of Chrome for Extreme Ultraviolet Lithography Mask Absorber Layer Patterning |
M |
| Ma, Shiau-Yi |
Lithography-Patterning-Fidelity-Aware Electron-Optical System Design Optimization |
| Ma, Shirley |
High Resolution Electron Beam Lithography Using Polystyrene Negative Resist |
| Ma, Yong |
Micro-Fabrication of Terahertz Metamaterial Absorbers |
| Maas, Diederik J. |
High Growth Efficiencies in Helium Ion Beam Induced Deposition at Short Beam Dwell Times |
| Maas, Diederik |
Characterization of Beam-Induced Chemical Structures in the Helium Ion Microscope |
| Maazouz, Mostafa |
(Invited) MOTIS: Focused Ion Beams from Laser-Cooled Atoms
MOTIS-Based Focused Ion Beams in Two Flavors
Pitfalls in the Measurement of FIB Beam Size |
| Macintyre, Douglas |
Comparison of HSQ Development Methods for Sub-10 nm Electron Beam Lithography Using Accurate Linewidth Inspection |
| Mack, Chris |
Correlated Surface Roughening During Photoresist Development |
| Mackie, William |
Defined Emission Area and Custom Thermal Electron Sources |
| Mackus, Adrie |
Direct Local Deposition of High-Purity Pt and Pd Nanostructures by a Novel Combination of EBID and ALD |
| Magel, Greg |
In situ Optical Imaging and Laser Processing in the SEM/FIB: A True EIPBN System |
| Magera, Gerald |
Defined Emission Area and Custom Thermal Electron Sources
Emission Imaging of a LaB6 Emitter |
| Mahmoudi, Masoud |
Direct Patterning of Sub-10 nm Optical Apertures with a Helium Ion Microscope |
| Mai, Daniel |
Commissioning of the 20-bit Vistec EBPG5000plus at the Melbourne Centre for Nanofabrication |
| Maier, Stefan |
Plasmonics On Lithographically-Defined Nanostructures as Studied in Electron Energy-Loss Spectroscopy |
| Maier, Urs |
High-Resolution High-Sensitivity Characterization Of Nanoscale Structures in a New Combined SIMS-SPM Instrument: Correction of Topography Artifacts |
| Makarewicz, Joseph |
Carbon Nanotube Field Emission Electron Gun Microassembly for Maskless Lithography |
| Makarova, Olga |
Fabrication of High-Aspect-Ratio Nanopores by Interference Lithography |
| Maldonado, Juan R. |
Crisp, High Aspect-Ratio, C-Shaped Nanoapertures Fabricated in Evaporated Aluminum Using Focused Helium Ions
Resistivity Changes Due to Environmental Contamination In Films Used For Charge Reduction in Electrostatic Electron Optics |
| Malloy, Matt |
Progress in Jet and Flash Imprint Defectivity Reduction Towards Semiconductor Manufacturing Requirements |
| Malm, B. |
High Precision FIB Fabrication of Customizable AFM Probes |
| Maloney, Stephen |
Real-time Dose Control for Electron-Beam Lithography |
| Man, Xingkun |
Diblock Copolymer Ordering by NanoImprint Lithography |
| Manakli, Serdar |
Challenges in Data Treatment and Proximity Effects Correction for Massively Parallel Electron Lithography |
| Mancini, Derric |
High Aspect Ratio Zone Plate Fabrication Using a Bilayer Mold |
| Mancini, Derrick C. |
Patterning of Poly(N-Isopropylacrylamide) Hydrogel Nano Structures Using Soft X-Ray and EUV Lithography |
| Manfrinato, Vitor |
(Invited) Sub-10-nm Beam-Based Lithography and Applications
Resolution Limits of 200 keV Electron-Beam Lithography Using Aberration-Corrected STEM
Scanning-Neon-Ion-Beam Lithography |
| Mankos, Marian |
A Novel Low Energy Electron Imaging Technique for DNA Sequencing and Surface Analysis |
| Mansourpour, Mahnaz |
Hard Stamp Processes for the EVG 620 Full Field Nanoimprint System |
| Manthena, Rajakumar |
Breaking the Diffraction Barrier in Nanopatterning with Optical Saturable Transformations |
| Marbach, Hubertus |
Focused Electron Beam Induced Surface Activation: A Novel Lithographic Method to Fabricate Nanostructures
Addressing the Fabrication of Titanium Oxide Nanostructures by Electron Beam Induced Deposition |
| Marchman, Herschel |
In situ Optical Imaging and Laser Processing in the SEM/FIB: A True EIPBN System |
| Marconi, Mario |
Table Top Nanopatterning by De-Magnified Talbot Effect |
| Marrows, Christopher |
Long Range Magnetic Ordering in Nanofabricated Artificial Spin-Ice Arrays |
| Martin, Luc |
Challenges in Data Treatment and Proximity Effects Correction for Massively Parallel Electron Lithography
Comparison of PSF for non CAR and CAR Resists in E-Beam Lithography |
| Martin, Mickael |
5kV Multi Electron Beam Lithography MAPPER Tool: From 32nm to 22nm Resolution Capability |
| Maruyama, Benji |
Single Walled Nanotube (SWNT) Fiber Field Emission Cathodes |
| Maruyama, Hiroki |
Roll Diameter Amplification Method Using Direct Transfer of Fine Patterned Small Roll Mold Fabricated by Electron Beam Lithography |
| Maser, Jörg Maser |
Fabrication of High-Aspect-Ratio Nanostructures to Characterize High-resolution Hard X-ray Nano-probe |
| Mastropaolo, Enrico |
Tantalum Electro-Mechanical Systems For Low Frequency Sensing In Biomimetical Applications |
| Mathai, Pramod |
Simultaneous Positioning and Orienting of a Single Nano-object Using Flow Control |
| Mathur, Anurag |
A New Approach for Measuring Protrusive Forces in Cells |
| Matsui, S. |
Annealing Dependence of Deposit Morphology for Fe-Ga Contained DLC Film Formed by FIB-CVD with Ferrocene Source Gas
Room-Temperature Nanoimprint Using Spin-Coated HSQ with High Boiling -Point Solvent |
| Matsui, Shinji |
Mechanical Characteristics Of Nanostructures Fabricated By Nanoimprint
Evaluation of Effect of Fluorine Additive Agent for Cationic UV-Nanoimprint Resin
Evaluation of PDMS Thin Layer as Antisticking Layer for UV Nanoimprinting
Evaluation of SiOx Containing UV Nanoimprint Resin
Effect Evaluation of Pentafluoropropane Gas for UV Nanoimprint Resin By Using Contact Angle Meter
Comparison of Surface Condition of Nanoimprint Antisticking Layers Formed by CVD And Dip-Coat Methods
Evaluation of Curing Process of UV Resin in PFP Gas Ambient by Photo-Differential Scanning Calorimetry
Adhesion and Frictional Forces Measurement by Scanning Probe Microscopy Under Pentafluoropropane Gas Atmosphere |
| Matsumoto, Kohei |
On-Machine Wavefront Evaluation of the Full-Field Extreme Ultra-Violet Lithography Exposure System |
| Maximov, Ivan |
Metal-Assisted Chemical Etching of Si for Fabrication of Nanoimprint Stamps |
| Mayer, Andre |
Experimental Analysis For Process Control In Hybrid Lithography (T-NIL + UV-L)
Low Temperature Thermal Imprint via Frequency Assistance |
| McClelland, Jabez |
Electron Beams with Helical Wavefronts and Quantized Angular Momentum
(Invited) MOTIS: Focused Ion Beams from Laser-Cooled Atoms
MOTIS-Based Focused Ion Beams in Two Flavors |
| McClinton, Brittany |
(Invited) Challenges and Progress in Extreme Ultraviolet Mask Development |
| McComb, David |
Plasmonics On Lithographically-Defined Nanostructures as Studied in Electron Energy-Loss Spectroscopy |
| McCord, Mark |
Resistivity Changes Due to Environmental Contamination In Films Used For Charge Reduction in Electrostatic Electron Optics |
| McEuen, Paul |
Fabricating Arrays of Graphene Mechanical Resonators with High, Size-Dependent Quality Factors |
| McKinley, Gareth H. |
Fabrication of Subwavelength High Aspect-Ratio Tapered Fused Silica Nanostructures for Transparent Photophilic Material |
| McLeod, Alex |
Elucidating Effects of Nanoscale Structural Variations on Local Plasmonic Modes via Photon Localization Microscopy |
| McMorran, Benjamin |
Electron Beams with Helical Wavefronts and Quantized Angular Momentum |
| McVey, Shawn |
Scanning-Neon-Ion-Beam Lithography
Neon GFIS Nanomachining Applications –A Study Of The Machining Properties of Neon for Semiconductor FA and Circuit Edit
Scanning Transmission Ion Microscopy with the Helium Ion Microscope – Modeling and Selected Applications |
| Mehrotra, Prateek |
Solid-Immersion Interference Lithography Using a Lloyd’s Mirror |
| Mehta, Apurva |
Resistivity Changes Due to Environmental Contamination In Films Used For Charge Reduction in Electrostatic Electron Optics |
| Mekaru, Harutaka |
Impact of Hydrofluoroether on Contact Force of Thermal Nanoimprint
Soft Patterning on Cylindrical Surface of Plastic Optical Fiber by Sliding Roller-Imprinting |
| Melngailis, J. |
Patterning of Graphene on SiC using a He ion Nanobeam |
| Melville, David |
(Invited) Computational Lithography: Exhausting Optical System Limits Through Intensive Optimization |
| Melvin, Lawrence |
Chemically Amplified Resist Modeling in High Compact Model Format for Photolithography Process Simulation
Process Window Modeling Using Focus Balancing Technique |
| Menon, Rajesh |
Breaking the Diffraction Barrier in Nanopatterning with Optical Saturable Transformations
Design and Fabrication of Broadband Diffractive Optics |
| Menoni, Carmen |
Table Top Nanopatterning by De-Magnified Talbot Effect |
| Meyer, Ernst |
High-Resolution High-Sensitivity Characterization Of Nanoscale Structures in a New Combined SIMS-SPM Instrument: Correction of Topography Artifacts |
| Miao, Jianwei |
(Invited) Coherent Diffraction Imaging
Iterative Phase Recovery Using Wavelet Domain Constraints |
| Michels, Thomas |
Ultrafast Cantilever for High Speed Scanning Force Microscopy |
| Midorikawa, K. |
Generation of Highly Coherent, Bright 13 nm Light with Phase-Matched High-Order Harmonics for Coherent Scatterometry Microscope |
| Mielczarek, Kamil |
Dehydration Assisted Nanoimprint Of PEDOT:PSS Nanogratings To Improve Organic Photovoltaics |
| Miller, Paul |
EWOD-Based Droplet Actuation by Active-Matrix Electrode Array |
| Miller, Ron |
Hybrid Tri-Layer Stamps for Step and Repeat Imprint Lithography |
| Minatec, CEA-LETI |
Viscoelastic Properties Measurements of Thin Polymer Films from Reflow of Nanoimprinted Patterns |
| Minjun, Yan |
7-nm-Pitch Gratings Fabricated on Diamond Substrates Using Hydrogen Silsesquioxane Resists and Electron-Beam Lithography |
| Miro, Hozanna |
High Growth Efficiencies in Helium Ion Beam Induced Deposition at Short Beam Dwell Times |
| Mitra, Subhasish |
Atomic Layer Deposition Encapsulation of Carbon Nanotubes with Al2O3 |
| Miyake, Hiroto |
Evaluation of Effect of Fluorine Additive Agent for Cationic UV-Nanoimprint Resin
Evaluation of Curing Process of UV Resin in PFP Gas Ambient by Photo-Differential Scanning Calorimetry |
| Miyake, Yumiko |
Atomic Step Pattering in Nanoimprint Lithography : Molecular Dynamics Study |
| Mkrtchyan, Masis |
High Accuracy Charged Beam Modeling in MICHELLE–eBEAM |
| Mocella, Vito |
Fabrication of Nanoparticles Deposited Photonic Crystals |
| Mochi, Iacopo |
Actinic Characterization of EUV Bump-Type Phase Defects
Native Blank Defect Analysis for the Study of Printability |
| Moellenbeck, Saskia |
Low Temperature Thermal Imprint via Frequency Assistance |
| Moghaddam, Mehran Vahdani |
Broadband Light-Induced Thermionic Electron Emission from Arrays of Carbon Nanotubes using Laser Pointers
