EIPBN 2008 Authors Index

A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z

Name	Abstract
A
Abe, H.	Contrast Reversal Effect In SEM Due To Charging
Abe, Kazuki	Hydrogen Radical Cleaning Of Carbon Contamination On EUV Mask
Abramson, Justin	Fabrication Of Nanoscale Bioarrays For The Study Of Cytoskeletal Protein Binding Interactions Using Nano-Imprint Lithography
Adam, Konstantinos	Pattern Specific Optical Models
Adesida, Ilesanmi	The Effects Of Molecular Weight On Resist Evaluation Parameters In Poly(Methylmethacrylate) Developed At Sub-Zero Temperatures
Afzali, Ali	(Invited) Chemical Functionalization For The Selective Placement Of Single-Walled Carbon Nanotubes
Ahn, Minseung	Fabrication Of 200 Nm Period Blazed Transmission Gratings On Silicon-On-Insulator Wafers
Akasaka, Satoshi	Integration Of Electron Beam Lithography With Block Copolymer Self-Assembly For 10nm Scale Nanofabrication
Akhadov, E. A.	Design And Fabrication Of Vertical Nanowire Device Arrays
Aktary, M.	High Density Nanostructure Fabrication by Electron Beam Lithography, Zs. Szabo
Albrecht, Tom	Patterned Magnetic Recording Media
Aldana, Rafael	The Prospects Of Free Electron Analog To Digital Technology
Alducin, Juan	Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities
Alkaisi, Maan	UV Curable Nanoimprint Lithography For Replicating Three Dimensional Structures
Alpha, Christopher	Chip-Based Microfabricated Electrospinning Nozzles
Alvaro, Virginie Maffini	Hybrid High Resolution Lithography (E-Beam/DUV) And Etch Process For Achieving Stacked Nanowire MOSFETs
Alvine, Kyle	Polyhedral Oligomeric Silsesquioxane (POSS) Functional Patterns Directly Fabricated By Nanoimprint Lithography
Amatya, Reja	Fabrication Strategies For Filter Banks Based On Microring Resonators
Anazawa, Toshihisa	Hydrogen Radical Cleaning Of Carbon Contamination On EUV Mask
Ancona, Mario G.	(Invited) Electron-Transparent Cantilevers For TEM Visualization Of Nanodevices
Anderson, Christopher	Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool Impact Of Base And PAG Loading On Intrinsic Resolution In EUV Resists
Anderson, Erik	Actinic Euv Mask Inspection Beyond 0.25 NA 50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser Ultra Compact Interferometric Lithography System Realized With A Desk-Top Extreme Ultraviolet Laser
Ando, Manabu	Low Energy Ion Beam Machining Of Si Layer Deposited On An ULE Substrate For EUVL Optics - Evaluation Of Surface Roughness
Anikeeva, Polina	Templated Self-Assembly Of Sub-10nm Quantum Dots
Aoki, Nobutada	Development Of The Compact Low-Energy Soft X-Ray CT Equipment For The Soft Material Structural Analysis
Arai, Yoshihiro	(Invited) Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained From High Resolution Transmission Electron Microscopy
Aramaki, Fumio	Application Of Vector Scanning In FIB Photomask Repair System Image Quality Improvement In Fib Photomask Repair System
Arcamone, Julien	Dynamic Stencil Lithography On Full Wafer Scale
Argitis, Panagiotis	Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists
Argyrakis, Petros	Plastic Deformation Magnetic Assembly Of Out Of Plane Structures Using Hydrofluoric Acid Vapour Release
Artioukov, Igor	50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Aryal, Mukti	Imprinted Large-Scale High Density Polymer Nanopillars For Various Applications Stability Of HSQ Nano-Lines Defined By E-Beam Lithography
Ashkenasy, N.	Formation Of Nano Holes By An Electron Beam- Induced Etching Process
Astolfi, David	Contributions Of Resist Polymers To Innate Material Roughness
Attwood, David	50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Auth, Nicole	(Invited) Applications Of Focused Electron Beam Processing
Ay, Feridun	Reducing Optical Losses In Focused-Ion-Beam Etched Silicon
Azpiroz, Jaione Tirapu	(Invited) The Role Of Computational Modeling In Semiconductor Lithography:Progressing Towards The Virtual Fab
B
Babin, S.	Contrast Reversal Effect In SEM Due To Charging Modeling Of Charge And Discharge In Scanning Electron Microscopy
Baets, Roel	Reducing Optical Losses In Focused-Ion-Beam Etched Silicon Focused-Ion-Beam Lithography For Prototyping Of Silicon Photonic Components
Bahm, A. S.	Range Of Validity Of Field Emission Equations
Bai, Shufeng	Fabrication Of Wafer-Scale Nano-Split-Ring Metamaterials By Nanoimprint Without Direct-Write In Mold Making
Baldi, Antoni	Impedimetric Biosensing With Interdigitated Arrays Of Nano Electrodes Fabricated By Nanoimprint Lithography
Banine, Vadim	Extreme Ultraviolet Lithography: Status And Prospects
Bao, Tianming	Enabling Nanometrology For High Aspect Ratio Structures With Carbon Nanotube AFM Probes
Baranov, Leonid	A Modeling Approach For Shot Noise Effect On Feature Roughness
Barbastathis, George	Carbon Nanotube-Based Magnetic Actuation Of Origami Membranes
Barwicz, Tymon	(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices
Basnar, B.	Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates
Baudemprez, Bart	Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections
Bawendi, Moungi	Templated Self-Assembly Of Sub-10nm Quantum Dots
Bazin, Arnaud	Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness
Bean, Jeffrey	Thermal Infrared Detection Using Antenna-Coupled Metal-Oxide-Metal Diode Detectors
Belau, Leonid	The Effects Of Wet And Dry Cleaning Methods On The Chemical Composition And Morphology Of The Ru Capping Layer Of The Extreme Ultraviolet (EUV) Mask Blanks
Bellan, Leon	Chip-Based Microfabricated Electrospinning Nozzles
Benschop, Jos	Extreme Ultraviolet Lithography: Status And Prospects
Berger, Ruediger	Guided Phase Separation Of Polymer Blends For Patterns Varying From Micron To Nanometer Length Scales
Berggren, K. K	Sub-15 Nm Half-Pitch Nanoimprint Molds Using High Resolution Negative Tone Resist And Reactive Ion Etching
Berggren, Karl	Optimum Exposure Parameters For High-Resolution Scanning Electron Beam Lithography Hydrogen Silsesquioxane Nano-Posts As Decoys For Guiding The Self-Assembly Of Block Copolymers Templated Self-Assembly Of Sub-10nm Quantum Dots
Berghe, Gerard ten	(Invited) MAPPER: High Throughput Maskless Lithography
Bernstein, Gary	Thermal Infrared Detection Using Antenna-Coupled Metal-Oxide-Metal Diode Detectors
Bertagnolli, Emmerich	Effect of Microstructures on Growth of Human Epithelial Layers Effect Of Gaseous Additives On Electron Beam Induced Deposition
Berton, Kevin	Capillary Forces Assembly In Microfluidic Cell: Faster Assembly By Accelerating The Particles Convective Flux And Integration Into Complex Pattern
Biasis, Nicolas	Fabrication Of Elastometer Pillar Arrays With Modulated Stiffness For Cellular Force Measurements
Bita, Ion	Hydrogen Silsesquioxane Nano-Posts As Decoys For Guiding The Self-Assembly Of Block Copolymers
Blaikie, Richard	(Invited) Silver Superlenses For Near-Field Optical Nanolithography UV Curable Nanoimprint Lithography For Replicating Three Dimensional Structures
Bogdanski, Nicolas	Contact Angles In A Thermal Imprint Process Quality Assessment Of Anti-Sticking Layers For T-NIL
Bokor, Jeff	Patterned Epitaxial Nanomagnets For Novel Logic Devices (Invited) DNA Directed Assembly Of Nanoparticles Linear Structure For Nanophotonics
Bokor, Jeffrey	Capacitive Characterization Of The Schottky Contact Between Metal And Semiconducting Carbon Nanotube Spin-Dependent Scattering Off Neutral Donors In Silicon Field-Effect Transistors
Bollepalli, Srinivas	(Invited) Advanced Imaging Via Pixelated Phase Masks And Inverse Lithography Effect Of Microstructure On Deprotection Kinetics In Photoresist
Boolchand, Punit	Relief And Trench Formation On Chalcogenide Thin-Films Using Electron Beams
Borisov, S.	Contrast Reversal Effect In SEM Due To Charging Modeling Of Charge And Discharge In Scanning Electron Microscopy
Borodovsky, Yan	(Invited) Advanced Imaging Via Pixelated Phase Masks And Inverse Lithography
Borrisé, Xavier	Impedimetric Biosensing With Interdigitated Arrays Of Nano Electrodes Fabricated By Nanoimprint Lithography
Botman, Aurelien	Focused Electron-Beam-Induced Deposition Of Platinum At Very Low Landing Energies Investigation Of Morphological Changes In Platinum Nano-Structures Created By Focused Electron-Beam-Induced Deposition
Bourov, Anatoly	Aluminum Oxides As Metamaterials For Enhancement Of 193nm Lithography
Boussey, Jumana	Epoxy Silsesquioxane Resists For UV Nanoimprint Lithography Comparison Of Monomer And Polymer Resists In Thermal Nanoimprint Lithography
Bozano, Luisa	Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces
Brainard, Robert	Impact Of Base And PAG Loading On Intrinsic Resolution In EUV Resists
Bratkovski, Alexandre	Tunable Optical Gain For Negative Index Materials By Integration Of Near-Infrared Emitting Nanocrystals
Bratkovsky, Alexander	Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies
Braun, Paul	Inorganic Photoresist Materials For Direct Fabrication Of 3D Photonic Crystals Using Phase Mask Lithography
Brewer, Courtney	50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Brianceau, Pierre	Improvement Of High Resolution Lithography Capabilities By Using Amorphous Carbon Hard Masks Hybrid High Resolution Lithography (E-Beam/DUV) And Etch Process For Achieving Stacked Nanowire MOSFETs
Bristol, Robert	Impact Of Trench Width Roughness On The Directed Self-Assembly Of Block Copolymers On Topographic Substrates
Brizuela, Fernando	50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Bronsgeest, Merijn	Effect Of The Electric Field On The Decay Of A Schottky Electron Emitter Tip End: A Step Flow Model
Brooks, Cynthia	Patterned Media Using Step And Flash Imprint Lithography
Brown, Devin	Direct Patterning Of Plasma Enhanced Chemical Deposition Silicon Dioxide By Electron Beam Lithography
Brueck, Steven	Fabrication Of Porous Nanochannels Using Nanoparticles And Application To The Transport Of DNA Molecules
Bruenger, Wilhelm	Guided Phase Separation Of Polymer Blends For Patterns Varying From Micron To Nanometer Length Scales
Brugger, Juergen	Dynamic Stencil Lithography On Full Wafer Scale
Budach, Michael	(Invited) Applications Of Focused Electron Beam Processing
Bulovic, Vladimir	(Invited) Nanostructured Optoelectronics Templated Self-Assembly Of Sub-10nm Quantum Dots
Bunk, Oliver	In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS
Burghard, Marko	(Invited) Catalyst Patterning For Carbon Nanotube Growth On Elevating Posts By Self-Aligned Double-Layer Electron Beam Lithography
Burr, Geoffrey W.	(Invited) Storage Class Memory
Butschke, J.	Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates
Buyukserin, Fatih	Imprinted Large-Scale High Density Polymer Nanopillars For Various Applications
C
Cabrini, Stefano	An Alternative Electron Beam Exposure Mechanism For Hydrogen Silsesquioxane – A Raman And FTIR Study Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale (Invited) DNA Directed Assembly Of Nanoparticles Linear Structure For Nanophotonics
Cahill, David	Inorganic Photoresist Materials For Direct Fabrication Of 3D Photonic Crystals Using Phase Mask Lithography
Cann, Susan	Contributions Of Resist Polymers To Innate Material Roughness
Cao, Heidi	Impact Of Trench Width Roughness On The Directed Self-Assembly Of Block Copolymers On Topographic Substrates
Cardozo, B. L.	Fabrication Of Organic Light Emitting Diode Arrays By Reversal Imprint Lithography Control of DNA Motion in Microchannels Integrated with Dual Electrodes
Carlton, David	Patterned Epitaxial Nanomagnets For Novel Logic Devices
Castaldo, Vincenzo	Sputtering Limits Versus Signal To Noise Limits In The Observation Of Sn Balls In A Ga Ions Microscope
Ceperley, Daniel	Quantitatively Engineering Surface Plasmon Coupling Through Computer Simulation
Cerrina, Franco	40 Nm Pitch Extreme Ultraviolet Interferometric Lithography
Cha, Jennifer	Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces
Chandhok, Manish	Improvement In Line Width Roughness (LWR) By Post-Processing
Chang, Allan	Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale
Chang, Chih-Hao	Spatial-Frequency Multiplication With Multilayer Interference Lithography
Chang, Chih-hung	Biofunctionalization For Enhanced Photoluminescence Of Nanopatterned Silica From The Diatom Cyclotella Sp.
