A |
| Acosta, Victor M. |
Diamond nitrogen-vacancy centers created by scanning focused helium ion beam and annealing |
| Adesida, Ilesanmi |
Reduction of proximity effects using high-contrast developer in fabricating large-area nanoimprint molds |
| Adiga, Vivekananda |
High quality factors in graphene and ultra thin Silicon nitride nanomechanical drums |
| AG, Eulitha |
Phase shifting mask for high-throughput high-contrast patterning with Displacement Talbot Lithography (DTL)
Optical lithography method for generation of sub-35nm line/space patterns for use in complementary lithography |
| Agrawal, Amit |
Sculpting Electron Beam Profile and Phase with Nanofabricated Diffractive Optics |
| Ahn, Jinho |
Lithographic Performance of EUV Mask using Coherent Scattering Microscopy |
| Ahn, Se Hyun |
Vibrational Indentation Patterning of Grating Structures with Real-time Period Tunability |
| Ai, Zhongkai |
Patterning of Sub-10 nm Optical Apertures on Single Crystal Metallic Films with the Helium Ion Microscope (Invited)
Immersion Optics for Excitation of Surface Plasmons in a Transmission Mode Photoemission Electron Microscope |
| Aida, Kouhei |
Directed Self-Assembly of Perpendicularly Oriented Nano-Cylinders with Liquid Crystalline Block Copolymer |
| Aida, Yukinori |
High Resolution Patterning on Non-Planar Substrates with Large Height Variation Using Electron-Beam Lithography |
| Aitchison, J. Stewart |
Nanolithography and pattern transfer of dense sub-10 nm lines |
| Akinwande, Deji |
Graphene transistors with record mobilities on polyimide for high-performance flexible nanoelectronics
Sub-20 nm fabrication on polyimide plastics enabled by directed self-assembly |
| Albrecht, Thomas |
Fabrication of CoCrPt Alloy Bit Patterned Media at 1 Td/in2 for Recording Measurement |
| Alexander-Katz, Alfredo |
Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films |
| Alexander, Justin |
Determining Tip Position Tolerances for Atomically Precise STM lithography of Si(001):H
Automated position corrections for Atomically Precise STM lithography of Si(001):H |
| Alkaisi, Maan M. |
Polymeric Substrates with Bioimprinted Micro- and Nanoscale Topography for Regulation of Chondrocyte Re-Differentiation |
| Alkemade, Paul |
Helium ion beam lithography of thick HSQ resists |
| Allen, J. Brent |
Focused Ion Beam Implantation of Li+ in WO3 Using A Magneto-Optical Trap Ion Source (Invited) |
| Altana, Mirco |
Sidewall-angle dependent pre-filling of three-dimensional microcavities in thermal nanoimprint |
| Alvis, Roger |
Optimization of the Gun, Lenses, and Detectors for High-Vacuum SEM Studies of Non-Conductive Specimens |
| Amano, Tsuyoshi |
Residual-type mask defect printability for EUV lithography
Dependence of Image Characteristics Dependece on Incident Electron Beam Energy for EUV Mask inspection using Monte Carlo simulation |
| Amirsadeghi, Alborz |
Bonding of PMMA nanofluidic devices and its effect on DNA behavior in nanochannels |
| Amon, Andreas |
Microfluidic Axon-Isolation Device fabricated by Nanoimprint lithography |
| Ananth, M. |
Plasmonic Nanostructures Fabricated using Helium and Gallium Ion Beam Instruments. |
| Andrews, Trisha |
Deep-subwavelength patterning with photoswitchable molecules |
| Angelova, Polina |
1 nm Thick Chemically Functionalized Carbon Nanomembranes (CNMs): Two-dimensional Materials for Nanoengineering |
| Antcliffe, M. |
Graphene for RF Applications: Opportunities & Challenges (Invited) |
| Antohe, Alin |
Understanding the sources of unwanted etch in ion beam sputter deposition production of EUV mask blanks |
| Appleton, Bill R. |
Nanofabrication of Graphene on SiC by Multi-Ion Beam Lithography and Low-Temperature Processing |
| Arai, Norikazu |
Development of a large areal metallic nano stamp fabrication process using UV nanoimprinting and pulse reverse current electroforming for discrete track media with pattern width of 35nm |
| Araki, Kosei |
Molecular simulation of electron-irradiation damages in resist materials (Invited) |
| Archibald, Michelle |
Imprint-Templated Nanocoaxial Array Architecture |
| Arrieta, Jose P. |
Resolution improvement for positive tone poly(methyl methacrylate) resist |
| Arrieta, Jose |
Templated Placement of Colloidal Quantum Dots |
| Arthur, Graham |
Fresnel zone plates as X-ray lenses by electron beam lithography with HSQ resist |
| Aryal, Mukti |
Large area optical lithography using cylindrical masks |
| Asakawa, Koji |
Spin on Glass as an Orientation Control Layer for Block Copolymer Direct Self-Assembly |
| Asayama, Yoshiki |
Molecular dynamics study on structural modifications of graphene by electron beam irradiation |
| Asbeck, P. |
Graphene for RF Applications: Opportunities & Challenges (Invited) |
| Ashiba, Hiroki |
Nanomechanical Tuning Forks Fabricated by Focused-ion-beam Chemical Vapor Deposition |
| Atasoy, Hakan |
3-D microfabrication based on a glass transition temperature selective thermal reflow - towards optical applications
Release-Optimized UV-NIL Resists |
| Awazu, Koichi |
Optical and Electrical Sensing application of High-Aspect-Ratio Nanoholes Formed by Etching of Latent Tracks |
| Ayothi, Ramakrishnan |
Fundamental Study of EUV Resist Line Edge Roughness: Characterization, Experiment and Modeling |
B |
| Babin, Sergey |
SEM dimensional metrology on sub-15 nm bit-patterned media using model-based analysis
Fabrication of High Resolution Digital Spectrometers-on-Chip
Direct Nanoimprinting of Functional Inorganic Layers for Nanophotonic Chip Devices |
| Bain, James |
SPM Local Oxidation and In-situ Characterization Using AFM Probes in Multiple Modes |
| Balaz, Martina |
Optimization of a Self-Closing Effect to Produce Bottle-Shaped Nanochannels in Quartz |
| Ballard, Joshua |
Determining Tip Position Tolerances for Atomically Precise STM lithography of Si(001):H
Automated position corrections for Atomically Precise STM lithography of Si(001):H |
| Ballif, Christophe |
Stencil-nanopatterned back reflector increases efficiency of thin-film solar cells |
| Bao, Wei |
Hyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of “Campanile” Tips
Towards the holy grail of near field optics via reproducibly fabricated optical nano antennae on Scanning Probe Tips
Putting Plasmonic Probes in Perspective: The Case for the Campanile Tip |
| Bao, Xin-Yu |
Directed Self-Assembly for the Semiconductor Industry (Invited)
Design Space for One-hole Pattern using Block Copolymer Directed Self-Assembly |
| Barcelona |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Barry, Daniel |
Fabrication of high resolution computer-generated holograms using 3D electron beam lithography. |
| Barton, Rob |
High quality factors in graphene and ultra thin Silicon nitride nanomechanical drums |
| Barton, Robert |
Fabricating Graphene-Silicon Nitride Heterostructures for High-Q Tunable Nanomechanical Resonators |
| Bawendi, Moungi |
Templated Placement of Colloidal Quantum Dots |
| Beausoleil, Ray |
Non-periodic sub-wavelength gratings fabricated by helium ion beam lithography |
| Beausoleil, Raymond. G. |
Diamond nitrogen-vacancy centers created by scanning focused helium ion beam and annealing |
| Beck, TJ |
Electron Beam Lithography of Antidot Arrays for the Fabrication of Nanogenerators and Detectors in 2DEG Materials |
| Bedolla, Marco |
Defect Evolution in Thin Films of Self-Assembling Lamella Forming Block Copolymers on a Neutral Surface |
| Bell, David |
Nanoscale imaging, analysis and nano-fabrication using Helium Ion Microscope |
| Belova, Lyubov M. |
3D Patterning of Si Micro and Nano Structures by Focused Ion Beam Implantation, Si Deposition and Selective Si Etching |
| Bencher, Christopher |
Directed Self-Assembly for the Semiconductor Industry (Invited)
Design Space for One-hole Pattern using Block Copolymer Directed Self-Assembly |
| Bender, Helmar |
Potential modulation by plasmonic sub-micron structures for the manipulation of ultracold atomic gas clouds |
| Bennett, Patrick |
Hyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of “Campanile” Tips |
| Benson, Oliver |
Embedding and Combining Plasmonic Elements and Photonic Crystal Structures |
| Bergbauer, Werner |
Position control of MOVPE grown GaN nanorods using nanoimprint lithography |
| Berggren, Karl K. |
Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films
Complex self-assembled patterns from a square grid template with restricted geometry
Block Copolymer Self-Assembly Using Sacrificial Template
Achieving Ordered Nanoholes and Other Non-bulk Morphologies by Directed Self-Assembly of a Block Copolymer
Resolution improvement for positive tone poly(methyl methacrylate) resist |
| Berggren, Karl |
Templated Placement of Colloidal Quantum Dots
Investigation of Templated Self-assembly of High-χ Diblock Copolymer |
| Bergmair, Iris |
High aspect ratio lift-off process and silver optimization for negative index materials in the visible
Micro- and Nanostructuring of Graphene on various Substrates using UV-NIL
Nanometer Size Protein Patterning using nCP for the Investigation of Protein-Protein Interactions in Live Cells |
| Berry, Shaun |
Electrically Controlled Switchable Adhesion of Dual Nanometer and Micrometer Structured Surfaces |
| Bertagnolli, Emmerich |
Focused Electron Beam Induced Deposition as novel nanofabrication approach for magnetic nanosensors and nanomagnet logic
Magnetic reversal of iron nanowires deposited by Focused Electron Beam Induced Deposition for nanomagnet logic application
Fabrication of 3-dimensional Nanoimprint Stamps - A comparison of 4 approaches using FIB
Engineering electrical properties of Silicon nanowires by focused electron beam induced processing with Chlorine |
| Bertagnollo, Emmerich |
Microfluidic Axon-Isolation Device fabricated by Nanoimprint lithography |
| Bertarelli, Chiara |
Deep-subwavelength patterning with photoswitchable molecules |
| Bevis, Chris |
REBL: A Lithography Solution for High Volume Manufacturing at 16 nm (Invited) |
| Beyer, André |
1 nm Thick Chemically Functionalized Carbon Nanomembranes (CNMs): Two-dimensional Materials for Nanoengineering |
| Bhadra, Shoham |
A Tri-layer Method to Fabricate Wafer Scale Nanoimprint Mold by Copolymer Lithography |
| Bidawid, Sabah |
High Aspect Ratio, Triangular Silicon Pillars for Bump Array Concentration of Pathogenic Bacteria |
| Binh, Vu Thien |
X-rays and field-emission gun: an intrinsic quasi-monochromatic X-ray source (Invited) |
| Birringer, Ryan |
Monolithic 3D Integration via Al-Ge Bonding of Single Crystal Islands (Invited) |
| Bischoff, Lothar |
Taming Nanostructures: From Sponge to Dot Pattern on Ge Controlled by Heavy-Ion-Deposited Energy
Taming of Ga droplets on DLC layers – Size tuning and local arrangement with nm accuracy |
| Bishop, James |
A Mechanism for Dendritic Nano-Pillar Growth using EBID |
| Bisotto, Isabelle |
Electron Beam Lithography of Antidot Arrays for the Fabrication of Nanogenerators and Detectors in 2DEG Materials |
| Black, Charles T. |
Image quality and pattern transfer in block copolymer directed assembly with block-selective atomic layer deposition |
| Blaikie, Richard |
Ultra-high-Numerical Aperture Interference Lithography at High Aspect Ratios using Surface States on Effective Gain Media |
| Bodis, Pavol |
Continuous Electron Beam Lithography Writing Modes for Optical Waveguide Nanofabrication |
| Bøggild, P. |
Reproducibility of Drift Tolerant Focused Ion Beam Lithography Method |
| Bogy, David |
Sub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens
An FPGA-based Pattern Generator for Massive Parallel High-Speed Nanolithography System |
| Bokor, Jeff |
Hyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of “Campanile” Tips |
| Bokor, Jeffrey |
Magneto-optical and X-ray microscopy of nanomagnetic logic components with shape-induced biaxial anisotropy |
| Bonam, Ravi |
Concentric Ring Metal-Dielectric Structures for Surface Electromagnetic Wave Assisted Compact Photoelectron Source (Invited) |
| Borah, Dipu |
Control of the PS-b-PDMS directed self-assembly by silsesquioxane-based graphoepitaxial substrate engineering
Directed self-assembly of PS-PEO using solvent vapors assisted nanoimprint lithography |
| Born, Philip |
Metal Nanoparticle Arrays by Controlled Decomposition of Polymer Particles |
| Bosman, Michel |
Patterning of Sub-10 nm Optical Apertures on Single Crystal Metallic Films with the Helium Ion Microscope (Invited)
Plasmonics At The Single-Nanometer Scale (Invited) |
| Böttger, Roman |
Taming Nanostructures: From Sponge to Dot Pattern on Ge Controlled by Heavy-Ion-Deposited Energy |
| Bozano, Luisa |
Fundamental Study of EUV Resist Line Edge Roughness: Characterization, Experiment and Modeling |
| Bramati, Arianna |
Mask Aligner Process Simulation for Advanced Lithography and Resolution Enhancement Techniques |
| Bresin, M. |
Liquid phase electron beam induced deposition of CdS |
| Brianceau, Pierre |
Capped carbon hard mask an innovative route to nanoscale device fabrication |
| Brimhall, Nicole |
Deep-subwavelength patterning with photoswitchable molecules |
| Brodoceanu, Daniel |
Metal Nanoparticle Arrays by Controlled Decomposition of Polymer Particles |
| Brown, Devin |
Point spread function analysis of dense high resolution nanodots in hydrogen silsesquioxane |
| Bruccoleri, Alexander |
Fabrication of Nano-scale, High Throughput, High Aspect Ratio Freestanding Gratings |
| Brugger, Juergen |
Stencil-nanopatterned back reflector increases efficiency of thin-film solar cells
Thermal control extends heated stencil's life-time |
| Brugger, Jürgen |
Polymeric freestanding structures by direct write laser without sacrificial layers |
| Bruley, John |
Combining SIMS with GPA of aberration corrected HAADF STEM images for measurement of misfit strain in epitaxial SiGe layers |
| Bruno, Giovanni |
Micro- and Nanostructuring of Graphene on various Substrates using UV-NIL |
| Bucchignano, James |
Electron beam lithography-based grating customization strategies for gate level patterning in high density SRAM circuits (Invited) |
| Burcham, Kevin |
Stitch-Error Free Electron Beam Lithography of Periodic Structures |
| Burckel, D. Bruce |
Interferometrically Defined 3D Pyrolyzed-Carbon Sensors |
| Bureau, Jean-Baptiste |
Polymeric freestanding structures by direct write laser without sacrificial layers |
| Burns, Michael J. |
Imprint-Templated Nanocoaxial Array Architecture |
| Buttard, Denis |
Directed Self-Assembled Porous Anodic Alumina by NanoImprinting Lithography |
| Byeon, Kyeong-Jae |
Thermal Imprinting Process using ZnO Nanoparticles-Dispersed Resin for the Improvement of Light Extraction Efficiency of GaN-based LEDs |
C |
| Cabral, Alberto |
Electrically Controlled Switchable Adhesion of Dual Nanometer and Micrometer Structured Surfaces |
| Cabrini, Stefano |
Hyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of “Campanile” Tips
Towards the holy grail of near field optics via reproducibly fabricated optical nano antennae on Scanning Probe Tips
30 nm nanochannels with plasmonic bowtie nanoantenna
Fabrication of High Resolution Digital Spectrometers-on-Chip
Sub-10 nm area-selective ALD using block copolymer lithography
Super selective silicon cryo-etching for nanoscale pattern transfer with block copolymer lithogrpahy
Sculpting Electron Beam Profile and Phase with Nanofabricated Diffractive Optics
Direct Nanoimprinting of Functional Inorganic Layers for Nanophotonic Chip Devices
Tunable Plasmonic Light Trapping Metal Structures
Putting Plasmonic Probes in Perspective: The Case for the Campanile Tip
High resolution dry photo-ablation development (Invited) |
| Cabrini, Stephano |
Single digit nanoimprint lithography achieved by template modification with atomic layer deposition |
| Cadarso, Víctor J. |
Polymeric freestanding structures by direct write laser without sacrificial layers |
| Calderon, Jose Alonzo |
Probing Nanostructures of Aged Active Layer Materials for Organic Solar Cells |
| Calo, Cosimo |
Direct Nanoimprinting of Functional Inorganic Layers for Nanophotonic Chip Devices |
| Cameron, James |
Low Diffusion EUV Resists using Bound PAG Technology (Invited) |
| Campbell, P.M. |
Graphene for RF Applications: Opportunities & Challenges (Invited) |
| Cantu, Precious |
Deep-subwavelength patterning with photoswitchable molecules |
| Carlton, David |
Magneto-optical and X-ray microscopy of nanomagnetic logic components with shape-induced biaxial anisotropy |
| Carroll, Allen |
REBL: A Lithography Solution for High Volume Manufacturing at 16 nm (Invited) |
| Castagna, Rossella |
Deep-subwavelength patterning with photoswitchable molecules |
| Cha, Hyuk-Jin |
Thermal Imprinting Process using ZnO Nanoparticles-Dispersed Resin for the Improvement of Light Extraction Efficiency of GaN-based LEDs |
| Chan, Wei Min |
Directed Patterning for Electronics Using Multiple Block Copolymers Orthogonally |
| Chanda, Debashis |
Reduction of proximity effects using high-contrast developer in fabricating large-area nanoimprint molds |
| Chang, Che-Cheng |
Low-Energy Electron Diffraction Microscopy Based on a Single-Atom Electron Source |
| Chang, Chih-Hao |
Fabrication of Hollow-Shell Nano-volcanoes from Mie Scattering of Colloidal Nanospheres |
| Chang, Hsiao-Yu |
Sub-20 nm fabrication on polyimide plastics enabled by directed self-assembly |
| Chang, Jae-Byum |
Complex self-assembled patterns from a square grid template with restricted geometry |
| Chang, Josephine |
Electron beam lithography-based grating customization strategies for gate level patterning in high density SRAM circuits (Invited) |
| Chang, Li-Wen |
Directed Self-Assembly for the Semiconductor Industry (Invited) |
| Chang, Long |
Multi-domain storage in graded bit patterned media (Invited)
Fabrication of dense non-circular nanomagnetic device arrarys using self-limiting low-energy glow-discharge processing |
| Chang, Mu-Tung |
Low-Energy Electron Diffraction Microscopy Based on a Single-Atom Electron Source |
| Chang, Wei-Tse |
Low-Energy Electron Diffraction Microscopy Based on a Single-Atom Electron Source |
| Chapin, Caitlin |
Point spread function analysis of dense high resolution nanodots in hydrogen silsesquioxane |
| Chen, Brian |
Growth Characterization of Electron Beam Induced Silver Deposition from Liquid Precursor |
| Chen, Chang-Lee |
Overcoming 3DIC Technology Hurdles (Invited) |
| Chen, Chenson K. |
Overcoming 3DIC Technology Hurdles (Invited) |
| Chen, Chien-Yu |
Monolithic 3D Integration (Invited) |
| Chen, Hao |
Significant Enhancement of Colloidal Quantum Dots Fluorescence by 3D Disk-dot Coupled Nanoantenna Array |
| Chen, Lichuan |
Development of jet rollable nanoimprint process to fabricate bio-polymer nanostructures |
| Chen, Long |
Nanostructured, Active Electrostatic Trap for Confining Nanometric Objects in a Fluid: mimicking DNA-Protein interactions in a synthetic system |
| Chen, Ray |
Transfer Processes of Silicon Nanomembranes for Three Dimensional Integration of Photonics and Electronics |
| Chen, Tao |
Piezoelectrically Transduced Silicon Carbide MEMS Double-Clamped Beam Resonators
Optimization the visibility of graphene on poly-Si film by thin-film optics engineering |
| Chen, Yifang |
Dry-Release Self-assembling of Microtube Arrays for Catalytic Micropump Application
Fresnel zone plates as X-ray lenses by electron beam lithography with HSQ resist
Tunable silver nano-pillar arrays as a surface-enhanced Raman scattering sensor by a self-aligned nanofabrication process
Novel techniques for modifying microtube surface with various periodic structures ranging from nano to micro scale
Fabrication of Nanostructured Hydrophobic Surfaces with Laser Interference Lithography |
| Chen, Yijian |
Near-Field EUV Imaging for Spatial Frequency Multiplication |
| Chen, Yongmei |
Design Space for One-hole Pattern using Block Copolymer Directed Self-Assembly |
| Chen, Yung-Pin |
Fabrication of a Binary Phase Grating on a Fiber End by Utilizing Interference Lithography |
| Cheng, Joy |
Sub-30 nm pitch circuit relevant patterning in Si, SiO2 and SiN using directed self assembly based pattern generation (Invited) |
| Cheng, Xing |
High-Resolution Non-Destructive Patterning of Isolated Organic Semiconductors
Dual-Layer Thermal Nanoimprint Lithography without Dry Etching
Template-Assisted Self-Assembly and Alignment of ZnO Nanowires with Post-Deposition Growth |
| Cheng, Yao-Te |
Nanoscale Photoelectron Emission Using C-shaped Nanoapertures with Cesium Bromide Photocathode |
| Cheong, Lin Lee |
The Membrane-Alignment Stage in Fabricating 3-Dimensional Nanostructures |
| Cheung, Anthony |
REBL: A Lithography Solution for High Volume Manufacturing at 16 nm (Invited) |
| Cheung, Rebecca |
Piezoelectrically Transduced Silicon Carbide MEMS Double-Clamped Beam Resonators
Optimization the visibility of graphene on poly-Si film by thin-film optics engineering
Bimaterial electro-mechanical systems for audio frequency applications |
| Chhim, Bophan |
Determination of Base Dose and Scattering Coefficients for Proximity Effect Correction in Electron Beam Lithography |
| Chihara, Yoshinori |
Molecular dynamics study on structural modifications of graphene by electron beam irradiation |
| Chiles, Thomas C. |
Imprint-Templated Nanocoaxial Array Architecture |
| Chilukusha, Daniel |
Multiple phase-formation in Ni-Ge system monitored by SEM, AFM and PIXE analytical techniques |
| Cho, Eikhyun |
Development of a large areal metallic nano stamp fabrication process using UV nanoimprinting and pulse reverse current electroforming for discrete track media with pattern width of 35nm |
| Cho, H.K. |
Optimization of Spatial Dose Distribution for Vertical Sidewall of Resist Profile Minimizing Total Dose in Electron-beam Lithography
Fast Simulation of Stochastic Exposure Distribution in Electron-beam Lithography |
| Cho, Joong-Yeon |
Thermal Imprinting Process using ZnO Nanoparticles-Dispersed Resin for the Improvement of Light Extraction Efficiency of GaN-based LEDs |
| Choi, Chang-Hwan |
Fabrication of Polymer Nanostructures via Maskless O2 Plasma Etching
From Nanocone to Nanodisk: Structural Transformation of Nanoarrays via Mechanical Stresses
Nanopatterning of “Disconnected” Metal Nanostructures on Polydimethylsiloxane (PDMS) Substrate by Using Free-Standing Photoresist Film as Stencil Lithography Mask |
| Choi, Chulmin |
Di-block Copolymer Guided Patterning of Graphene
The Blood-Brain-Barrier Crossing in vivo using Magnetic Nanocapsules
Fabrication of omniphobic surfaces using deposited silicon dioxide layer and dry etching process |
| Choi, Duyoung |
Di-block Copolymer Guided Patterning of Graphene
Fabrication of omniphobic surfaces using deposited silicon dioxide layer and dry etching process |
| Choi, Heon |
Concentric Ring Metal-Dielectric Structures for Surface Electromagnetic Wave Assisted Compact Photoelectron Source (Invited) |
| Choi, Hong Kyoon |
Complex self-assembled patterns from a square grid template with restricted geometry |
| Choi, Junho |
Large-Area Nanostructures by Laser-Scanning Imprinting (Invited) |
| Choi, Seonjun |
Fabrication of On-Chip Fluidic Ion Channels using Self-Aligned Double Layer Resist Processing Technique
Negative electron-beam resist hard mask ion-beam etching process for the fabrication of nanoscale magnetic tunnel junctions |
| Chou, Stephen Y. |
New Nanoplasmonic Devices and Fabrication for Large Enhancement and Tunability of Second Harmonic Light Generation
Giant and Uniform Fluorescence Enhancement of Organic Dye by 3D Plasmonic NanoCavity Array |
| Chou, Stephen |