Polarization-Sensitive Visible-Light-Induced Thermionic Electron Emission from Carbon Nanotube Forests |
| Mohammad, Mohammad Ali |
Developer-Free Direct Patterning on PMMA by Low Voltage Electron Beam Lithography
Comparison Between ZEP and PMMA Resists for Nanoscale Electron Beam Lithography Experimentally and by Numeric Modeling
Nanofabrication of Silicon Carbon Nitride Cantilevers – Comparison of PMMA and HSQ Based Processes |
| Mohammad, Saifullah |
Direct-Write Lithography of Sub-10nm Features on Metallorganic Resists Using a Helium Ion Microscope |
| Mohammadi-Gheidari, A. |
Parallel Electron-Beam-Induced Deposition using a Multi- Beam Scanning Electron Microscope |
| Möllenbeck, Saskia |
Experimental Analysis For Process Control In Hybrid Lithography (T-NIL + UV-L) |
| Mollenhauer, Thomas |
Replication Of Undercut Trenches for Water Based Lift-Off Process by Residue-Free UV-NIL |
| Montelius, Lars |
Metal-Assisted Chemical Etching of Si for Fabrication of Nanoimprint Stamps |
| Mook, H.W. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Moon, Euclid |
3D Fabrication by Stacking Pre-patterned, Rigidly-held Membranes
3D Nanostructures by Stacking Pre-Patterned, Fluid-Supported Single-Crystal Si Membranes
Templated Photo-Ablation of Graphene
Secondary-Electron Signal Levels of Self-Assembled Monolayers for Spatial-Phase-Locked Electron-Beam Lithography |
| Moore, Ciaran |
Flexible PDMS Support Layers for the Evanescent Characterization of Near-Field Lithography Systems |
| Moore, Tom |
In situ Optical Imaging and Laser Processing in the SEM/FIB: A True EIPBN System |
| Moormann, Christian |
Liquid Transfer Imprint Lithography: A New Route to Residual Layer Thickness Control
Replication Of Undercut Trenches for Water Based Lift-Off Process by Residue-Free UV-NIL |
| Morgan, Jason |
Long Range Magnetic Ordering in Nanofabricated Artificial Spin-Ice Arrays |
| Morissette, Jean-François |
Top-Down Approaches for the Fabrication of Titanium Nanostructures |
| Moshkalev, Stanislav |
FIB Cross-Sections for Morphological Analysis of Ni-P Hard-Mask Transformation During Plasma Etching
Investigation of Contacts Between Metal and Few Layer Graphene Using Focused Ion Beam Cross-Sectioning |
| Motapothula, Mallikarjuna Rao |
Direct-Write Lithography of Sub-10nm Features on Metallorganic Resists Using a Helium Ion Microscope |
| Muhammad, Mustafa |
Nano-Patterning of PMMA on Insulating Surfaces With Various Anti-Charging Schemes Using 30 Kev Electron Beam Lithography |
| Mulders, Hans |
Direct Local Deposition of High-Purity Pt and Pd Nanostructures by a Novel Combination of EBID and ALD |
| Mulders, J.J.L. |
A New Process for Electron Beam Induced Deposition of Cobalt with Excellent Properties |
| Mulders, Johannes |
Direct Carbon Deposition by EBID at Low Substrate Temperatures |
| Mülders, Thomas |
Chemically Amplified Resist Modeling in High Compact Model Format for Photolithography Process Simulation |
| Munro, Eric |
E-beam Energy Dissipation in Complex Solid Targets |
| Murakami, Katsuhiko |
On-Machine Wavefront Evaluation of the Full-Field Extreme Ultra-Violet Lithography Exposure System |
| Murray, Lynn |
Photo Nanoimprint Lithography of Biological Samples Defined by Microfabricated PDMS Stencils |
| Murray, Terry |
(Invited) Cold Cathodes of Low Electron Affinity and Negative Electron Affinity Thin Films And Nanoclusters |
| Myrs-Ward, R.L. |
Patterning of Graphene on SiC using a He ion Nanobeam |
N |
| Nadzeyka, Achim |
Novel Nanopatterning Strategies for Focused Ion Beam Lithography of Nanophotonic Structures
Ion Beam Lithography for Sub-50 nm Patterning of Metal Mold Inserts and Replication by Injection Molding |
| Nagata, Yutaka |
Generation of Highly Coherent, Bright 13 nm Light with Phase-Matched High-Order Harmonics for Coherent Scatterometry Microscope |
| Nagato, Keisuke |
Copper Oxide Nanowire Arrays Synthesized from Sputtered Cu Thin Film
Injection Compression Molding of High-Aspect-Ratio Nanostructures |
| Nakagawa, Masaru |
(Invited) Release Property of Fluorinated Silica Surfaces for UV-Curable Resins Evaluated by Fluorescence Microscopy and Mechanical Measurement
Adhesive Forces of Fluorinated Silica Surfaces Affected by Surface Coverage of Tridecafluoro-1,1,2,2-Tetrahydrooctyltrimethoxysilane |
| Nakai, Yasuki |
Mechanical Characteristics Of Nanostructures Fabricated By Nanoimprint
Annealing Dependence of Deposit Morphology for Fe-Ga Contained DLC Film Formed by FIB-CVD with Ferrocene Source Gas
Evaluation of SiOx Containing UV Nanoimprint Resin
Comparison of Surface Condition of Nanoimprint Antisticking Layers Formed by CVD And Dip-Coat Methods |
| Nakajima, Toshio |
Native Blank Defect Analysis for the Study of Printability |
| Nakao, Masayuki |
Copper Oxide Nanowire Arrays Synthesized from Sputtered Cu Thin Film
Injection Compression Molding of High-Aspect-Ratio Nanostructures |
| Nakasuji, Masato |
EUV-Mask Pattern Imaging by the Coherent Scatterometry Microscope |
| Namboodiri, Pradeep |
Fabrication of Nanoscale Structures on Micro Patterned Silicon (100) Surfaces |
| Nanographics, ASELTA |
Challenges in Data Treatment and Proximity Effects Correction for Massively Parallel Electron Lithography |
| Nasrullah, Azeem |
Characterization of a Saddle-Field Ion Source for Proximity Lithography
Suspended, Micron-scale Corner Cube Retroreflectors as Ultra-bright Optical Labels |
| Naulleau, Patrick |
(Invited) Challenges and Progress in Extreme Ultraviolet Mask Development |
| Navarro, Christophe |
Graphoepitaxy of Block Copolymers Using 193nm Lithography: A Process and Defectivity Study |
| Nealey, Paul F. |
Pattern Transfer of Block Copolymer Template from Density Multiplication on Chemically Patterned Surface
Patterning of Poly(N-Isopropylacrylamide) Hydrogel Nano Structures Using Soft X-Ray and EUV Lithography
Coupled Planar-Localized Surface Plasmon Resonance Device by Block-Copolymer and Nanoimprint Lithography Fabrication Methods |
| Nealey, Paul |
Towards an All-Track Process for DSA
Evolution of Critical Dimension and Line Edge Roughness During Block-Copolymer Nano-Patterning |
| Neaton, Jeff |
Elucidating Effects of Nanoscale Structural Variations on Local Plasmonic Modes via Photon Localization Microscopy |
| Nelson, Shelby |
Vertical Transistors with High Alignment Tolerance |
| Nettikadan, Saju |
Tip Based Lithography for Biocompatible Materials |
| Newton, Michael |
Tantalum Electro-Mechanical Systems For Low Frequency Sensing In Biomimetical Applications |
| Ng, Hoi-Tou |
Lithography-Patterning-Fidelity-Aware Electron-Optical System Design Optimization |
| Nguyen, Cattien |
Carbon Nanotube Field Emission Electron Gun Microassembly for Maskless Lithography |
| Nicaise, Sam |
Spatial-Frequency Doubling Below the Block Copolymer Period by Templated Self-Assembly |
| Nicaise, Samuel |
Scanning-Neon-Ion-Beam Lithography |
| Nicu, Liviu |
Wafer Scale Integration Of Oriented Carbon Nanotubes Interconnects |
| Niedermayer, Stefan |
Diblock Copolymer Ordering by NanoImprint Lithography |
| Niemann, Darrell |
Carbon Nanotube Field Emission Electron Gun Microassembly for Maskless Lithography |
| Nikolov, N. |
Self-Actuated Piezoresistive 512-Cantilever Arrays for Large-Area Imaging and Manipulation |
| Nill, Peter |
The Influence of Surface Patterning on Bacterial Growth Behavior |
| Nilsson, Bengt |
Experimental Evaluation Method of Point Spread Functions in EBL Used for Proximity Effect Correction |
| Nilsson, Daniel |
A New High-Aspect-Ratio Diamond Dry-Etch Process for Hard X-Ray FEL Radiation Zone Plates |
| Nishi, Shunjiro |
Dynamic Characteristics Control of DLC Nano-Resonator Fabricated by Focused-Ion-Beam Chemical Vapor Deposition |
| Nishi, Yoshio |
DNA Concentrating by Electro-Kinetic Forces in Nano-bridge FET Array for DNA Hybridization Detection |
| Nishikura, Naoki |
Novel Nanoimprint Lithography Using Dispersed Molecular Weights |
| Nishimura, Yukio |
Novel Nanoimprint Lithography Using Dispersed Molecular Weights |
| Nock, Volker |
(Invited) Optical Sensors for Spatially-Resolved Measurement of Oxygen in Microfluidic Devices
Photo Nanoimprint Lithography of Biological Samples Defined by Microfabricated PDMS Stencils |
| Noh, Kunbae |
Di-block Copolymer Directed Anodization of Hexagonally Ordered Nanoporous Aluminum Oxide
Geometry Controlled Periodic Si Nanopillar Arrays by Dry Oxidation and Wet Etching
Multi-Tip AFM Lithography System for High Throughput Nano-patterning |
| Nojeh, Alireza |
Broadband Light-Induced Thermionic Electron Emission from Arrays of Carbon Nanotubes using Laser Pointers
Polarization-Sensitive Visible-Light-Induced Thermionic Electron Emission from Carbon Nanotube Forests |
| Notte, John |
Neon GFIS Nanomachining Applications –A Study Of The Machining Properties of Neon for Semiconductor FA and Circuit Edit
Scanning Transmission Ion Microscopy with the Helium Ion Microscope – Modeling and Selected Applications |
| Nouvertné, Frank |
Dimensional Characterization Of Waveguide Coupling Device Structures Fabricated By The Fixed Beam Moving Stage (FBMS) Electron Beam Lithography
Novel Nanopatterning Strategies for Focused Ion Beam Lithography of Nanophotonic Structures |
| Nouvertne, Frank |
Chip Scale Focussed Electron Beam Induced Etching of a Silicon Nitride Membrane with Unique Beam Writing Strategies. |
| Nowak, Christoph |
Replication Of Undercut Trenches for Water Based Lift-Off Process by Residue-Free UV-NIL |
| Nuckolls, Colin |
Selective Biomolecular Nanoarrays for Parallel Single-Molecule Investigations |
| Nunes, Alcinei |
FIB Cross-Sections for Morphological Analysis of Ni-P Hard-Mask Transformation During Plasma Etching |
| Nyakiti, L.O. |
Patterning of Graphene on SiC using a He ion Nanobeam |
O |
| O'Neal, Chad |
Fabrication of Carbon Nanotube Film-Piezoelectric (CNF-PZT) Microcantilevers for Energy Harvesting Application |
| Ober, Christopher |
Sub-millisecond Post-Exposure and Hard Bake of Chemically Amplified Photoresists |
| Ocola, Leonidas |
Improving PMMA Etch Resistance using Sequential Infiltration Synthesis
High Aspect Ratio Zone Plate Fabrication Using a Bilayer Mold |
| Oh, Tae-Sik |
Advanced Microcolumn with a Quadrupole Electrostatic Lens |
| Oh, Young |
Di-block Copolymer Directed Anodization of Hexagonally Ordered Nanoporous Aluminum Oxide
Geometry Controlled Periodic Si Nanopillar Arrays by Dry Oxidation and Wet Etching
Multi-Tip AFM Lithography System for High Throughput Nano-patterning |
| Ohkawa, Tatsuro |
Multi Column Cell Writer Architecture and a Correction Technique for Consistent CD Uniformity Between Column Cells |
| Ohki, Hirofumi |
Improved Time Dependent Performance of HSQ Resist Using a Spin on Top Coat