Chang, S.H.	Diffusers With Both Surface-Relief And Particle-Diffusing Functions Fabricated Using Hybrid Extrusion Roller Embossing
Chang, Wen-Huei	3D Mask Topographic Effects In EUV Lithography
Chao, Liang-Chiun	ZnO Nanowires Grown On Cone-Shaped Zinc Nanostructures By Thermal Oxidation
Chao, Weilun	50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Chaturvedi, Pratik	λ/12 Sub-wavelength Optical Lithography With A Smooth Superlens
Chau, K.	(Invited) Nanophotonics Lab-On-A-Chip Sculpted By Focused-Ion-Beam Milling: Direct Characterization Of Negative-Index Metamaterials Operating In The Visible
Chen, Charlie Chung-ping	Abbe-SVD: Compact Abbe’s Kernel Generation For Microlithography Aerial Image Simulation Using Singular- Value Decomposition Method
Chen, Chun-Chi	Protein-Induced Electrical Variation On Gold-Silicide Embedded Nanowires Hybridization Sensing By Electrical Enhancement With Nanoparticles In Nano-Gap
Chen, H. L.	Using Colloidal Lithography To Fabricate Semitransparent Metal Anodes In Organic Solar Cells Using Reversal Imprint Lithography To Pattern Textured Metal Fims For Surface Plasmonic Device Applications
Chen, Hsuen-Li	3D Mask Topographic Effects In EUV Lithography
Chen, S. H.	Using Reversal Imprint Lithography To Pattern Textured Metal Fims For Surface Plasmonic Device Applications
Chen, T. H.	Using Reversal Imprint Lithography To Pattern Textured Metal Fims For Surface Plasmonic Device Applications
Chen, Yifang	Electron Beam Lithography For Distributed Bragg Reflectors In SU-8
Cheng, Joy	Polymer Self-Assembly For Nanopatterning
Cheng, Mosong	Superfocusing Of Light Using A Metallic/Dielectric Nano-Optic Lens Focusing Of Plasmonic Micro Zone Plate-Based Metallic Structures Covered By A Dielectric Layer
Cheng, Sulin	Interdigitated Electrode Structures For Osteoblast Growth Studies
Cheng, Xing	(Invited) Stability Of Self-Assembled Monolayer Surfactant Coating In Thermal Nanoimprint Improving Organic Thin-Film Transistor Performance By Nanoimprint-Induced Chain Ordering Microfluidic MDM Structure As A Tunable Optical Filter Optical Antennas: A Boost For Infrared Detection Solvent-Etching And Dewetting Techniques For Residual Layer Removal In Thermal Nanoimprint
Cheng, Yang-Chun (Jeff)	40 Nm Pitch Extreme Ultraviolet Interferometric Lithography
Cheung, Rebecca	Electrothermal Actuation Studies On Silicon Carbide Resonators Plastic Deformation Magnetic Assembly Of Out Of Plane Structures Using Hydrofluoric Acid Vapour Release
Chiang, Jerry	Abbe-SVD: Compact Abbe’s Kernel Generation For Microlithography Aerial Image Simulation Using Singular- Value Decomposition Method
Chiu, Jerrin	Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool
Chiu, T-W.	Protein-Induced Electrical Variation On Gold-Silicide Embedded Nanowires
Cho, Han Ku	Resist Charging Effect In Photomask: Its Impact On Pattern Placement Error And Critical Dimension
Cho, Han-Ku	Effects Of Mask Absorber Structures On The EUV Lithography Coherent Euv Scattering Microscopy
Choi, Jin	Resist Charging Effect In Photomask: Its Impact On Pattern Placement Error And Critical Dimension
Choi, Kai	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
Choi, Kang-Hoon	Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment
Choi, S. G.	Design And Fabrication Of Vertical Nanowire Device Arrays
Choi, Sookyung	The Effects Of Molecular Weight On Resist Evaluation Parameters In Poly(Methylmethacrylate) Developed At Sub-Zero Temperatures
Chou, Stephen	Fabrication Of Wafer-Scale Nano-Split-Ring Metamaterials By Nanoimprint Without Direct-Write In Mold Making Graphene Transistors Fabricated Via Transfer-Printing In Device Active-Areas On Large Wafer (Invited) Quantized-Patterning Using Nanoimprinted-Blanks Buried Silicon Dioxide Nanochannels Fabricated By Nanoimprint, Etching And Self-Sealing, Self-Limited Thermal Oxidation Fabrication And Measurement Of Solar-Blind Aluminum Nano-Grid UV Filters By Nanoimprint Lithography And Edge Patterning A Novel Method For Fabricating Sub-16 Nm Footprint T-Gate Nanoimprint Molds
Chouiki, Mustapha	Epoxy Silsesquioxane Resists For UV Nanoimprint Lithography
Chow, Edmond	Efficient Nanoscale Pattern Transfer Process For Porous Silicon
Chu, Tieh-Chi	Hybridization Sensing By Electrical Enhancement With Nanoparticles In Nano-Gap
Chuang, S. Y.	Using Colloidal Lithography To Fabricate Semitransparent Metal Anodes In Organic Solar Cells Using Reversal Imprint Lithography To Pattern Textured Metal Fims For Surface Plasmonic Device Applications
Chuang, V.P.	(Invited) Si-Containing Block Copolymers For Self-Assembled Nanolithography Applications
Chun, Ik-Su	Efficient Nanoscale Pattern Transfer Process For Porous Silicon
Ciou, J.R.	Diffusers With Both Surface-Relief And Particle-Diffusing Functions Fabricated Using Hybrid Extrusion Roller Embossing
Ciou, Tzu-Chien	Large-Area Microlens Arrays Fabricated By Integrated Gas-Assisted UV-Curing Embossing With UV-LED Array Lamp
Comboroure, Corinne	Improvement Of High Resolution Lithography Capabilities By Using Amorphous Carbon Hard Masks Hybrid High Resolution Lithography (E-Beam/DUV) And Etch Process For Achieving Stacked Nanowire MOSFETs
Cord, Bryan	Optimum Exposure Parameters For High-Resolution Scanning Electron Beam Lithography Templated Self-Assembly Of Sub-10nm Quantum Dots
Corso, Tom	Chip-Based Microfabricated Electrospinning Nozzles
Couladouros, Elias	Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists
Coyne , Edward	Superzone Blazed Phase Solid Immersion Diffractive Optics For Enhanced Near-Infrared Scanning Laser Microscopy
Craighead, Harold	Chip-Based Microfabricated Electrospinning Nozzles Optical Excitation Of In-Plane Modes Of Nanoelectromechanical Oscillators For Selective Detachment Of Microspheres
Craver, Barry	An Atom Beam Lithography Tool For Fabricating Dense Nanostructure Arrays
Crnogorac, Filip	Low Temperature Limits For Nano-Graphoepitaxy Of Semiconductors Preferential Orientation Effects In Partial Melt Laser Crystallization Of Silicon
Crozier, P.A.	(Invited) 1 nm Patterning
Cui, Dehu	Improving Organic Thin-Film Transistor Performance By Nanoimprint-Induced Chain Ordering
Cunge, Gilles	Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness
Curri, Lucia	Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities
D
Dahlem, Marcus	(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices Fabrication Strategies For Filter Banks Based On Microring Resonators
Dai, Ding	X-Ray Diffraction Microscopy: Reconstruction With Partial Magnitude And Spatial A Priori Information
Dalby, M.	(Invited) Controlling Cell Behaviour Using Nanopatterned Surfaces
Dardano, Principia	Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale
David, Christian	Fabrication Of Fresnel Zone Plates By Holography In The Extreme Ultraviolet Region
Davis, Ronald W.	Impedance Modulation In Coaxial Nanoneedle Biosensor Multicriteria Optimization In Sensor Design And Fabrication For DNA Thermosequencing Platform
de Boer, Guido	(Invited) MAPPER: High Throughput Maskless Lithography
De Girolamo, Julia	Epoxy Silsesquioxane Resists For UV Nanoimprint Lithography
De La Rue, Richard	Optical Characterisation Of An HSQ Lithography Process
de Pablo, Juan	In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS
De Ridder, Rene. M.	Reducing Optical Losses In Focused-Ion-Beam Etched Silicon
de Winter, Matthijs	Focused Electron-Beam-Induced Deposition Of Platinum At Very Low Landing Energies
Dean, Kim	Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool Impact Of Base And PAG Loading On Intrinsic Resolution In EUV Resists
Denham, Paul	Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool
DeRose, Guy	Diffractive Optical Element Fabrication By Electron Beam Lithography
Dew, S.K.	High Density Nanostructure Fabrication by Electron Beam Lithography, Zs. Szabo
Dhawan, Anuj	FIB Fabrication Of Metallic Nanostructures On End-Faces Of Cleaved Optical Fibers For Chemical Sensing Applications
Dhuey, Scott	Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale
Diebold, Ulrike	Model Studies Of The Photocatalytic Removal Of Carbon From Titanium Dioxide
Dietzel, Andreas	Guided Phase Separation Of Polymer Blends For Patterns Varying From Micron To Nanometer Length Scales
Ding, Baoquan	(Invited) DNA Directed Assembly Of Nanoparticles Linear Structure For Nanophotonics
Ding, Yifu	Continuous Patterns With Height Gradients By Nanoimprint Lithography And Thermal Gradient Annealing Polyhedral Oligomeric Silsesquioxane (POSS) Functional Patterns Directly Fabricated By Nanoimprint Lithography
Dionne, J.	(Invited) Nanophotonics Lab-On-A-Chip Sculpted By Focused-Ion-Beam Milling: Direct Characterization Of Negative-Index Metamaterials Operating In The Visible
Dobberstein, Harald	(Invited) Applications Of Focused Electron Beam Processing
Dobisz, Elizabeth	Integration Of Electron Beam Lithography With Block Copolymer Self-Assembly For 10nm Scale Nanofabrication
Dobisz, Elizabeth	65mm Disk Patterning At 500 Gb/In2 With Full Surface Area Coverage From Diblock Copolymer Templates
Doi, Toshio	Application Of Vector Scanning In FIB Photomask Repair System Image Quality Improvement In Fib Photomask Repair System
Dokania, Anand	Transformation Of Polycrystalline Tungsten To Monocrystalline Tungsten W(100) And Its Potential Application In Schottky Emitters
Doktycz, Mitchel	Development Of Nanoporous Picoliter Reaction Vessels For The Characterization Of Biochemical Systems
Downes, Ian	X-Ray Diffraction Microscopy: Reconstruction With Partial Magnitude And Spatial A Priori Information
Doyle, Hugh	Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities
Dresden, Qimonda	Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment
Dresden, TU	Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment
Drezner, Yariv	E-Beam Nano-Machining For Circuit Edit: An Invasiveness Study
Dror, Raphi	Inorganic Photoresist Materials For Direct Fabrication Of 3D Photonic Crystals Using Phase Mask Lithography
Drygiannakis, Dimitrios	Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists
Dupre, Cecilia	Hybrid High Resolution Lithography (E-Beam/DUV) And Etch Process For Achieving Stacked Nanowire MOSFETs
E
Ebm, Christof	Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates
Economou, Nicholas	(Invited) Elemental Analysis With The Helium Ion Microscope
Eder-Kapl, Stefan	Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates
Edinger, Klaus	(Invited) Applications Of Focused Electron Beam Processing
Efremov, Mikhail	40 Nm Pitch Extreme Ultraviolet Interferometric Lithography
Elata, David	Mask-Less Wet Etching Using Laser Induced Local Heating
Emley, Nathan	Patterned Epitaxial Nanomagnets For Novel Logic Devices
Ercole, Mario	Enabling Nanometrology For High Aspect Ratio Structures With Carbon Nanotube AFM Probes
Ernst, Thomas	Hybrid High Resolution Lithography (E-Beam/DUV) And Etch Process For Achieving Stacked Nanowire MOSFETs
Ersani, Charles Rettner, M.	Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces
Esfandyarpour, Hesaam	Impedance Modulation In Coaxial Nanoneedle Biosensor Multicriteria Optimization In Sensor Design And Fabrication For DNA Thermosequencing Platform
Estroff, Andrew	Aluminum Oxides As Metamaterials For Enhancement Of 193nm Lithography
Estroff, Andrew	Photomask Image Enhancement Using Grating Generated Surface Waves
F
Fang, Nicholas	λ/12 Sub-wavelength Optical Lithography With A Smooth Superlens
Farrar, Nigel	Improving Lithography Pattern Fidelity And Line-Edge Roughness By Reducing Laser Speckle
Farrow, Reginald	Self-Assembly Of Individual Vertically Aligned Carbon Nanotubes
Fay, Patrick	Thermal Infrared Detection Using Antenna-Coupled Metal-Oxide-Metal Diode Detectors
Faynot, Olivier	Improvement Of High Resolution Lithography Capabilities By Using Amorphous Carbon Hard Masks
Fazio, Teresa	(Invited) Nanoscale “Curtain Rods” For The Study Of Protein-DNA Interactions
Fedynyshyn, Theodore	Contributions Of Resist Polymers To Innate Material Roughness
Fernandez-Cuesta, Irene	Impedimetric Biosensing With Interdigitated Arrays Of Nano Electrodes Fabricated By Nanoimprint Lithography
Fernández-Sánchez, César	Impedimetric Biosensing With Interdigitated Arrays Of Nano Electrodes Fabricated By Nanoimprint Lithography
Fetter, Linus	Self-Assembly Of Individual Vertically Aligned Carbon Nanotubes
Fink, Marion	Design Of Polymers For Thermal Nanoimprint Lithography Based On Rheological Investigations
Fleischer, Monika	(Invited) Catalyst Patterning For Carbon Nanotube Growth On Elevating Posts By Self-Aligned Double-Layer Electron Beam Lithography
Fokkema, Emile	Brightness Measurements Of A Gallium Liquid Metal Ion Source
Foos, Edward E.	(Invited) Electron-Transparent Cantilevers For TEM Visualization Of Nanodevices
Fornof, Ann	Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces
Fotowat, Haleh	A Multi-Electrode Cuff For Neuronal Sensing In The Locust
Fowlkes, Jason	Development Of Nanoporous Picoliter Reaction Vessels For The Characterization Of Biochemical Systems (Invited) Maskless Nanolithography Approaches Utilizing Electron-Beam-Induced Deposition Mass–Transport And Reaction-Rate Limited Growth Modes During Electron–Beam Induced Deposition
Frankel, Robert	Aluminum Oxides As Metamaterials For Enhancement Of 193nm Lithography
Frasure, Kent	Improvement In Line Width Roughness (LWR) By Post-Processing
Frendberg, Eric	(Invited) Advanced Imaging Via Pixelated Phase Masks And Inverse Lithography
Friedli, Vinzenz	Optimization Of Nozzle-Based Gas Injection Systems For Focused Electron- And Ion- Beam Induced Processing Stiffness, Density And Quality Of High Aspect Ratio Cu/C Nanostructures Produced By Focused Electron-Beam Induced Deposition
Frommer, Jane	Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces
Fryer, David	Effect Of Microstructure On Deprotection Kinetics In Photoresist
Fu, Peng-Fei	Structure-Property Relationship Of Photocurable Silsesquioxane Resists For Nanoimprint Lithography
Fu, Tsu-Yi	Gas Field Ion Source From An Ir/W<111> Single-Atom Tip
Fu, Zengli	Graphene Transistors Fabricated Via Transfer-Printing In Device Active-Areas On Large Wafer
Fujii, Toshiaki	(Invited) Transmission Electron Microscopy Sample Preparation Employing A "Triple" Beam Instrument
Fujita, Jun-ichi	Multilevel Visualization Of The Local Electric Field At A Sharp Probe Apex By Scanning Electron Microscopy
G
Gabbiani, Fabrizio	A Multi-Electrode Cuff For Neuronal Sensing In The Locust
Gabor, Nathaniel	(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes
Gadegaard, Nicolaj	(Invited) Controlling Cell Behaviour Using Nanopatterned Surfaces
Gaeta, Alexander	(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes
Gale, Debra	Biofunctionalization For Enhanced Photoluminescence Of Nanopatterned Silica From The Diatom Cyclotella Sp.