Significant Enhancement of Colloidal Quantum Dots Fluorescence by 3D Disk-dot Coupled Nanoantenna Array
A Tri-layer Method to Fabricate Wafer Scale Nanoimprint Mold by Copolymer Lithography |
| Choukourov, Andrei |
Direct nano-structuring of solid surface by extreme ultraviolet Ar8+ laser |
| christiansen, silke |
Nanowire device concepts for thin film photovoltaics (Invited) |
| Chun, Sungwoo |
Fabrication of On-Chip Fluidic Ion Channels using Self-Aligned Double Layer Resist Processing Technique
Negative electron-beam resist hard mask ion-beam etching process for the fabrication of nanoscale magnetic tunnel junctions |
| Chung, Sung Hwan |
Horizontal Growth of Silicon Nanowire Arrays for Large-Scale Circuit Applications |
| Cibuzar, Greg |
E-Beam Patterning of Nanoparticle Filled Sucrose Resist |
| Clare, Adam |
Surface-Finishing of Focused Ion Beam Milled Features by Pulsed Electron Irradiation |
| Clime, Liviu |
High Aspect Ratio, Triangular Silicon Pillars for Bump Array Concentration of Pathogenic Bacteria |
| Clube, Francis |
Phase shifting mask for high-throughput high-contrast patterning with Displacement Talbot Lithography (DTL)
Optical lithography method for generation of sub-35nm line/space patterns for use in complementary lithography |
| Clyne, Joshua |
REBL: A Lithography Solution for High Volume Manufacturing at 16 nm (Invited) |
| Cohen, Ross |
Bio-Fuel Cell Operational Enhancements using Nanoscale Electrodes |
| Coley, Suzanne |
Low Diffusion EUV Resists using Bound PAG Technology (Invited) |
| College, Boston |
Imprint-Templated Nanocoaxial Array Architecture |
| College, Pomona |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Comboroure, Corinne |
Capped carbon hard mask an innovative route to nanoscale device fabrication |
| Comrie, Craig |
Multiple phase-formation in Ni-Ge system monitored by SEM, AFM and PIXE analytical techniques |
| Con, Celal |
Electron beam lithography using dry thermal development |
| Cooke, Simon |
Modeling of Counter Streaming Charged Beams in MICHELLE–eBEAM |
| Cord, Bryan |
High-Speed Patterning of Hexagonal Dot Arrays Using Electron-Beam Lithography
E-Beam Patterning of Nanoparticle Filled Sucrose Resist |
| Cordeiro, Julien |
3D Capillary Force Assembly : Fabrication of a white light emitter |
| Corneau, Nathalie |
High Aspect Ratio, Triangular Silicon Pillars for Bump Array Concentration of Pathogenic Bacteria |
| Cornet, Marion |
Single digit nanoimprint lithography achieved by template modification with atomic layer deposition |
| Corporation, Crestec |
Development of MEMS electron-optics bonded on electron emitter array for Massively Parallel EB Lithography System |
| Corporation, Nanobeam |
A Large-Aperture Ion-Beam Lens Corrected For Both Chromatic And Spherical Aberration |
| Corporation, Tech-X |
Modeling of defect transport in EUVL plasma chambers |
| Corporation, Toshiba |
Fabrication of 5 Tb/in2 Bit Patterned Media with Servo Pattern using Directed Self-Assembly
Spin on Glass as an Orientation Control Layer for Block Copolymer Direct Self-Assembly |
| Craighead, Harold |
Fabricating Graphene-Silicon Nitride Heterostructures for High-Q Tunable Nanomechanical Resonators
High quality factors in graphene and ultra thin Silicon nitride nanomechanical drums |
| Crendal, Richard |
A Mechanism for Dendritic Nano-Pillar Growth using EBID |
| Crepp, Justin |
Fabrication of a band-limited mask for PHARO |
| Crnogorac, Filip |
Monolithic 3D Integration (Invited)
Monolithic 3D Integration via Al-Ge Bonding of Single Crystal Islands (Invited)
Transfer Processes of Silicon Nanomembranes for Three Dimensional Integration of Photonics and Electronics |
| Cui, Ajuan |
Fabrication of Sealed Nano-channels Based on Sacrificial Nanotemplates by Focused-ion-beam Induced Chemical Vapor Deposition |
| Cui, Bo |
Effect of molecular weight distribution on e-beam resist polystyrene
Periodic tilted Au structure fabrication by electron beam exposure
Electron beam lithography using dry thermal development
Electron beam lithography with evaporated resist
Patterning of porous silicon nitride membrane by CsCl self assembly |
| Cullen, Jared |
A Mechanism for Dendritic Nano-Pillar Growth using EBID |
| Czaplewski, David |
Variation of Proximity Effect Correction Parameters with Density |
D |
| Dagenais, Mario |
Strain Assisted Self Lift-Off Process for the Fabrication Ultra Low Capacitive Antenna Coupled MIM Tunnel Diodes for the Application of Infrared Detection and Energy Harvesting |
| Dai, Huixiong |
Design Space for One-hole Pattern using Block Copolymer Directed Self-Assembly |
| Dai, Jun |
Superconductivity of tungsten-containing carbon nanowires fabricated by focused-ion-beam chemical vapor deposition |
| Dai, Q. |
Optimization of Spatial Dose Distribution for Vertical Sidewall of Resist Profile Minimizing Total Dose in Electron-beam Lithography |
| Dai, Xiaoguang |
Electron-beam Patterned PEG Microgels for DNA Detection |
| Dais, Christian |
Phase shifting mask for high-throughput high-contrast patterning with Displacement Talbot Lithography (DTL)
Optical lithography method for generation of sub-35nm line/space patterns for use in complementary lithography |
| Dam, Henrik |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Darling, Seth |
Enhancing the Etch Resistance of PMMA-Based Photoresist to Meet ITRS Target from Year 2022 |
| Dauskardt, Reinhold |
Monolithic 3D Integration via Al-Ge Bonding of Single Crystal Islands (Invited) |
| Davis, Ron |
Progress Towards An Aberration-Corrected Low Energy Electron Microscope for DNA Sequencing and Surface Analysis |
| Dawson, Paula |
Fabrication of high resolution computer-generated holograms using 3D electron beam lithography. |
| de Angelis, Francesco |
Surface Chemical Imaging at the Nanoscale (Invited)
Breaking the diffusion limit of nanosensors through super hydrophobic and nano plasmonic structures |
| de Pablo, Juan |
Directed Assembly of Symmetric ABA Triblock Copolymers on Chemically Nanopatterned Substrates
A Molecular View of Block Copolymer Directed Assembly and its Application to Sub-Lithographic Patterning (Invited)
Defect Evolution in Thin Films of Self-Assembling Lamella Forming Block Copolymers on a Neutral Surface |
| Dean, Cory |
Scalable Graphene Field Effect Transistors with Boron Nitride Dielectrics (Invited) |
| Delcambre, Sean |
Directed Assembly of Symmetric ABA Triblock Copolymers on Chemically Nanopatterned Substrates |
| DeRose, Guy |
Determination of Base Dose and Scattering Coefficients for Proximity Effect Correction in Electron Beam Lithography |
| Despont, Michel |
Probe nanopatterning: Towards a smarter lithography technology (Invited)
Curved cantilever design for a robust and scalable microelectromechanical switch |
| Dew, Steve |
Study of Line-Edge Roughness in ZEP Resist Nanopatterns from Electron Beam Lithography by Numerical Modeling |
| Dew, Steven K. |
High Aspect Ratio SML Resist Patterning using 30 keV Electron Beam Lithography
Study of the Interaction of Polymethylmethacrylate Fragments with Methyl Isobutyl Ketone |
| Dey, Ripon Kumar |
Effect of molecular weight distribution on e-beam resist polystyrene |
| Dhima, Khalid |
Study of defect mechanisms in partly filled stamp cavities for thermal nano imprint control
Crosslinking control during imprint for hybrid lithography (T-NIL + UV-L) |
| Dhima, Khlid |
Preparation of surfaces with patterned roughness for sensing application |
| Dhuey, Scott |
Single digit nanoimprint lithography achieved by template modification with atomic layer deposition
30 nm nanochannels with plasmonic bowtie nanoantenna
Magneto-optical and X-ray microscopy of nanomagnetic logic components with shape-induced biaxial anisotropy
Fabrication of High Resolution Digital Spectrometers-on-Chip
Sub-10 nm area-selective ALD using block copolymer lithography
Super selective silicon cryo-etching for nanoscale pattern transfer with block copolymer lithogrpahy
Direct Nanoimprinting of Functional Inorganic Layers for Nanophotonic Chip Devices
Tunable Plasmonic Light Trapping Metal Structures
High resolution dry photo-ablation development (Invited) |
| Dias, Guilherme Osvaldo |
3D Capillary Force Assembly : Fabrication of a white light emitter |
| Diettert, Bernt |
Control of the PS-b-PDMS directed self-assembly by silsesquioxane-based graphoepitaxial substrate engineering |
| Ding, Fei |
Giant and Uniform Fluorescence Enhancement of Organic Dye by 3D Plasmonic NanoCavity Array |
| Ding, Wei |
New Nanoplasmonic Devices and Fabrication for Large Enhancement and Tunability of Second Harmonic Light Generation |
| Diop, Babacar |
X-rays and field-emission gun: an intrinsic quasi-monochromatic X-ray source (Invited) |
| DiPiazza, Frank |
Fabrication of Nano-scale, High Throughput, High Aspect Ratio Freestanding Gratings |
| Dittert, Bernd |
Nanometer Size Protein Patterning using nCP for the Investigation of Protein-Protein Interactions in Live Cells |
| Divan, Ralu |
Growth Characterization of Electron Beam Induced Silver Deposition from Liquid Precursor
Nanofabrication with Si(311) |
| Dobisz, Elizabeth |
Image quality and pattern transfer in block copolymer directed assembly with block-selective atomic layer deposition
Directed Self-assembly with Density Multiplication of 6 tera-dot/in2 Pattern by POSS-Containing Block Copolymer
Fabrication of CoCrPt Alloy Bit Patterned Media at 1 Td/in2 for Recording Measurement |
| Docherty, Kevin |
Nanofabrication of high aspect ratio (~50:1) sub-10 nm silicon nanowires using plasma etch technologies
High aspect ratio (~25:1) sub-10 nm HSQ lines using electron beam lithography |
| Doh, Jonggul |
Lithographic Performance of EUV Mask using Coherent Scattering Microscopy |
| Donev, Eugene U. |
Patterning Silver Using an Atomic Force Microscope and Laser-induced Deposition from Liquids (Invited) |
| Doran, Andrew |
Magneto-optical and X-ray microscopy of nanomagnetic logic components with shape-induced biaxial anisotropy |
| Dorfmüller, Jens |
Patterning of Sub-10 nm Optical Apertures on Single Crystal Metallic Films with the Helium Ion Microscope (Invited) |
| Douglas, Erica |
Inductively Coupled Plasma Etching of Benzocyclobutene with SF6 Chemistry |
| Dowsett, David |
Towards Secondary Ion Mass Spectrometry on the Helium Ion Microscope |
| Doxastakis, Manolis |
Measurements of the Latent Image in Chemically-Amplified Resists |
| Drechsler, Ute |
Curved cantilever design for a robust and scalable microelectromechanical switch |
| Drezner, Yariv |
A Quantitative Probe Current Distribution Characterization Technique for Focused Ion Beam |
| Druzhinina, Tamara |
Placement error study of cylindrical phase self-assembly guided by graphoepitaxy |
| Du, Ke |
Fabrication of Polymer Nanostructures via Maskless O2 Plasma Etching
From Nanocone to Nanodisk: Structural Transformation of Nanoarrays via Mechanical Stresses
Nanopatterning of “Disconnected” Metal Nanostructures on Polydimethylsiloxane (PDMS) Substrate by Using Free-Standing Photoresist Film as Stencil Lithography Mask |
| Duan, Huigao |
Plasmonics At The Single-Nanometer Scale (Invited)
Lithographically-Defined Nanostructures for Color Plasmonic Printing |
| Duerig, Urs |
Probe nanopatterning: Towards a smarter lithography technology (Invited) |
| Dunham, Scott |
Scanning Probe Nanostructure Direct-Write: Serial and Parallel Patterning via High Field Chemistry |
| Dupré, Ludovic |
Directed Self-Assembled Porous Anodic Alumina by NanoImprinting Lithography |
| Dustin, Michael |
Screening T-Cell Activation with Nanostructured Substrates |
| Dzurak, Andrew |
Fabrication of high resolution computer-generated holograms using 3D electron beam lithography. |
E |
| Ekinci, Yasin |
High-resolution patterning with EUV interference lithography
Resonant Dielectric Nanostructures for biosensor applications (Invited)
High resolution patterning of Hafnium oxide based resist by EUV and Electron beam lithography |
| Elam, Jeffrey |
Enhancing the Etch Resistance of PMMA-Based Photoresist to Meet ITRS Target from Year 2022 |
| Elek, Jonathan |
Fabrication of Hollow-Shell Nano-volcanoes from Mie Scattering of Colloidal Nanospheres |
| Eliceiri, Brian |
The Blood-Brain-Barrier Crossing in vivo using Magnetic Nanocapsules |
| Elliman, Robert G. |
Nanofabrication of Graphene on SiC by Multi-Ion Beam Lithography and Low-Temperature Processing |
| Emoto, Akira |
Pattern-size Effect of Reorientation of Photoinduced Liquid Crystalline Polymer by Thermal Nanoimprinting
Reorientation Evaluation of Bidirectional Line Pattern on Photoinduced Liquid Crystalline Polymer Fabricated by Thermal Nanoimprinting |
| Engelmann, Sebastian |
Electron beam lithography-based grating customization strategies for gate level patterning in high density SRAM circuits (Invited)
Sub-30 nm pitch circuit relevant patterning in Si, SiO2 and SiN using directed self assembly based pattern generation (Invited) |
| Eriksson, Torbjörn |
High Volume Nanoimprint Lithography technology and applications
Position control of MOVPE grown GaN nanorods using nanoimprint lithography |
| Esashi, Masayoshi |
Development of MEMS electron-optics bonded on electron emitter array for Massively Parallel EB Lithography System |
F |
| Falch, Rolf |
High resolution dry photo-ablation development (Invited) |
| Fan, Li |
Sub-20 nm Metal Gratings by Nanoimprint Lithography
Fabrication of Photonic Devices on Flexible Platform
Fabrication of an 18-layer 3D Woodpile Photonic Crystal via Stacking of Pre-Patterned Free-Standing Membranes |
| Fan, Rong |
Fabrication and Characterization of Field Effect Reconfigurable Nanofluidic Ionic Diodes: Building Blocks Towards Digitally-Programmed Manipulation of Biomolecules |
| Fang, Chao |
Patterning of Sub-10 nm Optical Apertures on Single Crystal Metallic Films with the Helium Ion Microscope (Invited) |
| Fang, Cheng |
Metal Nanoparticle Arrays by Controlled Decomposition of Polymer Particles |
| Faraon, Andrei |
Diamond nitrogen-vacancy centers created by scanning focused helium ion beam and annealing |
| Farber, Jeff |
High Aspect Ratio, Triangular Silicon Pillars for Bump Array Concentration of Pathogenic Bacteria |
| Farkas, Louis |
Progress Towards a Commercial Neon Gas Field Ion Source |
| Farnham, William |
Investigation of Templated Self-assembly of High-χ Diblock Copolymer |
| Farrow, Reginald |
Bio-Fuel Cell Operational Enhancements using Nanoscale Electrodes |
| Farshchian, Bahador |
Bonding of PMMA nanofluidic devices and its effect on DNA behavior in nanochannels
3-D Nanomolding |
| Fattal, David |
Non-periodic sub-wavelength gratings fabricated by helium ion beam lithography |
| Fay, Patrick |
Via-Hole Fabrication for III-V Triple-Junction Solar Cells
High Aspect Ratio Features in PMGI using Electron Beam Lithography and Solvent Developers |
| Fedynyshyn, Theodore |
Electrically Controlled Switchable Adhesion of Dual Nanometer and Micrometer Structured Surfaces
Investigation of Templated Self-assembly of High-χ Diblock Copolymer |
| Ferguson, Mark |
Patterning of porous silicon nitride membrane by CsCl self assembly |
| Fernandez-Cuesta, Irene |
30 nm nanochannels with plasmonic bowtie nanoantenna |
| Fernandez-Dominguez, Antonio |
Plasmonics At The Single-Nanometer Scale (Invited) |
| Ferranti, David |
Deposition and Characterization of Platinum Wires Deposited by a Neon Gas Field Ion Source |
| Ferrier, Nicola |
Defect Evolution in Thin Films of Self-Assembling Lamella Forming Block Copolymers on a Neutral Surface |
| Finders, Jo |
Placement error study of cylindrical phase self-assembly guided by graphoepitaxy |
| Finn, Andreas |
Cleaning Defects of Soft UV-Nanoimprint Molds for High Aspect-Ratio Features |
| Firlar, Emre |
Electron-beam Patterned PEG Microgels for DNA Detection |
| Fischer, Andreas C. |
3D Patterning of Si Micro and Nano Structures by Focused Ion Beam Implantation, Si Deposition and Selective Si Etching |
| Fischer, Wolf-Joachim |
Experimental Investigation on the Short Channel Effect of Nano-Imprinted Organic Field Effect Transistors (Invited)
Cleaning Defects of Soft UV-Nanoimprint Molds for High Aspect-Ratio Features |
| Fleischer, Monika |
Potential modulation by plasmonic sub-micron structures for the manipulation of ultracold atomic gas clouds
Pyramid Array Substrates for Biomedical Studies |
| Fleming, Yves |
Combined SIMS-SPM instrument for high sensitivity and high resolution elemental 3D analysis |
| Ford, Michael |
A Mechanism for Dendritic Nano-Pillar Growth using EBID |
| Fort, Tomas |
Direct nano-structuring of solid surface by extreme ultraviolet Ar8+ laser |
| foubert, philippe |
EUV lithography in pre-production mode (Invited) |
| Foundry, Molecular |
Hyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of “Campanile” Tips |
| Fourkas, John |
Photodeactivatable photoresists for visbile-light nanolithography? |
| France, Grenoble |
Electron Beam Lithography of Antidot Arrays for the Fabrication of Nanogenerators and Detectors in 2DEG Materials |
| Francone, Achille |
Sub-100 nm three dimensional diffractive optical elements fabricated by UV light assisted roll-to-roll nanoimprint lithography
Directed self-assembly of PS-PEO using solvent vapors assisted nanoimprint lithography |
| Freiburg |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Fridmann, Joel |
Nanofabrication of Graphene on SiC by Multi-Ion Beam Lithography and Low-Temperature Processing |
| Frolov, Olexandr |
Direct nano-structuring of solid surface by extreme ultraviolet Ar8+ laser |
| Fu, Joseph |
Fabrication of nano structures for Dimensional Metrology and Device Applications |
| Fu, Peng-Fei |
Wire-Grid Polarizer by Nanoimprint Lithography Using Epoxysilsesquioxane |
| Fucetola, Corey |
The Membrane-Alignment Stage in Fabricating 3-Dimensional Nanostructures |
| Fuchs, Ehud |
Determining Tip Position Tolerances for Atomically Precise STM lithography of Si(001):H
Automated position corrections for Atomically Precise STM lithography of Si(001):H |
| Fujimaki, Makoto |
Optical and Electrical Sensing application of High-Aspect-Ratio Nanoholes Formed by Etching of Latent Tracks |
| Fujita, Jun-ichi |
Strain characteristics of free-standing graphene induced by low-energy electron beam irradiation |
| Fuller, Nicholas |
Electron beam lithography-based grating customization strategies for gate level patterning in high density SRAM circuits (Invited) |
| Funakoshi, Ryo |
High Resolution Patterning on Non-Planar Substrates with Large Height Variation Using Electron-Beam Lithography |
G |
| G., Amir Tavakkoli K. |
Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films
Block Copolymer Self-Assembly Using Sacrificial Template
Achieving Ordered Nanoholes and Other Non-bulk Morphologies by Directed Self-Assembly of a Block Copolymer |
| Galagan, Yulia |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Gao, Jinming |
Development of jet rollable nanoimprint process to fabricate bio-polymer nanostructures |
| Garcia de Oteyza, Dimas |
High resolution dry photo-ablation development (Invited) |
| Gargas, Daniel |
30 nm nanochannels with plasmonic bowtie nanoantenna |
| Gaskill, D.K. |
Graphene for RF Applications: Opportunities & Challenges (Invited) |
| Gauzner, Gene |
Cleaning Induced Imprint Template Erosion
Progress and Challenges in Bit Patterned Media Nanofabrication (Invited) |
| Gavagnin, Marco |
Focused Electron Beam Induced Deposition as novel nanofabrication approach for magnetic nanosensors and nanomagnet logic
Magnetic reversal of iron nanowires deposited by Focused Electron Beam Induced Deposition for nanomagnet logic application |
| Ge, Yang |
Experimental Investigation on the Short Channel Effect of Nano-Imprinted Organic Field Effect Transistors (Invited) |
| Geiss, Reinhard |
Lithium Niobate Nanowaveguides fabricated by Ion-Beam Enhanced Etching |
| Gentile, Pascal |
Directed Self-Assembled Porous Anodic Alumina by NanoImprinting Lithography |
| Gestmann, Ingo |
Optimization of the Gun, Lenses, and Detectors for High-Vacuum SEM Studies of Non-Conductive Specimens |
| Gevorgyan, Suren |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Ghadarghadr, Shabnam |
The Membrane-Alignment Stage in Fabricating 3-Dimensional Nanostructures |
| Ghassemi, Saba |
Sub-micron scale gold-tipped elastomeric pillar arrays for human T cell activation and culture |
| Giangregorio, Maria |
Micro- and Nanostructuring of Graphene on various Substrates using UV-NIL |
| Giessen, Harald |
Patterning of Sub-10 nm Optical Apertures on Single Crystal Metallic Films with the Helium Ion Microscope (Invited) |
| Gila, Brent |
Nanofabrication of Graphene on SiC by Multi-Ion Beam Lithography and Low-Temperature Processing |
| Glatzel, Thilo |
Combined SIMS-SPM instrument for high sensitivity and high resolution elemental 3D analysis |
| Gleason, Arianna |
System to Measure the Shear Modulus of Iron at high temperature and pressure using Transverse Displacement Interferometry Fabricated by Electron Beam Lithography |
| GmbH, Raith |
Continuous Electron Beam Lithography Writing Modes for Optical Waveguide Nanofabrication |
| Gobrecht, Jens |
Resonant Dielectric Nanostructures for biosensor applications (Invited)
High resolution patterning of Hafnium oxide based resist by EUV and Electron beam lithography |
| Goethals, Mieke |
EUV lithography in pre-production mode (Invited) |
| Goldsman, Neil |
Strain Assisted Self Lift-Off Process for the Fabrication Ultra Low Capacitive Antenna Coupled MIM Tunnel Diodes for the Application of Infrared Detection and Energy Harvesting |
| Goltsov, Alexander |
Fabrication of High Resolution Digital Spectrometers-on-Chip |
| Gölzhäuser, Armin |
1 nm Thick Chemically Functionalized Carbon Nanomembranes (CNMs): Two-dimensional Materials for Nanoengineering |
| Gondarenko, Alexander |
Fabricating Graphene-Silicon Nitride Heterostructures for High-Q Tunable Nanomechanical Resonators
Sub-micron scale gold-tipped elastomeric pillar arrays for human T cell activation and culture
Screening T-Cell Activation with Nanostructured Substrates |
| Gong, Peng |
Fast Aerial Image Simulation for Partially Coherent Systems by TCC Decomposition with Analytical Kernels (Invited) |
| Goodman, Russell |
Investigation of Templated Self-assembly of High-χ Diblock Copolymer |
| Goodwin, Frank |
EUV Mask Challenges, Status & Closing The Remaining Technology Gaps (Invited)
Understanding the sources of unwanted etch in ion beam sputter deposition production of EUV mask blanks |
| Gorisse, Therese |
Directed Self-Assembled Porous Anodic Alumina by NanoImprinting Lithography |
| Goto, Hiroshi |
Fast and Continuous Patterning on the Surface of Plastic Fiber by Using Thermal Roller Imprint |
| Gotrik, Kevin W. |
Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films
Block Copolymer Self-Assembly Using Sacrificial Template
Achieving Ordered Nanoholes and Other Non-bulk Morphologies by Directed Self-Assembly of a Block Copolymer |
| Gotrik, Kevin |
Sub-20 nm fabrication on polyimide plastics enabled by directed self-assembly |
| Graczyk, Mariusz |
Optimization of a Self-Closing Effect to Produce Bottle-Shaped Nanochannels in Quartz |
| Graham, William |
Electron beam lithography-based grating customization strategies for gate level patterning in high density SRAM circuits (Invited) |
| Graupera, Anthony |
A Mass Filtered Plasma FIB |
| Greenwald, Anton |
Continuous fabrication of large-area flexible metamaterial via Roll-to-Roll nanopatterning for IR filter applications |
| Greenway, Robert |
An all-optical process for extending GRATE to the 11nm (20nm hp) Technology Node (Invited) |
| Greenzweig, Yuval |