The New Method of Electron-Beam Lithography on HSQ at Overlay Writing |
| Ohkubo, Takashi |
Improved Time Dependent Performance of HSQ Resist Using a Spin on Top Coat |
| Ohnishi, Osamu |
Negative-tone E-beam Resist Patterning for more than 1 Tbit/in2 Bit-patterned Media NIL Mold |
| Ohsaki, Takeshi |
Evaluation of Curing Process of UV Resin in PFP Gas Ambient by Photo-Differential Scanning Calorimetry |
| Ohta, Toshiyuki |
Surface Electron Emission Lithography with Electron Source of High Emission Efficiency |
| Ohtomo, Akihiro |
Soft Patterning on Cylindrical Surface of Plastic Optical Fiber by Sliding Roller-Imprinting |
| Ohya, Kaoru |
Modeling of Charging Effect on Ion Induced Secondary Electron Emission from Nano-Structured Materials |
| Ohyi, Hideyuki |
Surface Electron Emission Lithography with Electron Source of High Emission Efficiency |
| Ok, Jong G. |
High Aspect-ratio Nanograting Formation on Liquid Resists by a Continuous Mold-assisted Direct-write Process
Invisibility at Visible Frequency Using Carbon Nanotube Carpet |
| Okada, M. |
Room-Temperature Nanoimprint Using Spin-Coated HSQ with High Boiling -Point Solvent |
| Okada, Makoto |
Mechanical Characteristics Of Nanostructures Fabricated By Nanoimprint
Annealing Dependence of Deposit Morphology for Fe-Ga Contained DLC Film Formed by FIB-CVD with Ferrocene Source Gas
Evaluation of Effect of Fluorine Additive Agent for Cationic UV-Nanoimprint Resin
Evaluation of PDMS Thin Layer as Antisticking Layer for UV Nanoimprinting
Evaluation of SiOx Containing UV Nanoimprint Resin
Effect Evaluation of Pentafluoropropane Gas for UV Nanoimprint Resin By Using Contact Angle Meter
Comparison of Surface Condition of Nanoimprint Antisticking Layers Formed by CVD And Dip-Coat Methods
Evaluation of Curing Process of UV Resin in PFP Gas Ambient by Photo-Differential Scanning Calorimetry
Adhesion and Frictional Forces Measurement by Scanning Probe Microscopy Under Pentafluoropropane Gas Atmosphere |
| Olynick, Deirdre L. |
Integrated Tool and Feature 2D Plasma Processing Simulator, Used for a Modeling of Cryogenic Plasma Etching of Silicon |
| Olynick, Deirdre |
Digital Planar Holograms Fabricated by Step and Repeat UV Nanoimprint Lithography
Fabrication of Nanoparticles Deposited Photonic Crystals
Nanoimprint Induced Block Copolymer Self-Assembly
Fabrication of Sub-20nm Nanochannels Integrated with Bowtie Nanoantenna
Cryogenic Silicon Process for Etching 15 nm Trenches and Beyond |
| Omoto, S. |
Room-Temperature Nanoimprint Using Spin-Coated HSQ with High Boiling -Point Solvent |
| Omoto, Shinya |
Evaluation of SiOx Containing UV Nanoimprint Resin |
| Ooms, T. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Oosumi, Takaki |
Dwell Time Adjustment for Focused Ion Beam Machining |
| Optica, Electon |
A Novel Low Energy Electron Imaging Technique for DNA Sequencing and Surface Analysis |
| Ore De Boddy, Marion |
The Fabrication of Shallow Co-axial P-N Junctions on Silicon Micro/Nanopillars for Solar Cell Applications |
| Orland, Henri |
Diblock Copolymer Ordering by NanoImprint Lithography |
| Orloff, Jon |
(Invited) MOTIS: Focused Ion Beams from Laser-Cooled Atoms
MOTIS-Based Focused Ion Beams in Two Flavors
Pitfalls in the Measurement of FIB Beam Size |
| Orlov, Alexei O. |
Novel method for Fabrication of Nanoscale Single-Electron Transistors: Electron Beam Induced Deposition of Pt and Atomic Layer Deposition of Tunnel Barriers |
| Orlov, Alexei |
Fabrication of Hybrid Silicon/Metal Island Single Electron Transistors |
| Orlova, Tatyana A. |
Novel method for Fabrication of Nanoscale Single-Electron Transistors: Electron Beam Induced Deposition of Pt and Atomic Layer Deposition of Tunnel Barriers |
| Osada, Akira |
Measurement of Surface Potential of Insulating Film on Conductive Substrate in a Scanning Electron Microscope |
| Otaki, Katsura |
On-Machine Wavefront Evaluation of the Full-Field Extreme Ultra-Violet Lithography Exposure System |
| Otis, Charles |
Pitfalls in the Measurement of FIB Beam Size |
| Otto, Martin |
Liquid Transfer Imprint Lithography: A New Route to Residual Layer Thickness Control |
| Ou, Fung-Soung |
A Molecule Trapping and SERS Sensing Device by 3-D Nanoimprint |
| Ou, Neil |
Tunable Waveguide-Plasmon Coupling in Silicon-Nitride Photonic Crystal Slabs with Double-coated Silver Films
Investigation of Surface Plasmons Coupling via Guided Modes in Metal/Dielectric/Metal Photonic Crystal Slabs |
| Ou, Niel |
Coupling of Surface Plasmons in Au Nanorings with Subwavelength Holes Array |
| Ovsyannikov, Vladimir Petrovich |
Fine-Focused Beams of Highly Charged Ions |
| Ovtchinnikov, Serguei |
High Accuracy Charged Beam Modeling in MICHELLE–eBEAM |
| Owen, James |
Multiscale Hydrogen Depassivation Lithography Using a Scanning Tunneling Microscope
Patterned Atomic Layer Epitaxy of Si / Si(001):H |
P |
| Padmore, Howard A. |
Plasmonic Light Trapping in Nanostructural Metal Surfaces |
| Pain, Laurent |
5kV Multi Electron Beam Lithography MAPPER Tool: From 32nm to 22nm Resolution Capability |
| Palma, Matteo |
DNA Assembly on Patterned Surfaces
Selective Biomolecular Nanoarrays for Parallel Single-Molecule Investigations |
| Palmarelli, Anna Laura |
Fabrication of Sub-20nm Nanochannels Integrated with Bowtie Nanoantenna |
| Parizi, Kosar |
DNA Concentrating by Electro-Kinetic Forces in Nano-bridge FET Array for DNA Hybridization Detection |
| Park, Byong Chon |
Transmission Electron Microscopy Study of Annealed Platinum Films Made by Ion Beam Induced Deposition |
| Park, Heyjin |
Direct-Write Lithography of Sub-10nm Features on Metallorganic Resists Using a Helium Ion Microscope |
| Park, Hui Joon |
High Aspect-ratio Nanograting Formation on Liquid Resists by a Continuous Mold-assisted Direct-write Process
Solar Energy Harvesting Photonic Color Filters |
| Park, Jiwoong |
Fabricating Arrays of Graphene Mechanical Resonators with High, Size-Dependent Quality Factors |
| Park, Kyoo-Chul (Kenneth) |
Fabrication of Subwavelength High Aspect-Ratio Tapered Fused Silica Nanostructures for Transparent Photophilic Material |
| Park, Kyung Jin |
Transmission Electron Microscopy Study of Annealed Platinum Films Made by Ion Beam Induced Deposition
Fabrication of Plasmonic Nano-Pore Array for Nanobio Sensor |
| Park, Myoung Jin |
Fabrication of Plasmonic Nano-Pore Array for Nanobio Sensor |
| Park, Nam Kyoo |
Fabrication of Plasmonic Nano-Pore Array for Nanobio Sensor |
| Park, Sang-Min |
Nanoimprint Induced Block Copolymer Self-Assembly |
| Park, Woon Ik |
Extensive Tunability of Self-Assembled Block Copolymer Patterns for Nanolithography |
| Park, Yun Chang |
Transmission Electron Microscopy Study of Annealed Platinum Films Made by Ion Beam Induced Deposition |
| Parpia, Jeevak |
Fabricating Arrays of Graphene Mechanical Resonators with High, Size-Dependent Quality Factors |
| Pasquali, Matteo |
Single Walled Nanotube (SWNT) Fiber Field Emission Cathodes |
| Patel, Amil |
3D Fabrication by Stacking Pre-patterned, Rigidly-held Membranes |
| Patel, Kanaiyalal |
Pattern Transfer of Block Copolymer Template from Density Multiplication on Chemically Patterned Surface |
| Patlolla, Anitha |
A Parametric Study of Electrophoretic Deposition of Single Wall Nanotubes In Nanoscale Windows |
| Paul, Philip C. |
Thermo-Mechanical Probe Lithography at 500 kHz Pixel Rate |
| Pauliac-Vaujour, Sébastien |
Development of a 13 Silicon Suspended Stacked Nanowire Architecture for Gate-All-Around (GAA) Field Effect Transistors |
| Pease, Fabian |
Optimizing the Performance of Keyhole Diffraction Microscopy
Detection and Characterization of Buried Structures by Exploring Patterns in Angle- and Energy- Filtered Back-Scattered Electrons
Iterative Phase Recovery Using Wavelet Domain Constraints |
| Pease, R. Fabian |
Crisp, High Aspect-Ratio, C-Shaped Nanoapertures Fabricated in Evaporated Aluminum Using Focused Helium Ions |
| Pease, Roger Fabian |
Resistivity Changes Due to Environmental Contamination In Films Used For Charge Reduction in Electrostatic Electron Optics |
| Peckerar, Martin |
Zero-bias Rectifying Performance Enhancement of MIM Tunneling Diodes by Geometric Field Enhancement and Boiling Water Oxidation
Improving the Zero Bias Performance of MIM Tunneling Diodes by Introducing Traps in the Barrier |
| Pehrsson, Pehr |
Gas Sensors Based on Vertically Aligned Nanowire Arrays |
| Pelligrino, Paolo |
Block-Copolymer Thin Film Templates for Nanoscale Fabrication Processes: Reactive Ion Etching, E-Beam Deposition and Ion Beam Synthesis |
| Peng, Qing |
Improving PMMA Etch Resistance using Sequential Infiltration Synthesis |
| Peng, Yue |
(Invited) Creative Metrology Development for EUVL: Flare and Out-of-Band Qualification |
| Penzo, Erika |
DNA Assembly on Patterned Surfaces |
| Perego, Michele |
Block-Copolymer Thin Film Templates for Nanoscale Fabrication Processes: Reactive Ion Etching, E-Beam Deposition and Ion Beam Synthesis |
| Perez-Martinez, Carla |
Ionic Liquid Ion Sources as a Unique and Versatile Option in Focused Ion Beam Applications
Filtering and Energy Characterization of Ion Species from Ionic Liquid Ion Sources for Focused Ion Beam Applications |
| Peric, Oliver |
Drawing with Nanostencils on Flexible Substrates |
| Peroz, Christophe |
Digital Planar Holograms Fabricated by Step and Repeat UV Nanoimprint Lithography
Fabrication of Digital Planar Holograms for Brighter Power Laser Diodes |
| Peschel, Andreas |
The Influence of Surface Patterning on Bacterial Growth Behavior |
| Peter, Rödiger |
Focused Beam Induced Etching - Making the Right Choice Between Ions and Electrons |
| Peterson, D.H. |
High Precision FIB Fabrication of Customizable AFM Probes |
| Petillo, John |
High Accuracy Charged Beam Modeling in MICHELLE–eBEAM |
| Peto, Lloyd |
Novel Nanopatterning Strategies for Focused Ion Beam Lithography of Nanophotonic Structures
Ion Beam Lithography for Sub-50 nm Patterning of Metal Mold Inserts and Replication by Injection Molding |
| Petric, Paul |
Resistivity Changes Due to Environmental Contamination In Films Used For Charge Reduction in Electrostatic Electron Optics |
| Petrillo, Karen |
10 nm node Pattern Transfer Development Using an EUV, DUV and Electron Beam Sensitive Acrylate-Based Resist |
| Pettersson, Håkan |
Metal-Assisted Chemical Etching of Si for Fabrication of Nanoimprint Stamps |
| Phillips, Matthew |
Growth of SiOx Nano-Pillars Using Electron Beam Induced Deposition in an Environmental SEM |
| Pianetta, Piero |
Optimizing the Performance of Keyhole Diffraction Microscopy
Resistivity Changes Due to Environmental Contamination In Films Used For Charge Reduction in Electrostatic Electron Optics
Iterative Phase Recovery Using Wavelet Domain Constraints |