Gallatin, Gregg	Impact Of Base And PAG Loading On Intrinsic Resolution In EUV Resists
Gamble, Thomas	Fabrication Of Porous Nanochannels Using Nanoparticles And Application To The Transport Of DNA Molecules
Gan, Fuwan	(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices
Gao, Jinming	Imprinted Large-Scale High Density Polymer Nanopillars For Various Applications
García, Jesús	Impedimetric Biosensing With Interdigitated Arrays Of Nano Electrodes Fabricated By Nanoimprint Lithography
Gautam, D.R.	Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists
Gauzner, Gene	Patterned Media Using Step And Flash Imprint Lithography Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media
Geiss, Reinhard	Fabrication Of Large-Area Negative-Index Metamaterial By Electron-Beam-Lithography
George, Matthew	Inorganic Photoresist Materials For Direct Fabrication Of 3D Photonic Crystals Using Phase Mask Lithography
Gerhold, Michael	FIB Fabrication Of Metallic Nanostructures On End-Faces Of Cleaved Optical Fibers For Chemical Sensing Applications
Ghassemi, Saba	Fabrication Of Elastometer Pillar Arrays With Modulated Stiffness For Cellular Force Measurements
Ghatnekar-Nilsson, Sara	Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography
Gil, Dario	(Invited) The Role Of Computational Modeling In Semiconductor Lithography:Progressing Towards The Virtual Fab
Gleeson, James	FIB Fabrication Of Metallic Nanostructures On End-Faces Of Cleaved Optical Fibers For Chemical Sensing Applications
Gnan, Marco	Optical Characterisation Of An HSQ Lithography Process
Goethals, Mieke	Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections
Gogolides, Evangelos	(Invited) High-Aspect-Ratio Plasma-Induced Nanotexturing Of Polymers (PDMS PMMA, PEEK, ...) For Protein Adsorption Applications Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists
Goldberg, Kenneth	Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool Actinic Euv Mask Inspection Beyond 0.25 NA
Goldner, A.	Formation Of Nano Holes By An Electron Beam- Induced Etching Process
Gonsalves, Kenneth	Understanding The Effects Of Photoacid Distribution Homogeneity And Diffusivity On Lithography Performance In Polymer-Bound PAG Photoresists
Goodman, Russell	Contributions Of Resist Polymers To Innate Material Roughness
Gopalakrishnan, Kailash	(Invited) Storage Class Memory
Gotkis, Yehiel	(Invited) Interfacial Mesoscopic Structuring As A Highly Probable Origin Of The Mysterious “LER Fundamental 5nm Limit“
Gourgon, Cecile	NIL Processes And Material Characterization On Transparent Substrates For Optical Applications, Nicolas Chaix
Gourgon, Cécile	Comparison Of Monomer And Polymer Resists In Thermal Nanoimprint Lithography
Goyal, Amit	Self-Assembly Of Individual Vertically Aligned Carbon Nanotubes
Graczyk, Mariusz	Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography
Gray, Stephen	Fabrication Of Metallic Nano-Slit Waveguides With Sharp Bends
Greene, Eric	(Invited) Nanoscale “Curtain Rods” For The Study Of Protein-DNA Interactions
Greenzweig, Yuval	E-Beam Nano-Machining For Circuit Edit: An Invasiveness Study
Gross, Gerard	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
Gross, Gerhard	(Invited) Projection Mask-Less Patterning (PMLP) For Nanotechnology Applications
Groves, Jay	(Invited) Deconstructing Receptor Signaling With Nanopatterned Supported Membranes
Gruetzner, Gabi	Design Of Polymers For Thermal Nanoimprint Lithography Based On Rheological Investigations
Guan, Yingfeng	(Invited) Maskless Nanolithography Approaches Utilizing Electron-Beam-Induced Deposition
Gunther, Norman	Fabrication Of Carbon Nanotube Field Emission Guns For Potential Maskless Lithography
Guo, Hongjie	An Atom Beam Lithography Tool For Fabricating Dense Nanostructure Arrays
Guo, L. Jay	Metal Transfer Assisted Nanolithography On Flexible Substrate Plasma-Etch Fabrication Of High Aspect Ratio Freestanding Silicon Nanogratings As Deep UV Filters Structure-Property Relationship Of Photocurable Silsesquioxane Resists For Nanoimprint Lithography
Gutu, Timothy	Biofunctionalization For Enhanced Photoluminescence Of Nanopatterned Silica From The Diatom Cyclotella Sp.
H
Hadad, Benyimin	Formation Of Nano Holes By An Electron Beam- Induced Etching Process
Häffner, Michael	(Invited) Catalyst Patterning For Carbon Nanotube Growth On Elevating Posts By Self-Aligned Double-Layer Electron Beam Lithography
Hagen, C.W.	(Invited) 1 nm Patterning
Hagen, Cornelis W.	Brightness Measurements Of A Gallium Liquid Metal Ion Source
Hagiwara, Ryoji	Application Of Vector Scanning In FIB Photomask Repair System Image Quality Improvement In Fib Photomask Repair System
Hamaguchi, A.	Contrast Reversal Effect In SEM Due To Charging
Hamakubo, Takao	Development Of The Compact Low-Energy Soft X-Ray CT Equipment For The Soft Material Structural Analysis
Hamamoto, Kazuhiro	Coherent Euv Scattering Microscopy
Han, Hakseung	Actinic Euv Mask Inspection Beyond 0.25 NA
Han, Woosun	Study Of Machine To Machine Overlay Error For Sub-60-Nm Memory Devices
Hannon, James	(Invited) Chemical Functionalization For The Selective Placement Of Single-Walled Carbon Nanotubes
Hanssen, James	A Novel, High Brightness Ion Source Based On Laser Cooled Atoms
Harteneck, Bruce	Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale
Hartley, J	Tools For Resist Heating Analysis And Compensation For Electron Beam Tools
Hartley, John	Charging And Error Budgets In Electron Beam Lithography Tools Optical Wafer Height And Tilt Sensor For Electron Beam Lithography System
Hasegawa, Hirokazu	Integration Of Electron Beam Lithography With Block Copolymer Self-Assembly For 10nm Scale Nanofabrication
Hassanein, Elsayed	Impact Of Base And PAG Loading On Intrinsic Resolution In EUV Resists
Hastings, J. Todd	Self-Assembled Monolayer Fiduical Grids For Spatial-Phase-Locked Electron-Beam Lithography
Hastings, Jeffrey Todd	The Effect Of Thin Metal Over-Layers On The Electron Beam Exposure Of Poly-Methyl Methacrylate
Hastings, Todd	FPGA Implementation Of Real-Time Spatial-Phase Locking For Electron Beam Lithography Optical Properties Of Sputtered Fluorinated Ethylene Propylene
Hayashi, Kunito	Potential Of Rotary Stage Electron Beam Mastering System For Fabricating Patterned Magnetic Media
He, Jianhua	Spin-Dependent Scattering Off Neutral Donors In Silicon Field-Effect Transistors
Hedhili, M. N.	Carbon Film Growth And Mitigation On Model Electron-Irradiated EUVL Mirror Capping Layers: TiO₂ And Ru
Heeren, Andreas	(Invited) Catalyst Patterning For Carbon Nanotube Growth On Elevating Posts By Self-Aligned Double-Layer Electron Beam Lithography
Heilmann, Ralf	Spatial-Frequency Multiplication With Multilayer Interference Lithography Fabrication Of 200 Nm Period Blazed Transmission Gratings On Silicon-On-Insulator Wafers
Helgert, Christian	Fabrication Of Large-Area Negative-Index Metamaterial By Electron-Beam-Lithography
Henderson, Clifford	Single Component Molecular Resists With Covalently Bound Photoacids Next Generation Chemically Amplified Molecular Resists For E-Beam Lithography Based On Epoxide Cross-Linking Understanding The Effects Of Photoacid Distribution Homogeneity And Diffusivity On Lithography Performance In Polymer-Bound PAG Photoresists
Henion, Jack	Chip-Based Microfabricated Electrospinning Nozzles
Hermans, Jan	Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections
Herrero, Fred A.	Plasma-Etch Fabrication Of High Aspect Ratio Freestanding Silicon Nanogratings As Deep UV Filters
Hersam, Mark	(Invited) Probing The Structure And Properties Of Individual Molecules On Silicon Surfaces
Hesselberth, Marcel	Investigation Of Morphological Changes In Platinum Nano-Structures Created By Focused Electron-Beam-Induced Deposition
Hessman, Dan	Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography
Hill, David	Ultra Compact Interferometric Lithography System Realized With A Desk-Top Extreme Ultraviolet Laser
Hill, Shannon	A Novel, High Brightness Ion Source Based On Laser Cooled Atoms
Hinsberg, William	Polymer Self-Assembly For Nanopatterning
Hirai, Yoshihiko	Experimental And Theoretical Study On The Demolding Mechanics Experimental And Theoretical Study On The Demolding Mechanics In Imprint Process Experimental And Numerical Analysis On Recovery Of Polymer Deformation After Demolding In Hot-Embossing Process
Hochleitner, Gottfried	Effect Of Gaseous Additives On Electron Beam Induced Deposition
Hoef, Brian	Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool
Hoffman, Galen	Relief And Trench Formation On Chalcogenide Thin-Films Using Electron Beams
Hofmann, Thorsten	(Invited) Applications Of Focused Electron Beam Processing
Hofsäss, Hans	Self-Aligned Graphitic Nanowires In Diamond-Like Carbon
Hohle, Christoph	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment
Holzwarth, Charles	(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices Fabrication Strategies For Filter Banks Based On Microring Resonators
Hon, Min-Hsiung	Polyimide Hierarchical Structures Via Imprinting And Dewetting
Hone, James	Fabrication Of Nanoscale Bioarrays For The Study Of Cytoskeletal Protein Binding Interactions Using Nano-Imprint Lithography Fabrication Of Elastometer Pillar Arrays With Modulated Stiffness For Cellular Force Measurements
Hong-Shi, Kuo	Investigation of Single-Walled Carbon Nanotubes With LEEPS Microscope, Chang Che-Cheng
Hopman, Wico C.L.	Reducing Optical Losses In Focused-Ion-Beam Etched Silicon
Horsley, David	Light Modulation With A Nano-Patterned Diffraction Grating And MEMS Pixel
Hoshino, Hiromi	Process Variation-Aware 3-Dimensional Proximity Effect Correction For Electron Beam Direct Writing At 45 Nm Node And Beyond
Houkes, Annemarie	(Invited) MAPPER: High Throughput Maskless Lithography
Howe, Roger	Mask-Less Wet Etching Using Laser Induced Local Heating
Hu, Walter	Imprinted Large-Scale High Density Polymer Nanopillars For Various Applications Stability Of HSQ Nano-Lines Defined By E-Beam Lithography
Hua, Jui- Ming	FDTD Study Of Near Field Phase-Shifting Lithography For High-Precision Fabrication Of Nano-Image Profiles
Huan, Po-Hsun	Diffusers With Both Surface-Relief And Particle-Diffusing Functions Fabricated Using Hybrid Extrusion Roller Embossing
Huang, Po-Hsun	Large-Area Microlens Arrays Fabricated By Integrated Gas-Assisted UV-Curing Embossing With UV-LED Array Lamp
Huang, Tzu-Chien	Diffusers With Both Surface-Relief And Particle-Diffusing Functions Fabricated Using Hybrid Extrusion Roller Embossing
Huang, Xiaoxia	Estimation Of Remaining Resist Profile Without Exposure And Development Simulations In E-Beam Lithography
Huh, Sungmin	Effects Of Mask Absorber Structures On The EUV Lithography
Hung, A.	Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces
Huq, Ejaz	Electron Beam Lithography For Distributed Bragg Reflectors In SU-8
Hwang, Ing-Shouh	Gas Field Ion Source From An Ir/W<111> Single-Atom Tip
Hwang, Sung Ho	Full Field Imprint Masks Using Variable Shape Beam Pattern Generators
Hwangbo, Chang Kwon	Absorber Stack With Transparent Conductive Compound Material For EUV Lithography Mask
I
Icard, Beatrice	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
Ichihashi, Toshinari	Resisitivity Change Of The Diamond-Like Carbon
Ikeda, Yuta	Multilevel Visualization Of The Local Electric Field At A Sharp Probe Apex By Scanning Electron Microscopy
Ilani, S.	(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes
Ilic, Rob	Optical Excitation Of In-Plane Modes Of Nanoelectromechanical Oscillators For Selective Detachment Of Microspheres
Ilievski, F.	(Invited) Si-Containing Block Copolymers For Self-Assembled Nanolithography Applications
Imprints, Molecular	Full Field Imprint Masks Using Variable Shape Beam Pattern Generators Patterned Media Using Step And Flash Imprint Lithography
Imre, Alexandra	Espacer Protective Surface Coat For Cutting-Edge Ion-Beam Lithography
In, Hyun Jin	Carbon Nanotube-Based Magnetic Actuation Of Origami Membranes
Ing-Shouh, Hwang	Investigation of Single-Walled Carbon Nanotubes With LEEPS Microscope, Chang Che-Cheng
Ippen, Eric	Fabrication Strategies For Filter Banks Based On Microring Resonators
Ippen, Erich	(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices
Iqbal, Zafar	Self-Assembly Of Individual Vertically Aligned Carbon Nanotubes
Iriye, Yasuroh	Experimental And Numerical Analysis On Recovery Of Polymer Deformation After Demolding In Hot-Embossing Process
Irmscher, M.	Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates
Irmscher, Mathias	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
Ishihara, Jyunya	Experimental And Theoretical Study On The Demolding Mechanics Experimental And Theoretical Study On The Demolding Mechanics In Imprint Process
Ishihara, Sunao	Resisitivity Change Of The Diamond-Like Carbon
Ishikawa, Kiyoshi	Fabrication Of The Nanoimprint Mold Using Inorganic Electron Beam Resist With Post Exposure Bake
Islam, Saif	λ/12 Sub-wavelength Optical Lithography With A Smooth Superlens
Isoyan, Artak	40 Nm Pitch Extreme Ultraviolet Interferometric Lithography
Israel, Intel	E-Beam Nano-Machining For Circuit Edit: An Invasiveness Study
Itani, Toshiro	(Invited) Latent Image Formation In Chemically Amplified Extreme Ultraviolet Resists With Low Activation Energy For Deprotection Reaction Novel Negative-Tone Molecular Resist For EUV Lithography Dissolution Characteristics Of Chemically Amplified EUV Resist
Ivanchikov, A.	Modeling Of Charge And Discharge In Scanning Electron Microscopy
Iwasaki, Koji	(Invited) Transmission Electron Microscopy Sample Preparation Employing A "Triple" Beam Instrument
Iwasaki, Takuya	Experimental And Numerical Analysis On Recovery Of Polymer Deformation After Demolding In Hot-Embossing Process
Izumi, Akira	Hydrogen Radical Cleaning Of Carbon Contamination On EUV Mask
J
Jacobson, Peter	Model Studies Of The Photocatalytic Removal Of Carbon From Titanium Dioxide
Jager, Remco	(Invited) MAPPER: High Throughput Maskless Lithography
Jahnes, Christopher	(Invited) Fluorinated Diamond-Like Carbon Templates For High Resolution Nanoimprint Lithography
Jarrahi, Mona	High-Speed Optical Beam-Steering Based On Phase-Arrayed Waveguides
Javey, Ali	Roll Printing Of Synthetic Nanowires For Novel Sensor And Electronic Applications
Jiang, Fan	40 Nm Pitch Extreme Ultraviolet Interferometric Lithography
Jiao, Jun	Biofunctionalization For Enhanced Photoluminescence Of Nanopatterned Silica From The Diatom Cyclotella Sp.