A Quantitative Probe Current Distribution Characterization Technique for Focused Ion Beam |
| Greil, Johannes |
Engineering electrical properties of Silicon nanowires by focused electron beam induced processing with Chlorine |
| Griffin, Peter |
Monolithic 3D Integration (Invited) |
| Grobis, Michael |
Fabrication of CoCrPt Alloy Bit Patterned Media at 1 Td/in2 for Recording Measurement |
| Grogg, Daniel |
Curved cantilever design for a robust and scalable microelectromechanical switch |
| Gronheid, Roel |
Relationship between Film Thickness Loss and Polymer Deprotection for EUV and ArF Photoresists |
| Groves, Timothy |
Concentric Ring Metal-Dielectric Structures for Surface Electromagnetic Wave Assisted Compact Photoelectron Source (Invited) |
| Gruetzner, Gabi |
Polymeric freestanding structures by direct write laser without sacrificial layers
Release-Optimized UV-NIL Resists |
| Gu, Changzhi |
Fabrication of Sealed Nano-channels Based on Sacrificial Nanotemplates by Focused-ion-beam Induced Chemical Vapor Deposition
The Sensing Properties of IR Nanostructed Plasmonic Crystals Fabricatied by Electron Beam Lithography and Argon Ion Milling
Enhancement of Light-Emitting Efficiency for GaN-based Light-Emitting Diodes by Nanoscale Bump and Pit ITO Surface |
| Gu, Xiaodan |
Super selective silicon cryo-etching for nanoscale pattern transfer with block copolymer lithogrpahy |
| Gu, Zheng |
Magneto-optical and X-ray microscopy of nanomagnetic logic components with shape-induced biaxial anisotropy |
| Guan, Weihua |
Fabrication and Characterization of Field Effect Reconfigurable Nanofluidic Ionic Diodes: Building Blocks Towards Digitally-Programmed Manipulation of Biomolecules |
| Gubiotti, Thomas |
REBL: A Lithography Solution for High Volume Manufacturing at 16 nm (Invited) |
| Guezenko, Vitaliy |
High resolution patterning of Hafnium oxide based resist by EUV and Electron beam lithography |
| Guillorn, Michael |
Electron beam lithography-based grating customization strategies for gate level patterning in high density SRAM circuits (Invited)
Sub-30 nm pitch circuit relevant patterning in Si, SiO2 and SiN using directed self assembly based pattern generation (Invited) |
Guo, Jay
Angle Independent Reflective Color Filters by Plasmonic-induced Light Funneling Effect |
| Guo, L. Jay |
Vibrational Indentation Patterning of Grating Structures with Real-time Period Tunability
Controlling Nanostructures in Organic Photovoltaic Cells (Invited)
Continuous roller photolithography and application to large area IR metamaterial fabrication
Nanostructured, Active Electrostatic Trap for Confining Nanometric Objects in a Fluid: mimicking DNA-Protein interactions in a synthetic system
Development of continuous phase lithography and application to transparent conductor fabrication
Wire-Grid Polarizer by Nanoimprint Lithography Using Epoxysilsesquioxane
Continuous fabrication of polymer waveguides with smooth sidewalls by Dynamic Nano-Inscribing (DNI) and NanoChannel-guided Lithography (NCL) processes (Invited)
Continuous fabrication of large-area flexible metamaterial via Roll-to-Roll nanopatterning for IR filter applications |
| Guo, Lingjie |
High aspect-ratio doped Si nanostructures for plasmonics induced light funneling applications |
| Guzenko, Vitaliy |
3-D microfabrication based on a glass transition temperature selective thermal reflow - towards optical applications
Resonant Dielectric Nanostructures for biosensor applications (Invited) |
| Gylfason, Kristinn B. |
3D Patterning of Si Micro and Nano Structures by Focused Ion Beam Implantation, Si Deposition and Selective Si Etching |
| Gysin, Urs |
Combined SIMS-SPM instrument for high sensitivity and high resolution elemental 3D analysis |
H |
| Habanyama, Adriaan |
Multiple phase-formation in Ni-Ge system monitored by SEM, AFM and PIXE analytical techniques |
| Hackl, Wolfgang |
Micro- and Nanostructuring of Graphene on various Substrates using UV-NIL |
| Hagemann, Falk |
Experimental Investigation on the Short Channel Effect of Nano-Imprinted Organic Field Effect Transistors (Invited) |
| Hagen, Cornelis W. |
Electron impact gas ion source development; evaluation of different electron injection sources (Invited) |
| Hagleitner, Christoph |
Curved cantilever design for a robust and scalable microelectromechanical switch |
| Hamaguchi, Tetsuya |
Large-Area Nanostructures by Laser-Scanning Imprinting (Invited)
Injection compression molding of replica molds for nanoimprint lithography
Effect of offset temperature on replication of laser-assisted imprinting |
| Hamilton, Alister |
Bimaterial electro-mechanical systems for audio frequency applications |
| Han, Hee-Sun |
Templated Placement of Colloidal Quantum Dots |
| Han, Jungjin |
Development of a large areal metallic nano stamp fabrication process using UV nanoimprinting and pulse reverse current electroforming for discrete track media with pattern width of 35nm |
| Hannon, Adam F. |
Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films
Complex self-assembled patterns from a square grid template with restricted geometry
Block Copolymer Self-Assembly Using Sacrificial Template
Achieving Ordered Nanoholes and Other Non-bulk Morphologies by Directed Self-Assembly of a Block Copolymer |
| Hao, Hanfang |
Patterning of Sub-10 nm Optical Apertures on Single Crystal Metallic Films with the Helium Ion Microscope (Invited) |
| Harada, Tetsuo |
Development of Standalone Coherent EUV Scatterometry Microscope for EUV Mask Observation
At-Wavelength EUV Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors |
| Haraguchi, Takeshi |
Multi-axis and Multi-beam technology for high throughput maskless E-beam lithography |
| Harris-Jones, Jenah |
EUV Mask Challenges, Status & Closing The Remaining Technology Gaps (Invited) |
| Harteneck, Bruce |
Sub-10 nm area-selective ALD using block copolymer lithography
Super selective silicon cryo-etching for nanoscale pattern transfer with block copolymer lithogrpahy
High resolution dry photo-ablation development (Invited) |
| Hartung, Holger |
Lithium Niobate Nanowaveguides fabricated by Ion-Beam Enhanced Etching |
| Haruyama, Yuichi |
Characteristics of mechanical vibration in imprinted nanostructures
Pattern-size Effect of Reorientation of Photoinduced Liquid Crystalline Polymer by Thermal Nanoimprinting
Reorientation Evaluation of Bidirectional Line Pattern on Photoinduced Liquid Crystalline Polymer Fabricated by Thermal Nanoimprinting
Study of demolding Characteristics in continuous UV nanoimprinting |
| Harvey, Tyler |
Sculpting Electron Beam Profile and Phase with Nanofabricated Diffractive Optics |
| Hasegawa, Hirokazu |
Directed Self-assembly with Density Multiplication of 6 tera-dot/in2 Pattern by POSS-Containing Block Copolymer |
| Hastings, J. T. |
Liquid phase electron beam induced deposition of CdS |
| Hastings, J. Todd |
Patterning Silver Using an Atomic Force Microscope and Laser-induced Deposition from Liquids (Invited) |
| Hatakeyama, Taiki |
Quality factor improvement of graphene resonator by SU-8 shrinkage-induced strain |
| Hatano, Hiroshi |
Development of a large areal metallic nano stamp fabrication process using UV nanoimprinting and pulse reverse current electroforming for discrete track media with pattern width of 35nm |
| Hatano, Tadashi |
At-Wavelength EUV Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors |
| Haug, Franz-Josef |
Stencil-nanopatterned back reflector increases efficiency of thin-film solar cells |
| Hayakawa, Teruaki |
Directed Self-assembly with Density Multiplication of 6 tera-dot/in2 Pattern by POSS-Containing Block Copolymer |
| He, Hong |
Combining SIMS with GPA of aberration corrected HAADF STEM images for measurement of misfit strain in epitaxial SiGe layers |
| He, Jian |
Experimental Investigation on the Short Channel Effect of Nano-Imprinted Organic Field Effect Transistors (Invited) |
| Hebard, Arthur F. |
Nanofabrication of Graphene on SiC by Multi-Ion Beam Lithography and Low-Temperature Processing |
| Hedrick, James |
Probe nanopatterning: Towards a smarter lithography technology (Invited) |
| Hegde, Ravi S. |
Lithographically-Defined Nanostructures for Color Plasmonic Printing |
| Heidari, Babak |
High Volume Nanoimprint Lithography technology and applications
Position control of MOVPE grown GaN nanorods using nanoimprint lithography |
| Heilmann, Ralf |
Fabrication of Nano-scale, High Throughput, High Aspect Ratio Freestanding Gratings |
| Heinig, Karl-Heinz |
Taming Nanostructures: From Sponge to Dot Pattern on Ge Controlled by Heavy-Ion-Deposited Energy |
| Helgert, Christian |
Micro- and Nanostructuring of Graphene on various Substrates using UV-NIL |
| Hellwig, Olav |
Fabrication of CoCrPt Alloy Bit Patterned Media at 1 Td/in2 for Recording Measurement |
| Hendel, Rudi |
An all-optical process for extending GRATE to the 11nm (20nm hp) Technology Node (Invited) |
| Henderson, Clifford |
High Resolution Negative Tone Resists via Controlled Polymerization
Production of sub-20nm Pitch Features from Directed Self Assembly of High Chi Polymers via a Selective Block Removal Process Utilizing Atomic Layer Deposition (Invited) |
| Hendrickx, Eric |
EUV lithography in pre-production mode (Invited) |
| Hermans, Jan |
EUV lithography in pre-production mode (Invited) |
| Hermenau, Martin |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Hesselink, Lambertus |
Nanoscale Photoelectron Emission Using C-shaped Nanoapertures with Cesium Bromide Photocathode |
| Hetzel, Martin |
Engineering electrical properties of Silicon nanowires by focused electron beam induced processing with Chlorine |
| Hieno, Atsushi |
Spin on Glass as an Orientation Control Layer for Block Copolymer Direct Self-Assembly |
| Hiller, J.M. |
Plasmonic Nanostructures Fabricated using Helium and Gallium Ion Beam Instruments. |
| Hinds, Bruce |
Electrophoretic and electroosmotic flow through carbon nanotube membranes as chemical pumps |
| Hirai, Yoshihiko |
Study of defect mechanisms in partly filled stamp cavities for thermal nano imprint control
Molecular dynamics study on structural modifications of graphene by electron beam irradiation
Molecular simulation of electron-irradiation damages in resist materials (Invited)
Impact of Mold-Resist Roughness on Friction and Adhesion Properties by Nano Tribological Inspection
Study on De-molding Kinetics of Peeling and Perpendicular Releasing in NIL process
Filling Characteristics of Imprint Process for Concave Pattern Molds |
| Hirano, Ryoichi |
Residual-type mask defect printability for EUV lithography
Dependence of Image Characteristics Dependece on Incident Electron Beam Energy for EUV Mask inspection using Monte Carlo simulation |
| Hirayama, Yoshiyuki |
Etching Process for Patten Transfer from Sphere-type PMMA-b-PMAPOSS Block Copolymer |
| Hiroshiba, Nobuya |
Sub-10 nm area-selective ALD using block copolymer lithography |
| Hiroshima, Hiroshi |
Full area real time monitoring of filling process by dark field illumination in UV nanoimprint lithography (Invited)
Replacement of Trapped Air by Fluoride Liquid in Thermal Nanoimprint
Study of demolding Characteristics in continuous UV nanoimprinting |
| Hishiro, Yoshi |
Fundamental Study of EUV Resist Line Edge Roughness: Characterization, Experiment and Modeling |
| Hoa, Xuyen |
High Aspect Ratio, Triangular Silicon Pillars for Bump Array Concentration of Pathogenic Bacteria |
| Hoffman, Galen |
Electron Beam Direct Write of Chalcogenide Glass Integrated Optics |
| Hoffman, Ulrich |
Point spread function analysis of dense high resolution nanodots in hydrogen silsesquioxane |
| Hofmann, Ulrich |
Mask Aligner Process Simulation for Advanced Lithography and Resolution Enhancement Techniques |
| Hoga, Morihisa |
Phase shifting mask for high-throughput high-contrast patterning with Displacement Talbot Lithography (DTL)
Au Nanorods and Nanogap Split-Ring Structures Fabricated by Reactive-Monolayer-Assisted Thermal Nanoimprinting and Electrodeposition |
| Hojeij, Mohamad |
High-resolution patterning with EUV interference lithography
Resonant Dielectric Nanostructures for biosensor applications (Invited)
High resolution patterning of Hafnium oxide based resist by EUV and Electron beam lithography |
| Holzner, Felix |
Probe nanopatterning: Towards a smarter lithography technology (Invited) |
| Hone, James |
Scalable Graphene Field Effect Transistors with Boron Nitride Dielectrics (Invited)
Fabricating Graphene-Silicon Nitride Heterostructures for High-Q Tunable Nanomechanical Resonators
Sub-micron scale gold-tipped elastomeric pillar arrays for human T cell activation and culture
Screening T-Cell Activation with Nanostructured Substrates |
| Hong, Seongchul |
Lithographic Performance of EUV Mask using Coherent Scattering Microscopy |
| Hoppe, Harald |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Hopstaken, Marinus |
Combining SIMS with GPA of aberration corrected HAADF STEM images for measurement of misfit strain in epitaxial SiGe layers |
| Horng, Lance |
Fabrication and magnetic properties of hundred-nanometer-scaled permalloy cylinders arrays |
| Hornung, Michael |
Mask Aligner Process Simulation for Advanced Lithography and Resolution Enhancement Techniques |
| Hösel, Markus |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Hsu, Wei-Hao |
Low-Energy Electron Diffraction Microscopy Based on a Single-Atom Electron Source |
| Hsu, Yautzong |
Cleaning Induced Imprint Template Erosion |
| Hu, Junqiang |
Screening T-Cell Activation with Nanostructured Substrates |
| Hu, Walter |
Nanoimprinted Polymer Solar Cell
Development of jet rollable nanoimprint process to fabricate bio-polymer nanostructures |
| Hu, Weihua |
SPM Local Oxidation and In-situ Characterization Using AFM Probes in Multiple Modes |
| Hua, Yueming |
Fundamental Study of EUV Resist Line Edge Roughness: Characterization, Experiment and Modeling |
| Huang, Gaoshan |
Dry-Release Self-assembling of Microtube Arrays for Catalytic Micropump Application
Novel techniques for modifying microtube surface with various periodic structures ranging from nano to micro scale |
| Huang, Jian-Hao |
Employing Nano Imprint to Fabricate Space-Charge-Limited Transistors (SCLTs) |
| Huang, Y. C. |
Fabrication and magnetic properties of hundred-nanometer-scaled permalloy cylinders arrays |
| Huang, Yu-chen |
Surface plasmon resonance coupling assisted optical transmission through Ag/SiN /Ag photonic crystal slabs |
| Huang, Zhihong |
Diamond nitrogen-vacancy centers created by scanning focused helium ion beam and annealing
Patterning nitrogen-vacancy color centers in diamond using scanning focused helium ion beam |
| Huber, Christina |
Metal Nanoparticle Arrays by Controlled Decomposition of Polymer Particles |
| Hudson, Fay |
Fabrication of high resolution computer-generated holograms using 3D electron beam lithography. |
| Huynh, C. |
Plasmonic Nanostructures Fabricated using Helium and Gallium Ion Beam Instruments. |
| Huynh, Chuong |
Nanoscale Photoelectron Emission Using C-shaped Nanoapertures with Cesium Bromide Photocathode |
| Hwang, Ing-Shouh |
Low-Energy Electron Diffraction Microscopy Based on a Single-Atom Electron Source |
| Hwang, Seoyeong |
Design and fabrication of micro optical system for multi-optical probe confocal microscopy for large areal measurement |
| Hwangbo, Chang Kwon |
Optical Performance of Binary Mask with a Tantalum Telluride Absorber Layer for Extreme Ultraviolet Lithography (Invited) |
| Hwu, Justin |
SEM dimensional metrology on sub-15 nm bit-patterned media using model-based analysis |
I |
| Iida, Susumu |
Residual-type mask defect printability for EUV lithography
Dependence of Image Characteristics Dependece on Incident Electron Beam Energy for EUV Mask inspection using Monte Carlo simulation |
| Ikegami, Naokatsu |
Development of MEMS electron-optics bonded on electron emitter array for Massively Parallel EB Lithography System |
| Ilg, Michael |
Improved single ion implantation with scanning probe alignment |
| Ilic, Rob |
High quality factors in graphene and ultra thin Silicon nitride nanomechanical drums |
| Inazuki, Yuichi |
Residual-type mask defect printability for EUV lithography |
| Inomata, Naoki |
Vacuum-packaged Resonant Thermal Sensor for Biological Cell in liquid (MNC Paper) |
| Inoue, Takao |
Additional and correction patterning of resist layer using scanning probe lithography |
| Intonti, Francesca |
Hyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of “Campanile” Tips
Towards the holy grail of near field optics via reproducibly fabricated optical nano antennae on Scanning Probe Tips |
| Iqbal, Zafar |
Bio-Fuel Cell Operational Enhancements using Nanoscale Electrodes |
| Ishida, Yoshihito |
Directed Self-assembly with Density Multiplication of 6 tera-dot/in2 Pattern by POSS-Containing Block Copolymer |
| Ishihara, Sunao |
Superconductivity of tungsten-containing carbon nanowires fabricated by focused-ion-beam chemical vapor deposition
The three-dimensional nanostructure fabrication from HSQ by FIB/EB dual-beam lithography
Quality factor improvement of graphene resonator by SU-8 shrinkage-induced strain
Electron Beam Lithography by Using Self-Assembled Block Copolymer Thin Films as Positive/Negative Tone Combined Resist
Nanomechanical Tuning Forks Fabricated by Focused-ion-beam Chemical Vapor Deposition |
| Ishikawa, Toyofumi |
Diamond nitrogen-vacancy centers created by scanning focused helium ion beam and annealing |
| Ismail, Bassem |
Engineering electrical properties of Silicon nanowires by focused electron beam induced processing with Chlorine |
| Isoyan, Artak |
Defect Tolerant Extreme Ultraviolet Lithography |
| Itani, Toshiro |
An In situ Analysis of EUV Resist Film Inhomogeneity during the Dissolution Process |
| Ito, Shunya |
Release Layer Free Acrylate Resins for Ultraviolet Nanoimprinting Prepared by Adding Segregation Auxiliary Agents |
| Itoh, Kimio |
Phase shifting mask for high-throughput high-contrast patterning with Displacement Talbot Lithography (DTL) |
| Ivanov, Andre |
Diameter Dependence of the Effect of Light Polarization on Interband Transitions in Zigzag Carbon Nanotubes |
| Ivonin, Igor |
Fabrication of High Resolution Digital Spectrometers-on-Chip |
| Iwase, Taku |
Etching Process for Patten Transfer from Sphere-type PMMA-b-PMAPOSS Block Copolymer |
| Iyoda, Tomokazu |
Directed Self-Assembly of Perpendicularly Oriented Nano-Cylinders with Liquid Crystalline Block Copolymer |
| Iyoshi, Shuso |
Study of demolding Characteristics in continuous UV nanoimprinting |
J |
| Jahn, Andreas |
Experimental Investigation on the Short Channel Effect of Nano-Imprinted Organic Field Effect Transistors (Invited) |
| Jain, Vipul |
Low Diffusion EUV Resists using Bound PAG Technology (Invited) |
| Jaksch, Heiner |
The contrast mechanisms of LL-BSE electrons from Hybridization & Band Gaps |
| Japan |
Vacuum-packaged Resonant Thermal Sensor for Biological Cell in liquid (MNC Paper) |
| Jarnagin, Nathan |
Production of sub-20nm Pitch Features from Directed Self Assembly of High Chi Polymers via a Selective Block Removal Process Utilizing Atomic Layer Deposition (Invited) |
| Jarro, Carlos Andres |
Patterning Silver Using an Atomic Force Microscope and Laser-induced Deposition from Liquids (Invited) |
| Jeanmaire, Damien |
Determination of Base Dose and Scattering Coefficients for Proximity Effect Correction in Electron Beam Lithography |
| Jede, Ralf |
Stitch-Error Free Electron Beam Lithography of Periodic Structures |
| Jena, Debdeep |
High Aspect Ratio Features in PMGI using Electron Beam Lithography and Solvent Developers |
| Jenkins, Derek |
Fresnel zone plates as X-ray lenses by electron beam lithography with HSQ resist |
| Jhon, Young Min |
Image Compensation of Mask Misalignment in Aerial Image Microscope System |
| Ji, Shengxiang |
Directed Assembly of Symmetric ABA Triblock Copolymers on Chemically Nanopatterned Substrates |
| Jiang, Wenjun |
Scanning Probe Nanostructure Direct-Write: Serial and Parallel Patterning via High Field Chemistry |
| Jin, Chongjun |
Non-planar nano-arc-gap arrays fabricated via colloidal lithography |
| Jin, Peng |
Model of Curing Shrinkage and Kinetics Parameters of Acrylate-based UV-embossing Resist Based on Free Volume Theory |
| Jin, Sungho |
Di-block Copolymer Guided Patterning of Graphene
The Blood-Brain-Barrier Crossing in vivo using Magnetic Nanocapsules
Fabrication of omniphobic surfaces using deposited silicon dioxide layer and dry etching process |
| Jindal, Vibhu |
EUV Mask Challenges, Status & Closing The Remaining Technology Gaps (Invited)
Modeling of defect transport in EUVL plasma chambers
Understanding the sources of unwanted etch in ion beam sputter deposition production of EUV mask blanks |
| jinglei, Du |
Study of nanospheres lithography technology with super-lens for fabricating nano holes
Fabrication of nano metallic holes for color filter based on a controllable polystyrene spheres self-assemble |
| Jo, Han-Byeol |
Thermal Imprinting Process using ZnO Nanoparticles-Dispersed Resin for the Improvement of Light Extraction Efficiency of GaN-based LEDs |
| John, Arun |
Modeling of defect transport in EUVL plasma chambers |
| Johnston, Danvers E. |
Image quality and pattern transfer in block copolymer directed assembly with block-selective atomic layer deposition |
| jonckheere, rik |
EUV lithography in pre-production mode (Invited) |
| Jørgensen, Mikkel |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Joselevich, Ernesto |
Nanowires with controlled location and direction by surface-guided growth from patterned catalyst |
| Joshi-Imre, Alexandra |
Growth Characterization of Electron Beam Induced Silver Deposition from Liquid Precursor |
| Joy, David |
Modeling for Multi-Beam Ion Imaging and Analysis |
| Juarros, Aritz |
Enhanced Transmission through Gold Nanohole Arrays Fabricated by Thermal Nanoimprint Lithography for Surface Plasmon Based Biological Sensing |
| Judokusumo, Edward |
Screening T-Cell Activation with Nanostructured Substrates |
| Jugessur, Aju |
Nanolithography and pattern transfer of dense sub-10 nm lines |
| Jun, David |
Energy Spread Measurement of an Electron Impact Gas Ion Source Equipped with a Miniaturized Gas Chamber
Electron impact gas ion source development; evaluation of different electron injection sources (Invited) |
| Jung, Myungki |
Design and fabrication of micro optical system for multi-optical probe confocal microscopy for large areal measurement |
| Jung, Yunbum |
Dual-Layer Thermal Nanoimprint Lithography without Dry Etching |
K |
| Kadaksham, Arun John |
EUV Mask Challenges, Status & Closing The Remaining Technology Gaps (Invited) |
| Kadowaki, Takuya |
Strain characteristics of free-standing graphene induced by low-energy electron beam irradiation |
| Kahl, Michael |
Stitch-Error Free Electron Beam Lithography of Periodic Structures
Continuous Electron Beam Lithography Writing Modes for Optical Waveguide Nanofabrication |
| Kallaher, R.L. |
Stable Field Emission from Nanoporous Silicon Carbide Tips Patterned by a Focused Ion Beam(Invited) |
| Kam, Lance |
Screening T-Cell Activation with Nanostructured Substrates |
| Kamata, Yoshiyuki |
Fabrication of 5 Tb/in2 Bit Patterned Media with Servo Pattern using Directed Self-Assembly |
| Kaneko, Shu |
Study of demolding Characteristics in continuous UV nanoimprinting |
| Kang, Hee Young |
Optical Performance of Binary Mask with a Tantalum Telluride Absorber Layer for Extreme Ultraviolet Lithography (Invited) |
| Kang, M.-G. |
Stable Field Emission from Nanoporous Silicon Carbide Tips Patterned by a Focused Ion Beam(Invited) |