| Piaszenski, Guido |
Dimensional Characterization Of Waveguide Coupling Device Structures Fabricated By The Fixed Beam Moving Stage (FBMS) Electron Beam Lithography |
| Piccirillo, Lucio |
High Acceleration Voltage Characterization of SML Electron Beam Resist for Ultra High Aspect Ratio Nano-Lithographic Applications |
| Pick, T. E. |
(Invited) Dynamic Single Particle Probes of Temperature and Viscosity in Aqueous Media |
| Pick, Teresa |
Nanoimprint Induced Block Copolymer Self-Assembly |
| Pickard, Daniel |
Direct-Write Lithography of Sub-10nm Features on Metallorganic Resists Using a Helium Ion Microscope
Direct Patterning of Sub-10 nm Optical Apertures with a Helium Ion Microscope |
| Piner, Richard |
Patterned Graphene Oxide Films by a Simple Method |
| Pipelka, Friedrich |
Ion Beam Lithography for Sub-50 nm Patterning of Metal Mold Inserts and Replication by Injection Molding |
| Podraza, Nikolas |
Process-Structure-Property Relationship of Nanocrystalline Vanadium Oxide Thin Films Used in Uncooled Infrared Focal Plane Arrays |
| Poliakov, Pavel |
Impact of EUV Lithography Line Edge Roughness on 16 nm Memory Generation |
| Polsky, R. |
Structural Influence of 3D Pyrolyzed Carbon Electrodes on Electrochemical Behavior |
| Polyakov, Aleksandr |
Plasmonic Light Trapping in Nanostructural Metal Surfaces |
| Pont, Jérémy |
Top-Down Approaches for the Fabrication of Titanium Nanostructures |
| Post, P.C. |
Parallel Electron-Beam-Induced Deposition using a Multi- Beam Scanning Electron Microscope |
| Postma, S. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Povinelli, Michelle |
(Invited) Applications of Nanofabrication: Structural Absorption Engineering and Optomechanically-Responsive Photonic Circuits |
| Pozzato, Alessandro |
Fabrication of Nickel Diffractive Phase Elements for X-Ray Microscopy at 8 keV Photon Energy |
| Prabhu, Vivek |
Nanoparticle Modified Developers for Enhanced Dissolution Control Studied by Simultaneous Light Reflectance and Quartz Crystal Microbalance Techniques |
| Prasciolu, Mauro |
Fabrication of Nickel Diffractive Phase Elements for X-Ray Microscopy at 8 keV Photon Energy |
| Pret, Alessandro Vaglio |
Impact of EUV Lithography Line Edge Roughness on 16 nm Memory Generation |
| Provine, J |
Atomic Layer Deposition Encapsulation of Carbon Nanotubes with Al2O3 |
Q |
| Qi, Minghao |
Equivalent Chirped Bragg Gratings on SOI Using Optical Lithography |
| Qiu, Zhi-Jun |
Selective Photochemical Reduction of Silver on Nanoembossed Ferroelectric Nanowires |
| Qu, Xin-Ping |
Large Area Fast Patterning in High Resolution by a Combined Near-Field Exposure and Reversal Imprint Lithography |
| Que, Long |
Fabrication of Carbon Nanotube Film-Piezoelectric (CNF-PZT) Microcantilevers for Energy Harvesting Application
Nanocomposite-Beam Based Microresonator Fabricated by Combining Microlithography And Layer-By-Layer Nanoassembly |
R |
| Rack, Philip |
In situ Optical Imaging and Laser Processing in the SEM/FIB: A True EIPBN System
The Directed Assembly of Metallic Nanoparticle Chains by Pulsed Laser Induced Dewetting and Nanolithography |
| Rack, Philip D. |
High Growth Efficiencies in Helium Ion Beam Induced Deposition at Short Beam Dwell Times |
| Rad, Leili Baghaei |
Optimizing the Performance of Keyhole Diffraction Microscopy
Iterative Phase Recovery Using Wavelet Domain Constraints |
| Rajauria, S |
(Invited) Electromagnetic Radiation Pressure on Left- and Right-handed Dissipative Media |
| Randall, John |
Multiscale Hydrogen Depassivation Lithography Using a Scanning Tunneling Microscope
Patterned Atomic Layer Epitaxy of Si / Si(001):H |
| Randolph, Steven |
A Comparison of Xe+ Plasma FIB Technology with Conventional Gallium LMIS FIB |
| Ranganath, Teki |
Native Blank Defect Analysis for the Study of Printability |
| Rangelow, Ivo W. |
Self-Actuated Piezoresistive 512-Cantilever Arrays for Large-Area Imaging and Manipulation
Scanning Proximal Probe Lithography (SPPL) with Sub-10nm Resolution on Calix[4]resorcinarene
Ultrafast Cantilever for High Speed Scanning Force Microscopy
Integrated Tool and Feature 2D Plasma Processing Simulator, Used for a Modeling of Cryogenic Plasma Etching of Silicon |
| Rangelow, Ivo W |
Micromachined Video Rate AFM Silicon Cantilever
Single Crystal Silicon Nanowires used as Cantilever for Femtonewton Detection |
| Raub, Alex |
Evolution of Critical Dimension and Line Edge Roughness During Block-Copolymer Nano-Patterning
Large Area 3D Helical Photonic Crystals |
| Raurell, Arnau Pou |
Block-Copolymer Thin Film Templates for Nanoscale Fabrication Processes: Reactive Ion Etching, E-Beam Deposition and Ion Beam Synthesis |
| Reed, Mark |
Subwavelength Optical Lithography of Complex Nanopatterns by Diffraction |
| Reimhult, Erik |
Nanomenhirs for Surface-based Biosensing of Lipid Structures |
| Reinspach, Julia |
A New High-Aspect-Ratio Diamond Dry-Etch Process for Hard X-Ray FEL Radiation Zone Plates
Towards High-Resolution High-Diffraction-Efficiency Soft X-Ray Zone Plate Lenses: Sub-15 Nm Pattern Transfer to Tungsten Using HSQ and Cryogenic RIE |
| Ren, Yujie |
Patterned Graphene Oxide Films by a Simple Method |
| Ribaya, Bryan |
Carbon Nanotube Field Emission Electron Gun Microassembly for Maskless Lithography |
| Richter, Karola |
Fabrication of Silicon Template With Smooth Tapered Side Wall for Nanoimprint Lithography |
| Ricketts, David |
Localized Thermal Modification of Surfaces via Electron Bombardment from an STM Tip
High Current Pulse Generation for Thermal Surface Modification Using Standard STM |
| Rietzler, Florian |
Focused Electron Beam Induced Surface Activation: A Novel Lithographic Method to Fabricate Nanostructures |
| RIKEN, ASI |
Generation of Highly Coherent, Bright 13 nm Light with Phase-Matched High-Order Harmonics for Coherent Scatterometry Microscope |
| Rio, David |
5kV Multi Electron Beam Lithography MAPPER Tool: From 32nm to 22nm Resolution Capability |
| Rissman, Paul |
Hard Stamp Processes for the EVG 620 Full Field Nanoimprint System |
| Ro, Hyun Wook |
Mapping Resist Flow into Nanoscale Channels During Nanoimprint Lithography |
| Ro, Hyun-Wook |
The Effects of Thin Films and Confinement on Thermal Nanoimprint Lithography Patterning |
| Roberts, Nick |
In situ Optical Imaging and Laser Processing in the SEM/FIB: A True EIPBN System |
| Robinson, Jeremy |
Tuning Graphene Nanomechanical Resonators |
| Rocca, Jorge |
Table Top Nanopatterning by De-Magnified Talbot Effect |
| Roediger, Peter |
Removal of FIB-Induced Amorphization and Gallium Contamination by Focused-Electron-Beam-Induced-Etching
Local, Direct-Write, Damage-Free Thinning of Germanium Nanowires
Etching of Germanium by Chlorine Gas using a Focused Electron Beam |
| Rogers, John |
(Invited) Large-Area Negative Index Metamaterials and Plasmonic Devices by Printing and Molding |
| Rognin, Etienne |
Viscoelastic Properties Measurements of Thin Polymer Films from Reflow of Nanoimprinted Patterns |
| Roll, Mark |
Nanoparticle Modified Developers for Enhanced Dissolution Control Studied by Simultaneous Light Reflectance and Quartz Crystal Microbalance Techniques |
| Roman, Patrick |
Fabrication of an Optical Magnetic Mirror by E-Beam Writing |
| Rooij, Nico de |
Self Aligned Concentric Nanostructures Formed by E-beam Overexposure of PMMA and Single Post Processing Steps |
| Ropp, Chad |
Development of Metal Etch Mask by Single Layer Lift-Off for Silicon Nitride Photonic Crystals |
| Rosenbluth, Alan |
(Invited) Computational Lithography: Exhausting Optical System Limits Through Intensive Optimization |
| Rosenmann, Daniel |
Fabrication of High-Aspect-Ratio Nanopores by Interference Lithography |
| Ross, Caroline A. |
High Throughput Sub-10-nm Fabrication Based on Templated Self-Assembly of Block Copolymer |
| Ross, Caroline |
Multi-Layer Block Copolymer Self-Assembled Structures Using Tilted Pillar Templates
Spatial-Frequency Doubling Below the Block Copolymer Period by Templated Self-Assembly |
| Rouse, John |
E-beam Energy Dissipation in Complex Solid Targets |
| Rouxinol, Francisco |
Investigation of Contacts Between Metal and Few Layer Graphene Using Focused Ion Beam Cross-Sectioning |
| Roy, Madhumita |
Fabrication of an Optical Magnetic Mirror by E-Beam Writing |
| Ruchhoeft, Paul |
Characterization of a Saddle-Field Ion Source for Proximity Lithography
Suspended, Micron-scale Corner Cube Retroreflectors as Ultra-bright Optical Labels
Graded Bit Patterned Media via Helium Ion Irradiation |
| Rue, Chad |
A Comparison of Xe+ Plasma FIB Technology with Conventional Gallium LMIS FIB |
| Ruiz, Ricardo |
Directed Self-assembly with Density Multiplication of POSS-Containing Block Copolymer via Controlled Solvent Annealing |
| Ruiz-Vargas, Carlos |
Fabricating Arrays of Graphene Mechanical Resonators with High, Size-Dependent Quality Factors |
| Ruiz, Ricardo |
Pattern Transfer of Block Copolymer Template from Density Multiplication on Chemically Patterned Surface |
| Ruoff, Rodney |
Patterned Graphene Oxide Films by a Simple Method |
| Russell, Thomas |
Solvent Annealing Conbined with Surface Resconstruction towards the Fabrication of Silicon Nanodots with Areal Density beyond 1 Teradots/Inch2 |
| Ryu, Geunmin |
Zero-bias Rectifying Performance Enhancement of MIM Tunneling Diodes by Geometric Field Enhancement and Boiling Water Oxidation |
S |
| Saha, Shimul |
Micro-Fabrication of Terahertz Metamaterial Absorbers |
| Sahli, Billel |
Direct Top-Down Ordering of Diblock Copolymers Through Nanoimprint Lithography |
| Sakamoto, Junji |
High Aspect Ratio Fine Pattern Transfer Using Novel Mold by Nanoimprint Lithography
Novel Nanoimprint Lithography Using Dispersed Molecular Weights |
| Salaun, Mathieu |
Direct Top-Down Ordering of Diblock Copolymers Through Nanoimprint Lithography |
| Salaün, Mathieu |
Tailored Synthesized Silsesquioxane Based Resists For UV-Assisted Nanoimprint Lithography |
| Salomon, Sven |
Wafer Scale Integration Of Oriented Carbon Nanotubes Interconnects |
| Samantaray, Chandan |
Electron-Beam Induced Deposition of Transition Metals from Bulk Liquids: Ag, Cr, and Ni |
| Sanabia, Jason |
Dimensional Characterization Of Waveguide Coupling Device Structures Fabricated By The Fixed Beam Moving Stage (FBMS) Electron Beam Lithography
Novel Nanopatterning Strategies for Focused Ion Beam Lithography of Nanophotonic Structures
Chip Scale Focussed Electron Beam Induced Etching of a Silicon Nitride Membrane with Unique Beam Writing Strategies. |
| Sanders, Dan |
(Invited) Block Copolymer Self-assembly as an Extension of Lithography: Status, Applications, Current Research and Future Directions |
| Sanderse, M. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Sanford, Colin |