Jiménez, Sonia Fernández	50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Joest, Michael	(Invited) Applications Of Focused Electron Beam Processing
Johann, Bartha W.	Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment
Jonckheere, Rik	Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections
Jones, Gideon	Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool
Jones, Robert	Direct Write Electron Beam Patterning Of DNA:Complex Thin Films
Joshi, Vishwanath	Controlled Chemical Mechanical Polishing Of Polysilicon And Silicon-Dioxide For Si Based Single-Electron Device With Oxide Tunnel Barriers
Joubert, Olivier	Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness
Juarros, A.	Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography
Jung, Y.S.	(Invited) Si-Containing Block Copolymers For Self-Assembled Nanolithography Applications
Jung, Yeon Sik	Hydrogen Silsesquioxane Nano-Posts As Decoys For Guiding The Self-Assembly Of Block Copolymers
K
Kaertner, Franz	(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices Fabrication Strategies For Filter Banks Based On Microring Resonators
Kaito, Takashi	Resisitivity Change Of The Diamond-Like Carbon
Kakabakos, Sotirios	(Invited) High-Aspect-Ratio Plasma-Induced Nanotexturing Of Polymers (PDMS PMMA, PEEK, ...) For Protein Adsorption Applications
Kakutani, Yukinobu	Protection And Reduction Of Surface Oxidation Of Mo/Si Multilayers For EUVL Projection Optics By Control Of Hydrocarbon Gas Atmosphere
Kampherbeek, Bert Jan	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status (Invited) MAPPER: High Throughput Maskless Lithography
Kanda, Kazuhiro	Resisitivity Change Of The Diamond-Like Carbon
Kaneyama, Koji	Dissolution Characteristics Of Chemically Amplified EUV Resist
Kang, Hee Young	Absorber Stack With Transparent Conductive Compound Material For EUV Lithography Mask
Kang, Huiman	Directed Assembly Of Asymmetric Ternary Block Copolymer-Homopolymer Blends Thin Films Into Checkerboard Trimming Chemical Pattern
Kang, Myung-Gyu	Metal Transfer Assisted Nanolithography On Flexible Substrate
Kang, Shuhui	(Invited) Advances In Neutron Research Methods For Photoresists Fundamentals
Kanje, M.	(Invited) Neurite Outgrowth on Nanomodified Surfaces
Karade, Yogesh	Guided Phase Separation Of Polymer Blends For Patterns Varying From Micron To Nanometer Length Scales
Kawata, Hiroaki	Experimental And Theoretical Study On The Demolding Mechanics Experimental And Theoretical Study On The Demolding Mechanics In Imprint Process
Kayama, Masayo	Experimental And Theoretical Study On The Demolding Mechanics Experimental And Theoretical Study On The Demolding Mechanics In Imprint Process
Keathley, Phillip	Optical Properties Of Sputtered Fluorinated Ethylene Propylene
Kehagias, Nikolaos	Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities
Keil, Katja	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment
Kemp, Charles	Actinic Euv Mask Inspection Beyond 0.25 NA
Kercher, Dan	Integration Of Electron Beam Lithography With Block Copolymer Self-Assembly For 10nm Scale Nanofabrication
Kercher, Dan	65mm Disk Patterning At 500 Gb/In2 With Full Surface Area Coverage From Diblock Copolymer Templates
Kern, Dieter Paul	(Invited) Catalyst Patterning For Carbon Nanotube Growth On Elevating Posts By Self-Aligned Double-Layer Electron Beam Lithography
Kershner, Ryan	Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces
Kewell, Adrian	Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography
Khan, Maroof H.	Reducing Mode-Transition Loss In Silicon-On-Insulator Strip Waveguide Bends
Khilo, Anatoly	Fabrication Strategies For Filter Banks Based On Microring Resonators
Khusnatdinov, Niyaz	Patterned Media Using Step And Flash Imprint Lithography
Kim, Philip	Toward Carbon Based Electronics: Graphene, a New Opportunity
Kim, Byung Gook	Resist Charging Effect In Photomask: Its Impact On Pattern Placement Error And Critical Dimension
Kim, Byung-Sung	(Invited) Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained From High Resolution Transmission Electron Microscopy
Kim, Dongwan	Effects Of Mask Absorber Structures On The EUV Lithography
Kim, Evgenia	Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies
Kim, Ho-Cheol	Polymer Self-Assembly For Nanopatterning
Kim, Hochul	Study Of Machine To Machine Overlay Error For Sub-60-Nm Memory Devices
Kim, Hoon	Effects Of Mask Absorber Structures On The EUV Lithography
Kim, Hoyeon	Full Field Imprint Masks Using Variable Shape Beam Pattern Generators
Kim, Hyun Chul	Superfocusing Of Light Using A Metallic/Dielectric Nano-Optic Lens Focusing Of Plasmonic Micro Zone Plate-Based Metallic Structures Covered By A Dielectric Layer
Kim, Hyun-Mi	Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application (Invited) Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained From High Resolution Transmission Electron Microscopy The Modification Of Aperture System For Atomic Image Projection Electron-Beam Lithography (AIPEL) Two-Step Development Method Of Hydrogen Silsesquioxane Resist For High-Density Electron Beam Nanopatterning
Kim, Insung	Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections
Kim, Ki-Bum	Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application (Invited) Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained From High Resolution Transmission Electron Microscopy The Modification Of Aperture System For Atomic Image Projection Electron-Beam Lithography (AIPEL) Two-Step Development Method Of Hydrogen Silsesquioxane Resist For High-Density Electron Beam Nanopatterning
Kim, S. -J.	Fabrication Of 3-D Micro- And Nano- Structures By Focused-Ion-Beam (FIB) Machining Systems
Kim, Sang-Gook	Carbon Nanotube-Based Magnetic Actuation Of Origami Membranes
Kim, Seong-Sue	Effects Of Mask Absorber Structures On The EUV Lithography Coherent Euv Scattering Microscopy
Kim, Sungwon	Self-Aligned Asymmetric Recess Technique With E-Beam Lithography
Kinion, Doug	Nanoscale To Millimeter Scale Milling With A Focused Ion Beam Instrument
Kinoshita, Hiroo	Coherent Euv Scattering Microscopy
Kishimoto, Junki	Coherent Euv Scattering Microscopy
Klein, Christof	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
Klein, Edwin J.	Reducing Optical Losses In Focused-Ion-Beam Etched Silicon
Kley, Ernst-Bernhard	Fabrication Of Large-Area Negative-Index Metamaterial By Electron-Beam-Lithography
Knowles, Ralph	Nanofabrication By Ultra-High Resolution Environmental Scanning Electron Microscopy
Ko, Fu-Hsiang	3D Mask Topographic Effects In EUV Lithography Protein-Induced Electrical Variation On Gold-Silicide Embedded Nanowires Hybridization Sensing By Electrical Enhancement With Nanoparticles In Nano-Gap
Ko, Hyungduk	Superfocusing Of Light Using A Metallic/Dielectric Nano-Optic Lens Focusing Of Plasmonic Micro Zone Plate-Based Metallic Structures Covered By A Dielectric Layer
Kobayashi, Kazuhiko	Potential Of Rotary Stage Electron Beam Mastering System For Fabricating Patterned Magnetic Media
Kodama, Tatsuhiko	Development Of The Compact Low-Energy Soft X-Ray CT Equipment For The Soft Material Structural Analysis
Koh, Yumin	Self-Aligned Asymmetric Recess Technique With E-Beam Lithography
Koida, Keigo	Protection And Reduction Of Surface Oxidation Of Mo/Si Multilayers For EUVL Projection Optics By Control Of Hydrocarbon Gas Atmosphere
Koishikawa, Atsushi	Development Of The Compact Low-Energy Soft X-Ray CT Equipment For The Soft Material Structural Analysis
Kojima, Akira	Sub-50nm Resolution Surface Electron Emission Lithography Using Nano-Si Ballistic Electron Emitter
Kometani, Reo	Resisitivity Change Of The Diamond-Like Carbon
Kondr, Viktor	50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Kondratovich, Marianna	Optical Excitation Of In-Plane Modes Of Nanoelectromechanical Oscillators For Selective Detachment Of Microspheres
Koshida, Nobuyoshi	Sub-50nm Resolution Surface Electron Emission Lithography Using Nano-Si Ballistic Electron Emitter
Kozakai, Tomokazu	Application Of Vector Scanning In FIB Photomask Repair System Image Quality Improvement In Fib Photomask Repair System
Kozawa, Takahiro	(Invited) Latent Image Formation In Chemically Amplified Extreme Ultraviolet Resists With Low Activation Energy For Deprotection Reaction Multispur In Chemically Amplified Electron Beam Resists Dissolution Characteristics Of Chemically Amplified EUV Resist
Krauser, Johann	Self-Aligned Graphitic Nanowires In Diamond-Like Carbon
Kretz, Johannes	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment
Kritsun, Oleg	Improving Lithography Pattern Fidelity And Line-Edge Roughness By Reducing Laser Speckle
Krug, David	Polyhedral Oligomeric Silsesquioxane (POSS) Functional Patterns Directly Fabricated By Nanoimprint Lithography
Krüger, Jan	Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography
Kruit, P.	(Invited) 1 nm Patterning
Kruit, Pieter	Brightness Measurements Of A Gallium Liquid Metal Ion Source Sputtering Limits Versus Signal To Noise Limits In The Observation Of Sn Balls In A Ga Ions Microscope Transformation Of Polycrystalline Tungsten To Monocrystalline Tungsten W(100) And Its Potential Application In Schottky Emitters Experiments Towards A High Brightness 100-Electron-Beam Source Effect Of The Electric Field On The Decay Of A Schottky Electron Emitter Tip End: A Step Flow Model
Kruppa, Walter	(Invited) Electron-Transparent Cantilevers For TEM Visualization Of Nanodevices
Krylov, Slava	Optical Excitation Of In-Plane Modes Of Nanoelectromechanical Oscillators For Selective Detachment Of Microspheres
Kuba, Yukio	Potential Of Rotary Stage Electron Beam Mastering System For Fabricating Patterned Magnetic Media
Kuemmeth, F.	(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes
Kumise, Takaaki	Novel Negative-Tone Molecular Resist For EUV Lithography
Kuo, David	Patterned Media Using Step And Flash Imprint Lithography Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media
Kuo, Hong-Shi	Gas Field Ion Source From An Ir/W<111> Single-Atom Tip
Kuo, S. S.	Using Reversal Imprint Lithography To Pattern Textured Metal Fims For Surface Plasmonic Device Applications
Kurashima, Yuichi	Low Energy Ion Beam Machining Of Si Layer Deposited On An ULE Substrate For EUVL Optics - Evaluation Of Surface Roughness
Kurdi, Bulent N.	(Invited) Storage Class Memory
Kutchoukov, Vladimir	Experiments Towards A High Brightness 100-Electron-Beam Source
Kwok, Wai	(Invited) Advanced Imaging Via Pixelated Phase Masks And Inverse Lithography
Kye, Jongwook	Line Edge Roughness Impacts On Overlay
L
La Fontaine, Bruno	Improving Lithography Pattern Fidelity And Line-Edge Roughness By Reducing Laser Speckle Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool
LaBrake, Dwayne	Patterned Media Using Step And Flash Imprint Lithography
Lafferty, Neal	Aluminum Oxides As Metamaterials For Enhancement Of 193nm Lithography Photomask Image Enhancement Using Grating Generated Surface Waves
Lai, Fu-Der	FDTD Study Of Near Field Phase-Shifting Lithography For High-Precision Fabrication Of Nano-Image Profiles
Laine, Richard	Polyhedral Oligomeric Silsesquioxane (POSS) Functional Patterns Directly Fabricated By Nanoimprint Lithography
Laitinen, Mikko	Interdigitated Electrode Structures For Osteoblast Growth Studies
Lalovic, Ivan	Improving Lithography Pattern Fidelity And Line-Edge Roughness By Reducing Laser Speckle
Lam, Michael	Pattern Specific Optical Models
Lambertini, Vito	NIL Processes And Material Characterization On Transparent Substrates For Optical Applications, Nicolas Chaix
Landis, Stefan	NIL Processes And Material Characterization On Transparent Substrates For Optical Applications, Nicolas Chaix
Lassiter, Matthew	Nanoscale Electron Beam Induced Etching (EBIE)
Lavery, Kristopher	(Invited) Advances In Neutron Research Methods For Photoresists Fundamentals
Lawson, Richard	Single Component Molecular Resists With Covalently Bound Photoacids Next Generation Chemically Amplified Molecular Resists For E-Beam Lithography Based On Epoxide Cross-Linking Understanding The Effects Of Photoacid Distribution Homogeneity And Diffusivity On Lithography Performance In Polymer-Bound PAG Photoresists
Lecarme, Olivier	Capillary Forces Assembly In Microfluidic Cell: Faster Assembly By Accelerating The Particles Convective Flux And Integration Into Complex Pattern
Lee, Cheng-Tsung	Single Component Molecular Resists With Covalently Bound Photoacids Next Generation Chemically Amplified Molecular Resists For E-Beam Lithography Based On Epoxide Cross-Linking Understanding The Effects Of Photoacid Distribution Homogeneity And Diffusivity On Lithography Performance In Polymer-Bound PAG Photoresists
Lee, Dong Gun	Effects Of Mask Absorber Structures On The EUV Lithography Coherent Euv Scattering Microscopy
Lee, Hyo-Sung	Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application (Invited) Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained From High Resolution Transmission Electron Microscopy The Modification Of Aperture System For Atomic Image Projection Electron-Beam Lithography (AIPEL) Two-Step Development Method Of Hydrogen Silsesquioxane Resist For High-Density Electron Beam Nanopatterning
Lee, Hyung Woo	Carbon Nanotube-Based Magnetic Actuation Of Origami Membranes
Lee, J.M.	High Density Nanostructure Fabrication by Electron Beam Lithography, Zs. Szabo
Lee, Jae Jong	Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application
Lee, Jun-Wei	ZnO Nanowires Grown On Cone-Shaped Zinc Nanostructures By Thermal Oxidation
Lee, Junghyeon	Study Of Machine To Machine Overlay Error For Sub-60-Nm Memory Devices
Lee, Kim	Patterned Media Using Step And Flash Imprint Lithography Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media
Lee, Sihyeung	Study Of Machine To Machine Overlay Error For Sub-60-Nm Memory Devices
Lee, Soo-Young	Estimation Of Remaining Resist Profile Without Exposure And Development Simulations In E-Beam Lithography
Lee, Thomas H.	High-Speed Optical Beam-Steering Based On Phase-Arrayed Waveguides