| Kang, Myung-Gyu |
Continuous fabrication of large-area flexible metamaterial via Roll-to-Roll nanopatterning for IR filter applications |
| Kang, Shinill |
Design and fabrication of micro optical system for multi-optical probe confocal microscopy for large areal measurement
Development of a large areal metallic nano stamp fabrication process using UV nanoimprinting and pulse reverse current electroforming for discrete track media with pattern width of 35nm |
| Kang, Yongfeng |
Calculation of high order aberrations of practical multi-pole type electron optical aberration correctors using a differential algebraic method |
| Kang, Yuji |
Characteristics of mechanical vibration in imprinted nanostructures |
| Kannan, Ethirajulu |
Electron Beam Lithography of Antidot Arrays for the Fabrication of Nanogenerators and Detectors in 2DEG Materials |
| Kanwal, Alokik |
Bio-Fuel Cell Operational Enhancements using Nanoscale Electrodes |
| Kaplan, Alex |
High aspect-ratio doped Si nanostructures for plasmonics induced light funneling applications |
| Karbasian, Golnaz |
High Aspect Ratio Features in PMGI using Electron Beam Lithography and Solvent Developers |
| Karg, Matthias |
Metal Nanoparticle Arrays by Controlled Decomposition of Polymer Particles |
| Katine, Jordan |
Fabrication of CoCrPt Alloy Bit Patterned Media at 1 Td/in2 for Recording Measurement |
| Kawata, Hiroaki |
Molecular dynamics study on structural modifications of graphene by electron beam irradiation
Molecular simulation of electron-irradiation damages in resist materials (Invited)
Impact of Mold-Resist Roughness on Friction and Adhesion Properties by Nano Tribological Inspection
Study on De-molding Kinetics of Peeling and Perpendicular Releasing in NIL process
Filling Characteristics of Imprint Process for Concave Pattern Molds |
| Kawatsuki, Nobuhiro |
Pattern-size Effect of Reorientation of Photoinduced Liquid Crystalline Polymer by Thermal Nanoimprinting
Reorientation Evaluation of Bidirectional Line Pattern on Photoinduced Liquid Crystalline Polymer Fabricated by Thermal Nanoimprinting |
| Kearney, Patrick |
EUV Mask Challenges, Status & Closing The Remaining Technology Gaps (Invited)
Modeling of defect transport in EUVL plasma chambers
Understanding the sources of unwanted etch in ion beam sputter deposition production of EUV mask blanks |
| Keast, Craig L. |
Overcoming 3DIC Technology Hurdles (Invited) |
| Kehagias, Nikolaos |
Sub-100 nm three dimensional diffractive optical elements fabricated by UV light assisted roll-to-roll nanoimprint lithography
Directed self-assembly of PS-PEO using solvent vapors assisted nanoimprint lithography |
| Kellogg, S. |
Computer Modeling of the Schottky Electron Source |
| Kercher, Dan |
Fabrication of CoCrPt Alloy Bit Patterned Media at 1 Td/in2 for Recording Measurement |
| Kern, Dieter P. |
Potential modulation by plasmonic sub-micron structures for the manipulation of ultracold atomic gas clouds |
| Kern, Dieter |
Pyramid Array Substrates for Biomedical Studies |
| Kessel, Cynthia |
Growth Characterization of Electron Beam Induced Silver Deposition from Liquid Precursor |
| Khaira, Gurdaman |
Defect Evolution in Thin Films of Self-Assembling Lamella Forming Block Copolymers on a Neutral Surface |
| Khamwannah, Jirapon |
The Blood-Brain-Barrier Crossing in vivo using Magnetic Nanocapsules
Fabrication of omniphobic surfaces using deposited silicon dioxide layer and dry etching process |
| Khizroev, Sakhrat |
Multi-domain storage in graded bit patterned media (Invited)
Fabrication of dense non-circular nanomagnetic device arrarys using self-limiting low-energy glow-discharge processing |
| Kidwingira, Francoise |
REBL: A Lithography Solution for High Volume Manufacturing at 16 nm (Invited) |
| Kihara, Naoko |
Fabrication of 5 Tb/in2 Bit Patterned Media with Servo Pattern using Directed Self-Assembly |
| Kikitsu, Akira |
Fabrication of 5 Tb/in2 Bit Patterned Media with Servo Pattern using Directed Self-Assembly |
| Kilbey, Michael S, II |
Probing Nanostructures of Aged Active Layer Materials for Organic Solar Cells |
| Kim, B.G. |
Optimization of Spatial Dose Distribution for Vertical Sidewall of Resist Profile Minimizing Total Dose in Electron-beam Lithography
Fast Simulation of Stochastic Exposure Distribution in Electron-beam Lithography |
| Kim, Bongho |
Fabrication of On-Chip Fluidic Ion Channels using Self-Aligned Double Layer Resist Processing Technique
Negative electron-beam resist hard mask ion-beam etching process for the fabrication of nanoscale magnetic tunnel junctions |
| Kim, Daehong |
Fabrication of On-Chip Fluidic Ion Channels using Self-Aligned Double Layer Resist Processing Technique
Negative electron-beam resist hard mask ion-beam etching process for the fabrication of nanoscale magnetic tunnel junctions |
| Kim, Ezra |
Point spread function analysis of dense high resolution nanodots in hydrogen silsesquioxane |
| Kim, Gyu |
Development of jet rollable nanoimprint process to fabricate bio-polymer nanostructures |
| Kim, Jin-Seung |
Thermal Imprinting Process using ZnO Nanoparticles-Dispersed Resin for the Improvement of Light Extraction Efficiency of GaN-based LEDs |
| Kim, Jinsoo |
Bonding of PMMA nanofluidic devices and its effect on DNA behavior in nanochannels
3-D Nanomolding |
| Kim, Sang-Kon |
Electric Field Induced Patterning in Computational Lithography |
| Kim, Seong-Su |
Optical Performance of Binary Mask with a Tantalum Telluride Absorber Layer for Extreme Ultraviolet Lithography (Invited) |
| Kim, Seong-Sue |
Lithographic Performance of EUV Mask using Coherent Scattering Microscopy |
| Kim, Yong Tae |
Image Compensation of Mask Misalignment in Aerial Image Microscope System |
| Kim, Young-joo |
Development of a large areal metallic nano stamp fabrication process using UV nanoimprinting and pulse reverse current electroforming for discrete track media with pattern width of 35nm |
| King, W.P. |
Tip-Based Nanofabrication and Nanometrology of Functional Nanodevices using Heated Cantilever Arrays (Invited) |
| Kingsborough, Richard |
Investigation of Templated Self-assembly of High-χ Diblock Copolymer |
| Kinoshita, Hiroo |
Development of Standalone Coherent EUV Scatterometry Microscope for EUV Mask Observation
At-Wavelength EUV Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors |
| Kirchner, Robert |
Experimental Investigation on the Short Channel Effect of Nano-Imprinted Organic Field Effect Transistors (Invited)
Cleaning Defects of Soft UV-Nanoimprint Molds for High Aspect-Ratio Features |
| Kirk, Eugenie |
High-resolution patterning with EUV interference lithography |
| Klaus, David |
Electron beam lithography-based grating customization strategies for gate level patterning in high density SRAM circuits (Invited) |
| Klein, Mona |
Stencil-nanopatterned back reflector increases efficiency of thin-film solar cells |
| Kley, Ernst - Bernhard |
An Enhanced E-beam Pattern Writing for Nano-Optics Based on Character Projection |
| Kley, Ernst-Bernhard |
Micro- and Nanostructuring of Graphene on various Substrates using UV-NIL
Lithium Niobate Nanowaveguides fabricated by Ion-Beam Enhanced Etching |
| Knecht, Jeffrey M. |
Overcoming 3DIC Technology Hurdles (Invited) |
| Knoll, Armin |
Probe nanopatterning: Towards a smarter lithography technology (Invited)
Curved cantilever design for a robust and scalable microelectromechanical switch |
| Knuffman, Brenton |
Focused Ion Beam Implantation of Li+ in WO3 Using A Magneto-Optical Trap Ion Source (Invited) |
| Kobayashi, Kei |
Release Layer Free Acrylate Resins for Ultraviolet Nanoimprinting Prepared by Adding Segregation Auxiliary Agents
Study of demolding Characteristics in continuous UV nanoimprinting |
| Kobrin, Boris |
Large area optical lithography using cylindrical masks |
| Koh, Samuel C.W. |
Lithographically-Defined Nanostructures for Color Plasmonic Printing |
| Koickal, Thomas |
Bimaterial electro-mechanical systems for audio frequency applications |
| Kojima, Akira |
Development of MEMS electron-optics bonded on electron emitter array for Massively Parallel EB Lithography System |
| Kokubo, Mitsunori |
Fast and Continuous Patterning on the Surface of Plastic Fiber by Using Thermal Roller Imprint |
| Kolacek, Karel |
Direct nano-structuring of solid surface by extreme ultraviolet Ar8+ laser |
| Kolahdouz, Mohammadreza |
3D Patterning of Si Micro and Nano Structures by Focused Ion Beam Implantation, Si Deposition and Selective Si Etching |
| Kometani, Reo |
Superconductivity of tungsten-containing carbon nanowires fabricated by focused-ion-beam chemical vapor deposition
The three-dimensional nanostructure fabrication from HSQ by FIB/EB dual-beam lithography
Quality factor improvement of graphene resonator by SU-8 shrinkage-induced strain
Electron Beam Lithography by Using Self-Assembled Block Copolymer Thin Films as Positive/Negative Tone Combined Resist
Nanomechanical Tuning Forks Fabricated by Focused-ion-beam Chemical Vapor Deposition |
| Komura, Motonori |
Directed Self-Assembly of Perpendicularly Oriented Nano-Cylinders with Liquid Crystalline Block Copolymer |
| Kondo, Mizuho |
Pattern-size Effect of Reorientation of Photoinduced Liquid Crystalline Polymer by Thermal Nanoimprinting
Reorientation Evaluation of Bidirectional Line Pattern on Photoinduced Liquid Crystalline Polymer Fabricated by Thermal Nanoimprinting |
| Kong, Seong Deok |
The Blood-Brain-Barrier Crossing in vivo using Magnetic Nanocapsules |
| Kong, Seong-Deok |
Fabrication of omniphobic surfaces using deposited silicon dioxide layer and dry etching process |
| Koshelev, Alexandr |
Fabrication of High Resolution Digital Spectrometers-on-Chip |
| Koshelev, Kirill |
Study of Line-Edge Roughness in ZEP Resist Nanopatterns from Electron Beam Lithography by Numerical Modeling |
| Koshida, Nobuyoshi |
Development of MEMS electron-optics bonded on electron emitter array for Massively Parallel EB Lithography System |
| Kosmala, Barbara |
Control of the PS-b-PDMS directed self-assembly by silsesquioxane-based graphoepitaxial substrate engineering |
| Kotera, Masatoshi |
Measurement of fogging electron current in scanning electron microscope
Measurement of Surface Potential Distribution at an Insulating Film Produced by Fogging Electrons in a Scanning Electron Microscope
Charging process simulation of a resist film on Si substrate under electron beam irradiation |
| Kratschmer, Ernst |
Electron beam lithography-based grating customization strategies for gate level patterning in high density SRAM circuits (Invited) |
| Kraus, Tobias |
Metal Nanoparticle Arrays by Controlled Decomposition of Polymer Particles |
| Kravchenko, Ivan |
Fabrication of a band-limited mask for PHARO |
| Krebs, Frederik |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Krishnan, Prasanna Venkatesh |
High Volume Nanoimprint Lithography technology and applications |
| Krockenberger, Yoshiharu |
Superconductivity of tungsten-containing carbon nanowires fabricated by focused-ion-beam chemical vapor deposition |
| Kroner, Elmar |
Metal Nanoparticle Arrays by Controlled Decomposition of Polymer Particles |
| Kruit, Pieter |
Energy Spread Measurement of an Electron Impact Gas Ion Source Equipped with a Miniaturized Gas Chamber
Electron impact gas ion source development; evaluation of different electron injection sources (Invited) |
| Kubo, Shoichi |
Au Nanorods and Nanogap Split-Ring Structures Fabricated by Reactive-Monolayer-Assisted Thermal Nanoimprinting and Electrodeposition |
| Kumar, Karthik |
Plasmonics At The Single-Nanometer Scale (Invited)
Lithographically-Defined Nanostructures for Color Plasmonic Printing |
| Kuo, C. Y. |
Fabrication and magnetic properties of hundred-nanometer-scaled permalloy cylinders arrays |
| Kuo, David |
Cleaning Induced Imprint Template Erosion
Progress and Challenges in Bit Patterned Media Nanofabrication (Invited) |
| Kuo, Hong-Shi |
Low-Energy Electron Diffraction Microscopy Based on a Single-Atom Electron Source |
| Kurataka, Nobuo |
Cleaning Induced Imprint Template Erosion |
| Kurihara, Masaru |
Etching Process for Patten Transfer from Sphere-type PMMA-b-PMAPOSS Block Copolymer |
| Kurita, Mami |
Pattern-size Effect of Reorientation of Photoinduced Liquid Crystalline Polymer by Thermal Nanoimprinting
Reorientation Evaluation of Bidirectional Line Pattern on Photoinduced Liquid Crystalline Polymer Fabricated by Thermal Nanoimprinting |
| Kuroda, Kouhei |
The three-dimensional nanostructure fabrication from HSQ by FIB/EB dual-beam lithography |
| Kuru, Cihan |
Di-block Copolymer Guided Patterning of Graphene |
| Kwak, Moon Kyu |
Vibrational Indentation Patterning of Grating Structures with Real-time Period Tunability
Continuous roller photolithography and application to large area IR metamaterial fabrication
Development of continuous phase lithography and application to transparent conductor fabrication
Wire-Grid Polarizer by Nanoimprint Lithography Using Epoxysilsesquioxane
Continuous fabrication of large-area flexible metamaterial via Roll-to-Roll nanopatterning for IR filter applications |
| Kwon, Jihun |
Fabrication of On-Chip Fluidic Ion Channels using Self-Aligned Double Layer Resist Processing Technique
Negative electron-beam resist hard mask ion-beam etching process for the fabrication of nanoscale magnetic tunnel junctions |
| Kwon, Moo-Hyun |
Thermal Imprinting Process using ZnO Nanoparticles-Dispersed Resin for the Improvement of Light Extraction Efficiency of GaN-based LEDs |
| Kwong, David |
Transfer Processes of Silicon Nanomembranes for Three Dimensional Integration of Photonics and Electronics |
L |
| LaBeaume, Paul |
Low Diffusion EUV Resists using Bound PAG Technology (Invited) |
| Lai, Haoyu |
Scanning Probe Nanostructure Direct-Write: Serial and Parallel Patterning via High Field Chemistry |
| Lakshmanan, Shanmugamurthy |
Bio-Fuel Cell Operational Enhancements using Nanoscale Electrodes |
| Lam, David |
Sub-20nm Hybrid Lithography enabled by Highly Regular Layout,Pitch Division, and e-Beam Exposure (Invited) |
| Lambson, Brian |
Magneto-optical and X-ray microscopy of nanomagnetic logic components with shape-induced biaxial anisotropy |
| Langner, Andreas |
High-resolution patterning with EUV interference lithography |
| Latif, Rhonira |
Bimaterial electro-mechanical systems for audio frequency applications |
| Lawson, Richard |
High Resolution Negative Tone Resists via Controlled Polymerization |
| Lecarme, Olivier |
3D Capillary Force Assembly : Fabrication of a white light emitter |
| Lee, C. M. |
Fabrication and magnetic properties of hundred-nanometer-scaled permalloy cylinders arrays |
| Lee, Chunghun |
Fabrication of an 18-layer 3D Woodpile Photonic Crystal via Stacking of Pre-Patterned Free-Standing Membranes |
| Lee, Dong Gun |
Lithographic Performance of EUV Mask using Coherent Scattering Microscopy |
| Lee, Gwan-Hyoung |
Fabricating Graphene-Silicon Nitride Heterostructures for High-Q Tunable Nanomechanical Resonators |
| Lee, Heon |
Thermal Imprinting Process using ZnO Nanoparticles-Dispersed Resin for the Improvement of Light Extraction Efficiency of GaN-based LEDs |
| Lee, Huang-Ming |
Surface plasmon resonance coupling assisted optical transmission through Ag/SiN /Ag photonic crystal slabs |
| Lee, Hyungyu |
Fabrication of On-Chip Fluidic Ion Channels using Self-Aligned Double Layer Resist Processing Technique
Negative electron-beam resist hard mask ion-beam etching process for the fabrication of nanoscale magnetic tunnel junctions |
| Lee, Inhwan |
Lithographic Performance of EUV Mask using Coherent Scattering Microscopy |
| Lee, Jae Uk |
Lithographic Performance of EUV Mask using Coherent Scattering Microscopy |
| Lee, JaeJong |
Flow behaviors of a polymer according to the imprint velocity during pressing step in NIL
Fabrication of Adhesion-free Transparent Roll Stamp for Large Area Patterning using UV-typed Roller Nanoimprint Lithography
3-D Nanomolding |
| Lee, Jaesun |
Reduction of proximity effects using high-contrast developer in fabricating large-area nanoimprint molds |
| Lee, Jinbeyung |
Development of a large areal metallic nano stamp fabrication process using UV nanoimprinting and pulse reverse current electroforming for discrete track media with pattern width of 35nm |
| Lee, Jisook |
The Blood-Brain-Barrier Crossing in vivo using Magnetic Nanocapsules |
| Lee, Joanne J. M. |
Polymeric Substrates with Bioimprinted Micro- and Nanoscale Topography for Regulation of Chondrocyte Re-Differentiation |
| Lee, Jongho |
Graphene transistors with record mobilities on polyimide for high-performance flexible nanoelectronics |
| Lee, K.-M. |
Graphene for RF Applications: Opportunities & Challenges (Invited) |
| Lee, Ki Dong |
Position control of MOVPE grown GaN nanorods using nanoimprint lithography |
| Lee, Kim |
Cleaning Induced Imprint Template Erosion
Progress and Challenges in Bit Patterned Media Nanofabrication (Invited) |
| Lee, S.-H. |
Optimization of Spatial Dose Distribution for Vertical Sidewall of Resist Profile Minimizing Total Dose in Electron-beam Lithography
Fast Simulation of Stochastic Exposure Distribution in Electron-beam Lithography |
| Lee, S.-Y. |
Optimization of Spatial Dose Distribution for Vertical Sidewall of Resist Profile Minimizing Total Dose in Electron-beam Lithography
Fast Simulation of Stochastic Exposure Distribution in Electron-beam Lithography |
| Lee, Sangsul |
Lithographic Performance of EUV Mask using Coherent Scattering Microscopy |
| Lee, Seung-Back |
Fabrication of On-Chip Fluidic Ion Channels using Self-Aligned Double Layer Resist Processing Technique |
| Lee, Seung-Beck |
Negative electron-beam resist hard mask ion-beam etching process for the fabrication of nanoscale magnetic tunnel junctions |
| Lee, Sunwoo |
Fabricating Graphene-Silicon Nitride Heterostructures for High-Q Tunable Nanomechanical Resonators |
| Lee, Tao-Hua |
Template-Assisted Self-Assembly and Alignment of ZnO Nanowires with Post-Deposition Growth |
| Leggett, Graham |
Analysis on probe-sample interaction for scanning near-field photolithography (snp) |
| Lehmann, Thomas |
Sub-10 nm area-selective ALD using block copolymer lithography |
| Lemaitre, Maxime |
Nanofabrication of Graphene on SiC by Multi-Ion Beam Lithography and Low-Temperature Processing |
| Levush, Baruch |
Modeling of Counter Streaming Charged Beams in MICHELLE–eBEAM |
| Lewis, Scott |
Determination of Base Dose and Scattering Coefficients for Proximity Effect Correction in Electron Beam Lithography |
| Lezec, H.J. |
Stable Field Emission from Nanoporous Silicon Carbide Tips Patterned by a Focused Ion Beam(Invited) |
| Lezec, Henri |
Sculpting Electron Beam Profile and Phase with Nanofabricated Diffractive Optics |
| Li, Can |
Focused-Ion-Beam Introduced Bidirectional Bending for Complex Three-Dimensional Structures |
| Li, Dawen |
High-Resolution Non-Destructive Patterning of Isolated Organic Semiconductors |
| Li, Hui |
Fabrication of Nanostructured Hydrophobic Surfaces with Laser Interference Lithography |
| Li, Jianying |
Fabrication of Nanostructured Hydrophobic Surfaces with Laser Interference Lithography |
| Li, Jinxing |
Dry-Release Self-assembling of Microtube Arrays for Catalytic Micropump Application
Novel techniques for modifying microtube surface with various periodic structures ranging from nano to micro scale |
| Li, Junjie |
Fabrication of Sealed Nano-channels Based on Sacrificial Nanotemplates by Focused-ion-beam Induced Chemical Vapor Deposition
The Sensing Properties of IR Nanostructed Plasmonic Crystals Fabricatied by Electron Beam Lithography and Argon Ion Milling |
| Li, Kai |
Fabrication of nano structures for Dimensional Metrology and Device Applications |
| lI, Wang |
High resolution patterning of Hafnium oxide based resist by EUV and Electron beam lithography |
| Li, Wen-Di |
Demonstration of sub-4 nm nanoimprint lithography using a template fabricated by helium ion beam lithography
Diamond nitrogen-vacancy centers created by scanning focused helium ion beam and annealing
Patterning nitrogen-vacancy color centers in diamond using scanning focused helium ion beam
Non-periodic sub-wavelength gratings fabricated by helium ion beam lithography |
| Li, Wuxia |
Fabrication of Sealed Nano-channels Based on Sacrificial Nanotemplates by Focused-ion-beam Induced Chemical Vapor Deposition |
| Li, Xu |
Nanofabrication of high aspect ratio (~50:1) sub-10 nm silicon nanowires using plasma etch technologies |
| Liang, Yixing |
A Tri-layer Method to Fabricate Wafer Scale Nanoimprint Mold by Copolymer Lithography |
| liangke, Ren |
Fabrication of nano metallic holes for color filter based on a controllable polystyrene spheres self-assemble |
| Liapis, Anastasia |
Screening T-Cell Activation with Nanostructured Substrates |
| Libera, Matthew |
Electron-beam Patterned PEG Microgels for DNA Detection |
| Lieb, Andreas |
Resonant Dielectric Nanostructures for biosensor applications (Invited) |
| Likhanskii, Alex |
Modeling of defect transport in EUVL plasma chambers
Understanding the sources of unwanted etch in ion beam sputter deposition production of EUV mask blanks |
| Liliensiek, Sara J. |
Arrays of Topographically and Peptide-Functionalized Hydrogels for Analysis of Biomimetic Extracellular Matrix Properties (Invited) |
| Lille, Jeffrey |
Image quality and pattern transfer in block copolymer directed assembly with block-selective atomic layer deposition |
| Lim, HyungJun |
Flow behaviors of a polymer according to the imprint velocity during pressing step in NIL |
| Lim, Jiseok |
Design and fabrication of micro optical system for multi-optical probe confocal microscopy for large areal measurement
Development of a large areal metallic nano stamp fabrication process using UV nanoimprinting and pulse reverse current electroforming for discrete track media with pattern width of 35nm |
| Lin, Burn |
New Era of Electron Beam Lithography |
| Lin, Jie |
Model of Curing Shrinkage and Kinetics Parameters of Acrylate-based UV-embossing Resist Based on Free Volume Theory |
| Lin, S.C. |
Graphene for RF Applications: Opportunities & Challenges (Invited) |
| Lin, Shih-Chieh |
Fabrication of a Binary Phase Grating on a Fiber End by Utilizing Interference Lithography |
| Ling, Tao |
Continuous fabrication of polymer waveguides with smooth sidewalls by Dynamic Nano-Inscribing (DNI) and NanoChannel-guided Lithography (NCL) processes (Invited) |
| Linke, Heiner |
Optimization of a Self-Closing Effect to Produce Bottle-Shaped Nanochannels in Quartz |
| Lira-Cantu, Monica |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Litvinov, Dmitri |
Multi-domain storage in graded bit patterned media (Invited)
Fabrication of dense non-circular nanomagnetic device arrarys using self-limiting low-energy glow-discharge processing |
| Liu, Baoli |
Enhancement of Light-Emitting Efficiency for GaN-based Light-Emitting Diodes by Nanoscale Bump and Pit ITO Surface |
| Liu, Chi-Chun |
Sub-30 nm pitch circuit relevant patterning in Si, SiO2 and SiN using directed self assembly based pattern generation (Invited) |
| Liu, Chin-Hung |
Fabrication of omniphobic surfaces using deposited silicon dioxide layer and dry etching process |
| Liu, Guoliang |
Directed Assembly of Symmetric ABA Triblock Copolymers on Chemically Nanopatterned Substrates |
| Liu, Jianhong |
Via-Hole Fabrication for III-V Triple-Junction Solar Cells |
| Liu, Nan |
Model of Curing Shrinkage and Kinetics Parameters of Acrylate-based UV-embossing Resist Based on Free Volume Theory |
| Liu, Nannan |
Electron impact gas ion source development; evaluation of different electron injection sources (Invited) |