Fabrication of Nanopores Using a Helium Ion Microscope
Scanning Transmission Ion Microscopy with the Helium Ion Microscope – Modeling and Selected Applications |
| Sang, Bruno Lee |
Top-Down Approaches for the Fabrication of Titanium Nanostructures |
| Sanii, Babak |
Single Crystal Silicon Nanowires used as Cantilever for Femtonewton Detection |
| Sannomiya, Takumi |
Nanomenhirs for Surface-based Biosensing of Lipid Structures |
| Sarov, Yanko |
Self-Actuated Piezoresistive 512-Cantilever Arrays for Large-Area Imaging and Manipulation
Ultrafast Cantilever for High Speed Scanning Force Microscopy |
| Satake, Shin-ichi |
Dwell Time Adjustment for Focused Ion Beam Machining
Surface Deformation Of Ga+ Ion Collision Process via Molecular Dynamics Simulation |
| Satija, Sushil |
Mapping Resist Flow into Nanoscale Channels During Nanoimprint Lithography |
| Savenko, A. |
High Precision FIB Fabrication of Customizable AFM Probes |
| Savu, Veronica |
Drawing with Nanostencils on Flexible Substrates |
| Sawada, Yohei |
Evaluation of Curing Process of UV Resin in PFP Gas Ambient by Photo-Differential Scanning Calorimetry |
| Schabes, Manfred |
Fabrication and Recording Performance of Bit Patterned Media |
| Schäfer, Christian |
Fabrication of Plasmonic Nanostructures by Etch Mask Transfer |
| Schamm-Chardon, Sylvie |
Block-Copolymer Thin Film Templates for Nanoscale Fabrication Processes: Reactive Ion Etching, E-Beam Deposition and Ion Beam Synthesis |
| Schander, Andreas |
Selective Profile Transformation of Electron-Beam Exposed Multilevel Resist Structures Based on a Molecular Weight Dependent Thermal Reflow |
| Schardein, Gregory |
Electron-Beam Induced Deposition of Transition Metals from Bulk Liquids: Ag, Cr, and Ni |
| scheer, Hella-chirstin |
Experimental Analysis For Process Control In Hybrid Lithography (T-NIL + UV-L) |
| Scheer, Hella-Christin |
Low Temperature Thermal Imprint via Frequency Assistance |
| Scherer, Axel |
High Acceleration Voltage Characterization of SML Electron Beam Resist for Ultra High Aspect Ratio Nano-Lithographic Applications |
| Schiavone, Patrick |
Challenges in Data Treatment and Proximity Effects Correction for Massively Parallel Electron Lithography
Comparison of PSF for non CAR and CAR Resists in E-Beam Lithography |
| Schift, Helmut |
Combining Nanoimprint Lithography and a Molecular Weight Selective Thermal Reflow for the Generation of Mixed 3-D Structures
Selective Profile Transformation of Electron-Beam Exposed Multilevel Resist Structures Based on a Molecular Weight Dependent Thermal Reflow |
| Schirmer, Michael |
Focused Electron Beam Induced Surface Activation: A Novel Lithographic Method to Fabricate Nanostructures
Addressing the Fabrication of Titanium Oxide Nanostructures by Electron Beam Induced Deposition |
| Schlachter, Florian |
Replication Of Undercut Trenches for Water Based Lift-Off Process by Residue-Free UV-NIL |
| Schleunitz, Arne |
Combining Nanoimprint Lithography and a Molecular Weight Selective Thermal Reflow for the Generation of Mixed 3-D Structures
Selective Profile Transformation of Electron-Beam Exposed Multilevel Resist Structures Based on a Molecular Weight Dependent Thermal Reflow |
| Schmid, Jens |
Electron-Beam Lithography of Photonic Waveguides: Measurement of the Effect of Field Stitching Errors on Optical Performance and Evaluation of a New Compensation Method |
| Schmidt, Mike |
Fine-Focused Beams of Highly Charged Ions |
| Scholl, Andreas |
Time-Lapse Imaging of Thermally-Driven Signal Propagation in Nanomagnetic Logic |
| Schuck, P. James |
Elucidating Effects of Nanoscale Structural Variations on Local Plasmonic Modes via Photon Localization Microscopy |
| Schulz, Martin |
A Model Based Hybrid Proximity Effect Correction Scheme Combining Dose Modulation and Shape Adjustments |
| Schwind, Greg |
MOTIS-Based Focused Ion Beams in Two Flavors |
| Schwind, Gregory |
(Invited) MOTIS: Focused Ion Beams from Laser-Cooled Atoms |
| Scipioni, Larry |
Comparative Study of Nano-Pillar Growth by Helium Ion and Gallium Ion Focused Beams
Characterization of Beam-Induced Chemical Structures in the Helium Ion Microscope |
| Seguini, Grabriele |
Block-Copolymer Thin Film Templates for Nanoscale Fabrication Processes: Reactive Ion Etching, E-Beam Deposition and Ion Beam Synthesis |
| Seichepine, Florent |
Wafer Scale Integration Of Oriented Carbon Nanotubes Interconnects |
| Shapiro, Benjamin |
Simultaneous Positioning and Orienting of a Single Nano-object Using Flow Control |
| Sheetz, Michael |
A New Approach for Measuring Protrusive Forces in Cells |
| Shen, Zexiang |
Fabrication of Sub-10-Nm-Gapped Gold Structures For Plasmonic Applications |
| Shen, Zhenkui |
Fabrication of Complex Nanostructures of P(VDF-TrFE) by Dual Step Hot-embossing
Selective Photochemical Reduction of Silver on Nanoembossed Ferroelectric Nanowires |
| Sherlock, Tim |
Characterization of a Saddle-Field Ion Source for Proximity Lithography
Suspended, Micron-scale Corner Cube Retroreflectors as Ultra-bright Optical Labels |
| Shi, Haofei |
Invisibility at Visible Frequency Using Carbon Nanotube Carpet |
| Shiao, M.H. |
Studies in Synthetic Antiferromagnetically Coupled Ring Array Magnets via Hysteresis Loops |
| Shibahara, Masahiko |
Surface Deformation Of Ga+ Ion Collision Process via Molecular Dynamics Simulation |
| Shiffler, Donald |
Single Walled Nanotube (SWNT) Fiber Field Emission Cathodes |
| Shokouhi, Babak |
High Sensitivity Electron Beam Lithography Using ZEP Resist and MEK:MIBK Developer |
| Shop, Nano/MEMS |
Studies in Synthetic Antiferromagnetically Coupled Ring Array Magnets via Hysteresis Loops |
| Shtokhamer, Roman |
High Accuracy Charged Beam Modeling in MICHELLE–eBEAM |
| Shulaker, Max |
Atomic Layer Deposition Encapsulation of Carbon Nanotubes with Al2O3 |
| Shyu, JH |
Study of Optical Transmittance Through Tack-Typed and Goblet-Typed Dielectric Pillar Arrays |
| Shyu, Jia-Hong |
Tunable Waveguide-Plasmon Coupling in Silicon-Nitride Photonic Crystal Slabs with Double-coated Silver Films
Investigation of Surface Plasmons Coupling via Guided Modes in Metal/Dielectric/Metal Photonic Crystal Slabs
Coupling of Surface Plasmons in Au Nanorings with Subwavelength Holes Array |
| Siddiqui, Meena |
Near-Field 3D Lithography Using Self-Assembled Nanospheres |
| Sijbrandij, Sybren |
Scanning Transmission Ion Microscopy with the Helium Ion Microscope – Modeling and Selected Applications |
| Silver, Richard |
Fabrication of Nanoscale Structures on Micro Patterned Silicon (100) Surfaces |
| Sim, Jae In |
Enhancement of Light Extraction Efficiency in n-GaN Patterned Vertical Light-Emitting Diodes using Nanosphere Lithography |
| Simon, Waid |
Focused Beam Induced Etching - Making the Right Choice Between Ions and Electrons |
| Sinclair, M.B. |
Fabrication of Multilayer 3D Micron-Scale Metamaterials |
| Sivakumar, Sam |
Moore for Less: Lithography for the 15nm Node and Beyond |
| Sixt, Pierre |
Development of a 13 Silicon Suspended Stacked Nanowire Architecture for Gate-All-Around (GAA) Field Effect Transistors |
| Skinner, Jack L. |
Evolution of Critical Dimension and Line Edge Roughness During Block-Copolymer Nano-Patterning
Coupled Planar-Localized Surface Plasmon Resonance Device by Block-Copolymer and Nanoimprint Lithography Fabrication Methods |
| Skinner, Jack |
The Fabrication of Shallow Co-axial P-N Junctions on Silicon Micro/Nanopillars for Solar Cell Applications |
| Smetana, Alexander |
Tip Based Lithography for Biocompatible Materials |
| Smith, Bruce |
Image-Based EUVL Aberration Metrology
Image Invariant and Information Content Comparisons across Sub-32nm Technologies |
| Smith, Daryl A. |
High Growth Efficiencies in Helium Ion Beam Induced Deposition at Short Beam Dwell Times |
| Smith, Henry |
3D Fabrication by Stacking Pre-patterned, Rigidly-held Membranes
3D Nanostructures by Stacking Pre-Patterned, Fluid-Supported Single-Crystal Si Membranes
Secondary-Electron Signal Levels of Self-Assembled Monolayers for Spatial-Phase-Locked Electron-Beam Lithography
Equivalent Chirped Bragg Gratings on SOI Using Optical Lithography |
| Smith, Joshua |
Localized Thermal Modification of Surfaces via Electron Bombardment from an STM Tip |
| Smith, Leslie |
Tantalum Electro-Mechanical Systems For Low Frequency Sensing In Biomimetical Applications |
| Snider, Gregory L. |
Novel method for Fabrication of Nanoscale Single-Electron Transistors: Electron Beam Induced Deposition of Pt and Atomic Layer Deposition of Tunnel Barriers |
| Snider, Gregory |
Fabrication of Hybrid Silicon/Metal Island Single Electron Transistors |
| Snow, Eric |
Tuning Graphene Nanomechanical Resonators |
| Solak, Harun |
Demonstration of Full 4-inch Patterning with Displacement Talbot Lithography
High-Contrast Images Obtained with Displacement Talbot Lithography |
| Soles, Christopher |
Mapping Resist Flow into Nanoscale Channels During Nanoimprint Lithography
The Effects of Thin Films and Confinement on Thermal Nanoimprint Lithography Patterning
Characterization of Cross Sectional Profile of Epitaxially Assembled Block Copolymer Domains using Transmission Small Angle X-Ray Scattering |
| Soman, Joel |
Fabrication of Carbon Nanotube Film-Piezoelectric (CNF-PZT) Microcantilevers for Energy Harvesting Application |
| Somu, Sivasubramanian |
Plasmonic Nanopillar Arrays for Enhanced Biosensing, Spectroscopy and Optical Trapping |
| Son, Jeong Gon |
Multi-Layer Block Copolymer Self-Assembled Structures Using Tilted Pillar Templates
High Throughput Sub-10-nm Fabrication Based on Templated Self-Assembly of Block Copolymer |
| Son, Sung Hun |
Enhancement of Light Extraction Efficiency in n-GaN Patterned Vertical Light-Emitting Diodes using Nanosphere Lithography |
| Soulan, Sébastien |
Challenges in Data Treatment and Proximity Effects Correction for Massively Parallel Electron Lithography |
| Sovernigo, Enrico |
Fabrication of Nickel Diffractive Phase Elements for X-Ray Microscopy at 8 keV Photon Energy |
| Spreu, Christian |
Combining Nanoimprint Lithography and a Molecular Weight Selective Thermal Reflow for the Generation of Mixed 3-D Structures |
| Stach, Eric |
Resolution Limits of 200 keV Electron-Beam Lithography Using Aberration-Corrected STEM |
| Stadler, Andrea |
DNA Arrays with Site-Specific Labels |
| Stadlober, Barbara |
Replication Of Undercut Trenches for Water Based Lift-Off Process by Residue-Free UV-NIL |
| Staufer, Urs |
Deposition and Structuring of Ag/AgCl Electrodes into a Closed Polymeric Microfluidic System for Electroosmotic Pumping |
| Steele, Adam |
(Invited) MOTIS: Focused Ion Beams from Laser-Cooled Atoms
MOTIS-Based Focused Ion Beams in Two Flavors |
| Stein, Aaron |
Table Top Nanopatterning by De-Magnified Talbot Effect |