Lee, W. H.	Using Colloidal Lithography To Fabricate Semitransparent Metal Anodes In Organic Solar Cells Using Reversal Imprint Lithography To Pattern Textured Metal Fims For Surface Plasmonic Device Applications
Letzkus, F.	Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates
Leu, Ing-Chi	Polyimide Hierarchical Structures Via Imprinting And Dewetting
Leu, Joshua	Templated Self-Assembly Of Sub-10nm Quantum Dots
Levinson, Harry	Improving Lithography Pattern Fidelity And Line-Edge Roughness By Reducing Laser Speckle Line Edge Roughness Impacts On Overlay
Lezec, Henri	(Invited) Nanophotonics Lab-On-A-Chip Sculpted By Focused-Ion-Beam Milling: Direct Characterization Of Negative-Index Metamaterials Operating In The Visible
Li, Huifeng	Improving Organic Thin-Film Transistor Performance By Nanoimprint-Induced Chain Ordering Microfluidic MDM Structure As A Tunable Optical Filter Optical Antennas: A Boost For Infrared Detection
Li, Jianliang	Resist Bias Measured From Iso-Focal Structure
Li, K-L	Protein-Induced Electrical Variation On Gold-Silicide Embedded Nanowires
Li, W.	Direct Write Electron Beam Patterning Of DNA:Complex Thin Films
Li, Wen-Di	Fabrication Of Wafer-Scale Nano-Split-Ring Metamaterials By Nanoimprint Without Direct-Write In Mold Making (Invited) Quantized-Patterning Using Nanoimprinted-Blanks Fabrication And Measurement Of Solar-Blind Aluminum Nano-Grid UV Filters By Nanoimprint Lithography And Edge Patterning
Li, Xiuling	Efficient Nanoscale Pattern Transfer Process For Porous Silicon
Li, Xuema	Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies Fabrication Of Amorphous Metallic Nanowires For IC Interconnects By Nanoimprint Lithography
Liang, Ted	The Effects Of Wet And Dry Cleaning Methods On The Chemical Composition And Morphology Of The Ru Capping Layer Of The Extreme Ultraviolet (EUV) Mask Blanks
Liang, Xiaogan	Graphene Transistors Fabricated Via Transfer-Printing In Device Active-Areas On Large Wafer (Invited) Quantized-Patterning Using Nanoimprinted-Blanks Buried Silicon Dioxide Nanochannels Fabricated By Nanoimprint, Etching And Self-Sealing, Self-Limited Thermal Oxidation A Novel Method For Fabricating Sub-16 Nm Footprint T-Gate Nanoimprint Molds
Liau, Chung-Chi	ZnO Nanowires Grown On Cone-Shaped Zinc Nanostructures By Thermal Oxidation
Lim, Ki-Phil	Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application
Lin-Gibson, Sheng	Continuous Patterns With Height Gradients By Nanoimprint Lithography And Thermal Gradient Annealing
Lin, C. H.	Using Colloidal Lithography To Fabricate Semitransparent Metal Anodes In Organic Solar Cells
Lin, Chun-Hung	3D Mask Topographic Effects In EUV Lithography
Lin, Chun-Yueh	Gas Field Ion Source From An Ir/W<111> Single-Atom Tip
Lin, Eric	(Invited) Advances In Neutron Research Methods For Photoresists Fundamentals
Lin, Nancy	Continuous Patterns With Height Gradients By Nanoimprint Lithography And Thermal Gradient Annealing
Lin, Y. H.	Using Colloidal Lithography To Fabricate Semitransparent Metal Anodes In Organic Solar Cells
Liu, Chi-Chun	In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS
Liu, Guoliang	In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS
Liu, Haoning	Aberration Correction For Electron Beam Inspection, Metrology And Lithography
Liu, Ran	Electron Beam Lithography For Distributed Bragg Reflectors In SU-8
Liu, Sheng	Self-Assembly Of Individual Vertically Aligned Carbon Nanotubes
Liu, Wenchao	Relief And Trench Formation On Chalcogenide Thin-Films Using Electron Beams
Liu, Xuefeng	Evaluation Of Electron Energy Spread In Csbr Based Photocathodes
Liu, Zhi	Evaluation Of Electron Energy Spread In Csbr Based Photocathodes
Livengood, Richard H.	E-Beam Nano-Machining For Circuit Edit: An Invasiveness Study
Lo, Cheuk Chi	Spin-Dependent Scattering Off Neutral Donors In Silicon Field-Effect Transistors
Lobo, Charlene	Nanofabrication By Ultra-High Resolution Environmental Scanning Electron Microscopy Direct Writing Of High Resolution, Radially-Symmetric Nanostructures By Simultaneous Electron Beam Induced Deposition And Etching
Loeschner, Hans	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status (Invited) Projection Mask-Less Patterning (PMLP) For Nanotechnology Applications Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates
Loeser, John G.	Large-Area Microlens Arrays Fabricated By Integrated Gas-Assisted UV-Curing Embossing With UV-LED Array Lamp Diffusers With Both Surface-Relief And Particle-Diffusing Functions Fabricated Using Hybrid Extrusion Roller Embossing
Logeeswaran, VJ	λ/12 Sub-wavelength Optical Lithography With A Smooth Superlens
Lok, Sjoerd	Extreme Ultraviolet Lithography: Status And Prospects
Loopstra, Erik	Extreme Ultraviolet Lithography: Status And Prospects
Lopez, Gabriel	Fabrication Of Porous Nanochannels Using Nanoparticles And Application To The Transport Of DNA Molecules
Lorusso, Gian	Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections
Lozano, Paulo	The Use Of Ionic Liquid Ion Sources (ILIS) In FIB Applications
Lu, Ming	Fabrication Of Metallic Nano-Slit Waveguides With Sharp Bends
Lu, Yi-Hsien	Gas Field Ion Source From An Ir/W<111> Single-Atom Tip
Lui, Nicki	Mask-Less Wet Etching Using Laser Induced Local Heating
Lunsford, Patrick	(Invited) Stability Of Self-Assembled Monolayer Surfactant Coating In Thermal Nanoimprint
Luo, Gang	Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography
Lyon, Steve	Spin-Dependent Scattering Off Neutral Donors In Silicon Field-Effect Transistors
Lysaght, Michael	Nanofabrication By Ultra-High Resolution Environmental Scanning Electron Microscopy Direct Writing Of High Resolution, Radially-Symmetric Nanostructures By Simultaneous Electron Beam Induced Deposition And Etching
M
Ma, Yuansheng	Line Edge Roughness Impacts On Overlay
Machida, Yasuhide	Process Variation-Aware 3-Dimensional Proximity Effect Correction For Electron Beam Direct Writing At 45 Nm Node And Beyond
Macintyre, Douglas	Optical Characterisation Of An HSQ Lithography Process
Mack, Chris	Stochastic Approach To Modeling Line Edge Roughness In Photolithography
Madey, Theodore E.	Carbon Film Growth And Mitigation On Model Electron-Irradiated EUVL Mirror Capping Layers: TiO₂ And Ru
Maeda, Ryutaro	Experimental And Numerical Analysis On Recovery Of Polymer Deformation After Demolding In Hot-Embossing Process
Mahmood, Fahad	Mask-Less Wet Etching Using Laser Induced Local Heating
Makarewicz, Joseph	Fabrication Of Carbon Nanotube Field Emission Guns For Potential Maskless Lithography
Maldonado, Juan R.	Evaluation Of Electron Energy Spread In Csbr Based Photocathodes
Mallast, Siomone	Quality Assessment Of Anti-Sticking Layers For T-NIL
Manakli, Serdar	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
Manandhar, Pradeep	Design And Fabrication Of Vertical Nanowire Device Arrays
Maniura, Katharina	Fabrication Of Elastometer Pillar Arrays With Modulated Stiffness For Cellular Force Measurements
Mansfield, Scott	(Invited) The Role Of Computational Modeling In Semiconductor Lithography:Progressing Towards The Virtual Fab
Marconi, Mario	50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser Ultra Compact Interferometric Lithography System Realized With A Desk-Top Extreme Ultraviolet Laser
Martin, Mickael	Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness
Martin, Noel	Nanoscale To Millimeter Scale Milling With A Focused Ion Beam Instrument
Martinez, Jose	Novel SU8 Optical Waveguide Microgripper For Simultaneous Micromanipulation And Optical Detection
Martz, Dale	50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Masbou, Marc	Mask-Less Wet Etching Using Laser Induced Local Heating
Mastropaolo, Enrico	Electrothermal Actuation Studies On Silicon Carbide Resonators
Materials	Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application
Matsuda, Osamu	Application Of Vector Scanning In FIB Photomask Repair System Image Quality Improvement In Fib Photomask Repair System
Matsui, Shinji	Resisitivity Change Of The Diamond-Like Carbon Fabrication Of High Aspect Si Pillers By Deep Reactive Ion Etching Using Nanoimprinted HSQ Masks
Maximov, Ivan	Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography
Mayergoyz, Isaak	(Invited) Eigen Mode Analysis Of Plasmon Resonances In Nanoparticles
McClelland, Jabez	A Novel, High Brightness Ion Source Based On Laser Cooled Atoms
McCord, Mark	(Invited) Electron Beam Inspection Of In-Process Semiconductor Wafers: How, Why, And What’s Next?
McEuen, Paul	(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes
Mecerreyes, David	Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities
Melvin, Lawrence S. III	Abbe-SVD: Compact Abbe’s Kernel Generation For Microlithography Aerial Image Simulation Using Singular- Value Decomposition Method
Melvin, Lawrence	Resist Bias Measured From Iso-Focal Structure An Exploration Of Etch Step Interactions In The Dual Patterning Process For Process Modeling
Menguelti, Kevin	Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness
Menon, Rajesh	A Prototype Commercial System For Massively-Parallel Maskless Zone-Plate-Array Lithography (ZPAL)
Menoni, Carmen	50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser Ultra Compact Interferometric Lithography System Realized With A Desk-Top Extreme Ultraviolet Laser
Merino, S.	Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography
Micheel, Christine	Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces
Michler, Johann	Optimization Of Nozzle-Based Gas Injection Systems For Focused Electron- And Ion- Beam Induced Processing Stiffness, Density And Quality Of High Aspect Ratio Cu/C Nanostructures Produced By Focused Electron-Beam Induced Deposition
Miller, David A. B.	High-Speed Optical Beam-Steering Based On Phase-Arrayed Waveguides
Miller, Mike	Patterned Media Using Step And Flash Imprint Lithography
Miyamoto, Iwao	Low Energy Ion Beam Machining Of Si Layer Deposited On An ULE Substrate For EUVL Optics - Evaluation Of Surface Roughness
Miyano, Y.	Contrast Reversal Effect In SEM Due To Charging
Miyazaki, Takeshi	Potential Of Rotary Stage Electron Beam Mastering System For Fabricating Patterned Magnetic Media
Miyoshi, Motosuke	Development Of The Compact Low-Energy Soft X-Ray CT Equipment For The Soft Material Structural Analysis
Mocella, Vito	Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale
Mochiji, Kozo	Property Of In-Vacuum Direct Photo-Etching Of PTFE Brought By High Energy Synchrotron Radiation Irradiation
Mohamed, Khairudin	UV Curable Nanoimprint Lithography For Replicating Three Dimensional Structures
Mohammad, M.A.	High Density Nanostructure Fabrication by Electron Beam Lithography, Zs. Szabo
Möllenbeck, Saskia	Contact Angles In A Thermal Imprint Process Quality Assessment Of Anti-Sticking Layers For T-NIL
Montelius, Lars	Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography
Moon, Euclid E.	Nanometer-Level Alignment And Global Positioning To A Substrate-Embedded Coordinate System
Morecroft, D.	Sub-15 Nm Half-Pitch Nanoimprint Molds Using High Resolution Negative Tone Resist And Reactive Ion Etching
Morgan, Ray	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
Morris, Christopher J.	(Invited) Micro-Scale Self-Assembly Via Capillary Forces
Morton, Keith	Buried Silicon Dioxide Nanochannels Fabricated By Nanoimprint, Etching And Self-Sealing, Self-Limited Thermal Oxidation
Mountfield, Keith	Electron Beam Lithography For Fabricating Heat Assisted Magnetic Recording Heads
Mouri, Yuriko	Low Energy Ion Beam Machining Of Si Layer Deposited On An ULE Substrate For EUVL Optics - Evaluation Of Surface Roughness
Mukherjee, Pran	Plasma-Etch Fabrication Of High Aspect Ratio Freestanding Silicon Nanogratings As Deep UV Filters
Mulders, Hans	Focused Electron-Beam-Induced Deposition Of Platinum At Very Low Landing Energies Investigation Of Morphological Changes In Platinum Nano-Structures Created By Focused Electron-Beam-Induced Deposition
Munro, Eric	Aberration Correction For Electron Beam Inspection, Metrology And Lithography
Murali, Raghunath	Mitigation Of Microloading Effect In Nanoimprint Mask Fabrication
Muramatsu, Masashi	Application Of Vector Scanning In FIB Photomask Repair System Image Quality Improvement In Fib Photomask Repair System
Murano-Perez, Fransesc	Dynamic Stencil Lithography On Full Wafer Scale
Myers, Alan	Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections
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Naburgh, E.P.	Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates
Nair, Pradeep	(Invited) Deconstructing Receptor Signaling With Nanopatterned Supported Membranes
Nakamae, Koji	Application Of Vector Scanning In FIB Photomask Repair System Image Quality Improvement In Fib Photomask Repair System
Nakamatsu, Ken-ichiro	Fabrication Of High Aspect Si Pillers By Deep Reactive Ion Etching Using Nanoimprinted HSQ Masks
Nam, Dong Seok	Resist Charging Effect In Photomask: Its Impact On Pattern Placement Error And Critical Dimension
Nam, Sung-Wook	Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application (Invited) Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained From High Resolution Transmission Electron Microscopy The Modification Of Aperture System For Atomic Image Projection Electron-Beam Lithography (AIPEL) Two-Step Development Method Of Hydrogen Silsesquioxane Resist For High-Density Electron Beam Nanopatterning
Naulleau, Patrick	Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool Impact Of Base And PAG Loading On Intrinsic Resolution In EUV Resists
Nealey, Paul F.	Directed Assembly Of Asymmetric Ternary Block Copolymer-Homopolymer Blends Thin Films Into Checkerboard Trimming Chemical Pattern Impact Of Trench Width Roughness On The Directed Self-Assembly Of Block Copolymers On Topographic Substrates
Nealey, Paul	In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS 40 Nm Pitch Extreme Ultraviolet Interferometric Lithography
Nelson, Erik	Inorganic Photoresist Materials For Direct Fabrication Of 3D Photonic Crystals Using Phase Mask Lithography