| Liu, Ran |
Dry-Release Self-assembling of Microtube Arrays for Catalytic Micropump Application
Novel techniques for modifying microtube surface with various periodic structures ranging from nano to micro scale
Fabrication of Nanostructured Hydrophobic Surfaces with Laser Interference Lithography |
| Liu, Shiyuan |
Fast Aerial Image Simulation for Partially Coherent Systems by TCC Decomposition with Analytical Kernels (Invited)
Sensitivity Analysis for Lens Aberration Measurement in Lithographic Tools Using CTC-Based Quadratic Aberration Model |
| Liu, Wenhan |
Patterning of porous silicon nitride membrane by CsCl self assembly |
| Liu, Y |
Continuous fabrication of large-area flexible metamaterial via Roll-to-Roll nanopatterning for IR filter applications |
| Liu, Yuyang |
Fabrication of Polymer Nanostructures via Maskless O2 Plasma Etching
From Nanocone to Nanodisk: Structural Transformation of Nanoarrays via Mechanical Stresses
Nanopatterning of “Disconnected” Metal Nanostructures on Polydimethylsiloxane (PDMS) Substrate by Using Free-Standing Photoresist Film as Stencil Lithography Mask |
| Liu, Zhaoqian |
Dry-Release Self-assembling of Microtube Arrays for Catalytic Micropump Application
Novel techniques for modifying microtube surface with various periodic structures ranging from nano to micro scale
Fabrication of Nanostructured Hydrophobic Surfaces with Laser Interference Lithography |
| Liu, Zhe |
Fabrication of Sealed Nano-channels Based on Sacrificial Nanotemplates by Focused-ion-beam Induced Chemical Vapor Deposition
The Sensing Properties of IR Nanostructed Plasmonic Crystals Fabricatied by Electron Beam Lithography and Argon Ion Milling
Enhancement of Light-Emitting Efficiency for GaN-based Light-Emitting Diodes by Nanoscale Bump and Pit ITO Surface |
| Liu, Zhuming |
Analysis on probe-sample interaction for scanning near-field photolithography (snp) |
| Liu, Zuwei |
Sub-10 nm area-selective ALD using block copolymer lithography
Super selective silicon cryo-etching for nanoscale pattern transfer with block copolymer lithogrpahy |
| Livengood, Richard |
A Quantitative Probe Current Distribution Characterization Technique for Focused Ion Beam |
| Lloyd, Matthew |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Lo, Yi-Chen |
High-Resolution Non-Destructive Patterning of Isolated Organic Semiconductors |
| Lobo, Charlene |
A Mechanism for Dendritic Nano-Pillar Growth using EBID |
| Löchel, Bernd |
Embedding and Combining Plasmonic Elements and Photonic Crystal Structures |
| Loeffler, Ronny |
Pyramid Array Substrates for Biomedical Studies |
| Lopez, Gerald |
Point spread function analysis of dense high resolution nanodots in hydrogen silsesquioxane |
| Lorret, Olivier |
Control of the PS-b-PDMS directed self-assembly by silsesquioxane-based graphoepitaxial substrate engineering |
| Lorusso, Gian |
EUV lithography in pre-production mode (Invited) |
| Losurdo, Maria |
Micro- and Nanostructuring of Graphene on various Substrates using UV-NIL |
| Lovell, Josh |
Cold Field, Thermal-Field, and Schottky Emission from HfC(310) Sources |
| Lu, Bing-Rui |
Dry-Release Self-assembling of Microtube Arrays for Catalytic Micropump Application
Tunable silver nano-pillar arrays as a surface-enhanced Raman scattering sensor by a self-aligned nanofabrication process
Fabrication of Nanostructured Hydrophobic Surfaces with Laser Interference Lithography |
| Lu, Bingrui |
Novel techniques for modifying microtube surface with various periodic structures ranging from nano to micro scale |
| Lu, Bo |
Cleaning Defects of Soft UV-Nanoimprint Molds for High Aspect-Ratio Features |
| Lu, Hongbing |
Development of jet rollable nanoimprint process to fabricate bio-polymer nanostructures |
| Lu, Junling |
Enhancing the Etch Resistance of PMMA-Based Photoresist to Meet ITRS Target from Year 2022 |
| Lucas, Brandon D. |
Nanostructured, Active Electrostatic Trap for Confining Nanometric Objects in a Fluid: mimicking DNA-Protein interactions in a synthetic system |
| Luce, Stephen |
CMOS Compatible RF MEMs Technology (Invited) |
| Luebbert, Christian |
High Aspect Ratio, Triangular Silicon Pillars for Bump Array Concentration of Pathogenic Bacteria |
| Lugstein, Alois |
Engineering electrical properties of Silicon nanowires by focused electron beam induced processing with Chlorine |
| Luo, Gang |
High Volume Nanoimprint Lithography technology and applications |
| Luo, Qiang |
Fabrication of Sealed Nano-channels Based on Sacrificial Nanotemplates by Focused-ion-beam Induced Chemical Vapor Deposition |
| Lutsen+, Laurence |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Luttge, Regina |
Micro-nanofabricated platform technology for cell seeding experiments in neuro-nanobiology |
| Lv, Wen |
Fast Aerial Image Simulation for Partially Coherent Systems by TCC Decomposition with Analytical Kernels (Invited) |
| Lyons, Alan M. |
A superhydrophobic surface made from hydrophilic materials with micro-umbrella structures |
M |
| Ma, Andy |
EUV Mask Challenges, Status & Closing The Remaining Technology Gaps (Invited) |
| Ma, Zhengqiang |
Molecular Transfer Printing Using Silicon Membrane for the Fabrication of Large Area Chemical Patterns on Highly Flexible Substrates |
| MA |
Visualization of Ion Beams from IonicLiquid Ion Sources for Focused Ion Beam Applications |
| Maas, Diederik |
Helium ion beam lithography of thick HSQ resists |
| Macintyre, Douglas |
High aspect ratio (~25:1) sub-10 nm HSQ lines using electron beam lithography
Long Narrow Gaps for III-V Transistors Fabricated by Electron Beam Lithography |
| Mack, Chris |
Ultra-high-Numerical Aperture Interference Lithography at High Aspect Ratios using Surface States on Effective Gain Media |
| Mackie, William |
Cold Field, Thermal-Field, and Schottky Emission from HfC(310) Sources |
| Magera, Bud |
Thermionic Electron Gun with Small Virtual Source Size for Electron Beam Lithography Applications (Invited) |
| Magera, Gerald |
Cold Field, Thermal-Field, and Schottky Emission from HfC(310) Sources |
| Mahmoudi, Masoud |
Patterning of Sub-10 nm Optical Apertures on Single Crystal Metallic Films with the Helium Ion Microscope (Invited) |
| Maier, Stefan |
Plasmonics At The Single-Nanometer Scale (Invited) |
| Maier, Urs |
Combined SIMS-SPM instrument for high sensitivity and high resolution elemental 3D analysis |
| Maldonado, Juan R. |
Nanoscale Photoelectron Emission Using C-shaped Nanoapertures with Cesium Bromide Photocathode |
| Malik, Adnan |
Fresnel zone plates as X-ray lenses by electron beam lithography with HSQ resist |
| Malm, B. Gunnar |
3D Patterning of Si Micro and Nano Structures by Focused Ion Beam Implantation, Si Deposition and Selective Si Etching |
| Mane, Anil |
Enhancing the Etch Resistance of PMMA-Based Photoresist to Meet ITRS Target from Year 2022 |
| Manfrinato, Vitor R. |
Resolution improvement for positive tone poly(methyl methacrylate) resist |
| Manfrinato, Vitor |
Templated Placement of Colloidal Quantum Dots |
| Mankos, Marian |
Progress Towards An Aberration-Corrected Low Energy Electron Microscope for DNA Sequencing and Surface Analysis |
| Mansour, Raafat |
Effect of molecular weight distribution on e-beam resist polystyrene |
| Mao, Wendy |
System to Measure the Shear Modulus of Iron at high temperature and pressure using Transverse Displacement Interferometry Fabricated by Electron Beam Lithography |
| Mao, Zhantong |
A superhydrophobic surface made from hydrophilic materials with micro-umbrella structures |
| Marconi, Mario |
Defect Tolerant Extreme Ultraviolet Lithography |
| Marinero, Ernesto |
Fabrication of CoCrPt Alloy Bit Patterned Media at 1 Td/in2 for Recording Measurement |
| Markle, David |
An all-optical process for extending GRATE to the 11nm (20nm hp) Technology Node (Invited) |
| Marras, Salvatore |
Electron-beam Patterned PEG Microgels for DNA Detection |
| Marsili, Francesco |
Templated Placement of Colloidal Quantum Dots |
| Martin, Aiden |
Electron Beam Etching Kinetics of Diamond and Graphite |
| Martin, Frederick |
A Large-Aperture Ion-Beam Lens Corrected For Both Chromatic And Spherical Aberration |
| Martin, Mickael |
Directed Self-Assembled Porous Anodic Alumina by NanoImprinting Lithography |
| Martin, Noel |
Thermionic Electron Gun with Small Virtual Source Size for Electron Beam Lithography Applications (Invited) |
| Martinez-Perdiguero, Josu |
Enhanced Transmission through Gold Nanohole Arrays Fabricated by Thermal Nanoimprint Lithography for Surface Plasmon Based Biological Sensing |
| Maruyama, Hiroki |
High Density Pattern Transfer via Roll to Roll Ultraviolet Nanoimprint Lithograpy using Replica Mold |
| Mastropaolo, Enrico |
Piezoelectrically Transduced Silicon Carbide MEMS Double-Clamped Beam Resonators
Bimaterial electro-mechanical systems for audio frequency applications |
| Materials, Applied |
Silicon Photovoltaics: Accelerating To Grid Parity |
| Matschegewski, Claudia |
Pyramid Array Substrates for Biomedical Studies |
| Matsui, Shinji |
Characteristics of mechanical vibration in imprinted nanostructures
Reorientation Evaluation of Bidirectional Line Pattern on Photoinduced Liquid Crystalline Polymer Fabricated by Thermal Nanoimprinting
Study of demolding Characteristics in continuous UV nanoimprinting |
| Maximov, Ivan |
Nanoimprinted Electrodes for Highly Efficient and Stable Bio-Fuel Cells
Optimization of a Self-Closing Effect to Produce Bottle-Shaped Nanochannels in Quartz |
| Mayer, Andre |
Study of defect mechanisms in partly filled stamp cavities for thermal nano imprint control
Crosslinking control during imprint for hybrid lithography (T-NIL + UV-L) |
| McCalla, K. |
Graphene for RF Applications: Opportunities & Challenges (Invited) |
| McClelland, Jabez |
Focused Ion Beam Implantation of Li+ in WO3 Using A Magneto-Optical Trap Ion Source (Invited) |
| McCord, Mark |
REBL: A Lithography Solution for High Volume Manufacturing at 16 nm (Invited) |
| McCulloch, Andrew |
Arbitrarily Shaped High-Coherence Electron and Ion Bunches from Laser-Cooled Atoms |
| McMackin, Ian |
Large area optical lithography using cylindrical masks |
| McMahon, Gregory |
Imprint-Templated Nanocoaxial Array Architecture |
| McMorran, Benjamin |
Sculpting Electron Beam Profile and Phase with Nanofabricated Diffractive Optics |
| Mehrotra, Prateek |
Ultra-high-Numerical Aperture Interference Lithography at High Aspect Ratios using Surface States on Effective Gain Media |
| Mei, Yongfeng |
Dry-Release Self-assembling of Microtube Arrays for Catalytic Micropump Application
Novel techniques for modifying microtube surface with various periodic structures ranging from nano to micro scale |
| Mekaru, Harutaka |
Control of Inclined Angle of Glass-like Carbon Mold by Defocus UV Exposure on Si Containing Photoresist
Replacement of Trapped Air by Fluoride Liquid in Thermal Nanoimprint
Fast and Continuous Patterning on the Surface of Plastic Fiber by Using Thermal Roller Imprint |
| Melich, Radek |
Direct nano-structuring of solid surface by extreme ultraviolet Ar8+ laser |
| Melli, Mauro |
Hyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of “Campanile” Tips
Towards the holy grail of near field optics via reproducibly fabricated optical nano antennae on Scanning Probe Tips |
| Meng, Hsin-Fei |
Employing Nano Imprint to Fabricate Space-Charge-Limited Transistors (SCLTs) |
| Menon, Rajesh |
Deep-subwavelength patterning with photoswitchable molecules |
| Menoni, Carmen |
Defect Tolerant Extreme Ultraviolet Lithography |
| Merino, Santos |
Enhanced Transmission through Gold Nanohole Arrays Fabricated by Thermal Nanoimprint Lithography for Surface Plasmon Based Biological Sensing |
| Messerschmidt, Martin |
3-D microfabrication based on a glass transition temperature selective thermal reflow - towards optical applications |
| Meyer, Andre |
Preparation of surfaces with patterned roughness for sensing application |
| Meyer, Ernst |
Combined SIMS-SPM instrument for high sensitivity and high resolution elemental 3D analysis |
| Mi, Hongyi |
Molecular Transfer Printing Using Silicon Membrane for the Fabrication of Large Area Chemical Patterns on Highly Flexible Substrates |
| Mika, Johann |
Microfluidic Axon-Isolation Device fabricated by Nanoimprint lithography |
| Mikami, Haruka |
Directed Self-assembly with Density Multiplication of 6 tera-dot/in2 Pattern by POSS-Containing Block Copolymer |
| Mikoshiba, Satoshi |
Spin on Glass as an Orientation Control Layer for Block Copolymer Direct Self-Assembly |
| Miller, D.J. |
Plasmonic Nanostructures Fabricated using Helium and Gallium Ion Beam Instruments. |
| Milone, Michael |
Sub-micron scale gold-tipped elastomeric pillar arrays for human T cell activation and culture |
| Milosavljevic, I. |
Graphene for RF Applications: Opportunities & Challenges (Invited) |
| Mirza, Muhammad |
Nanofabrication of high aspect ratio (~50:1) sub-10 nm silicon nanowires using plasma etch technologies
High aspect ratio (~25:1) sub-10 nm HSQ lines using electron beam lithography |
| MIT, P. Lozano, |
Visualization of Ion Beams from IonicLiquid Ion Sources for Focused Ion Beam Applications |
| Miyazoe, Hiroyuki |
Sub-30 nm pitch circuit relevant patterning in Si, SiO2 and SiN using directed self assembly based pattern generation (Invited) |
| Mizuno, Seigo |
Optical and Electrical Sensing application of High-Aspect-Ratio Nanoholes Formed by Etching of Latent Tracks |
| Mkrtchyan, Masis |
Modeling of Counter Streaming Charged Beams in MICHELLE–eBEAM |
| Mohammad, Mohammad Ali |
High Aspect Ratio SML Resist Patterning using 30 keV Electron Beam Lithography
Study of the Interaction of Polymethylmethacrylate Fragments with Methyl Isobutyl Ketone |
| Mokarian-Tabari, Parvaneh |
Directed self-assembly of PS-PEO using solvent vapors assisted nanoimprint lithography |
| Moldovan, Nicolaie |
Nanofabrication with Si(311) |
| Möllenbeck, Saskia |
Study of defect mechanisms in partly filled stamp cavities for thermal nano imprint control
Crosslinking control during imprint for hybrid lithography (T-NIL + UV-L)
Preparation of surfaces with patterned roughness for sensing application |
| Møller-Nilsen, R. |
Reproducibility of Drift Tolerant Focused Ion Beam Lithography Method |
| Mondal, Bikash |
A superhydrophobic surface made from hydrophilic materials with micro-umbrella structures |
| Montelius, Lars |
Nanoimprinted Electrodes for Highly Efficient and Stable Bio-Fuel Cells |
| Moon, Euclid |
The Membrane-Alignment Stage in Fabricating 3-Dimensional Nanostructures |
| Moon, J. S. |
Graphene for RF Applications: Opportunities & Challenges (Invited) |
| Morris, Michael |
Directed self-assembly of PS-PEO using solvent vapors assisted nanoimprint lithography |
| Morris, Mick |
Control of the PS-b-PDMS directed self-assembly by silsesquioxane-based graphoepitaxial substrate engineering |
| Morton, Keith |
High Aspect Ratio, Triangular Silicon Pillars for Bump Array Concentration of Pathogenic Bacteria
Vibrant color transmission under cross-polarization through gold-coated gratings nanoimprinted in polymer foils |
| Motavas, Saloome |
Diameter Dependence of the Effect of Light Polarization on Interband Transitions in Zigzag Carbon Nanotubes |
| Mounier, Maxence |
High Aspect Ratio, Triangular Silicon Pillars for Bump Array Concentration of Pathogenic Bacteria |
| Muehlberger, Michael |
Micro- and Nanostructuring of Graphene on various Substrates using UV-NIL
Nanometer Size Protein Patterning using nCP for the Investigation of Protein-Protein Interactions in Live Cells |
| Mueller, Thomas |
Micro- and Nanostructuring of Graphene on various Substrates using UV-NIL |
| Mukherjee, Pran |
Fabrication of Nano-scale, High Throughput, High Aspect Ratio Freestanding Gratings |
| Müller, Marcus |
Directed Assembly of Symmetric ABA Triblock Copolymers on Chemically Nanopatterned Substrates |
| Multibeam |
Sub-20nm Hybrid Lithography enabled by Highly Regular Layout,Pitch Division, and e-Beam Exposure (Invited) |
| Murali, Raghu |
Electron Beam Lithography of Antidot Arrays for the Fabrication of Nanogenerators and Detectors in 2DEG Materials |
| Murata, Hidekazu |
Multi-axis and Multi-beam technology for high throughput maskless E-beam lithography |
| Murphy, Dene |
Arbitrarily Shaped High-Coherence Electron and Ion Bunches from Laser-Cooled Atoms |
| Murray, James |
Surface-Finishing of Focused Ion Beam Milled Features by Pulsed Electron Irradiation |
| Murray, Lynn M. |
Polymeric Substrates with Bioimprinted Micro- and Nanoscale Topography for Regulation of Chondrocyte Re-Differentiation |
N |
| N’Diaye, Alpha |
Progress Towards An Aberration-Corrected Low Energy Electron Microscope for DNA Sequencing and Surface Analysis |
| Nagao, Tadaaki |
Lithographically Designed Porous Plasmonic Nanostructures (Invited) |
| Nagase, Koichi |
Au Nanorods and Nanogap Split-Ring Structures Fabricated by Reactive-Monolayer-Assisted Thermal Nanoimprinting and Electrodeposition |
| Nagata, Yutaka |
Development of Standalone Coherent EUV Scatterometry Microscope for EUV Mask Observation |
| Nagato, Keisuke |
Large-Area Nanostructures by Laser-Scanning Imprinting (Invited)
Injection compression molding of replica molds for nanoimprint lithography
Effect of offset temperature on replication of laser-assisted imprinting |
| Nagpal, Umang |
Directed Assembly of Symmetric ABA Triblock Copolymers on Chemically Nanopatterned Substrates |
| Naieni, Ali Kashefian |
The Effect of Field Frequency and Solution Conductivity on Dielectrophoretic Deposition of Carbon Nanotubes |
| Nakagawa, Masaru |
Au Nanorods and Nanogap Split-Ring Structures Fabricated by Reactive-Monolayer-Assisted Thermal Nanoimprinting and Electrodeposition
Release Layer Free Acrylate Resins for Ultraviolet Nanoimprinting Prepared by Adding Segregation Auxiliary Agents
Fluoroalkyl-Containing Surfactants to Reduce Release Energy of UV-Cured Acrylate Resin
Study of demolding Characteristics in continuous UV nanoimprinting |
| Nakai, Yasuki |
Characteristics of mechanical vibration in imprinted nanostructures |
| Nakamura, Hiroko |
Spin on Glass as an Orientation Control Layer for Block Copolymer Direct Self-Assembly |
| Nakao, Masayuki |
Large-Area Nanostructures by Laser-Scanning Imprinting (Invited)
Injection compression molding of replica molds for nanoimprint lithography
Effect of offset temperature on replication of laser-assisted imprinting |
| Nakasuji, Masato |
Development of Standalone Coherent EUV Scatterometry Microscope for EUV Mask Observation |
| Namboodiri, Pradeep |
Fabrication of nano structures for Dimensional Metrology and Device Applications |
| Naughton, Jeffrey R. |
Imprint-Templated Nanocoaxial Array Architecture |
| Naughton, Michael J. |
Imprint-Templated Nanocoaxial Array Architecture |
| Nealey, Paul F. |
Arrays of Topographically and Peptide-Functionalized Hydrogels for Analysis of Biomimetic Extracellular Matrix Properties (Invited) |
| Nealey, Paul |
Directed Assembly of Symmetric ABA Triblock Copolymers on Chemically Nanopatterned Substrates
Molecular Transfer Printing Using Silicon Membrane for the Fabrication of Large Area Chemical Patterns on Highly Flexible Substrates
Defect Evolution in Thin Films of Self-Assembling Lamella Forming Block Copolymers on a Neutral Surface |
| Nebe, Barbara |
Pyramid Array Substrates for Biomedical Studies |
| Nemutudi, Rudzani |
Multiple phase-formation in Ni-Ge system monitored by SEM, AFM and PIXE analytical techniques |
| Newton, Michael |
Bimaterial electro-mechanical systems for audio frequency applications |
| Nicaise, Sam M. |
Block Copolymer Self-Assembly Using Sacrificial Template
Achieving Ordered Nanoholes and Other Non-bulk Morphologies by Directed Self-Assembly of a Block Copolymer |
| Nicaise, Samuel |
Investigation of Templated Self-assembly of High-χ Diblock Copolymer |
| Niklaus, Frank |
3D Patterning of Si Micro and Nano Structures by Focused Ion Beam Implantation, Si Deposition and Selective Si Etching |
| Nilsson, Bengt |
Dose to clear in EBL: comparison of Monte Carlo predictions with experiment |
| Nishijima, Takuya |
Strain characteristics of free-standing graphene induced by low-energy electron beam irradiation |
| Nishino, Tomoki |
Impact of Mold-Resist Roughness on Friction and Adhesion Properties by Nano Tribological Inspection
Study on De-molding Kinetics of Peeling and Perpendicular Releasing in NIL process |
| Nishioka, Emi |
Pattern-size Effect of Reorientation of Photoinduced Liquid Crystalline Polymer by Thermal Nanoimprinting
Reorientation Evaluation of Bidirectional Line Pattern on Photoinduced Liquid Crystalline Polymer Fabricated by Thermal Nanoimprinting |
| Niu, Ben |
Fabrication of Photonic Devices on Flexible Platform |
| Nock, Volker |
Polymeric Substrates with Bioimprinted Micro- and Nanoscale Topography for Regulation of Chondrocyte Re-Differentiation |
| Noh, Kunbae |
Di-block Copolymer Guided Patterning of Graphene |
| Nojeh, Alireza |
Solar Electron Source and Thermionic Solar Cell
Diameter Dependence of the Effect of Light Polarization on Interband Transitions in Zigzag Carbon Nanotubes
Two-photon Photoemission from Carbon Nanotube Arrays under Low-power Ultraviolet Illumination
The Effect of Field Frequency and Solution Conductivity on Dielectrophoretic Deposition of Carbon Nanotubes |
| Nomura, Ken-ichi |
Optical and Electrical Sensing application of High-Aspect-Ratio Nanoholes Formed by Etching of Latent Tracks |
| Norrman, Kion |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Notte, John |
Towards Secondary Ion Mass Spectrometry on the Helium Ion Microscope
Progress Towards a Commercial Neon Gas Field Ion Source
Deposition and Characterization of Platinum Wires Deposited by a Neon Gas Field Ion Source |
| Nouvertne, Frank |
Continuous Electron Beam Lithography Writing Modes for Optical Waveguide Nanofabrication |
| Nowak, Matt |
High Density 3D Through Silicon Stacking (TSS) – Game Changing Technology? |
| Nugent, Keith |
Arbitrarily Shaped High-Coherence Electron and Ion Bunches from Laser-Cooled Atoms |
| Nüsse, Nils |
Embedding and Combining Plasmonic Elements and Photonic Crystal Structures |
O |
| O'Connor, Roddy |
Sub-micron scale gold-tipped elastomeric pillar arrays for human T cell activation and culture |
| Ober, Christopher |
Directed Patterning for Electronics Using Multiple Block Copolymers Orthogonally |
| Ochi, Toshihiko |
Additional and correction patterning of resist layer using scanning probe lithography |
| Ocola, Leonidas Ernesto |
Growth Characterization of Electron Beam Induced Silver Deposition from Liquid Precursor |
| Ocola, Leonidas |
Variation of Proximity Effect Correction Parameters with Density |
| Ocypa, Łukasz |
Impact of Mold-Resist Roughness on Friction and Adhesion Properties by Nano Tribological Inspection |
| Ogletree, D. Frank |
Hyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of “Campanile” Tips |
| Ogletree, Frank |
Towards the holy grail of near field optics via reproducibly fabricated optical nano antennae on Scanning Probe Tips |
| Ohara, Yasuhiro |
Measurement of fogging electron current in scanning electron microscope
Measurement of Surface Potential Distribution at an Insulating Film Produced by Fogging Electrons in a Scanning Electron Microscope
Charging process simulation of a resist film on Si substrate under electron beam irradiation |
| Ohki, Yoshimichi |
Optical and Electrical Sensing application of High-Aspect-Ratio Nanoholes Formed by Etching of Latent Tracks |
| Ohta, Toshiyuki |