| Stein, Aaron |
Long Range Magnetic Ordering in Nanofabricated Artificial Spin-Ice Arrays |
| Stein, Gila |
Characterization of Cross Sectional Profile of Epitaxially Assembled Block Copolymer Domains using Transmission Small Angle X-Ray Scattering |
| Steinberg, Christian |
Experimental Analysis For Process Control In Hybrid Lithography (T-NIL + UV-L) |
| Steinhaus, Chip A. |
Coupled Planar-Localized Surface Plasmon Resonance Device by Block-Copolymer and Nanoimprint Lithography Fabrication Methods |
| Steinrück, Hans-Peter |
Focused Electron Beam Induced Surface Activation: A Novel Lithographic Method to Fabricate Nanostructures
Addressing the Fabrication of Titanium Oxide Nanostructures by Electron Beam Induced Deposition |
| Stepanova, Maria |
Developer-Free Direct Patterning on PMMA by Low Voltage Electron Beam Lithography
Density Multiplication of Nanostructures Fabricated by Ultra Low Voltage Electron Beam Lithography Using PMMA as Positive and Negative Tone Resist
Comparison Between ZEP and PMMA Resists for Nanoscale Electron Beam Lithography Experimentally and by Numeric Modeling
Nano-Patterning of PMMA on Insulating Surfaces With Various Anti-Charging Schemes Using 30 Kev Electron Beam Lithography
Nanofabrication of Silicon Carbon Nitride Cantilevers – Comparison of PMMA and HSQ Based Processes |
| Stern, L. |
Patterning of Graphene on SiC using a He ion Nanobeam |
| Stern, Lewis |
Fabrication of Nanopores Using a Helium Ion Microscope
Scanning-Neon-Ion-Beam Lithography
Comparative Study of Nano-Pillar Growth by Helium Ion and Gallium Ion Focused Beams |
| Stipe, Barry |
Fabrication and Testing of 1.5 Terabit/in2 Bit-Patterned Media for Thermally-Assisted Magnetic Recording. |
| Stock, Hans-Juergen |
A Model Based Hybrid Proximity Effect Correction Scheme Combining Dose Modulation and Shape Adjustments |
| Stock, Hans-Jürgen |
Chemically Amplified Resist Modeling in High Compact Model Format for Photolithography Process Simulation |
| Strobel, Sebastian |
(Invited) Sub-10-nm Beam-Based Lithography and Applications
In-situ Study of Rate of Hydrogen Silsesquioxane Dissolution in both Alkaline and Electrochemical Systems |
| Sturtevant, John |
(Invited) Challenges for Patterning Process Simulation Models Applied to Large Scale |
| Su, Dong |
Resolution Limits of 200 keV Electron-Beam Lithography Using Aberration-Corrected STEM |
| Sue, Hung-Jue |
Template-Assisted Growth of ZnO Nanorod Arrays |
| Sugiyama, Kiyotaka |
Development of On-Chip Micro Vacuum System with Gas-Liquid Phase Transition |
| Sun, Jie |
Equivalent Chirped Bragg Gratings on SOI Using Optical Lithography |
| Sun, Peter |
DNA Arrays with Site-Specific Labels |
| Sun, Yong |
Subwavelength Optical Lithography of Complex Nanopatterns by Diffraction |
| Suthar, Kamlesh J. |
Patterning of Poly(N-Isopropylacrylamide) Hydrogel Nano Structures Using Soft X-Ray and EUV Lithography |
| Sutter, Eli |
Focused ion Beam Milling Directed by BASIC-Like Code |
| Suzuki, Hiroaki |
Master Pattern Formation of Bit-Patterned Media by E-Beam Direct Drawing |
| Suzuki, Ryosuke |
Shrinkage Pattern Correction (SPC) in Nanoimprint Lithography |
| Szeghalmi, Adriana |
Double Patterning Technology: Process Simulation and Fabrication of Optical Elements |
| Szymanska, Joanna |
Fabrication of Sub-15nm Nanostructures via Metal Lift-Off or Silicon Etching |
T |
| Tabdanov, Erdem |
Micro and Nano Pillar Assay for T cell Activation |
| Taboryski, Rafael |
Fabrication of Nanostructures on Double-Curved PMMA Surfaces by Thermal Imprint with PDMS Stamp |
| Tada, Kazuhiro |
Atomic Step Pattering in Nanoimprint Lithography : Molecular Dynamics Study |
| Tada, Yasuhiko |
Directed Self-assembly with Density Multiplication of POSS-Containing Block Copolymer via Controlled Solvent Annealing |
| Takagi, Hideki |
Soft Patterning on Cylindrical Surface of Plastic Optical Fiber by Sliding Roller-Imprinting |
| takagi, takamitsu |
A Gradually Shifted Surface Plasmon Resonance with a Controlled Diameter of a Nano-Hole Structure by Self-Assembly Technique |
| Takahashi, Junki |
Deterioration Evaluation of Release Coated Surface for Nanoimprint by Macro Optical Inspection Method |
| Takami, Daiki |
Modeling of Charging Effect on Ion Induced Secondary Electron Emission from Nano-Structured Materials |
| Takamura, Yuzuru |
Development of On-Chip Micro Vacuum System with Gas-Liquid Phase Transition |
| Takashima, Yuzuru |
Crisp, High Aspect-Ratio, C-Shaped Nanoapertures Fabricated in Evaporated Aluminum Using Focused Helium Ions
Iterative Phase Recovery Using Wavelet Domain Constraints |
| Takenaka, Mikihito |
Directed Self-assembly with Density Multiplication of POSS-Containing Block Copolymer via Controlled Solvent Annealing |
| Takeuchi, Hidekazu |
Evaluation of Effect of Fluorine Additive Agent for Cationic UV-Nanoimprint Resin |
| Takizawa, Masahiro |
Multi Column Cell Writer Architecture and a Correction Technique for Consistent CD Uniformity Between Column Cells |
| Tamaru, Shingo |
High Current Pulse Generation for Thermal Surface Modification Using Standard STM |
| Tan, Shida |
Neon GFIS Nanomachining Applications –A Study Of The Machining Properties of Neon for Semiconductor FA and Circuit Edit |
| Tanaka, Hiroshi |
Master Pattern Formation of Bit-Patterned Media by E-Beam Direct Drawing |
| Tang, Cha-Mei |
Fabrication of High-Aspect-Ratio Nanopores by Interference Lithography |
| Taniguchi, Jun |
Roll Diameter Amplification Method Using Direct Transfer of Fine Patterned Small Roll Mold Fabricated by Electron Beam Lithography
Deterioration Evaluation of Release Coated Surface for Nanoimprint by Macro Optical Inspection Method
Fabrication of the Seamless Roll Mold Using Inorganic Electron Beam Resist with Post Exposure Bake
Dwell Time Adjustment for Focused Ion Beam Machining
Surface Deformation Of Ga+ Ion Collision Process via Molecular Dynamics Simulation |
| Taniguchi, Yukio |
Demonstration of Full 4-inch Patterning with Displacement Talbot Lithography |
| Tao, Li |
Nanofabrication Down to 10 nm on a Plastic Substrate |
| Tarucha, Seigo |
(Invited) Micro-Magnet Techniques for Implementing Spin Qbits with Quantum Dots |
| Tech, Seoul |
Investigation of Deposition Profile For Metal Structure Using Focused Ion Beam |
| Tedesco, J.L. |
Patterning of Graphene on SiC using a He ion Nanobeam |
| Teixeira, Fernando |
Investigation of Contacts Between Metal and Few Layer Graphene Using Focused Ion Beam Cross-Sectioning |
| Tennant, Don |
Improved Time Dependent Performance of HSQ Resist Using a Spin on Top Coat |
| Tervo, Jani |
Surface-Relief Polarization Gratings for Visible Light |
| Textor, Marcus |
Nanomenhirs for Surface-based Biosensing of Lipid Structures |
| Thébault, Pascal |
Diblock Copolymer Ordering by NanoImprint Lithography |
| Thirumalai, Venkatesan |
Direct-Write Lithography of Sub-10nm Features on Metallorganic Resists Using a Helium Ion Microscope |
| Thode, Christopher |
Towards an All-Track Process for DSA |
| Thompson, Michael |
Sub-millisecond Post-Exposure and Hard Bake of Chemically Amplified Photoresists |
| Thompson, William |
Crisp, High Aspect-Ratio, C-Shaped Nanoapertures Fabricated in Evaporated Aluminum Using Focused Helium Ions |
| Thoms, Stephen |
Comparison of HSQ Development Methods for Sub-10 nm Electron Beam Lithography Using Accurate Linewidth Inspection |
| Tian, Kehan |
(Invited) Computational Lithography: Exhausting Optical System Limits Through Intensive Optimization |
| Tian, Lei |
Near-Field 3D Lithography Using Self-Assembled Nanospheres |
| Tiron, Raluca |
Graphoepitaxy of Block Copolymers Using 193nm Lithography: A Process and Defectivity Study |
| Tomohiro, Kohei |
High Aspect Ratio Fine Pattern Transfer Using Novel Mold by Nanoimprint Lithography |
| Tong, William M. |
Resistivity Changes Due to Environmental Contamination In Films Used For Charge Reduction in Electrostatic Electron Optics |
| Tormen, Massimo |
Fabrication of Nickel Diffractive Phase Elements for X-Ray Microscopy at 8 keV Photon Energy |
| Torres, Clivia Marfa Sotomayor |
Characterisation of Optical Diffraction Metrology Templates for Self-Assembled Block Co-Polymers Fabricated by Nanoimprint Lithography |
| Torres, Clivia Sotomayor |
Direct Top-Down Ordering of Diblock Copolymers Through Nanoimprint Lithography
Tailored Synthesized Silsesquioxane Based Resists For UV-Assisted Nanoimprint Lithography |
| Tortai, Jean-Herve |
Comparison of PSF for non CAR and CAR Resists in E-Beam Lithography |
| Toth, Milos |
Investigation of Inter-Diffusion Between Layers in Cryogenic Enhanced Electron Beam-Induced-Deposition
Growth of SiOx Nano-Pillars Using Electron Beam Induced Deposition in an Environmental SEM |
| Toyama, Nobuhito |
Negative-tone E-beam Resist Patterning for more than 1 Tbit/in2 Bit-patterned Media NIL Mold |
| Treiblmayr, Dominik |
Hybrid Tri-Layer Stamps for Step and Repeat Imprint Lithography |
| Tritchkov, Alexander |
(Invited) Computational Lithography: Exhausting Optical System Limits Through Intensive Optimization |
| Trompenaars, Piet |
Direct Local Deposition of High-Purity Pt and Pd Nanostructures by a Novel Combination of EBID and ALD |
| Tsai, Kuen-Yu |
Lithography-Patterning-Fidelity-Aware Electron-Optical System Design Optimization |
| Tseng, Shao-Chin |
Use of Nanoimprint Lithography to Prepare Metallic Corrugated Structure Exhibiting Ultrasensitive Refractive Index Sensing
Using Intruded Gold Nanoclusters as Highly Active Catalysts to Fabricate Silicon Nano-Stalactite Structures |
| Tseng, Yu-Chih |
Improving PMMA Etch Resistance using Sequential Infiltration Synthesis |
| Tuchfeld, Eduard |
Time-Lapse Imaging of Thermally-Driven Signal Propagation in Nanomagnetic Logic |
| Tudorie, A. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Turunen, Jari |
Perfect Matching of Experimental and Simulated Optical Responses of Metallic Nanostructures Obtained Through the Use of Correct Refractive Index |
| Tutt, Lee |
Vertical Transistors with High Alignment Tolerance |
U |
| Uda, Mitsuru |
Deterioration Evaluation of Release Coated Surface for Nanoimprint by Macro Optical Inspection Method |
| Uhlen, Fredrik |
A New High-Aspect-Ratio Diamond Dry-Etch Process for Hard X-Ray FEL Radiation Zone Plates |
| Uhlén, Fredrik |
Towards High-Resolution High-Diffraction-Efficiency Soft X-Ray Zone Plate Lenses: Sub-15 Nm Pattern Transfer to Tungsten Using HSQ and Cryogenic RIE |
| Ukita, Yoshiaki |
Development of On-Chip Micro Vacuum System with Gas-Liquid Phase Transition |
| Umekawa, Hideki |
Evaluation of SiOx Containing UV Nanoimprint Resin |
| Unguris, John |
Electron Beams with Helical Wavefronts and Quantized Angular Momentum |
| Unno, Noriyuki |