Nemoto, Yoshimi	Fabrication Of Anti-Reflection Structures And Carbon Nanofibers Using Only Ion Beam Irradiation To Glassy Carbon
Neureuther, Andrew	Quantitatively Engineering Surface Plasmon Coupling Through Computer Simulation
Nguyen, Cattien	Fabrication Of Carbon Nanotube Field Emission Guns For Potential Maskless Lithography
Nguyen, Kim	Fabrication Of Nanoscale Bioarrays For The Study Of Cytoskeletal Protein Binding Interactions Using Nano-Imprint Lithography
Niakoula, Dimitra	Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool Impact Of Base And PAG Loading On Intrinsic Resolution In EUV Resists Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists
Nichol, Anthony	Carbon Nanotube-Based Magnetic Actuation Of Origami Membranes
Niemann, Darrell	Fabrication Of Carbon Nanotube Field Emission Guns For Potential Maskless Lithography
Niibe, Masahito	Protection And Reduction Of Surface Oxidation Of Mo/Si Multilayers For EUVL Projection Optics By Control Of Hydrocarbon Gas Atmosphere
Niihara, Koichi	Resisitivity Change Of The Diamond-Like Carbon
Nishiyama, Iwao	Hydrogen Radical Cleaning Of Carbon Contamination On EUV Mask
Nishiyama, Yasushi	Hydrogen Radical Cleaning Of Carbon Contamination On EUV Mask
Nix, Anne-Katrin	Self-Aligned Graphitic Nanowires In Diamond-Like Carbon
Notte, John	(Invited) Elemental Analysis With The Helium Ion Microscope
Nounu, Hatem	An Atom Beam Lithography Tool For Fabricating Dense Nanostructure Arrays
Nozik, Arthur J.	Third Generation Solar Photon Conversion Based on Multiple Exciton Generation in Semiconductor Quantum Dots
Numata, Atsushi	Low Energy Ion Beam Machining Of Si Layer Deposited On An ULE Substrate For EUVL Optics - Evaluation Of Surface Roughness
Nygard, Kim	In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS
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O'Reilly, Thomas B.	Linewidth Uniformity In Lloyd’s Mirror Interference Lithography Systems
Ocola, Leonidas E.	Espacer Protective Surface Coat For Cutting-Edge Ion-Beam Lithography
Ocola, Leonidas	An Atom Beam Lithography Tool For Fabricating Dense Nanostructure Arrays Fabrication Of Metallic Nano-Slit Waveguides With Sharp Bends Nanofabrication Of Super High-Aspect Ratio Structures In HSQ From Direct-Write E-Beam Lithography And Hot Development
Ogino, Kozo	Process Variation-Aware 3-Dimensional Proximity Effect Correction For Electron Beam Direct Writing At 45 Nm Node And Beyond
Ohlberg, Doug	Fabrication Of Amorphous Metallic Nanowires For IC Interconnects By Nanoimprint Lithography
Ohyi, Hideyuki	Potential Of Rotary Stage Electron Beam Mastering System For Fabricating Patterned Magnetic Media Sub-50nm Resolution Surface Electron Emission Lithography Using Nano-Si Ballistic Electron Emitter
Oizumi, Hiroaki	Hydrogen Radical Cleaning Of Carbon Contamination On EUV Mask
Oizumi, Hiroaki	Novel Negative-Tone Molecular Resist For EUV Lithography
Okamoto, Kazumasa	Multispur In Chemically Amplified Electron Beam Resists
Olynick, Deirdre	An Alternative Electron Beam Exposure Mechanism For Hydrogen Silsesquioxane – A Raman And FTIR Study Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale
Onishi, Yuki	Experimental And Numerical Analysis On Recovery Of Polymer Deformation After Demolding In Hot-Embossing Process
Orloff, Jon	A Novel, High Brightness Ion Source Based On Laser Cooled Atoms
Orlov, Alexei	Controlled Chemical Mechanical Polishing Of Polysilicon And Silicon-Dioxide For Si Based Single-Electron Device With Oxide Tunnel Barriers
Orozco, Jahir	Impedimetric Biosensing With Interdigitated Arrays Of Nano Electrodes Fabricated By Nanoimprint Lithography
Oster, Jens	(Invited) Applications Of Focused Electron Beam Processing
Ozkan, Mihri	(Invited) Nanopatterning And Assembly Of Electronics
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Pai, I-Ting	Polyimide Hierarchical Structures Via Imprinting And Dewetting
Pain, Laurent	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
Panepucci, Roberto	Novel SU8 Optical Waveguide Microgripper For Simultaneous Micromanipulation And Optical Detection
Pang, S. W.	Fabrication Of Organic Light Emitting Diode Arrays By Reversal Imprint Lithography Control of DNA Motion in Microchannels Integrated with Dual Electrodes
Panniello, A.	Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities
Pargon, Erwine	Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness
Parikh, Dhara	A Multi-Electrode Cuff For Neuronal Sensing In The Locust
Park, Doewon	(Invited) Electron-Transparent Cantilevers For TEM Visualization Of Nanodevices
Park, Hyunsoo	Improving Organic Thin-Film Transistor Performance By Nanoimprint-Induced Chain Ordering Microfluidic MDM Structure As A Tunable Optical Filter Solvent-Etching And Dewetting Techniques For Residual Layer Removal In Thermal Nanoimprint
Park, Jeong	The Effects Of Wet And Dry Cleaning Methods On The Chemical Composition And Morphology Of The Ru Capping Layer Of The Extreme Ultraviolet (EUV) Mask Blanks
Park, Su Yeon	Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application
Parkin, Stuart	(Invited) Race Track Memory!
Partlo, Bill	Improving Lithography Pattern Fidelity And Line-Edge Roughness By Reducing Laser Speckle
Patsis, George	Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists
Pauliac-Vaujour, Sebastien	Improvement Of High Resolution Lithography Capabilities By Using Amorphous Carbon Hard Masks Hybrid High Resolution Lithography (E-Beam/DUV) And Etch Process For Achieving Stacked Nanowire MOSFETs
Pease, Fabian	Preferential Orientation Effects In Partial Melt Laser Crystallization Of Silicon The Prospects Of Free Electron Analog To Digital Technology Mask-Less Wet Etching Using Laser Induced Local Heating Evaluation Of Electron Energy Spread In Csbr Based Photocathodes
Pease, R. F. W.	Low Temperature Limits For Nano-Graphoepitaxy Of Semiconductors
Pease, R. Fabian W.	High-Speed Optical Beam-Steering Based On Phase-Arrayed Waveguides Impedance Modulation In Coaxial Nanoneedle Biosensor Multicriteria Optimization In Sensor Design And Fabrication For DNA Thermosequencing Platform
Pease, R. Fabian	X-Ray Diffraction Microscopy: Reconstruction With Partial Magnitude And Spatial A Priori Information
Peijster, Jerry	(Invited) MAPPER: High Throughput Maskless Lithography
Peng, Can	Fabrication Of Wafer-Scale Nano-Split-Ring Metamaterials By Nanoimprint Without Direct-Write In Mold Making A Novel Method For Fabricating Sub-16 Nm Footprint T-Gate Nanoimprint Molds
Pérez-Murano, Francesc	Impedimetric Biosensing With Interdigitated Arrays Of Nano Electrodes Fabricated By Nanoimprint Lithography
Perret, Corine	NIL Processes And Material Characterization On Transparent Substrates For Optical Applications, Nicolas Chaix
Pertsch, Thomas	Fabrication Of Large-Area Negative-Index Metamaterial By Electron-Beam-Lithography
Petford-Long, Amanda	Espacer Protective Surface Coat For Cutting-Edge Ion-Beam Lithography
Petric, Paul	(Invited) Reflective Electron Beam Lithography (REBL), A Novel Approach To High Speed Maskless Ebeam Direct Write Lithography
Petrou, Panagiota	(Invited) High-Aspect-Ratio Plasma-Induced Nanotexturing Of Polymers (PDMS PMMA, PEEK, ...) For Protein Adsorption Applications
Peyrade, David	Capillary Forces Assembly In Microfluidic Cell: Faster Assembly By Accelerating The Particles Convective Flux And Integration Into Complex Pattern
Pianetta, Piero	X-Ray Diffraction Microscopy: Reconstruction With Partial Magnitude And Spatial A Priori Information Evaluation Of Electron Energy Spread In Csbr Based Photocathodes
Pickard, Dan	Preferential Orientation Effects In Partial Melt Laser Crystallization Of Silicon
Picraux, S. T.	Design And Fabrication Of Vertical Nanowire Device Arrays
Pina-Hernandez, Carlos	Structure-Property Relationship Of Photocurable Silsesquioxane Resists For Nanoimprint Lithography
Pinedo, Tatiana	Capillary Forces Assembly In Microfluidic Cell: Faster Assembly By Accelerating The Particles Convective Flux And Integration Into Complex Pattern
Placido, T.	Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities
Platzgummer, Elmar	(Invited) Projection Mask-Less Patterning (PMLP) For Nanotechnology Applications Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates
Platzgummer, Elmat	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
Ponizovskaya, Ekaterina	Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies Tunable Optical Gain For Negative Index Materials By Integration Of Near-Infrared Emitting Nanocrystals
Ponomareko, Alexander	50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Popova, Vera	Polyhedral Oligomeric Silsesquioxane (POSS) Functional Patterns Directly Fabricated By Nanoimprint Lithography
Popovic, Milos	(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices
Porod, Wolfgang	Thermal Infrared Detection Using Antenna-Coupled Metal-Oxide-Metal Diode Detectors
Prabhu, Vivek	(Invited) Advances In Neutron Research Methods For Photoresists Fundamentals
Provine, J	Mask-Less Wet Etching Using Laser Induced Local Heating
Pshenay-Severin, Ekaterina	Fabrication Of Large-Area Negative-Index Metamaterial By Electron-Beam-Lithography
Putkonen, Matti	Interdigitated Electrode Structures For Osteoblast Growth Studies
Putna, Steve	Improvement In Line Width Roughness (LWR) By Post-Processing
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Qi, Minghao	Generating Manhattan Patterns Via Cutting And Stitching Of Gratings
Qi, Minghao	Reducing Mode-Transition Loss In Silicon-On-Insulator Strip Waveguide Bends
Qu, XinPing	Electron Beam Lithography For Distributed Bragg Reflectors In SU-8
Quimonda	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
R
Rachmady, Willy	Improvement In Line Width Roughness (LWR) By Post-Processing
Rack, Philip	(Invited) Maskless Nanolithography Approaches Utilizing Electron-Beam-Induced Deposition Mass–Transport And Reaction-Rate Limited Growth Modes During Electron–Beam Induced Deposition Nanoscale Electron Beam Induced Etching (EBIE)
Rad, Leili Baghaei	X-Ray Diffraction Microscopy: Reconstruction With Partial Magnitude And Spatial A Priori Information
Raghunathan, S	Tools For Resist Heating Analysis And Compensation For Electron Beam Tools
Rahkila, Paavo	Interdigitated Electrode Structures For Osteoblast Growth Studies
Rahman, Mahmud	Fabrication Of Carbon Nanotube Field Emission Guns For Potential Maskless Lithography
Rajashekar, Ananda Sagari Arcot	Interdigitated Electrode Structures For Osteoblast Growth Studies
Rakich, Peter	(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices
Ralph, D.C.	(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes
Ram, Rajeev	(Invited) The Challenge Of CMOS Photonics And Electronics For Enhanced Microprocessor Performance Fabrication Strategies For Filter Banks Based On Microring Resonators
Ramos, Raphael	Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness
Rangelow, Ivo	(Invited) Scanning Proximal Probes For Parallel Imaging And Lithography
Raptis, Ioannis	Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists
Ratnagiri, VenkatSubramanian Kavasseri	The Effects Of Molecular Weight On Resist Evaluation Parameters In Poly(Methylmethacrylate) Developed At Sub-Zero Temperatures
Rauscher, Michael	(Invited) Transmission Electron Microscopy Sample Preparation Employing A "Triple" Beam Instrument
Raveh, Amir	E-Beam Nano-Machining For Circuit Edit: An Invasiveness Study
Reano, Ronald	Relief And Trench Formation On Chalcogenide Thin-Films Using Electron Beams
Reboud, Vincent	Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities
Redmond, Garreth	Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities
Regonda, Suresh	Stability Of HSQ Nano-Lines Defined By E-Beam Lithography
Rekawa, Senajith	Actinic Euv Mask Inspection Beyond 0.25 NA
Rendina, Ivo	Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale
Resnick, Douglas	Full Field Imprint Masks Using Variable Shape Beam Pattern Generators Patterned Media Using Step And Flash Imprint Lithography
Retolaza, A.	Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography
Retterer, Scott	Development Of Nanoporous Picoliter Reaction Vessels For The Characterization Of Biochemical Systems (Invited) Maskless Nanolithography Approaches Utilizing Electron-Beam-Induced Deposition
Rettner, Charles T.	(Invited) Storage Class Memory
Rettner, Charles	Polymer Self-Assembly For Nanopatterning
Reuther, Freimut	Design Of Polymers For Thermal Nanoimprint Lithography Based On Rheological Investigations
Reynolds, Jackson	An Atom Beam Lithography Tool For Fabricating Dense Nanostructure Arrays
Ribaya, Bryan	Fabrication Of Carbon Nanotube Field Emission Guns For Potential Maskless Lithography
Riehle, M.	(Invited) Controlling Cell Behaviour Using Nanopatterned Surfaces
Ro, Hyun Wook	Continuous Patterns With Height Gradients By Nanoimprint Lithography And Thermal Gradient Annealing Polyhedral Oligomeric Silsesquioxane (POSS) Functional Patterns Directly Fabricated By Nanoimprint Lithography
Roberts, Jeanette	Contributions Of Resist Polymers To Innate Material Roughness
Rocca, Jorge	50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser Ultra Compact Interferometric Lithography System Realized With A Desk-Top Extreme Ultraviolet Laser
Rockward, Willie	Ultra Compact Interferometric Lithography System Realized With A Desk-Top Extreme Ultraviolet Laser
Roelkens, Gunther	Focused-Ion-Beam Lithography For Prototyping Of Silicon Photonic Components
Rogers, John	Inorganic Photoresist Materials For Direct Fabrication Of 3D Photonic Crystals Using Phase Mask Lithography
Rokitski, Slava	Improving Lithography Pattern Fidelity And Line-Edge Roughness By Reducing Laser Speckle
Romero, Iván García	Design Of Polymers For Thermal Nanoimprint Lithography Based On Rheological Investigations
Ronse, Kurt	Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections
Rorrer, Gregory	Biofunctionalization For Enhanced Photoluminescence Of Nanopatterned Silica From The Diatom Cyclotella Sp.