Development of MEMS electron-optics bonded on electron emitter array for Massively Parallel EB Lithography System |
| Ohtomo, Akihiro |
Fast and Continuous Patterning on the Surface of Plastic Fiber by Using Thermal Roller Imprint |
| Ohyi, Hideyuki |
Development of MEMS electron-optics bonded on electron emitter array for Massively Parallel EB Lithography System |
| Ok, Jong G. |
Vibrational Indentation Patterning of Grating Structures with Real-time Period Tunability
Continuous roller photolithography and application to large area IR metamaterial fabrication
Development of continuous phase lithography and application to transparent conductor fabrication
Wire-Grid Polarizer by Nanoimprint Lithography Using Epoxysilsesquioxane
Continuous fabrication of polymer waveguides with smooth sidewalls by Dynamic Nano-Inscribing (DNI) and NanoChannel-guided Lithography (NCL) processes (Invited)
Continuous fabrication of large-area flexible metamaterial via Roll-to-Roll nanopatterning for IR filter applications |
| Okada, Makoto |
Characteristics of mechanical vibration in imprinted nanostructures
Pattern-size Effect of Reorientation of Photoinduced Liquid Crystalline Polymer by Thermal Nanoimprinting
Reorientation Evaluation of Bidirectional Line Pattern on Photoinduced Liquid Crystalline Polymer Fabricated by Thermal Nanoimprinting
Study of demolding Characteristics in continuous UV nanoimprinting |
| Okai, Nobuhiro |
Electron scattering simulation for subsurface metrology in scanning electron microscope |
| Okino, Takeshi |
Fabrication of 5 Tb/in2 Bit Patterned Media with Servo Pattern using Directed Self-Assembly |
| Okuyama, Chieko |
Control of Inclined Angle of Glass-like Carbon Mold by Defocus UV Exposure on Si Containing Photoresist |
| Olynick, Deirdre |
Single digit nanoimprint lithography achieved by template modification with atomic layer deposition
30 nm nanochannels with plasmonic bowtie nanoantenna
Sub-10 nm area-selective ALD using block copolymer lithography
Super selective silicon cryo-etching for nanoscale pattern transfer with block copolymer lithogrpahy
Tunable Plasmonic Light Trapping Metal Structures
High resolution dry photo-ablation development (Invited) |
| Ongayi, Owendi |
Low Diffusion EUV Resists using Bound PAG Technology (Invited) |
| Ono, Hiroshi |
Pattern-size Effect of Reorientation of Photoinduced Liquid Crystalline Polymer by Thermal Nanoimprinting
Reorientation Evaluation of Bidirectional Line Pattern on Photoinduced Liquid Crystalline Polymer Fabricated by Thermal Nanoimprinting |
| Ono, Takahito |
Vacuum-packaged Resonant Thermal Sensor for Biological Cell in liquid (MNC Paper) |
| Onomitsu, Koji |
Superconductivity of tungsten-containing carbon nanowires fabricated by focused-ion-beam chemical vapor deposition |
| Ootera, Yasuaki |
Fabrication of 5 Tb/in2 Bit Patterned Media with Servo Pattern using Directed Self-Assembly |
| Orlov, Alexei |
High Aspect Ratio Features in PMGI using Electron Beam Lithography and Solvent Developers |
| Osada, Akira |
Measurement of fogging electron current in scanning electron microscope
Measurement of Surface Potential Distribution at an Insulating Film Produced by Fogging Electrons in a Scanning Electron Microscope
Charging process simulation of a resist film on Si substrate under electron beam irradiation |
| Oshidari, Yuta |
Quality factor improvement of graphene resonator by SU-8 shrinkage-induced strain |
| Ostrzinski, Ute |
Polymeric freestanding structures by direct write laser without sacrificial layers |
| Oswald, Benedikt |
Resonant Dielectric Nanostructures for biosensor applications (Invited) |
| Otaduy, Deitze |
Enhanced Transmission through Gold Nanohole Arrays Fabricated by Thermal Nanoimprint Lithography for Surface Plasmon Based Biological Sensing |
| Otani, Masaru |
Measurement of fogging electron current in scanning electron microscope
Measurement of Surface Potential Distribution at an Insulating Film Produced by Fogging Electrons in a Scanning Electron Microscope
Charging process simulation of a resist film on Si substrate under electron beam irradiation |
| Otis, Charles |
A Mass Filtered Plasma FIB |
| Ou, Neil |
Surface plasmon resonance coupling assisted optical transmission through Ag/SiN /Ag photonic crystal slabs |
| Ovtchinnikov, Serguei |
Modeling of Counter Streaming Charged Beams in MICHELLE–eBEAM |
| Owen, James H. G. |
Automated position corrections for Atomically Precise STM lithography of Si(001):H |
| Owen, James |
Determining Tip Position Tolerances for Atomically Precise STM lithography of Si(001):H |
P |
| Padmore, Howard |
Tunable Plasmonic Light Trapping Metal Structures |
| Pahud, Céline |
Stencil-nanopatterned back reflector increases efficiency of thin-film solar cells |
| Paivanranta, Birgit |
High-resolution patterning with EUV interference lithography |
| Palma, Matteo |
Directed assembly of one-dimensional functional nanostructures |
| Pan, Liang |
Sub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens
An FPGA-based Pattern Generator for Massive Parallel High-Speed Nanolithography System |
| Panday, Ashwin |
Nanostructured, Active Electrostatic Trap for Confining Nanometric Objects in a Fluid: mimicking DNA-Protein interactions in a synthetic system |
| Pandey, Yogendra |
Measurements of the Latent Image in Chemically-Amplified Resists |
| Pang, Stella |
High Resolution Patterning on Non-Planar Substrates with Large Height Variation Using Electron-Beam Lithography |
| Pankratov, Dmitrii |
Nanoimprinted Electrodes for Highly Efficient and Stable Bio-Fuel Cells |
| Parameswaran, Lalitha |
Electrically Controlled Switchable Adhesion of Dual Nanometer and Micrometer Structured Surfaces |
| Park, Hui Joon |
Controlling Nanostructures in Organic Photovoltaic Cells (Invited)
Wire-Grid Polarizer by Nanoimprint Lithography Using Epoxysilsesquioxane |
| Park, Hyun-Ha |
Flow behaviors of a polymer according to the imprint velocity during pressing step in NIL |
| Park, Johnathan |
Growth Characterization of Electron Beam Induced Silver Deposition from Liquid Precursor |
| Park, Min-Chul |
Image Compensation of Mask Misalignment in Aerial Image Microscope System |
| Park, Sooyeon |
3-D Nanomolding |
| Park, Sunggook |
Bonding of PMMA nanofluidic devices and its effect on DNA behavior in nanochannels
3-D Nanomolding |
| Park, Yongshik |
Sub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens
An FPGA-based Pattern Generator for Massive Parallel High-Speed Nanolithography System |
| Parpia, Jeevak |
Fabricating Graphene-Silicon Nitride Heterostructures for High-Q Tunable Nanomechanical Resonators
High quality factors in graphene and ultra thin Silicon nitride nanomechanical drums |
| Patel, Kanaiyalal C. |
Image quality and pattern transfer in block copolymer directed assembly with block-selective atomic layer deposition |
| Patti, Robert |
Heterogeneous 3D Integration (Invited) |
| Paul, Douglas |
Nanofabrication of high aspect ratio (~50:1) sub-10 nm silicon nanowires using plasma etch technologies
High aspect ratio (~25:1) sub-10 nm HSQ lines using electron beam lithography |
| Paul, Philip |
Probe nanopatterning: Towards a smarter lithography technology (Invited) |
| Pauliac-Vaujour, Sébastien |
Capped carbon hard mask an innovative route to nanoscale device fabrication |
| Pearton, Stephen |
Inductively Coupled Plasma Etching of Benzocyclobutene with SF6 Chemistry |
| Pease, Fabian |
Monolithic 3D Integration (Invited)
Monolithic 3D Integration via Al-Ge Bonding of Single Crystal Islands (Invited)
Transfer Processes of Silicon Nanomembranes for Three Dimensional Integration of Photonics and Electronics |
| Pease, R. Fabian |
Nanoscale Photoelectron Emission Using C-shaped Nanoapertures with Cesium Bromide Photocathode |
| Peckerar, Martin |
Strain Assisted Self Lift-Off Process for the Fabrication Ultra Low Capacitive Antenna Coupled MIM Tunnel Diodes for the Application of Infrared Detection and Energy Harvesting |
| Peng, Zhen |
Non-periodic sub-wavelength gratings fabricated by helium ion beam lithography |
| Penzo, Erika |
Directed assembly of one-dimensional functional nanostructures |
| Peranantham, Pazhanisami |
Optical Performance of Binary Mask with a Tantalum Telluride Absorber Layer for Extreme Ultraviolet Lithography (Invited) |
| Percival, Randal |
Progress Towards a Commercial Neon Gas Field Ion Source |
| Perera, Ginusha |
Measurements of the Latent Image in Chemically-Amplified Resists |
| Perera, Pradeep |
High resolution dry photo-ablation development (Invited) |
| Perez-Martinez, C. |
Visualization of Ion Beams from IonicLiquid Ion Sources for Focused Ion Beam Applications |
| Peroz, Christophe |
Single digit nanoimprint lithography achieved by template modification with atomic layer deposition
Fabrication of High Resolution Digital Spectrometers-on-Chip
Direct Nanoimprinting of Functional Inorganic Layers for Nanophotonic Chip Devices |
| Perry-Houts, Jonathan |
Sculpting Electron Beam Profile and Phase with Nanofabricated Diffractive Optics |
| Persson, Henrik |
Progress Towards An Aberration-Corrected Low Energy Electron Microscope for DNA Sequencing and Surface Analysis |
| Pertsch, Thomas |
Micro- and Nanostructuring of Graphene on various Substrates using UV-NIL
Lithium Niobate Nanowaveguides fabricated by Ion-Beam Enhanced Etching |
| Peters, Andrew |
Production of sub-20nm Pitch Features from Directed Self Assembly of High Chi Polymers via a Selective Block Removal Process Utilizing Atomic Layer Deposition (Invited) |
| Petersen, D. H. |
Reproducibility of Drift Tolerant Focused Ion Beam Lithography Method |
| Petersen, John |
An all-optical process for extending GRATE to the 11nm (20nm hp) Technology Node (Invited) |
| Petillo, John |
Modeling of Counter Streaming Charged Beams in MICHELLE–eBEAM |
| Petric, Paul |
REBL: A Lithography Solution for High Volume Manufacturing at 16 nm (Invited) |
| Petrillo, Karen |
Fundamental Study of EUV Resist Line Edge Roughness: Characterization, Experiment and Modeling |
| Petrone, Nick |
Scalable Graphene Field Effect Transistors with Boron Nitride Dielectrics (Invited) |
| PEYRADE, David |
3D Capillary Force Assembly : Fabrication of a white light emitter |
| Pfeiffer, Karl |
Polymeric freestanding structures by direct write laser without sacrificial layers |
| Phaneuf, Mike |
Deposition and Characterization of Platinum Wires Deposited by a Neon Gas Field Ion Source |
| Phifer, Daniel |
Optimization of the Gun, Lenses, and Detectors for High-Vacuum SEM Studies of Non-Conductive Specimens |
| Philipp, Peter |
Taming of Ga droplets on DLC layers – Size tuning and local arrangement with nm accuracy |
| Phillips, Matthew |
A Mechanism for Dendritic Nano-Pillar Growth using EBID
Electron Beam Etching Kinetics of Diamond and Graphite |
| Piaszenski, Guido |
Continuous Electron Beam Lithography Writing Modes for Optical Waveguide Nanofabrication |
| Piccirillo, Lucio |
Determination of Base Dose and Scattering Coefficients for Proximity Effect Correction in Electron Beam Lithography |
| Pickard, Daniel |
Patterning of Sub-10 nm Optical Apertures on Single Crystal Metallic Films with the Helium Ion Microscope (Invited)
Immersion Optics for Excitation of Surface Plasmons in a Transmission Mode Photoemission Electron Microscope |
| Pillatsch, Lex |
Towards Secondary Ion Mass Spectrometry on the Helium Ion Microscope |
| Pina-Hernandez, Carlos |
Direct Nanoimprinting of Functional Inorganic Layers for Nanophotonic Chip Devices
Wire-Grid Polarizer by Nanoimprint Lithography Using Epoxysilsesquioxane |
| Pineda-Vargas, Carlos |
Multiple phase-formation in Ni-Ge system monitored by SEM, AFM and PIXE analytical techniques |
| Pinto, Mark |
Silicon Photovoltaics: Accelerating To Grid Parity |
| Pitera, Jed |
Fundamental Study of EUV Resist Line Edge Roughness: Characterization, Experiment and Modeling |
| Pitters, Jason |
Tip shaping of gas field ion sources for optimal ion beam generation |
| Plötner, Matthias |
Experimental Investigation on the Short Channel Effect of Nano-Imprinted Organic Field Effect Transistors (Invited) |
| Plummer, James |
Monolithic 3D Integration (Invited) |
| PoliMi |
Deep-subwavelength patterning with photoswitchable molecules |
| Pollentier, Ivan |
EUV lithography in pre-production mode (Invited) |
| Polyakov, Aleksandr |
Tunable Plasmonic Light Trapping Metal Structures |
| Popov, Vladimir |
Nanoimprinted Electrodes for Highly Efficient and Stable Bio-Fuel Cells |
| Portal, Jean -Claude |
Electron Beam Lithography of Antidot Arrays for the Fabrication of Nanogenerators and Detectors in 2DEG Materials |
| Postek, Michael |
On Clean Samples and High-Resolution Quantitative Charged Particle Microscopy |
| Prewett, Philips |
Model of Curing Shrinkage and Kinetics Parameters of Acrylate-based UV-embossing Resist Based on Free Volume Theory |
| Probst, Jürgen |
Embedding and Combining Plasmonic Elements and Photonic Crystal Structures |
| Provine, J |
Transfer Processes of Silicon Nanomembranes for Three Dimensional Integration of Photonics and Electronics |
| Prukner, Vaclav |
Direct nano-structuring of solid surface by extreme ultraviolet Ar8+ laser |
| Pu, Yu |
Curved cantilever design for a robust and scalable microelectromechanical switch |
| Purushotham, Kavuri |
On Clean Samples and High-Resolution Quantitative Charged Particle Microscopy |
| Putkunz, Corey |
Arbitrarily Shaped High-Coherence Electron and Ion Bunches from Laser-Cooled Atoms |
Q |
| Qi, Minghao |
Sub-20 nm Metal Gratings by Nanoimprint Lithography
Horizontal Growth of Silicon Nanowire Arrays for Large-Scale Circuit Applications
Fabrication of Photonic Devices on Flexible Platform
Fabrication of an 18-layer 3D Woodpile Photonic Crystal via Stacking of Pre-Patterned Free-Standing Membranes |
| Qu, Xin-Ping |
Tunable silver nano-pillar arrays as a surface-enhanced Raman scattering sensor by a self-aligned nanofabrication process |
| Qualcomm |
High Density 3D Through Silicon Stacking (TSS) – Game Changing Technology? |
| Quan, Baogang |
The Sensing Properties of IR Nanostructed Plasmonic Crystals Fabricatied by Electron Beam Lithography and Argon Ion Milling |
R |
| Racine, Georges-Andre |
Polymeric freestanding structures by direct write laser without sacrificial layers |
| Rack, Philip |
Deposition and Characterization of Platinum Wires Deposited by a Neon Gas Field Ion Source |
| Radhakrishnan, S |
Continuous fabrication of large-area flexible metamaterial via Roll-to-Roll nanopatterning for IR filter applications |
| Rahman, FHM |
Progress Towards a Commercial Neon Gas Field Ion Source |
| Ramachandra, Ranjan |
Modeling for Multi-Beam Ion Imaging and Analysis |
| Raman, Pattabiraman Santhana |
First lithography results obtained with the 2nd generation MeV proton beam writing facility |
| Ramanathan, Muruganathan |
Probing Nanostructures of Aged Active Layer Materials for Organic Solar Cells |
| Randall, John N. |
Automated position corrections for Atomically Precise STM lithography of Si(001):H |
| Randall, John |
Determining Tip Position Tolerances for Atomically Precise STM lithography of Si(001):H |
| Rangelow, Ivo |
Improved single ion implantation with scanning probe alignment |
| Rank, Andreas |
High aspect ratio lift-off process and silver optimization for negative index materials in the visible
Micro- and Nanostructuring of Graphene on various Substrates using UV-NIL
Nanometer Size Protein Patterning using nCP for the Investigation of Protein-Protein Interactions in Live Cells |
| Ratchev, Svetan |
Surface-Finishing of Focused Ion Beam Milled Features by Pulsed Electron Irradiation |
| Raub, Alex |
An all-optical process for extending GRATE to the 11nm (20nm hp) Technology Node (Invited) |
| Ravindran, Prabu |
Defect Evolution in Thin Films of Self-Assembling Lamella Forming Block Copolymers on a Neutral Surface |
| Ray, Vishva |
High Resolution Patterning on Non-Planar Substrates with Large Height Variation Using Electron-Beam Lithography |
| Reano, Ronald |
Electron Beam Direct Write of Chalcogenide Glass Integrated Optics |
| Reddy, N. |
Liquid phase electron beam induced deposition of CdS |
| Reed, Mark |
Fabrication and Characterization of Field Effect Reconfigurable Nanofluidic Ionic Diodes: Building Blocks Towards Digitally-Programmed Manipulation of Biomolecules |
| Ren, Fan |
Nanofabrication of Graphene on SiC by Multi-Ion Beam Lithography and Low-Temperature Processing |
| Renaldo, Alfred |
Large area optical lithography using cylindrical masks |
| Retolaza, Aritz |
Enhanced Transmission through Gold Nanohole Arrays Fabricated by Thermal Nanoimprint Lithography for Surface Plasmon Based Biological Sensing |
| Reuther, Freimut |
Release-Optimized UV-NIL Resists |
| Rho, Junsuk |
Sub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens |
| Riboli, Francesco |
Hyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of “Campanile” Tips
Towards the holy grail of near field optics via reproducibly fabricated optical nano antennae on Scanning Probe Tips |
| Richter, Karola |
Cleaning Defects of Soft UV-Nanoimprint Molds for High Aspect-Ratio Features |
| Ricketts, David |
SPM Local Oxidation and In-situ Characterization Using AFM Probes in Multiple Modes |
| Rikers, Yuri G.M. |
3D Patterning of Si Micro and Nano Structures by Focused Ion Beam Implantation, Si Deposition and Selective Si Etching |
| Ring, Johan |
High Volume Nanoimprint Lithography technology and applications |
| Rivaton, Agnès |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Rizal, Binod |
Imprint-Templated Nanocoaxial Array Architecture |
| Roberts, Clive |
Analysis on probe-sample interaction for scanning near-field photolithography (snp) |
| Roberts, Kevin |
E-Beam Patterning of Nanoparticle Filled Sucrose Resist |
| Robertson, Neil |
Fabrication of CoCrPt Alloy Bit Patterned Media at 1 Td/in2 for Recording Measurement |
| Rocca, Jorge |
Defect Tolerant Extreme Ultraviolet Lithography |
| Rode, Patrick |
Position control of MOVPE grown GaN nanorods using nanoimprint lithography |
| Roediger, Peter |
Engineering electrical properties of Silicon nanowires by focused electron beam induced processing with Chlorine |
| Rogers, John |
Reduction of proximity effects using high-contrast developer in fabricating large-area nanoimprint molds |
| Rokuta, Eiji |
Multi-axis and Multi-beam technology for high throughput maskless E-beam lithography |
| Rolandi, Marco |
Scanning Probe Nanostructure Direct-Write: Serial and Parallel Patterning via High Field Chemistry |
| Romijn, Hans |
High-Speed Patterning of Hexagonal Dot Arrays Using Electron-Beam Lithography |
| ronse, kurt |
EUV lithography in pre-production mode (Invited) |
| Rösch, Roland |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Ross, Caroline A. |
Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films
Complex self-assembled patterns from a square grid template with restricted geometry
Sub-20 nm fabrication on polyimide plastics enabled by directed self-assembly
Block Copolymer Self-Assembly Using Sacrificial Template
Achieving Ordered Nanoholes and Other Non-bulk Morphologies by Directed Self-Assembly of a Block Copolymer |
| Roussel, Laurent |
Optimization of the Gun, Lenses, and Detectors for High-Vacuum SEM Studies of Non-Conductive Specimens |
| Ruchhoeft, Paul |
Multi-domain storage in graded bit patterned media (Invited)
Fabrication of dense non-circular nanomagnetic device arrarys using self-limiting low-energy glow-discharge processing |
| Ruiz, Ricardo |
Image quality and pattern transfer in block copolymer directed assembly with block-selective atomic layer deposition
Directed Self-assembly with Density Multiplication of 6 tera-dot/in2 Pattern by POSS-Containing Block Copolymer |
| Ruoff, Rod |
Graphene-based & Graphene-derived Materials (Invited) |
| Russell, Thomas |
Super selective silicon cryo-etching for nanoscale pattern transfer with block copolymer lithogrpahy |
| Ruzic, David |
Understanding the sources of unwanted etch in ion beam sputter deposition production of EUV mask blanks |
| Ruzmentov, Dmitri |
Focused Ion Beam Implantation of Li+ in WO3 Using A Magneto-Optical Trap Ion Source (Invited) |
| Rymuza, Zygmunt |
Impact of Mold-Resist Roughness on Friction and Adhesion Properties by Nano Tribological Inspection |
| Ryu, JiHyeong |
Flow behaviors of a polymer according to the imprint velocity during pressing step in NIL |
S |
| Saito, Masashi |
High Density Pattern Transfer via Roll to Roll Ultraviolet Nanoimprint Lithograpy using Replica Mold |
| Sakai, Hirofumi |
Molecular simulation of electron-irradiation damages in resist materials (Invited) |
| Sakamoto, Jyunji |
Study of defect mechanisms in partly filled stamp cavities for thermal nano imprint control |
| Salaün, Mathieu |
Control of the PS-b-PDMS directed self-assembly by silsesquioxane-based graphoepitaxial substrate engineering |
| Saliba, Sebastian |
Arbitrarily Shaped High-Coherence Electron and Ion Bunches from Laser-Cooled Atoms |
| Samarelli, Antonio |
Nanofabrication of high aspect ratio (~50:1) sub-10 nm silicon nanowires using plasma etch technologies |
| Sanabia, Jason |
Stitch-Error Free Electron Beam Lithography of Periodic Structures |
| Sanchez, Martha |
Fundamental Study of EUV Resist Line Edge Roughness: Characterization, Experiment and Modeling |
| Santillan, Julius Joseph |
An In situ Analysis of EUV Resist Film Inhomogeneity during the Dissolution Process |
| Santori, Charles |
Diamond nitrogen-vacancy centers created by scanning focused helium ion beam and annealing
Patterning nitrogen-vacancy color centers in diamond using scanning focused helium ion beam |
| Sasao, Norikatsu |
Fabrication of 5 Tb/in2 Bit Patterned Media with Servo Pattern using Directed Self-Assembly |
| Sato, Hideki |
Scanning Probe Nanostructure Direct-Write: Serial and Parallel Patterning via High Field Chemistry |
| Sato, Mizuki |
Directed Self-assembly with Density Multiplication of 6 tera-dot/in2 Pattern by POSS-Containing Block Copolymer |
| Sato, Takashi |
Talbot effect immersion lithography by self-imaging of very fine grating pattern |
| Sato, Toshimi |
Large-Area Nanostructures by Laser-Scanning Imprinting (Invited)
Effect of offset temperature on replication of laser-assisted imprinting |
| Savenko, A. |
Reproducibility of Drift Tolerant Focused Ion Beam Lithography Method |
| Savu, Veronica |
Stencil-nanopatterned back reflector increases efficiency of thin-film solar cells
Thermal control extends heated stencil's life-time |
| Schardein, Greg |
Patterning Silver Using an Atomic Force Microscope and Laser-induced Deposition from Liquids (Invited) |
| Schattenburg, Mark |
Fabrication of Nano-scale, High Throughput, High Aspect Ratio Freestanding Gratings |
| Scheer, Hella-Christin |
Study of defect mechanisms in partly filled stamp cavities for thermal nano imprint control
Crosslinking control during imprint for hybrid lithography (T-NIL + UV-L)
Preparation of surfaces with patterned roughness for sensing application |
| Schenkel, Thomas |
Improved single ion implantation with scanning probe alignment |
| Scherer, Axel |
Determination of Base Dose and Scattering Coefficients for Proximity Effect Correction in Electron Beam Lithography |
| Schift, Helmut |
Sidewall-angle dependent pre-filling of three-dimensional microcavities in thermal nanoimprint
3-D microfabrication based on a glass transition temperature selective thermal reflow - towards optical applications |
| Schleunitz, Arne |
Sidewall-angle dependent pre-filling of three-dimensional microcavities in thermal nanoimprint