Roll Diameter Amplification Method Using Direct Transfer of Fine Patterned Small Roll Mold Fabricated by Electron Beam Lithography
Fabrication of the Seamless Roll Mold Using Inorganic Electron Beam Resist with Post Exposure Bake |
| Uno, Yuhei |
Master Pattern Formation of Bit-Patterned Media by E-Beam Direct Drawing |
| Urbanski, Lukasz |
Table Top Nanopatterning by De-Magnified Talbot Effect |
| USA, Raith |
Dimensional Characterization Of Waveguide Coupling Device Structures Fabricated By The Fixed Beam Moving Stage (FBMS) Electron Beam Lithography |
V |
| Vacic, Aleksandar |
Subwavelength Optical Lithography of Complex Nanopatterns by Diffraction |
| Valente, Gustavo |
Investigation of Contacts Between Metal and Few Layer Graphene Using Focused Ion Beam Cross-Sectioning |
| Valkering, A.M.C. |
Towards a 100 wph e-Beam Direct Write Cluster |
| van de Peut, T. |
Towards a 100 wph e-Beam Direct Write Cluster |
| van den Berg, C.R. |
Towards a 100 wph e-Beam Direct Write Cluster |
| van der Ploeg, Paul |
Deposition and Structuring of Ag/AgCl Electrodes into a Closed Polymeric Microfluidic System for Electroosmotic Pumping |
| van der Zande, Arend |
Fabricating Arrays of Graphene Mechanical Resonators with High, Size-Dependent Quality Factors |
| van Dorp, W.F. |
Functionalization of Focused Electron Beam Induced Deposits by Directed Self-Assembly |
| van Mil, I.L. |
Towards a 100 wph e-Beam Direct Write Cluster |
| van Oven, Jules C. |
Electron-Beam-Induced Deposition of 3.5 nm Half-Pitch Dense Patterns on Bulk Si by Using a Scanning Electron Microscope |
| Vancura, Tobias |
High-Resolution High-Sensitivity Characterization Of Nanoscale Structures in a New Combined SIMS-SPM Instrument: Correction of Topography Artifacts |
| Vartiainen, Ismo |
Surface-Relief Polarization Gratings for Visible Light |
| Vaz, Alfredo |
FIB Cross-Sections for Morphological Analysis of Ni-P Hard-Mask Transformation During Plasma Etching
Investigation of Contacts Between Metal and Few Layer Graphene Using Focused Ion Beam Cross-Sectioning |
| Veldhoven, Emile Van |
High Growth Efficiencies in Helium Ion Beam Induced Deposition at Short Beam Dwell Times
Characterization of Beam-Induced Chemical Structures in the Helium Ion Microscope |
| Venema, N. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Venkatasubramanian, Chandru |
Process-Structure-Property Relationship of Nanocrystalline Vanadium Oxide Thin Films Used in Uncooled Infrared Focal Plane Arrays |
| Verduin, Thomas |
The Influence of Gun Design on Coulomb-Interactions in a Field Emission Gun
Statistical Coulomb Forces in Photo-Field Emitters for Ultrafast Microscopy |
| Vergeer, N. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Vieu, Christophe |
Wafer Scale Integration Of Oriented Carbon Nanotubes Interconnects |
| Vila-Comamala, Joan |
3D Nanostructuring of Hydrogen Silsesquioxane Resist by 100 keV Electron Beam Lithography |
| Villwock, Diana |
Multi-Tip AFM Lithography System for High Throughput Nano-patterning |
| Viswanathan, Vignesh |
Direct-Write Lithography of Sub-10nm Features on Metallorganic Resists Using a Helium Ion Microscope
Direct Patterning of Sub-10 nm Optical Apertures with a Helium Ion Microscope |
| VJ, Logeeswaran |
The Fabrication of Shallow Co-axial P-N Junctions on Silicon Micro/Nanopillars for Solar Cell Applications |
| Vlasov, Alexander |
High Accuracy Charged Beam Modeling in MICHELLE–eBEAM |
| Vogler, Marko |
Combining Nanoimprint Lithography and a Molecular Weight Selective Thermal Reflow for the Generation of Mixed 3-D Structures
Selective Profile Transformation of Electron-Beam Exposed Multilevel Resist Structures Based on a Molecular Weight Dependent Thermal Reflow |
| Vogt, Ulrich |
A New High-Aspect-Ratio Diamond Dry-Etch Process for Hard X-Ray FEL Radiation Zone Plates |
| Volland, Burkhard E. |
Integrated Tool and Feature 2D Plasma Processing Simulator, Used for a Modeling of Cryogenic Plasma Etching of Silicon |
| Vollnhals, Florian |
Focused Electron Beam Induced Surface Activation: A Novel Lithographic Method to Fabricate Nanostructures
Addressing the Fabrication of Titanium Oxide Nanostructures by Electron Beam Induced Deposition |
| Von Her, James |
Multiscale Hydrogen Depassivation Lithography Using a Scanning Tunneling Microscope |
| von Her, Jim |
Patterned Atomic Layer Epitaxy of Si / Si(001):H |
W |
| Wachulak, Przemyslaw |
Table Top Nanopatterning by De-Magnified Talbot Effect |
| Waid, Simon |
Removal of FIB-Induced Amorphization and Gallium Contamination by Focused-Electron-Beam-Induced-Etching
3D Nano Patterning using Local Ga Implantation and Subsequent RIE Etch
Direct Hard Mask Patterning by Focused Ion Beam (FIB) |
| Waks, Edo |
Development of Metal Etch Mask by Single Layer Lift-Off for Silicon Nitride Photonic Crystals |
| Wakuda, Shinya |
Computational Study of Electron-Irradiation Effects in Carbon Nanomaterials on Substrates |
| Walz, Marie-Madeleine |
Focused Electron Beam Induced Surface Activation: A Novel Lithographic Method to Fabricate Nanostructures
Addressing the Fabrication of Titanium Oxide Nanostructures by Electron Beam Induced Deposition |
| Wang, Chao |
Design and Fabrication of High Enhancement Yet Wafer-Scale Uniform SERS/Plasmonic Structures Based on Nanoimprint Lithography and Self-Assembly
Extraction Efficiency Improvement of GaN-based Light-emitting Diodes Using Sub-wavelength Nanoimprinted Patterns on Sapphire Substrates
Nanofluidic Single DNA Sorter and Analyzer Fabricated by Nanoimprint and Wafer Bonding
Fabrication of Large-area Plasmonic Nano-cavity Antenna Array for High Efficiency Mid-and-Far Infrared Sensing
Large-area Patterning of Au Nano-particles Self-aligned to Fluidic Channels for Enhancement of Molecule Detection |
| Wang, Chengqing |
Characterization of Cross Sectional Profile of Epitaxially Assembled Block Copolymer Domains using Transmission Small Angle X-Ray Scattering |
| Wang, Qing |
Anisotropic Filling Phenomenon of Trenches in UV Nanoimprint |
| Wang, Risheng |
DNA Assembly on Patterned Surfaces |
| Wang, Yuanyuan |
Large Area Fast Patterning in High Resolution by a Combined Near-Field Exposure and Reversal Imprint Lithography |
| Wang, Yue |
Direct-Write Lithography of Sub-10nm Features on Metallorganic Resists Using a Helium Ion Microscope
Direct Patterning of Sub-10 nm Optical Apertures with a Helium Ion Microscope |
| Wanzenboeck, Heinz D. |
Removal of FIB-Induced Amorphization and Gallium Contamination by Focused-Electron-Beam-Induced-Etching
Local, Direct-Write, Damage-Free Thinning of Germanium Nanowires
Etching of Germanium by Chlorine Gas using a Focused Electron Beam |
| Wanzenboeck, Heinz |
3D Nano Patterning using Local Ga Implantation and Subsequent RIE Etch
Direct Hard Mask Patterning by Focused Ion Beam (FIB) |
| Warisawa, Shin'ichi |
Multi-Layer Block Copolymer Self-Assembled Structures Using Tilted Pillar Templates
Carbon Nanomechanical Resonator Fabrication from PMMA by FIB/EB Dual-Beam Lithography
A Gradually Shifted Surface Plasmon Resonance with a Controlled Diameter of a Nano-Hole Structure by Self-Assembly Technique
Quality Factor Enhancement on Nano Mechanical Resonators Utilizing Stiction Phenomena
Dynamic Characteristics Control of DLC Nano-Resonator Fabricated by Focused-Ion-Beam Chemical Vapor Deposition
Selective Graphene Growth from DLC Thin Film Patterned by Focused-ion-beam Chemical Vapor Deposition |
| Washburn, C. M. |
Structural Influence of 3D Pyrolyzed Carbon Electrodes on Electrochemical Behavior |
| Watanabe, Takeo |
EUV-Mask Pattern Imaging by the Coherent Scatterometry Microscope
Extreme Ultraviolet Interference Lithography toward 1X nm Nodes |
| Wathuthanthri, Ishan |
Large-Area Pattern Transfer of Metal Nanostructures via Interference Lithography
Single-Step Interferometric Patterning of High-Aspect-Ratio Three-Dimensional Nanostructures |
| Weber-Bargioni, Alex |
Elucidating Effects of Nanoscale Structural Variations on Local Plasmonic Modes via Photon Localization Microscopy |
| Weber, Matthieu |
Direct Local Deposition of High-Purity Pt and Pd Nanostructures by a Novel Combination of EBID and ALD |
| Weber, Thomas |
Double Patterning Technology: Process Simulation and Fabrication of Optical Elements |
| Wegmann, Urs |
High-Resolution High-Sensitivity Characterization Of Nanoscale Structures in a New Combined SIMS-SPM Instrument: Correction of Topography Artifacts |
| Wellenzohn, Roman Bruck Markus |
Ion Beam Lithography for Sub-50 nm Patterning of Metal Mold Inserts and Replication by Injection Molding |
| Wen, Juanjuan |
Fabrication of Complex Nanostructures of P(VDF-TrFE) by Dual Step Hot-embossing |
| Wen, Xuejin |
Cell Electroporation – A Diffusion Process or a Drive-In Process? |
| Wendt, J.R. |
Fabrication of Multilayer 3D Micron-Scale Metamaterials |
| Westly, Daron |
Improved Time Dependent Performance of HSQ Resist Using a Spin on Top Coat |
| Westra, Ken L. |
Comparison Between ZEP and PMMA Resists for Nanoscale Electron Beam Lithography Experimentally and by Numeric Modeling |
| Wheeler, D. R. |
Structural Influence of 3D Pyrolyzed Carbon Electrodes on Electrochemical Behavior |
| Whitney, William |
Fabricating Arrays of Graphene Mechanical Resonators with High, Size-Dependent Quality Factors |
| Wiedemann, Pablo |
5kV Multi Electron Beam Lithography MAPPER Tool: From 32nm to 22nm Resolution Capability |
| Wieland, M.J. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Wieldermann, Pablo |
Challenges in Data Treatment and Proximity Effects Correction for Massively Parallel Electron Lithography |
| Wiersma, A.D. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Wilkinson, Ray Espinal David |
Commissioning of the 20-bit Vistec EBPG5000plus at the Melbourne Centre for Nanofabrication |
| Williams, R. Stanley |
A Molecule Trapping and SERS Sensing Device by 3-D Nanoimprint |
| Williamson, Lance |
Evolution of Critical Dimension and Line Edge Roughness During Block-Copolymer Nano-Patterning |
| Willson, Richard |
(Invited) Applied Biochemistry Meets Microfabrication and Nanotechnology: Micro- and Nano-Labels for Biomedical Diagnostics
Suspended, Micron-scale Corner Cube Retroreflectors as Ultra-bright Optical Labels |
| Wind, Shalom |
DNA Assembly on Patterned Surfaces
DNA Arrays with Site-Specific Labels
A New Approach for Measuring Protrusive Forces in Cells
Selective Biomolecular Nanoarrays for Parallel Single-Molecule Investigations |
| Winston, Donald |
Scanning-Neon-Ion-Beam Lithography |
| Wirtz, Tom |
High-Resolution High-Sensitivity Characterization Of Nanoscale Structures in a New Combined SIMS-SPM Instrument: Correction of Topography Artifacts |
| Wojcik, Michael |
High Aspect Ratio Zone Plate Fabrication Using a Bilayer Mold |