Rosenbluth, Alan	(Invited) The Role Of Computational Modeling In Semiconductor Lithography:Progressing Towards The Virtual Fab
Ross, C.A.	(Invited) Si-Containing Block Copolymers For Self-Assembled Nanolithography Applications
Ross, Caroline	Hydrogen Silsesquioxane Nano-Posts As Decoys For Guiding The Self-Assembly Of Block Copolymers
Rossitto, Emmanuela	Capillary Forces Assembly In Microfluidic Cell: Faster Assembly By Accelerating The Particles Convective Flux And Integration Into Complex Pattern
Rothemund, Paul	Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces
Rottmayer, Robert	Electron Beam Lithography For Fabricating Heat Assisted Magnetic Recording Heads Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media
Rouse, John	Aberration Correction For Electron Beam Inspection, Metrology And Lithography
Roy, Ananya	An Atom Beam Lithography Tool For Fabricating Dense Nanostructure Arrays
Ruan, Junru	Optical Wafer Height And Tilt Sensor For Electron Beam Lithography System
Ruiz, Ricardo	65mm Disk Patterning At 500 Gb/In2 With Full Surface Area Coverage From Diblock Copolymer Templates
Russell, Phillip	FIB Fabrication Of Metallic Nanostructures On End-Faces Of Cleaved Optical Fibers For Chemical Sensing Applications
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Saeki, Akinori	Multispur In Chemically Amplified Electron Beam Resists
Sahoo, Pratap Kumar	Fabrication Of Fresnel Zone Plates By Holography In The Extreme Ultraviolet Region
Sajavaara, Timo	Interdigitated Electrode Structures For Osteoblast Growth Studies
Sakaya, Noriyuki	Coherent Euv Scattering Microscopy
Salaita, Khalid	(Invited) Deconstructing Receptor Signaling With Nanopatterned Supported Membranes
Samantaray, Chandan	Self-Assembled Monolayer Fiduical Grids For Spatial-Phase-Locked Electron-Beam Lithography The Effect Of Thin Metal Over-Layers On The Electron Beam Exposure Of Poly-Methyl Methacrylate
Samarelli, Antonio	Optical Characterisation Of An HSQ Lithography Process
Sanders, Daniel	Polymer Self-Assembly For Nanopatterning
Sansa, Marc	Dynamic Stencil Lithography On Full Wafer Scale
Santillan, Julius Joseph	(Invited) Latent Image Formation In Chemically Amplified Extreme Ultraviolet Resists With Low Activation Energy For Deprotection Reaction
Sarkar, Sankha Subhra	Fabrication Of Fresnel Zone Plates By Holography In The Extreme Ultraviolet Region
Satapathy, Dillip	In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS
Satija, Sushil	(Invited) Advances In Neutron Research Methods For Photoresists Fundamentals
Savu, Veronica	Dynamic Stencil Lithography On Full Wafer Scale
Schattenburg, Mark	Spatial-Frequency Multiplication With Multilayer Interference Lithography Fabrication Of 200 Nm Period Blazed Transmission Gratings On Silicon-On-Insulator Wafers
Scheer, Hella-Christin	Contact Angles In A Thermal Imprint Process Quality Assessment Of Anti-Sticking Layers For T-NIL
Schenkel, Thomas	(Invited) Single-Atom Doping And Single Atom Device Development Spin-Dependent Scattering Off Neutral Donors In Silicon Field-Effect Transistors
Schenker, Richard	(Invited) Advanced Imaging Via Pixelated Phase Masks And Inverse Lithography
Scherer, Axel	Diffractive Optical Element Fabrication By Electron Beam Lithography
Schift, H.	Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography
Schipotinin, Andreas	An Alternative Electron Beam Exposure Mechanism For Hydrogen Silsesquioxane – A Raman And FTIR Study
Schmid, Gerard	Patterned Media Using Step And Flash Imprint Lithography
Schrauwen, Jonathan	Reducing Optical Losses In Focused-Ion-Beam Etched Silicon Focused-Ion-Beam Lithography For Prototyping Of Silicon Photonic Components
Schuck, Jim	An Alternative Electron Beam Exposure Mechanism For Hydrogen Silsesquioxane – A Raman And FTIR Study
Schvartzman, Mark	Fabrication Of Nanoscale Bioarrays For The Study Of Cytoskeletal Protein Binding Interactions Using Nano-Imprint Lithography (Invited) Fluorinated Diamond-Like Carbon Templates For High Resolution Nanoimprint Lithography
Schwind, G. A.	Range Of Validity Of Field Emission Equations
Selinidis, Kosta	Full Field Imprint Masks Using Variable Shape Beam Pattern Generators
Sensor, Berkeley	Light Modulation With A Nano-Patterned Diffraction Grating And MEMS Pixel
Seo, Hwan-Seok	Effects Of Mask Absorber Structures On The EUV Lithography
Seo, Kwangseok	Self-Aligned Asymmetric Recess Technique With E-Beam Lithography
Sfez, Bruno	Inorganic Photoresist Materials For Direct Fabrication Of 3D Photonic Crystals Using Phase Mask Lithography
Shah, Uday	Improvement In Line Width Roughness (LWR) By Post-Processing
Sharping, Jay	(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes
Sheetz, Michael	Fabrication Of Nanoscale Bioarrays For The Study Of Cytoskeletal Protein Binding Interactions Using Nano-Imprint Lithography Fabrication Of Elastometer Pillar Arrays With Modulated Stiffness For Cellular Force Measurements
Shell, Melissa	Improvement In Line Width Roughness (LWR) By Post-Processing
Shen, Hao	Reducing Mode-Transition Loss In Silicon-On-Insulator Strip Waveguide Bends
Shen, Ron	Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies
Shenoy, Rohit S.	(Invited) Storage Class Memory
Shibata, Mayumi	Experimental And Theoretical Study On The Demolding Mechanics Experimental And Theoretical Study On The Demolding Mechanics In Imprint Process
Shin, Jangho	Study Of Machine To Machine Overlay Error For Sub-60-Nm Memory Devices
Shizuno, Miyako	Fabrication Of The Nanoimprint Mold Using Inorganic Electron Beam Resist With Post Exposure Bake
Shu, Zhen	Electron Beam Lithography For Distributed Bragg Reflectors In SU-8
Sidorkin, Vadim	Influence Of Resist Temperature During Exposure On Ultra-High Resolution Electron Beam Lithography Using HSQ Resist
Sidorov, Oleg	E-Beam Nano-Machining For Circuit Edit: An Invasiveness Study
Sijbrandij, Sybren	(Invited) Elemental Analysis With The Helium Ion Microscope
Simmons, Michelle	Engineered Materials for Single Atom Architectures for Computation
Simpson, Michael	Development Of Nanoporous Picoliter Reaction Vessels For The Characterization Of Biochemical Systems (Invited) Maskless Nanolithography Approaches Utilizing Electron-Beam-Induced Deposition Mass–Transport And Reaction-Rate Limited Growth Modes During Electron–Beam Induced Deposition
Singh, Vivek	Effect Of Microstructure On Deprotection Kinetics In Photoresist
Sirotkin, V.	Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography
Sirotkin, Vadim	Optimization Of Droplet Volume For UV-NIL
Siuti, Piro	Development Of Nanoporous Picoliter Reaction Vessels For The Characterization Of Biochemical Systems
Skinner, Jack	Light Modulation With A Nano-Patterned Diffraction Grating And MEMS Pixel
Slot, Erwin	(Invited) MAPPER: High Throughput Maskless Lithography
Smith, Bruce	Enhancement Of Hyper-NA Imaging Through Selective TM Polarization Aluminum Oxides As Metamaterials For Enhancement Of 193nm Lithography Photomask Image Enhancement Using Grating Generated Surface Waves
Smith, Henry I.	Nanometer-Level Alignment And Global Positioning To A Substrate-Embedded Coordinate System Linewidth Uniformity In Lloyd’s Mirror Interference Lithography Systems A Prototype Commercial System For Massively-Parallel Maskless Zone-Plate-Array Lithography (ZPAL)
Smith, Henry	(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices Fabrication Strategies For Filter Banks Based On Microring Resonators
Smith, Noel	Nanoscale To Millimeter Scale Milling With A Focused Ion Beam Instrument
Snider, Gregory	Controlled Chemical Mechanical Polishing Of Polysilicon And Silicon-Dioxide For Si Based Single-Electron Device With Oxide Tunnel Barriers
Snow, Arthur W.	(Invited) Electron-Transparent Cantilevers For TEM Visualization Of Nanodevices
Solak, Harun H.	Fabrication Of Fresnel Zone Plates By Holography In The Extreme Ultraviolet Region
Solak, Harun	In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS
Soles, Christopher	Continuous Patterns With Height Gradients By Nanoimprint Lithography And Thermal Gradient Annealing Polyhedral Oligomeric Silsesquioxane (POSS) Functional Patterns Directly Fabricated By Nanoimprint Lithography
Somorjai, Gabor	The Effects Of Wet And Dry Cleaning Methods On The Chemical Composition And Morphology Of The Ru Capping Layer Of The Extreme Ultraviolet (EUV) Mask Blanks
Sooryakumar, R	Relief And Trench Formation On Chalcogenide Thin-Films Using Electron Beams
Sorel, Marc	Optical Characterisation Of An HSQ Lithography Process
Spaeth, Hans	Direct Write Electron Beam Patterning Of DNA:Complex Thin Films
Sreenivasan, S.V.	Full Field Imprint Masks Using Variable Shape Beam Pattern Generators Patterned Media Using Step And Flash Imprint Lithography
Stacey, Nick	Full Field Imprint Masks Using Variable Shape Beam Pattern Generators
Standiford, Keith	A Modeling Approach For Shot Noise Effect On Feature Roughness
Stebler, Camille	(Invited) Transmission Electron Microscopy Sample Preparation Employing A "Triple" Beam Instrument
Steckl, Andrew	Direct Write Electron Beam Patterning Of DNA:Complex Thin Films
Steenbrink, Stijn	(Invited) MAPPER: High Throughput Maskless Lithography
Stepanova, M.	High Density Nanostructure Fabrication by Electron Beam Lithography, Zs. Szabo
Stojanovic, Vladimir	(Invited) The Challenge Of CMOS Photonics And Electronics For Enhanced Microprocessor Performance
Strain, Michael	Optical Characterisation Of An HSQ Lithography Process
Striccoli, Marinella	Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities
Stuen, Karl	In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS
Suga, Osamu	Hydrogen Radical Cleaning Of Carbon Contamination On EUV Mask
Sugatani, Shinji	(Invited) Application And Technology Of EBDW (Electron Beam Direct Writing):The Impact On Its Business Circumstances
Sugiyama, Yasuhiko	Application Of Vector Scanning In FIB Photomask Repair System Image Quality Improvement In Fib Photomask Repair System
Sun, Jirun	Continuous Patterns With Height Gradients By Nanoimprint Lithography And Thermal Gradient Annealing
Sun, Steven	Evaluation Of Electron Energy Spread In Csbr Based Photocathodes
Sun, Yi-Ting	Large-Area Microlens Arrays Fabricated By Integrated Gas-Assisted UV-Curing Embossing With UV-LED Array Lamp
Sundberg, Linda	Polymer Self-Assembly For Nanopatterning
Suzuki, Hidekazu	(Invited) Transmission Electron Microscopy Sample Preparation Employing A "Triple" Beam Instrument
Suzuki, Ikumi	Multilevel Visualization Of The Local Electric Field At A Sharp Probe Apex By Scanning Electron Microscopy
Suzuki, Tsuneo	Resisitivity Change Of The Diamond-Like Carbon
Svintsov, A.	Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography
Svintsov, Alexander	Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates Optimization Of Droplet Volume For UV-NIL
Swanson, L. W.	Range Of Validity Of Field Emission Equations
Szikszai, Laszlo	Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment
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Tada, Yasuhiko	Integration Of Electron Beam Lithography With Block Copolymer Self-Assembly For 10nm Scale Nanofabrication
Tagawa, Seiichi	(Invited) Latent Image Formation In Chemically Amplified Extreme Ultraviolet Resists With Low Activation Energy For Deprotection Reaction Multispur In Chemically Amplified Electron Beam Resists Dissolution Characteristics Of Chemically Amplified EUV Resist
Takagi, Hideki	Experimental And Numerical Analysis On Recovery Of Polymer Deformation After Demolding In Hot-Embossing Process
Takahashi, Haruo	(Invited) Transmission Electron Microscopy Sample Preparation Employing A "Triple" Beam Instrument
Takahashi, Masaharu	Experimental And Numerical Analysis On Recovery Of Polymer Deformation After Demolding In Hot-Embossing Process
Takaoka, Osamu	Application Of Vector Scanning In FIB Photomask Repair System Image Quality Improvement In Fib Photomask Repair System
Takenaka, Mikihito	Integration Of Electron Beam Lithography With Block Copolymer Self-Assembly For 10nm Scale Nanofabrication
Talin, A. Alec	Light Modulation With A Nano-Patterned Diffraction Grating And MEMS Pixel
Tanase, Mihaela	Espacer Protective Surface Coat For Cutting-Edge Ion-Beam Lithography
Tang, Jing	Tunable Optical Gain For Negative Index Materials By Integration Of Near-Infrared Emitting Nanocrystals
Taniguchi, Jun	Fabrication Of The Nanoimprint Mold Using Inorganic Electron Beam Resist With Post Exposure Bake Fabrication Of Anti-Reflection Structures And Carbon Nanofibers Using Only Ion Beam Irradiation To Glassy Carbon
Tanimoto, Sayaka	Evaluation Of Electron Energy Spread In Csbr Based Photocathodes
Teepen, Tijs	(Invited) MAPPER: High Throughput Maskless Lithography
Tejnil, Edita	Pattern Specific Optical Models
Tekniker, Fundacion	Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography
Tesch, Paul	Nanoscale To Millimeter Scale Milling With A Focused Ion Beam Instrument
Thiault, Jerome	Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness
Thiel, Bradley	Direct Writing Of High Resolution, Radially-Symmetric Nanostructures By Simultaneous Electron Beam Induced Deposition And Etching
Thomas, Darrell	Development Of Nanoporous Picoliter Reaction Vessels For The Characterization Of Biochemical Systems