3-D microfabrication based on a glass transition temperature selective thermal reflow - towards optical applications |
| Schmid, Andreas |
Progress Towards An Aberration-Corrected Low Energy Electron Microscope for DNA Sequencing and Surface Analysis |
| Schmidt, Bernd |
Taming Nanostructures: From Sponge to Dot Pattern on Ge Controlled by Heavy-Ion-Deposited Energy
Taming of Ga droplets on DLC layers – Size tuning and local arrangement with nm accuracy |
| Schmidt, Jiri |
Direct nano-structuring of solid surface by extreme ultraviolet Ar8+ laser |
| Schmidt, Martin |
High resolution dry photo-ablation development (Invited) |
| Schmits, Ruud |
Continuous Electron Beam Lithography Writing Modes for Optical Waveguide Nanofabrication |
| Schmitz, A. |
Graphene for RF Applications: Opportunities & Challenges (Invited) |
| Schoengen, Max |
Embedding and Combining Plasmonic Elements and Photonic Crystal Structures |
| Scholl, Andreas |
Magneto-optical and X-ray microscopy of nanomagnetic logic components with shape-induced biaxial anisotropy |
| Scholten, Robert |
Arbitrarily Shaped High-Coherence Electron and Ion Bunches from Laser-Cooled Atoms |
| Schrempel, Frank |
Lithium Niobate Nanowaveguides fabricated by Ion-Beam Enhanced Etching |
| Schuck, James |
High resolution dry photo-ablation development (Invited) |
| Schuck, Jim |
Towards the holy grail of near field optics via reproducibly fabricated optical nano antennae on Scanning Probe Tips |
| Schuck, P. James |
Hyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of “Campanile” Tips
30 nm nanochannels with plasmonic bowtie nanoantenna
Putting Plasmonic Probes in Perspective: The Case for the Campanile Tip |
| Schuck, Peter |
Tunable Plasmonic Light Trapping Metal Structures |
| Schuetz, Gerhard |
Nanometer Size Protein Patterning using nCP for the Investigation of Protein-Protein Interactions in Live Cells |
| Schvartzman, Mark |
Nanowires with controlled location and direction by surface-guided growth from patterned catalyst |
| Schwartz, Evan |
Directed Patterning for Electronics Using Multiple Block Copolymers Orthogonally |
| Schwartzberg, Adam |
Sub-10 nm area-selective ALD using block copolymer lithography
High resolution dry photo-ablation development (Invited) |
| Schwind, G.A. |
Computer Modeling of the Schottky Electron Source |
| Scipioni, L. |
Plasmonic Nanostructures Fabricated using Helium and Gallium Ion Beam Instruments. |
| Scipioni, Larry |
Nanoscale Photoelectron Emission Using C-shaped Nanoapertures with Cesium Bromide Photocathode
Deposition and Characterization of Platinum Wires Deposited by a Neon Gas Field Ion Source |
| Segal, Joel |
Surface-Finishing of Focused Ion Beam Milled Features by Pulsed Electron Irradiation |
| Semiconductor, Tezzaron |
Heterogeneous 3D Integration (Invited) |
| Seo, H.C. |
Graphene for RF Applications: Opportunities & Challenges (Invited) |
| Seo, Hwan-Seok |
Optical Performance of Binary Mask with a Tantalum Telluride Absorber Layer for Extreme Ultraviolet Lithography (Invited) |
| Shadman, Khashadyar |
Progress Towards An Aberration-Corrected Low Energy Electron Microscope for DNA Sequencing and Surface Analysis |
| Shaik, Shoieb |
High-Resolution Non-Destructive Patterning of Isolated Organic Semiconductors |
| Sharifi, Fred |
Stable Field Emission from Nanoporous Silicon Carbide Tips Patterned by a Focused Ion Beam(Invited) |
| Sheehan, Michael |
Investigation of Templated Self-assembly of High-χ Diblock Copolymer |
| Sheludko, David |
Arbitrarily Shaped High-Coherence Electron and Ion Bunches from Laser-Cooled Atoms |
| Shen, Yang |
Non-planar nano-arc-gap arrays fabricated via colloidal lithography |
| Shepard, Ken |
Scalable Graphene Field Effect Transistors with Boron Nitride Dielectrics (Invited) |
| Shepard, Stephen |
Imprint-Templated Nanocoaxial Array Architecture |
| Shi, Haofei |
High aspect-ratio doped Si nanostructures for plasmonics induced light funneling applications |
| Shi, Tielin |
Sensitivity Analysis for Lens Aberration Measurement in Lithographic Tools Using CTC-Based Quadratic Aberration Model |
| Shima, Darryl |
A Quantitative Probe Current Distribution Characterization Technique for Focused Ion Beam |
| Shimada, Takuya |
Fabrication of 5 Tb/in2 Bit Patterned Media with Servo Pattern using Directed Self-Assembly |
| Shimoyama, Hiroshi |
Multi-axis and Multi-beam technology for high throughput maskless E-beam lithography |
| Shin, Young Jae |
Wire-Grid Polarizer by Nanoimprint Lithography Using Epoxysilsesquioxane |
| Shleev, Sergey |
Nanoimprinted Electrodes for Highly Efficient and Stable Bio-Fuel Cells |
| Shokouhi, Babak |
Periodic tilted Au structure fabrication by electron beam exposure |
| Shroff, Yashesh |
Near-Field EUV Imaging for Spatial Frequency Multiplication |
| Shtokhamer, Roman |
Modeling of Counter Streaming Charged Beams in MICHELLE–eBEAM |
| shuhong, Li |
Study of nanospheres lithography technology with super-lens for fabricating nano holes
Fabrication of nano metallic holes for color filter based on a controllable polystyrene spheres self-assemble |
| Shul, Randy |
Inductively Coupled Plasma Etching of Benzocyclobutene with SF6 Chemistry |
| Shyu, Jia-Hong |
Surface plasmon resonance coupling assisted optical transmission through Ag/SiN /Ag photonic crystal slabs
Fabrication and magnetic properties of hundred-nanometer-scaled permalloy cylinders arrays |
| Sijbrandij, Sybren |
Towards Secondary Ion Mass Spectrometry on the Helium Ion Microscope
Progress Towards a Commercial Neon Gas Field Ion Source |
| Silva, S. R. P. |
Electron emission from carbon nanotubes |
| Silver, Richard |
Fabrication of nano structures for Dimensional Metrology and Device Applications |
| Simao, Claudia |
Directed self-assembly of PS-PEO using solvent vapors assisted nanoimprint lithography |
| Singapore |
Lithographically-Defined Nanostructures for Color Plasmonic Printing |
| Singh, Lovejeet |
Fundamental Study of EUV Resist Line Edge Roughness: Characterization, Experiment and Modeling |
| Singh, V. |
Liquid phase electron beam induced deposition of CdS |
| Slama, Sebastian |
Potential modulation by plasmonic sub-micron structures for the manipulation of ultracold atomic gas clouds |
| Smayling, Michael |
Sub-20nm Hybrid Lithography enabled by Highly Regular Layout,Pitch Division, and e-Beam Exposure (Invited) |
| Smith, Henry I. |
The Membrane-Alignment Stage in Fabricating 3-Dimensional Nanostructures |
| Smith, Henry |
A Novel Grating-Apodization Technique in Equivalent-Chirped Sampled-Bragg Gratings |
| Smith, Leslie |
Bimaterial electro-mechanical systems for audio frequency applications |
| Smith, Noel |
Thermionic Electron Gun with Small Virtual Source Size for Electron Beam Lithography Applications (Invited) |
| Snider, Gregory |
High Aspect Ratio Features in PMGI using Electron Beam Lithography and Solvent Developers |
| Sobota, Jaroslav |
Direct nano-structuring of solid surface by extreme ultraviolet Ar8+ laser |
| Sohda, Yasunari |
Electron scattering simulation for subsurface metrology in scanning electron microscope |
| Solak, Harun |
Phase shifting mask for high-throughput high-contrast patterning with Displacement Talbot Lithography (DTL)
Optical lithography method for generation of sub-35nm line/space patterns for use in complementary lithography |
| Son, Jeong Gon |
Sub-20 nm fabrication on polyimide plastics enabled by directed self-assembly |
| Soper, Steven |
Bonding of PMMA nanofluidic devices and its effect on DNA behavior in nanochannels |
| Sotomayor-Torres, Clivia |
Directed self-assembly of PS-PEO using solvent vapors assisted nanoimprint lithography |
| Sporre, John |
Understanding the sources of unwanted etch in ion beam sputter deposition production of EUV mask blanks |
| Spreu, Christian |
3-D microfabrication based on a glass transition temperature selective thermal reflow - towards optical applications |
| Sreenivasan, SV |
Nanoscale Manufacturing Using Jet and Flash Imprint Lithography (Invited) |
| Stach, Eric |
Templated Placement of Colloidal Quantum Dots |
| Staehlke, Susanne |
Pyramid Array Substrates for Biomedical Studies |
| Stamper, Anthony |
CMOS Compatible RF MEMs Technology (Invited) |
| Stan, Gheorghe |
Fabrication of nano structures for Dimensional Metrology and Device Applications |
| Steele, Adam |
Focused Ion Beam Implantation of Li+ in WO3 Using A Magneto-Optical Trap Ion Source (Invited) |
| Stehle, Christian |
Potential modulation by plasmonic sub-micron structures for the manipulation of ultracold atomic gas clouds |
| Stein, Aaron |
Defect Tolerant Extreme Ultraviolet Lithography |
| Stein, Gila |
Measurements of the Latent Image in Chemically-Amplified Resists |
| Steinberg, Christian |
Crosslinking control during imprint for hybrid lithography (T-NIL + UV-L) |
| Stemme, Göran |
3D Patterning of Si Micro and Nano Structures by Focused Ion Beam Implantation, Si Deposition and Selective Si Etching |
| Stenger, Dominik |
Sub-10 nm area-selective ALD using block copolymer lithography |
| Stepanova, Maria |
Study of Line-Edge Roughness in ZEP Resist Nanopatterns from Electron Beam Lithography by Numerical Modeling
High Aspect Ratio SML Resist Patterning using 30 keV Electron Beam Lithography
Study of the Interaction of Polymethylmethacrylate Fragments with Methyl Isobutyl Ketone |
| Stern, Lewis |
Deposition and Characterization of Platinum Wires Deposited by a Neon Gas Field Ion Source |
| Stevens, Jeffrey |
Inductively Coupled Plasma Etching of Benzocyclobutene with SF6 Chemistry |
| Stocker, Michael |
Photodeactivatable photoresists for visbile-light nanolithography? |
| Stoltz, Peter |
Modeling of defect transport in EUVL plasma chambers
Understanding the sources of unwanted etch in ion beam sputter deposition production of EUV mask blanks |
| Strasfeld, David |
Templated Placement of Colloidal Quantum Dots |
| Strassburg, Martin |
Position control of MOVPE grown GaN nanorods using nanoimprint lithography |
| Straus, Jaroslav |
Direct nano-structuring of solid surface by extreme ultraviolet Ar8+ laser |
| Structures, Periodic |
An all-optical process for extending GRATE to the 11nm (20nm hp) Technology Node (Invited) |
| Su, Dong |
Templated Placement of Colloidal Quantum Dots |
| Sun, Chen |
An FPGA-based Pattern Generator for Massive Parallel High-Speed Nanolithography System |
| Sun, Cheng |
Sub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens |
| Sun, Jeff |
REBL: A Lithography Solution for High Volume Manufacturing at 16 nm (Invited) |
| Sun, Jie |
A Novel Grating-Apodization Technique in Equivalent-Chirped Sampled-Bragg Gratings |
| Sun, Weijie |
The Sensing Properties of IR Nanostructed Plasmonic Crystals Fabricatied by Electron Beam Lithography and Argon Ion Milling |
| Sun, Yujiao |
Reduction of proximity effects using high-contrast developer in fabricating large-area nanoimprint molds |
| Sun, Zhenzhong |
High-Resolution Non-Destructive Patterning of Isolated Organic Semiconductors |
| Sundberg, Linda |
Fundamental Study of EUV Resist Line Edge Roughness: Characterization, Experiment and Modeling |
| Sundberg, Richard |
Nanoimprinted Electrodes for Highly Efficient and Stable Bio-Fuel Cells |
| Sung, CY |
Graphene Nanoelectronics (Invited) |
| Suntharalingam, Vyshnavi |
Overcoming 3DIC Technology Hurdles (Invited) |
| Sunzenauer, Stefan |
Nanometer Size Protein Patterning using nCP for the Investigation of Protein-Protein Interactions in Live Cells |
| Suyatin, Dmitry |
Nanoimprinted Electrodes for Highly Efficient and Stable Bio-Fuel Cells |
| Suzuki, Hiroyuki |
Electron Beam Lithography by Using Self-Assembled Block Copolymer Thin Films as Positive/Negative Tone Combined Resist |
| Suzuki, Kenta |
Full area real time monitoring of filling process by dark field illumination in UV nanoimprint lithography (Invited) |
| Sviličić, Boris |
Piezoelectrically Transduced Silicon Carbide MEMS Double-Clamped Beam Resonators |
| Swanson, L.W. |
Computer Modeling of the Schottky Electron Source |
| Szymanska, Joanna |
Fabrication of high resolution computer-generated holograms using 3D electron beam lithography. |
T |
| Tabdanov, Erdem |
Screening T-Cell Activation with Nanostructured Substrates |
| Tada, Yasuhiko |
Directed Self-Assembly of Perpendicularly Oriented Nano-Cylinders with Liquid Crystalline Block Copolymer
Directed Self-assembly with Density Multiplication of 6 tera-dot/in2 Pattern by POSS-Containing Block Copolymer
Etching Process for Patten Transfer from Sphere-type PMMA-b-PMAPOSS Block Copolymer |
| Takagi, Hideki |
Fast and Continuous Patterning on the Surface of Plastic Fiber by Using Thermal Roller Imprint |
| Takahashi, Junki |
Release Agent Properties in Ultraviolet Nanoimprint Lithography using High-Aspect-Ratio Nanoscale Molds |
| Takahata, Kouji |
Multi-axis and Multi-beam technology for high throughput maskless E-beam lithography |
| Takashima, Yuzuru |
Nanoscale Photoelectron Emission Using C-shaped Nanoapertures with Cesium Bromide Photocathode |
| Takatsuka, Masa |
Fabrication of high resolution computer-generated holograms using 3D electron beam lithography. |
| Takenaka, Mikihito |
Directed Self-assembly with Density Multiplication of 6 tera-dot/in2 Pattern by POSS-Containing Block Copolymer |
| Talin, Alec |
Focused Ion Beam Implantation of Li+ in WO3 Using A Magneto-Optical Trap Ion Source (Invited) |
| Tan, Shida |
A Quantitative Probe Current Distribution Characterization Technique for Focused Ion Beam |
| Tanenbaum, David |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Tang, Tiantong |
Calculation of high order aberrations of practical multi-pole type electron optical aberration correctors using a differential algebraic method |
| Tang, Zirong |
Sensitivity Analysis for Lens Aberration Measurement in Lithographic Tools Using CTC-Based Quadratic Aberration Model |
| Taniguchi, Jun |
High Density Pattern Transfer via Roll to Roll Ultraviolet Nanoimprint Lithograpy using Replica Mold
Release Agent Properties in Ultraviolet Nanoimprint Lithography using High-Aspect-Ratio Nanoscale Molds
Additional and correction patterning of resist layer using scanning probe lithography |
| Taniguchi, Yukio |
Phase shifting mask for high-throughput high-contrast patterning with Displacement Talbot Lithography (DTL) |
| Tansarawiput, Chookiat |
Horizontal Growth of Silicon Nanowire Arrays for Large-Scale Circuit Applications |
| Tao, Li |
Graphene transistors with record mobilities on polyimide for high-performance flexible nanoelectronics
Sub-20 nm fabrication on polyimide plastics enabled by directed self-assembly |
| Tazaki, Go |
High Density Pattern Transfer via Roll to Roll Ultraviolet Nanoimprint Lithograpy using Replica Mold |
| Teki, Ranganath |
EUV Mask Challenges, Status & Closing The Remaining Technology Gaps (Invited) |
| Teng, Lichao |
Experimental Investigation on the Short Channel Effect of Nano-Imprinted Organic Field Effect Transistors (Invited) |
| Teo, Benjamin |
First lithography results obtained with the 2nd generation MeV proton beam writing facility |
| Teora, Pat |
Understanding the sources of unwanted etch in ion beam sputter deposition production of EUV mask blanks |
| Terasawa, Tsuneo |
Residual-type mask defect printability for EUV lithography
Dependence of Image Characteristics Dependece on Incident Electron Beam Energy for EUV Mask inspection using Monte Carlo simulation |
| Terhalle, Bernd |
High-resolution patterning with EUV interference lithography |
| Ternent, Gary |
Nanofabrication of high aspect ratio (~50:1) sub-10 nm silicon nanowires using plasma etch technologies |
| Tesch, Paul |
Thermionic Electron Gun with Small Virtual Source Size for Electron Beam Lithography Applications (Invited) |
| Thackeray, James |
Low Diffusion EUV Resists using Bound PAG Technology (Invited) |
| Thomas, Gordon |
Bio-Fuel Cell Operational Enhancements using Nanoscale Electrodes |
| Thompson, Daniel |
Arbitrarily Shaped High-Coherence Electron and Ion Bunches from Laser-Cooled Atoms |
| Thompson, Kevin |
Tunable Plasmonic Light Trapping Metal Structures |
| Thoms, Stephen |
High aspect ratio (~25:1) sub-10 nm HSQ lines using electron beam lithography
Long Narrow Gaps for III-V Transistors Fabricated by Electron Beam Lithography |
| Thorsen, Todd |
Microfluidics Beyond Basic Biology- From Fertility Monitoring to Artificial Respiration (Invited) |
| Thrun, Xaver |
Cleaning Defects of Soft UV-Nanoimprint Molds for High Aspect-Ratio Features |
| Tian, Yingtao |
Fresnel zone plates as X-ray lenses by electron beam lithography with HSQ resist |
| TIberio, Richard |
System to Measure the Shear Modulus of Iron at high temperature and pressure using Transverse Displacement Interferometry Fabricated by Electron Beam Lithography |
| Tiwari, Sandip |
Directed Patterning for Electronics Using Multiple Block Copolymers Orthogonally |
| Toda, Masaya |
Vacuum-packaged Resonant Thermal Sensor for Biological Cell in liquid (MNC Paper) |
| Tokimasa, Akifumi |
At-Wavelength EUV Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors |
| Tolbert, Laren |
High Resolution Negative Tone Resists via Controlled Polymerization |
| Tominaka, Satoshi |
Lithographically Designed Porous Plasmonic Nanostructures (Invited) |
| Tomioka, Tatsuya |
Au Nanorods and Nanogap Split-Ring Structures Fabricated by Reactive-Monolayer-Assisted Thermal Nanoimprinting and Electrodeposition |
| Tomova, Zulya |
Photodeactivatable photoresists for visbile-light nanolithography? |
| Tongay, Sefaattin |
Nanofabrication of Graphene on SiC by Multi-Ion Beam Lithography and Low-Temperature Processing |
| Tornello, James |
Electron beam lithography-based grating customization strategies for gate level patterning in high density SRAM circuits (Invited) |
| Torres, Clivia Sotomayor |
Sub-100 nm three dimensional diffractive optical elements fabricated by UV light assisted roll-to-roll nanoimprint lithography |
| Toshiba |
Talbot effect immersion lithography by self-imaging of very fine grating pattern |
| Toth, Milos |
A Mechanism for Dendritic Nano-Pillar Growth using EBID
Electron Beam Etching Kinetics of Diamond and Graphite |
| Toyoda, Mitsunori |
At-Wavelength EUV Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors |
| Tran, Hieu |
Cleaning Induced Imprint Template Erosion |
| Tran, Hoang |
Investigation of Templated Self-assembly of High-χ Diblock Copolymer |
| Tsai, Hsin-Yu |
Sub-30 nm pitch circuit relevant patterning in Si, SiO2 and SiN using directed self assembly based pattern generation (Invited) |
| Tsai, Wu-Wei |
Employing Nano Imprint to Fabricate Space-Charge-Limited Transistors (SCLTs) |
| Tseng, Ching-Tung |
Fabrication of a Binary Phase Grating on a Fiber End by Utilizing Interference Lithography |
| Tseng, Yi-Chuan |
Fabrication of a Binary Phase Grating on a Fiber End by Utilizing Interference Lithography |
| Tseng, Yu-Chih |
Enhancing the Etch Resistance of PMMA-Based Photoresist to Meet ITRS Target from Year 2022 |
| Tsivion, David |
Nanowires with controlled location and direction by surface-guided growth from patterned catalyst |
| Tsong, Tien T. |
Low-Energy Electron Diffraction Microscopy Based on a Single-Atom Electron Source |
| Tsukidate, Yoshitaka |
Fluoroalkyl-Containing Surfactants to Reduce Release Energy of UV-Cured Acrylate Resin |
| Tünnermann, Andreas |
Lithium Niobate Nanowaveguides fabricated by Ion-Beam Enhanced Etching |
| Turchanin, Andrey |
1 nm Thick Chemically Functionalized Carbon Nanomembranes (CNMs): Two-dimensional Materials for Nanoengineering |
| Türke, Alexander |
Experimental Investigation on the Short Channel Effect of Nano-Imprinted Organic Field Effect Transistors (Invited) |
U |
| Uba, Franklin |
Bonding of PMMA nanofluidic devices and its effect on DNA behavior in nanochannels |
| Ueki, Ryuichi |
Strain characteristics of free-standing graphene induced by low-energy electron beam irradiation |
| Ueno, Akihisa |
Control of Inclined Angle of Glass-like Carbon Mold by Defocus UV Exposure on Si Containing Photoresist |
| Ulin-Avila, Erick |
Sub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens
An FPGA-based Pattern Generator for Massive Parallel High-Speed Nanolithography System |
| Ummethala, Upendra |
REBL: A Lithography Solution for High Volume Manufacturing at 16 nm (Invited) |
| Ünal, Nezih |
Mask Aligner Process Simulation for Advanced Lithography and Resolution Enhancement Techniques |
| Unal, Nezih |
Point spread function analysis of dense high resolution nanodots in hydrogen silsesquioxane |
| Univ, Yonsei |
Design and fabrication of micro optical system for multi-optical probe confocal microscopy for large areal measurement |
| Univ., Yonsei |
Development of a large areal metallic nano stamp fabrication process using UV nanoimprinting and pulse reverse current electroforming for discrete track media with pattern width of 35nm |
| Universität, Georg-August |
Directed Assembly of Symmetric ABA Triblock Copolymers on Chemically Nanopatterned Substrates |
| University, Keio |
Diamond nitrogen-vacancy centers created by scanning focused helium ion beam and annealing |
| University, Nottingham |
Analysis on probe-sample interaction for scanning near-field photolithography (snp) |
| University, Peking |
Focused-Ion-Beam Introduced Bidirectional Bending for Complex Three-Dimensional Structures
Near-Field EUV Imaging for Spatial Frequency Multiplication |
| University, Sichuan |
Study of nanospheres lithography technology with super-lens for fabricating nano holes
Fabrication of nano metallic holes for color filter based on a controllable polystyrene spheres self-assemble |
| Unno, Noriyuki |
High Density Pattern Transfer via Roll to Roll Ultraviolet Nanoimprint Lithograpy using Replica Mold |
| Uosaki, Kohei |
Lithographically Designed Porous Plasmonic Nanostructures (Invited) |
| Urban, Radovan |
Tip shaping of gas field ion sources for optimal ion beam generation |
| Urbanski, Lukasz |
Defect Tolerant Extreme Ultraviolet Lithography |
| Urgula, Ozan |
Optimization of the Gun, Lenses, and Detectors for High-Vacuum SEM Studies of Non-Conductive Specimens |
| USA, Raith |
Stitch-Error Free Electron Beam Lithography of Periodic Structures |
| Uzunoğlu+++, Gülşah |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
V |
| van de Veerdonk, Rene |
Progress and Challenges in Bit Patterned Media Nanofabrication (Invited) |
| van der Drift, Emile |
Helium ion beam lithography of thick HSQ resists |
| van der Heijden, Eddy |
Placement error study of cylindrical phase self-assembly guided by graphoepitaxy |
| van der Zande, Arend |
Scalable Graphene Field Effect Transistors with Boron Nitride Dielectrics (Invited)
Fabricating Graphene-Silicon Nitride Heterostructures for High-Q Tunable Nanomechanical Resonators |
| van Kan, Jeroen Anton |
First lithography results obtained with the 2nd generation MeV proton beam writing facility
Electron impact gas ion source development; evaluation of different electron injection sources (Invited) |
| van Langen-Suurling, Anja |
Helium ion beam lithography of thick HSQ resists |
| Van Leer, Brandon |
Optimization of the Gun, Lenses, and Detectors for High-Vacuum SEM Studies of Non-Conductive Specimens |
| van Veldhoven, Emile |
Helium ion beam lithography of thick HSQ resists |
| Van Zeijl, Elfi |
Fabrication of high resolution computer-generated holograms using 3D electron beam lithography. |
| vandenberghe, geert |
EUV lithography in pre-production mode (Invited) |
| Vanderzande+, Dirk |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Vanhove, Nico |
Towards Secondary Ion Mass Spectrometry on the Helium Ion Microscope |
| Varghese, Leo T. |