| Woszczyna, M. |
Self-Actuated Piezoresistive 512-Cantilever Arrays for Large-Area Imaging and Manipulation |
| Woutersen, S. |
Towards a 100 wph e-Beam Direct Write Cluster |
| Wright, John |
Electron-Beam Induced Deposition of Transition Metals from Bulk Liquids: Ag, Cr, and Ni |
| Wu, Yueying |
The Directed Assembly of Metallic Nanoparticle Chains by Pulsed Laser Induced Dewetting and Nanolithography |
| Wu, J.C. |
Studies in Synthetic Antiferromagnetically Coupled Ring Array Magnets via Hysteresis Loops |
| Wu, Jong-Ching |
Tunable Waveguide-Plasmon Coupling in Silicon-Nitride Photonic Crystal Slabs with Double-coated Silver Films
Investigation of Surface Plasmons Coupling via Guided Modes in Metal/Dielectric/Metal Photonic Crystal Slabs
Coupling of Surface Plasmons in Au Nanorings with Subwavelength Holes Array |
| Wu, Jong |
Study of Optical Transmittance Through Tack-Typed and Goblet-Typed Dielectric Pillar Arrays |
| Wu, Nathanael |
Block Copolymers for High-Resolution Nanopatterning |
| Wu, Teho |
Studies in Synthetic Antiferromagnetically Coupled Ring Array Magnets via Hysteresis Loops |
| Wu, Wei |
A Molecule Trapping and SERS Sensing Device by 3-D Nanoimprint |
| Wu, Wen-li |
Characterization of Cross Sectional Profile of Epitaxially Assembled Block Copolymer Domains using Transmission Small Angle X-Ray Scattering |
| Wu, Xiaofei |
Fast Aerial Image Simulations Using One Basis Mask for Optical Proximity Correction
Kernel Based Parametric Analytical Model of Source Intensity Distributions in Lithographic Tools |
| Wu, Ying |
Fabrication of Nanoparticles Deposited Photonic Crystals
Nanoimprint Induced Block Copolymer Self-Assembly
Cryogenic Silicon Process for Etching 15 nm Trenches and Beyond
Integrated Tool and Feature 2D Plasma Processing Simulator, Used for a Modeling of Cryogenic Plasma Etching of Silicon |
X |
| Xia, Qiangfei |
Arrays of 25 ×25 nm2 Cross-Point Resistive Switching Devices Fabricated with Nanoimprint Lithography |
| Xiao, Shuaigang |
Integration of Directed Block Copolymer Self-Assembly with Nanoimprint Lithography for Addressable Nanoarray Fabrication over Large Area
Solvent Annealing Conbined with Surface Resconstruction towards the Fabrication of Silicon Nanodots with Areal Density beyond 1 Teradots/Inch2 |
| Xiao, X. |
Structural Influence of 3D Pyrolyzed Carbon Electrodes on Electrochemical Behavior |
| Xie, Peng |
Image Invariant and Information Content Comparisons across Sub-32nm Technologies |
| Xu, Ji |
Solvent Annealing Conbined with Surface Resconstruction towards the Fabrication of Silicon Nanodots with Areal Density beyond 1 Teradots/Inch2 |
| Xu, Ting |
High Efficiency Plasmonic Color Filters Fabricated Using Imprint Lithography
Solar Energy Harvesting Photonic Color Filters |
| Xu, Wei |
Large-Area Pattern Transfer of Metal Nanostructures via Interference Lithography |
Y |
| Yaghoobi, Parham |
Broadband Light-Induced Thermionic Electron Emission from Arrays of Carbon Nanotubes using Laser Pointers
Polarization-Sensitive Visible-Light-Induced Thermionic Electron Emission from Carbon Nanotube Forests |
| Yagnyukova, Mariya |
Nanofabrication of Photonic Crystal-Based Devices Using Electron Beam Spot Lithography Technique |
| Yahiro, Takehisa |
On-Machine Wavefront Evaluation of the Full-Field Extreme Ultra-Violet Lithography Exposure System |
| Yamada, Akio |
Multi Column Cell Writer Architecture and a Correction Technique for Consistent CD Uniformity Between Column Cells |
| Yamaguchi, Yuya |
Extreme Ultraviolet Interference Lithography toward 1X nm Nodes |
| Yamanaka, Takuya |
Modeling of Charging Effect on Ion Induced Secondary Electron Emission from Nano-Structured Materials |
| Yamashita, Daisuke |
Comparison of Surface Condition of Nanoimprint Antisticking Layers Formed by CVD And Dip-Coat Methods |
| Yan, Hanfei |
Fabrication of High-Aspect-Ratio Nanostructures to Characterize High-resolution Hard X-ray Nano-probe |
| Yang, Chu Yeu Peter |
Coupled Planar-Localized Surface Plasmon Resonance Device by Block-Copolymer and Nanoimprint Lithography Fabrication Methods |
| yang, Elaine Lai |
Coupled Planar-Localized Surface Plasmon Resonance Device by Block-Copolymer and Nanoimprint Lithography Fabrication Methods |
| Yang, Henry |
Integration of Directed Block Copolymer Self-Assembly with Nanoimprint Lithography for Addressable Nanoarray Fabrication over Large Area |
| Yang, Ji won |
Enhancement of Light Extraction Efficiency in n-GaN Patterned Vertical Light-Emitting Diodes using Nanosphere Lithography |
| Yang, Jijin |
Fabrication of Nanopores Using a Helium Ion Microscope |
| Yang, Joel |
Fabrication of Sub-10-Nm-Gapped Gold Structures For Plasmonic Applications
(Invited) Sub-10-nm Beam-Based Lithography and Applications
Plasmonics On Lithographically-Defined Nanostructures as Studied in Electron Energy-Loss Spectroscopy
In-situ Study of Rate of Hydrogen Silsesquioxane Dissolution in both Alkaline and Electrochemical Systems |
| Yang, Muchuan |
EWOD-Based Droplet Actuation by Active-Matrix Electrode Array |
| Yang, Xiaomin |
Integration of Directed Block Copolymer Self-Assembly with Nanoimprint Lithography for Addressable Nanoarray Fabrication over Large Area |
| Yang, Yi |
Dehydration Assisted Nanoimprint Of PEDOT:PSS Nanogratings To Improve Organic Photovoltaics |
| Yang, Yugu |
Real-time Dose Control for Electron-Beam Lithography
Secondary-Electron Signal Levels of Self-Assembled Monolayers for Spatial-Phase-Locked Electron-Beam Lithography |
| Yanik, Ahmet Ali |
Plasmonic Nanopillar Arrays for Enhanced Biosensing, Spectroscopy and Optical Trapping
High-throughput Fabrication of Engineered Plasmonic Nanoantenna Arrays with Nanostencil Lithography |
| Yankov, Vladimir |
Digital Planar Holograms Fabricated by Step and Repeat UV Nanoimprint Lithography
Fabrication of Digital Planar Holograms for Brighter Power Laser Diodes |
| Yasuda, Masaaki |
Molecular Dynamics Study on Polymer Filling Process in Nanoimprint Lithography for Multi-Layered Resist
Shrinkage Pattern Correction (SPC) in Nanoimprint Lithography
High Aspect Ratio Fine Pattern Transfer Using Novel Mold by Nanoimprint Lithography
Novel Nanoimprint Lithography Using Dispersed Molecular Weights
Atomic Step Pattering in Nanoimprint Lithography : Molecular Dynamics Study
Computational Study of Electron-Irradiation Effects in Carbon Nanomaterials on Substrates |
| Ye, Jun |
Detection and Characterization of Buried Structures by Exploring Patterns in Angle- and Energy- Filtered Back-Scattered Electrons |
| Yesilkoy, Filiz |
Zero-bias Rectifying Performance Enhancement of MIM Tunneling Diodes by Geometric Field Enhancement and Boiling Water Oxidation
Improving the Zero Bias Performance of MIM Tunneling Diodes by Introducing Traps in the Barrier |
| Yildiz, I. |
High Precision FIB Fabrication of Customizable AFM Probes |
| Yilmaz, Cihan |
Plasmonic Nanopillar Arrays for Enhanced Biosensing, Spectroscopy and Optical Trapping |
| Yoshida, Hiroshi |
Directed Self-assembly with Density Multiplication of POSS-Containing Block Copolymer via Controlled Solvent Annealing |
| Yoshimoto, Mamoru |
Atomic Step Pattering in Nanoimprint Lithography : Molecular Dynamics Study |
| Young, Richard |
A Comparison of Xe+ Plasma FIB Technology with Conventional Gallium LMIS FIB |
| Young, Tony |
Time-Lapse Imaging of Thermally-Driven Signal Propagation in Nanomagnetic Logic |
| Younkin, Todd |
Sub-millisecond Post-Exposure and Hard Bake of Chemically Amplified Photoresists |
| Yu, Chen-Chieh |
Use of Nanoimprint Lithography to Prepare Metallic Corrugated Structure Exhibiting Ultrasensitive Refractive Index Sensing
Using Intruded Gold Nanoclusters as Highly Active Catalysts to Fabricate Silicon Nano-Stalactite Structures |
| Yu, Zhaoning |
Study of Spin-coated Resist Coverage on Nanoscale Topography Using Spectroscopic Ellipsometry |
| Yuji, Kang |
Annealing Dependence of Deposit Morphology for Fe-Ga Contained DLC Film Formed by FIB-CVD with Ferrocene Source Gas
Evaluation of SiOx Containing UV Nanoimprint Resin |
| Yukawa, Takao |
Evaluation of Effect of Fluorine Additive Agent for Cationic UV-Nanoimprint Resin |
Z |
| Zakhidov, Anvar |
Dehydration Assisted Nanoimprint Of PEDOT:PSS Nanogratings To Improve Organic Photovoltaics |
| Zalalutdinov, Maxim |
Tuning Graphene Nanomechanical Resonators |
| Zawierucha, P. |
Self-Actuated Piezoresistive 512-Cantilever Arrays for Large-Area Imaging and Manipulation |
| Zeeb, Bastian |
Fabrication of Plasmonic Nanostructures by Etch Mask Transfer |
| Zelsmann, Marc |
Direct Top-Down Ordering of Diblock Copolymers Through Nanoimprint Lithography
Tailored Synthesized Silsesquioxane Based Resists For UV-Assisted Nanoimprint Lithography |
| Zepka, Alex |
A Model Based Hybrid Proximity Effect Correction Scheme Combining Dose Modulation and Shape Adjustments |
| Zewail, Ahmed |
4D Electron Microscopy: History, Developments and Applications |
| Zhang, Chuanwei |
Fast Aerial Image Simulations Using One Basis Mask for Optical Proximity Correction
Kernel Based Parametric Analytical Model of Source Intensity Distributions in Lithographic Tools |
| Zhang, Jian |
High Sensitivity Electron Beam Lithography Using ZEP Resist and MEK:MIBK Developer |
| Zhang, Jingyu |
Fabrication of Nanoparticles Deposited Photonic Crystals
Fabrication of Sub-20nm Nanochannels Integrated with Bowtie Nanoantenna |
| Zhang, Lan |
Commissioning of the 20-bit Vistec EBPG5000plus at the Melbourne Centre for Nanofabrication |
| Zhang, Qi |
Fabrication of Large-area Plasmonic Nano-cavity Antenna Array for High Efficiency Mid-and-Far Infrared Sensing |
| Zhang, Weihua |
Design and Fabrication of High Enhancement Yet Wafer-Scale Uniform SERS/Plasmonic Structures Based on Nanoimprint Lithography and Self-Assembly |
| Zhang, Xingcai |
Nanocomposite-Beam Based Microresonator Fabricated by Combining Microlithography And Layer-By-Layer Nanoassembly |
| Zheng, David Ai Zhi |
Developer-Free Direct Patterning on PMMA by Low Voltage Electron Beam Lithography |
| Zheng, Xiaohu |
Investigation of Graphene Piezoresistor for Use as Strain Gauge Sensors |
| Zhu, Diling |
Optimizing the Performance of Keyhole Diffraction Microscopy |
| Zhu, Xieqing |
E-beam Energy Dissipation in Complex Solid Targets |
| Zhu, Yanwu |
Patterned Graphene Oxide Films by a Simple Method |
| Zimmermann, Rainer |
A Model Based Hybrid Proximity Effect Correction Scheme Combining Dose Modulation and Shape Adjustments |
| Zoellner, J.-P. |
Self-Actuated Piezoresistive 512-Cantilever Arrays for Large-Area Imaging and Manipulation |
| Zonnevylle, A. Christiaan |
Individual Beam Control for MEMS Multi Electron Beam Systems |
| Zschornack, Günter |
Fine-Focused Beams of Highly Charged Ions |