Horizontal Growth of Silicon Nanowire Arrays for Large-Scale Circuit Applications |
| Varghese, Leo |
Sub-20 nm Metal Gratings by Nanoimprint Lithography
Fabrication of Photonic Devices on Flexible Platform
Fabrication of an 18-layer 3D Woodpile Photonic Crystal via Stacking of Pre-Patterned Free-Standing Membranes |
| Vasko, Stephanie |
Scanning Probe Nanostructure Direct-Write: Serial and Parallel Patterning via High Field Chemistry |
| Vazquez-Mena, Oscar |
Stencil-nanopatterned back reflector increases efficiency of thin-film solar cells |
| Velha, Philippe |
Nanofabrication of high aspect ratio (~50:1) sub-10 nm silicon nanowires using plasma etch technologies |
| Venkatachalam, Dinesh K. |
Nanofabrication of Graphene on SiC by Multi-Ion Beam Lithography and Low-Temperature Processing |
| Veres, Teodor |
High Aspect Ratio, Triangular Silicon Pillars for Bump Array Concentration of Pathogenic Bacteria
Vibrant color transmission under cross-polarization through gold-coated gratings nanoimprinted in polymer foils |
| Virwani, Kumar |
Fundamental Study of EUV Resist Line Edge Roughness: Characterization, Experiment and Modeling |
| Viswanathan, Vignesh |
Patterning of Sub-10 nm Optical Apertures on Single Crystal Metallic Films with the Helium Ion Microscope (Invited)
Immersion Optics for Excitation of Surface Plasmons in a Transmission Mode Photoemission Electron Microscope |
| Vladar, Andras |
On Clean Samples and High-Resolution Quantitative Charged Particle Microscopy |
| Vladov, Nikola |
Surface-Finishing of Focused Ion Beam Milled Features by Pulsed Electron Irradiation |
| Vlasov, Alexander |
Modeling of Counter Streaming Charged Beams in MICHELLE–eBEAM |
| Vockenhuber, Michaela |
High-resolution patterning with EUV interference lithography |
| Vockenhubera, Michaela |
High resolution patterning of Hafnium oxide based resist by EUV and Electron beam lithography |
| Voelcker, Nico |
Metal Nanoparticle Arrays by Controlled Decomposition of Polymer Particles |
| Voelkel, Reinhard |
Mask Aligner Process Simulation for Advanced Lithography and Resolution Enhancement Techniques |
| Vogler, Marko |
3-D microfabrication based on a glass transition temperature selective thermal reflow - towards optical applications
Single digit nanoimprint lithography achieved by template modification with atomic layer deposition
Release-Optimized UV-NIL Resists |
| Vogler, Uwe |
Mask Aligner Process Simulation for Advanced Lithography and Resolution Enhancement Techniques |
| Voigt, Anja |
Polymeric freestanding structures by direct write laser without sacrificial layers |
| Von Ehr, James R. |
Automated position corrections for Atomically Precise STM lithography of Si(001):H |
| Von Her, Jim |
Determining Tip Position Tolerances for Atomically Precise STM lithography of Si(001):H |
| Voroshazi, Eszter |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
W |
| Wagner, Michael |
Low Diffusion EUV Resists using Bound PAG Technology (Invited) |
| Wago, Koichi |
Progress and Challenges in Bit Patterned Media Nanofabrication (Invited) |
| Waid, Simon |
Focused Electron Beam Induced Deposition as novel nanofabrication approach for magnetic nanosensors and nanomagnet logic
Magnetic reversal of iron nanowires deposited by Focused Electron Beam Induced Deposition for nanomagnet logic application
Fabrication of 3-dimensional Nanoimprint Stamps - A comparison of 4 approaches using FIB |
| Wall, David |
Optimization of the Gun, Lenses, and Detectors for High-Vacuum SEM Studies of Non-Conductive Specimens |
| Wallin, Chris |
High quality factors in graphene and ultra thin Silicon nitride nanomechanical drums |
| Wallraff, Gregory |
Fundamental Study of EUV Resist Line Edge Roughness: Characterization, Experiment and Modeling |
| Wan, Lei |
Image quality and pattern transfer in block copolymer directed assembly with block-selective atomic layer deposition
Molecular Transfer Printing Using Silicon Membrane for the Fabrication of Large Area Chemical Patterns on Highly Flexible Substrates |
| Wang, Gang |
Enhancement of Light-Emitting Efficiency for GaN-based Light-Emitting Diodes by Nanoscale Bump and Pit ITO Surface |
| Wang, Hongying |
Cleaning Induced Imprint Template Erosion |
| Wang, Jian |
Fabrication of Photonic Devices on Flexible Platform |
| Wang, Lei |
Scalable Graphene Field Effect Transistors with Boron Nitride Dielectrics (Invited) |
| Wang, Li |
High-resolution patterning with EUV interference lithography
Resonant Dielectric Nanostructures for biosensor applications (Invited) |
| Wang, Lon A. |
Fabrication of a Binary Phase Grating on a Fiber End by Utilizing Interference Lithography |
| Wang, Lon |
Employing Nano Imprint to Fabricate Space-Charge-Limited Transistors (SCLTs) |
| Wang, Qing |
Full area real time monitoring of filling process by dark field illumination in UV nanoimprint lithography (Invited) |
| Wang, Risheng |
Directed assembly of one-dimensional functional nanostructures |
| Wang, Shiunchin |
Bio-Fuel Cell Operational Enhancements using Nanoscale Electrodes |
| Wang, Si |
Study of defect mechanisms in partly filled stamp cavities for thermal nano imprint control
Crosslinking control during imprint for hybrid lithography (T-NIL + UV-L)
Preparation of surfaces with patterned roughness for sensing application |
| Wang, Xiaotie |
Nanofabrication of Graphene on SiC by Multi-Ion Beam Lithography and Low-Temperature Processing |
| Wang, Yuan |
Sub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens
An FPGA-based Pattern Generator for Massive Parallel High-Speed Nanolithography System |
| Wang, Yue |
Patterning of Sub-10 nm Optical Apertures on Single Crystal Metallic Films with the Helium Ion Microscope (Invited) |
| Wang, Yuxuan |
Significant Enhancement of Colloidal Quantum Dots Fluorescence by 3D Disk-dot Coupled Nanoantenna Array |
| Wanger, Darcy |
Templated Placement of Colloidal Quantum Dots |
| Wanzenboeck, Heinz D. |
Focused Electron Beam Induced Deposition as novel nanofabrication approach for magnetic nanosensors and nanomagnet logic
Magnetic reversal of iron nanowires deposited by Focused Electron Beam Induced Deposition for nanomagnet logic application
Microfluidic Axon-Isolation Device fabricated by Nanoimprint lithography
Fabrication of 3-dimensional Nanoimprint Stamps - A comparison of 4 approaches using FIB
Engineering electrical properties of Silicon nanowires by focused electron beam induced processing with Chlorine |
| Warisawa, Shin'ichi |
Superconductivity of tungsten-containing carbon nanowires fabricated by focused-ion-beam chemical vapor deposition
The three-dimensional nanostructure fabrication from HSQ by FIB/EB dual-beam lithography
Quality factor improvement of graphene resonator by SU-8 shrinkage-induced strain
Electron Beam Lithography by Using Self-Assembled Block Copolymer Thin Films as Positive/Negative Tone Combined Resist
Nanomechanical Tuning Forks Fabricated by Focused-ion-beam Chemical Vapor Deposition |
| Warner, Keith |
Overcoming 3DIC Technology Hurdles (Invited) |
| Watanabe, Hidehiro |
Residual-type mask defect printability for EUV lithography
Dependence of Image Characteristics Dependece on Incident Electron Beam Energy for EUV Mask inspection using Monte Carlo simulation |
| Watanabe, Takeo |
Development of Standalone Coherent EUV Scatterometry Microscope for EUV Mask Observation
At-Wavelength EUV Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors |
| Watanabe, Yuuta |
Filling Characteristics of Imprint Process for Concave Pattern Molds |
| Wathuthanthri, Ishan |
Fabrication of Polymer Nanostructures via Maskless O2 Plasma Etching
From Nanocone to Nanodisk: Structural Transformation of Nanoarrays via Mechanical Stresses
Nanopatterning of “Disconnected” Metal Nanostructures on Polydimethylsiloxane (PDMS) Substrate by Using Free-Standing Photoresist Film as Stencil Lithography Mask |
| Watson, George Pat |
A superhydrophobic surface made from hydrophilic materials with micro-umbrella structures |
| Weaver, Al |
Understanding the sources of unwanted etch in ion beam sputter deposition production of EUV mask blanks |
| Weaver, John |
Analysis on probe-sample interaction for scanning near-field photolithography (snp) |
| Weber-Bargioni, Alex |
Putting Plasmonic Probes in Perspective: The Case for the Campanile Tip |
| Weber-Bargioni, Alexander |
Hyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of “Campanile” Tips
Towards the holy grail of near field optics via reproducibly fabricated optical nano antennae on Scanning Probe Tips |
| Wegmann, Urs |
Combined SIMS-SPM instrument for high sensitivity and high resolution elemental 3D analysis |
| Wei, Jennifer |
Lithographically-Defined Nanostructures for Color Plasmonic Printing |
| Weichelt, Tina |
Mask Aligner Process Simulation for Advanced Lithography and Resolution Enhancement Techniques |
| Weis, Christoph |
Improved single ion implantation with scanning probe alignment |
| Weller, Dieter |
Fabrication of CoCrPt Alloy Bit Patterned Media at 1 Td/in2 for Recording Measurement |
| Wi, Jung-Sub |
Lithographically Designed Porous Plasmonic Nanostructures (Invited) |
| Wibowo, Andree |
Via-Hole Fabrication for III-V Triple-Junction Solar Cells |
| Wiersma, Diederik |
Hyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of “Campanile” Tips
Towards the holy grail of near field optics via reproducibly fabricated optical nano antennae on Scanning Probe Tips |
| Wijnands, Marc |
High-Speed Patterning of Hexagonal Dot Arrays Using Electron-Beam Lithography |
| William, Thompson |
Deposition and Characterization of Platinum Wires Deposited by a Neon Gas Field Ion Source |
| Williams, R. Stanley |
Demonstration of sub-4 nm nanoimprint lithography using a template fabricated by helium ion beam lithography
Diamond nitrogen-vacancy centers created by scanning focused helium ion beam and annealing
Patterning nitrogen-vacancy color centers in diamond using scanning focused helium ion beam |
| Wilson, Michelle J. |
Arrays of Topographically and Peptide-Functionalized Hydrogels for Analysis of Biomimetic Extracellular Matrix Properties (Invited) |
| Wind, Shalom |
Sub-micron scale gold-tipped elastomeric pillar arrays for human T cell activation and culture
Directed assembly of one-dimensional functional nanostructures |
| Winroth, Gustaf |
Relationship between Film Thickness Loss and Polymer Deprotection for EUV and ArF Photoresists |
| Wirtz, Tom |
Towards Secondary Ion Mass Spectrometry on the Helium Ion Microscope
Combined SIMS-SPM instrument for high sensitivity and high resolution elemental 3D analysis |
| Wolkow, Robert |
Tip shaping of gas field ion sources for optimal ion beam generation |
| Wolters, Janik |
Embedding and Combining Plasmonic Elements and Photonic Crystal Structures |
| Wong, H.-S. Philip |
Directed Self-Assembly for the Semiconductor Industry (Invited)
Design Space for One-hole Pattern using Block Copolymer Directed Self-Assembly |
| Wong, Simon |
Monolithic 3D Integration (Invited) |
| Wonn, Anne |
Metal Nanoparticle Arrays by Controlled Decomposition of Polymer Particles |
| Woodfield, Tim B. F. |
Polymeric Substrates with Bioimprinted Micro- and Nanoscale Topography for Regulation of Chondrocyte Re-Differentiation |
| Wu, Humeng |
Deposition and Characterization of Platinum Wires Deposited by a Neon Gas Field Ion Source |
| Wu, J. C. |
Fabrication and magnetic properties of hundred-nanometer-scaled permalloy cylinders arrays |
| Wu, Ji |
Electrophoretic and electroosmotic flow through carbon nanotube membranes as chemical pumps |
| Wu, Jiahao |
Bonding of PMMA nanofluidic devices and its effect on DNA behavior in nanochannels |
| Wu, Jong-Ching |
Surface plasmon resonance coupling assisted optical transmission through Ag/SiN /Ag photonic crystal slabs |
| Wu, Wei |
Demonstration of sub-4 nm nanoimprint lithography using a template fabricated by helium ion beam lithography
Diamond nitrogen-vacancy centers created by scanning focused helium ion beam and annealing
Patterning nitrogen-vacancy color centers in diamond using scanning focused helium ion beam |
| Wu, Wengang |
Focused-Ion-Beam Introduced Bidirectional Bending for Complex Three-Dimensional Structures |
| Wu, Xiaofei |
Sensitivity Analysis for Lens Aberration Measurement in Lithographic Tools Using CTC-Based Quadratic Aberration Model |
| Wu, Yang-Kai |
Employing Nano Imprint to Fabricate Space-Charge-Limited Transistors (SCLTs)
Fabrication of a Binary Phase Grating on a Fiber End by Utilizing Interference Lithography |
| Wu, Yi-Kuei |
Angle Independent Reflective Color Filters by Plasmonic-induced Light Funneling Effect |
| Wuister, Sander |
Placement error study of cylindrical phase self-assembly guided by graphoepitaxy |
| Würfel, Uli |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Wurm, Stefan |
EUV Mask Challenges, Status & Closing The Remaining Technology Gaps (Invited) |
X |
| Xia, Xiaoxiang |
The Sensing Properties of IR Nanostructed Plasmonic Crystals Fabricatied by Electron Beam Lithography and Argon Ion Milling
Enhancement of Light-Emitting Efficiency for GaN-based Light-Emitting Diodes by Nanoscale Bump and Pit ITO Surface |
| Xiao, Shuaigang |
Progress and Challenges in Bit Patterned Media Nanofabrication (Invited) |
| Xie, Shenqi |
Thermal control extends heated stencil's life-time |
| Xing, Huili |
High Aspect Ratio Features in PMGI using Electron Beam Lithography and Solvent Developers |
| Xiong, Shaomin |
Sub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens
An FPGA-based Pattern Generator for Massive Parallel High-Speed Nanolithography System |
| Xiong, Yi |
Sub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens
An FPGA-based Pattern Generator for Massive Parallel High-Speed Nanolithography System |
| Xu, Jun |
Focused-Ion-Beam Introduced Bidirectional Bending for Complex Three-Dimensional Structures |
| Xu, Qian Feng |
A superhydrophobic surface made from hydrophilic materials with micro-umbrella structures |
| Xu, Shuang |
Sensitivity Analysis for Lens Aberration Measurement in Lithographic Tools Using CTC-Based Quadratic Aberration Model |
| Xu, Wei |
Fabrication of Polymer Nanostructures via Maskless O2 Plasma Etching
Nanopatterning of “Disconnected” Metal Nanostructures on Polydimethylsiloxane (PDMS) Substrate by Using Free-Standing Photoresist Film as Stencil Lithography Mask |
| Xu, Xianfan |
Horizontal Growth of Silicon Nanowire Arrays for Large-Scale Circuit Applications |
| Xu, Zonggang |
Focused-Ion-Beam Introduced Bidirectional Bending for Complex Three-Dimensional Structures |
| Xuan, Yi |
Sub-20 nm Metal Gratings by Nanoimprint Lithography
Horizontal Growth of Silicon Nanowire Arrays for Large-Scale Circuit Applications
Fabrication of Photonic Devices on Flexible Platform
Fabrication of an 18-layer 3D Woodpile Photonic Crystal via Stacking of Pre-Patterned Free-Standing Membranes |
Y |
| Yabara, Hidebumi |
Multi-axis and Multi-beam technology for high throughput maskless E-beam lithography |
| Yaghoobi, Parham |
Solar Electron Source and Thermionic Solar Cell
Two-photon Photoemission from Carbon Nanotube Arrays under Low-power Ultraviolet Illumination |
| Yagnyukova, Mariya |
Nanolithography and pattern transfer of dense sub-10 nm lines |
| Yam, Jonathan |
Fabrication of Nano-scale, High Throughput, High Aspect Ratio Freestanding Gratings |
| Yamaguchi, Hiroshi |
Superconductivity of tungsten-containing carbon nanowires fabricated by focused-ion-beam chemical vapor deposition
New Technique of Three-Dimensional Nanofabrication in Semiconductors by Using Electron Beam Lithography |
| Yamamoto, Ryousuke |
Fabrication of 5 Tb/in2 Bit Patterned Media with Servo Pattern using Directed Self-Assembly |
| Yamashita, Kouta |
Optical and Electrical Sensing application of High-Aspect-Ratio Nanoholes Formed by Etching of Latent Tracks |
| Yamasoe, Kenjiro |
At-Wavelength EUV Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors |
| Yamazaki, Kenji |
New Technique of Three-Dimensional Nanofabrication in Semiconductors by Using Electron Beam Lithography |
| Yan, Minjun |
Reduction of proximity effects using high-contrast developer in fabricating large-area nanoimprint molds |
| Yanagihara, Mihiro |
At-Wavelength EUV Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors |
| Yanez-Soto, Bernardo |
Arrays of Topographically and Peptide-Functionalized Hydrogels for Analysis of Biomimetic Extracellular Matrix Properties (Invited) |
| Yang, Chen |
Horizontal Growth of Silicon Nanowire Arrays for Large-Scale Circuit Applications |
| Yang, Haifang |
Enhancement of Light-Emitting Efficiency for GaN-based Light-Emitting Diodes by Nanoscale Bump and Pit ITO Surface |
| Yang, Henry |
Cleaning Induced Imprint Template Erosion |
| Yang, Joel K.W. |
Lithographically-Defined Nanostructures for Color Plasmonic Printing |
| Yang, Joel |
Plasmonics At The Single-Nanometer Scale (Invited) |
| Yang, Wei |
Electron-beam Patterned PEG Microgels for DNA Detection |
| Yang, XiaoMin |
Progress and Challenges in Bit Patterned Media Nanofabrication (Invited) |
| Yankov, Vladimir |
Fabrication of High Resolution Digital Spectrometers-on-Chip |
| Yao, Yong |
First lithography results obtained with the 2nd generation MeV proton beam writing facility |
| Yasuda, Hiroshi |
Multi-axis and Multi-beam technology for high throughput maskless E-beam lithography |
| Yasuda, Masaaki |
Molecular dynamics study on structural modifications of graphene by electron beam irradiation
Molecular simulation of electron-irradiation damages in resist materials (Invited)
Filling Characteristics of Imprint Process for Concave Pattern Molds |
| Yavuz, Mustafa |
Patterning of porous silicon nitride membrane by CsCl self assembly |
| Ye, Ziliang |
Sub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens |
| Yesilkoy, Filiz |
Strain Assisted Self Lift-Off Process for the Fabrication Ultra Low Capacitive Antenna Coupled MIM Tunnel Diodes for the Application of Infrared Detection and Energy Harvesting |
| Yi, He |
Directed Self-Assembly for the Semiconductor Industry (Invited)
Design Space for One-hole Pattern using Block Copolymer Directed Self-Assembly |
| yidong, Houi |
Study of nanospheres lithography technology with super-lens for fabricating nano holes |
| Yin, Xiaobo |
Sub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens |
| Yoshida, Hiroshi |
Directed Self-Assembly of Perpendicularly Oriented Nano-Cylinders with Liquid Crystalline Block Copolymer
Directed Self-assembly with Density Multiplication of 6 tera-dot/in2 Pattern by POSS-Containing Block Copolymer
Etching Process for Patten Transfer from Sphere-type PMMA-b-PMAPOSS Block Copolymer |
| Yoshida, Takashi |
Development of MEMS electron-optics bonded on electron emitter array for Massively Parallel EB Lithography System |
| Yoshikawa, Hiroshi |
Fabrication of high resolution computer-generated holograms using 3D electron beam lithography.
High Density Pattern Transfer via Roll to Roll Ultraviolet Nanoimprint Lithograpy using Replica Mold |
| Yost, Donna R. W. |
Overcoming 3DIC Technology Hurdles (Invited) |
| Youn, Hong Seok |
Continuous fabrication of large-area flexible metamaterial via Roll-to-Roll nanopatterning for IR filter applications |
| Youn, Sung-Won |
Full area real time monitoring of filling process by dark field illumination in UV nanoimprint lithography (Invited) |
| Young, Anthony |
Magneto-optical and X-ray microscopy of nanomagnetic logic components with shape-induced biaxial anisotropy |
| Youtsey, Chris |
Via-Hole Fabrication for III-V Triple-Junction Solar Cells |
| Yu, Hang |
Fabrication of Nanostructured Hydrophobic Surfaces with Laser Interference Lithography |
| Yu, Zhaoning |
Cleaning Induced Imprint Template Erosion |
| Yun, Cheol Min |
Release Layer Free Acrylate Resins for Ultraviolet Nanoimprinting Prepared by Adding Segregation Auxiliary Agents |
| Yushmanov, Peter |
SEM dimensional metrology on sub-15 nm bit-patterned media using model-based analysis |
| Yuzawa, Akiko |
Fabrication of 5 Tb/in2 Bit Patterned Media with Servo Pattern using Directed Self-Assembly |
Z |
| Zaluzec, N.J. |
Plasmonic Nanostructures Fabricated using Helium and Gallium Ion Beam Instruments. |
| Zan, Hsiao-Wen |
Employing Nano Imprint to Fabricate Space-Charge-Limited Transistors (SCLTs) |
| Zelsmann, Marc |
Control of the PS-b-PDMS directed self-assembly by silsesquioxane-based graphoepitaxial substrate engineering
Directed Self-Assembled Porous Anodic Alumina by NanoImprinting Lithography |
| Zento, Toshiyuki |
High Density Pattern Transfer via Roll to Roll Ultraviolet Nanoimprint Lithograpy using Replica Mold |
| Zhang, Cheng |
Angle Independent Reflective Color Filters by Plasmonic-induced Light Funneling Effect
Continuous fabrication of polymer waveguides with smooth sidewalls by Dynamic Nano-Inscribing (DNI) and NanoChannel-guided Lithography (NCL) processes (Invited) |
| Zhang, Jian |
Periodic tilted Au structure fabrication by electron beam exposure
Electron beam lithography with evaporated resist |
| Zhang, Lihua |
Templated Placement of Colloidal Quantum Dots |
| Zhang, Weihua |
Giant and Uniform Fluorescence Enhancement of Organic Dye by 3D Plasmonic NanoCavity Array
Significant Enhancement of Colloidal Quantum Dots Fluorescence by 3D Disk-dot Coupled Nanoantenna Array |
| Zhang, Wenjun |
Tunable silver nano-pillar arrays as a surface-enhanced Raman scattering sensor by a self-aligned nanofabrication process |
| Zhang, Xiang |
Sub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lens
An FPGA-based Pattern Generator for Massive Parallel High-Speed Nanolithography System |
| Zhang, Xianhui |
1 nm Thick Chemically Functionalized Carbon Nanomembranes (CNMs): Two-dimensional Materials for Nanoengineering |
| Zhang, Xu A. |
Fabrication of Hollow-Shell Nano-volcanoes from Mie Scattering of Colloidal Nanospheres |
| Zhang, Yuan |
Analysis on probe-sample interaction for scanning near-field photolithography (snp) |
| Zhang, Zhiping |
Monolithic 3D Integration (Invited) |
| Zhao, Jingyi |
Calculation of high order aberrations of practical multi-pole type electron optical aberration correctors using a differential algebraic method |
| Zhao, Lin |
Horizontal Growth of Silicon Nanowire Arrays for Large-Scale Circuit Applications |
| Zhao, X. |
Fast Simulation of Stochastic Exposure Distribution in Electron-beam Lithography |
| Zhao, Yuning |
Via-Hole Fabrication for III-V Triple-Junction Solar Cells |
| Zheng, Zhen |
Fabrication of dense non-circular nanomagnetic device arrarys using self-limiting low-energy glow-discharge processing |
| Zhou, Chuandong |
Modeling of defect transport in EUVL plasma chambers
Understanding the sources of unwanted etch in ion beam sputter deposition production of EUV mask blanks |
| Zhou, Haiping |
Nanofabrication of high aspect ratio (~50:1) sub-10 nm silicon nanowires using plasma etch technologies
High aspect ratio (~25:1) sub-10 nm HSQ lines using electron beam lithography |
| Zhou, Liangcheng |
New Nanoplasmonic Devices and Fabrication for Large Enhancement and Tunability of Second Harmonic Light Generation
Significant Enhancement of Colloidal Quantum Dots Fluorescence by 3D Disk-dot Coupled Nanoantenna Array |
| Zhou, Xinjiang |
Fast Aerial Image Simulation for Partially Coherent Systems by TCC Decomposition with Analytical Kernels (Invited) |
| Zimmermann, Birger |
Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaboration |
| Zimmermann, Claus |
Potential modulation by plasmonic sub-micron structures for the manipulation of ultracold atomic gas clouds
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