Thomas, Edwin	Hydrogen Silsesquioxane Nano-Posts As Decoys For Guiding The Self-Assembly Of Block Copolymers
Thoms, Stephen	Optical Characterisation Of An HSQ Lithography Process
Thrum, Frank	(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
Tirumala, Vijay	Nanofabrication Of Super High-Aspect Ratio Structures In HSQ From Direct-Write E-Beam Lithography And Hot Development
Tiwari, Badri	Thermal Infrared Detection Using Antenna-Coupled Metal-Oxide-Metal Diode Detectors
Tolbert, Laren	Single Component Molecular Resists With Covalently Bound Photoacids Next Generation Chemically Amplified Molecular Resists For E-Beam Lithography Based On Epoxide Cross-Linking
Torres, Clivia M. Sotomayor	Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities
Tortai, Jean-Hervé	Epoxy Silsesquioxane Resists For UV Nanoimprint Lithography
Toth, Milos	Nanofabrication By Ultra-High Resolution Environmental Scanning Electron Microscopy Direct Writing Of High Resolution, Radially-Symmetric Nanostructures By Simultaneous Electron Beam Induced Deposition And Etching
Trautmann, Christina	Self-Aligned Graphitic Nanowires In Diamond-Like Carbon
Tseng, Yu-Chih	Capacitive Characterization Of The Schottky Contact Between Metal And Semiconducting Carbon Nanotube
Tserepi, Angeliki	(Invited) High-Aspect-Ratio Plasma-Induced Nanotexturing Of Polymers (PDMS PMMA, PEEK, ...) For Protein Adsorption Applications
Tsong, Tien T.	Gas Field Ion Source From An Ir/W<111> Single-Atom Tip
Tsougeni, Katerina	(Invited) High-Aspect-Ratio Plasma-Induced Nanotexturing Of Polymers (PDMS PMMA, PEEK, ...) For Protein Adsorption Applications
Tsuchiya, Masatoshi	Development Of The Compact Low-Energy Soft X-Ray CT Equipment For The Soft Material Structural Analysis
Tuchfeld, Eduard	Patterned Epitaxial Nanomagnets For Novel Logic Devices
Tulevski, George	(Invited) Chemical Functionalization For The Selective Placement Of Single-Walled Carbon Nanotubes
Tünnermann, Andreas	Fabrication Of Large-Area Negative-Index Metamaterial By Electron-Beam-Lithography
Twigg, Mark E.	(Invited) Electron-Transparent Cantilevers For TEM Visualization Of Nanodevices
Tyryshkin, Alexei	Spin-Dependent Scattering Off Neutral Donors In Silicon Field-Effect Transistors
Tzou, Tsong Tien	Investigation of Single-Walled Carbon Nanotubes With LEEPS Microscope, Chang Che-Cheng
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Ukita, Yoshiaki	Property Of In-Vacuum Direct Photo-Etching Of PTFE Brought By High Energy Synchrotron Radiation Irradiation
Ukraintsev, Vladimir	Enabling Nanometrology For High Aspect Ratio Structures With Carbon Nanotube AFM Probes
Unno, Noriyuki	Fabrication Of The Nanoimprint Mold Using Inorganic Electron Beam Resist With Post Exposure Bake
Utke, Ivo	Optimization Of Nozzle-Based Gas Injection Systems For Focused Electron- And Ion- Beam Induced Processing Stiffness, Density And Quality Of High Aspect Ratio Cu/C Nanostructures Produced By Focused Electron-Beam Induced Deposition
Utsumi, Yuichi	Property Of In-Vacuum Direct Photo-Etching Of PTFE Brought By High Energy Synchrotron Radiation Irradiation
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van Dalfsen, K.	High Density Nanostructure Fabrication by Electron Beam Lithography, Zs. Szabo
van de Peut, Ton	(Invited) MAPPER: High Throughput Maskless Lithography
van Delft, F.C.M.J.M.	Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates
van den Boogaart, Marc A. F.	Dynamic Stencil Lithography On Full Wafer Scale
van der Drift, Emile	Influence Of Resist Temperature During Exposure On Ultra-High Resolution Electron Beam Lithography Using HSQ Resist
van der Veen, Friso	In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS
van der Veen, Johannes Friso	Fabrication Of Fresnel Zone Plates By Holography In The Extreme Ultraviolet Region
van Dorp, W.F.	(Invited) 1 nm Patterning
Van Thourhout, Dries	Reducing Optical Losses In Focused-Ion-Beam Etched Silicon Focused-Ion-Beam Lithography For Prototyping Of Silicon Photonic Components
van Veen, Alexander	(Invited) MAPPER: High Throughput Maskless Lithography
Vidali, Veroniki	Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists
Vinogradov, Alexander	50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Visnapuu, Mari-Liis	(Invited) Nanoscale “Curtain Rods” For The Study Of Protein-DNA Interactions
Vivas, Javier Romero	Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities
Vizioz, Christian	Hybrid High Resolution Lithography (E-Beam/DUV) And Etch Process For Achieving Stacked Nanowire MOSFETs
Vlachopoulou, Maria-Elena	(Invited) High-Aspect-Ratio Plasma-Induced Nanotexturing Of Polymers (PDMS PMMA, PEEK, ...) For Protein Adsorption Applications
Vo-Dinh, Tuan	FIB Fabrication Of Metallic Nanostructures On End-Faces Of Cleaved Optical Fibers For Chemical Sensing Applications
Volker	(Invited) Applications Of Focused Electron Beam Processing
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Wachulak, Przemyslaw	50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser Ultra Compact Interferometric Lithography System Realized With A Desk-Top Extreme Ultraviolet Laser
Wagner, Raymond	Direct Writing Of High Resolution, Radially-Symmetric Nanostructures By Simultaneous Electron Beam Induced Deposition And Etching
Wallace, John	40 Nm Pitch Extreme Ultraviolet Interferometric Lithography
Wallow, Tom	Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool
Wallraff, Gregory	Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces
Walsh, Michael	A Prototype Commercial System For Massively-Parallel Maskless Zone-Plate-Array Lithography (ZPAL)
Wang, Chuandao	Model Studies Of The Photocatalytic Removal Of Carbon From Titanium Dioxide
Wang, Chuqing	Resist Bias Measured From Iso-Focal Structure
Wang, Liping	Aberration Correction For Electron Beam Inspection, Metrology And Lithography
Wang, Mingxing	Understanding The Effects Of Photoacid Distribution Homogeneity And Diffusivity On Lithography Performance In Polymer-Bound PAG Photoresists
Wang, S-Y	λ/12 Sub-wavelength Optical Lithography With A Smooth Superlens
Wang, Shih-Yuan	Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies Tunable Optical Gain For Negative Index Materials By Integration Of Near-Infrared Emitting Nanocrystals
Wang, Ying	(Invited) Quantized-Patterning Using Nanoimprinted-Blanks
Wanzenboeck, Heinz	Effect of Microstructures on Growth of Human Epithelial Layers Effect Of Gaseous Additives On Electron Beam Induced Deposition
Ward, Bill	(Invited) Elemental Analysis With The Helium Ion Microscope
Watanabe, Takeo	Coherent Euv Scattering Microscopy
Watts, Michael	(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices
Welander, Adam M.	Impact Of Trench Width Roughness On The Directed Self-Assembly Of Block Copolymers On Topographic Substrates
Welander, Adam	In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS
Weller, Dieter	Patterned Media Using Step And Flash Imprint Lithography
Whitlow, Harry James	Interdigitated Electrode Structures For Osteoblast Growth Studies
Wi, Jung-Sub	Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application (Invited) Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained From High Resolution Transmission Electron Microscopy The Modification Of Aperture System For Atomic Image Projection Electron-Beam Lithography (AIPEL) Two-Step Development Method Of Hydrogen Silsesquioxane Resist For High-Density Electron Beam Nanopatterning
Wiederrecht, Gary	Fabrication Of Metallic Nano-Slit Waveguides With Sharp Bends
Wieland, Marco	(Invited) MAPPER: High Throughput Maskless Lithography
Wilkinson, C.	(Invited) Controlling Cell Behaviour Using Nanopatterned Surfaces
Williams, R. Stanley	Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies Fabrication Of Amorphous Metallic Nanowires For IC Interconnects By Nanoimprint Lithography Tunable Optical Gain For Negative Index Materials By Integration Of Near-Infrared Emitting Nanocrystals
Wind, Shalom	Fabrication Of Nanoscale Bioarrays For The Study Of Cytoskeletal Protein Binding Interactions Using Nano-Imprint Lithography (Invited) Fluorinated Diamond-Like Carbon Templates For High Resolution Nanoimprint Lithography Fabrication Of Elastometer Pillar Arrays With Modulated Stiffness For Cellular Force Measurements (Invited) Nanoscale “Curtain Rods” For The Study Of Protein-DNA Interactions
Wissen, Matthias	Contact Angles In A Thermal Imprint Process Quality Assessment Of Anti-Sticking Layers For T-NIL
Witte, Daniel	Low Temperature Limits For Nano-Graphoepitaxy Of Semiconductors Preferential Orientation Effects In Partial Melt Laser Crystallization Of Silicon Mask-Less Wet Etching Using Laser Induced Local Heating
Wolfe, John	An Atom Beam Lithography Tool For Fabricating Dense Nanostructure Arrays A Multi-Electrode Cuff For Neuronal Sensing In The Locust
Woo, Sang-Gyun	Resist Charging Effect In Photomask: Its Impact On Pattern Placement Error And Critical Dimension
Wu, Tsai-wei	65mm Disk Patterning At 500 Gb/In2 With Full Surface Area Coverage From Diblock Copolymer Templates
Wu, Wei	Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies Fabrication Of Amorphous Metallic Nanowires For IC Interconnects By Nanoimprint Lithography Tunable Optical Gain For Negative Index Materials By Integration Of Near-Infrared Emitting Nanocrystals λ/12 Sub-wavelength Optical Lithography With A Smooth Superlens
Wu, Wen-li	(Invited) Advances In Neutron Research Methods For Photoresists Fundamentals
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Xia, Deying	Fabrication Of Porous Nanochannels Using Nanoparticles And Application To The Transport Of DNA Molecules
Xia, Qiangfei	Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies Fabrication Of Amorphous Metallic Nanowires For IC Interconnects By Nanoimprint Lithography Tunable Optical Gain For Negative Index Materials By Integration Of Near-Infrared Emitting Nanocrystals
Xiao, Shijun	Reducing Mode-Transition Loss In Silicon-On-Insulator Strip Waveguide Bends
Xiao, Shuaigang	Electron Beam Lithography For Fabricating Heat Assisted Magnetic Recording Heads (Invited) >1 Tdot/In.2 Bit Patterned Media Template Fabrication By Directed Polymer Self-Assembly Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media
Xie, Pen	Enhancement Of Hyper-NA Imaging Through Selective TM Polarization
Xu, Hongqi	Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography
Xu, Yuan	Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media
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Yakshinskiy, B. V.	Carbon Film Growth And Mitigation On Model Electron-Irradiated EUVL Mirror Capping Layers: TiO₂ And Ru
Yamabe, Masaki	Electron Beams In Individual Column Cells Of Multi Column Cell (MCC) System
Yamada, Akio	Electron Beams In Individual Column Cells Of Multi Column Cell (MCC) System
Yamaguchi, Hiroshi	Three-Dimensional (3D) Alignment With 10-nm Order Accuracy In Electron-Beam Lithography On Rotated Sample for 3D Nanofabrication
Yamamoto, Shigeaki	Property Of In-Vacuum Direct Photo-Etching Of PTFE Brought By High Energy Synchrotron Radiation Irradiation
Yamamoto, Yo	(Invited) Transmission Electron Microscopy Sample Preparation Employing A "Triple" Beam Instrument
Yamazaki, Kenji	Three-Dimensional (3D) Alignment With 10-nm Order Accuracy In Electron-Beam Lithography On Rotated Sample for 3D Nanofabrication
Yamazaki, Y.	Contrast Reversal Effect In SEM Due To Charging
Yan, Minjun	The Effects Of Molecular Weight On Resist Evaluation Parameters In Poly(Methylmethacrylate) Developed At Sub-Zero Temperatures
Yan, Qiliang	Resist Bias Measured From Iso-Focal Structure
Yan, Su-Jan	Hybridization Sensing By Electrical Enhancement With Nanoparticles In Nano-Gap
Yang, J. Joshua	Fabrication Of Amorphous Metallic Nanowires For IC Interconnects By Nanoimprint Lithography
Yang, J. K. W	Sub-15 Nm Half-Pitch Nanoimprint Molds Using High Resolution Negative Tone Resist And Reactive Ion Etching
Yang, Joel	Optimum Exposure Parameters For High-Resolution Scanning Electron Beam Lithography Hydrogen Silsesquioxane Nano-Posts As Decoys For Guiding The Self-Assembly Of Block Copolymers
Yang, Sen-Yeu	Large-Area Microlens Arrays Fabricated By Integrated Gas-Assisted UV-Curing Embossing With UV-LED Array Lamp Diffusers With Both Surface-Relief And Particle-Diffusing Functions Fabricated Using Hybrid Extrusion Roller Embossing
Yang, XiaoMin	Electron Beam Lithography For Fabricating Heat Assisted Magnetic Recording Heads (Invited) >1 Tdot/In.2 Bit Patterned Media Template Fabrication By Directed Polymer Self-Assembly Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media
Yang, Yugu	FPGA Implementation Of Real-Time Spatial-Phase Locking For Electron Beam Lithography
Yasaka, Anto	Application Of Vector Scanning In FIB Photomask Repair System Image Quality Improvement In Fib Photomask Repair System
Yasuda, Hiroshi	Electron Beams In Individual Column Cells Of Multi Column Cell (MCC) System
Yasuda, Masaaki	Experimental And Theoretical Study On The Demolding Mechanics Experimental And Theoretical Study On The Demolding Mechanics In Imprint Process
Ye, Jun	X-Ray Diffraction Microscopy: Reconstruction With Partial Magnitude And Spatial A Priori Information
Yemini, M.	Formation Of Nano Holes By An Electron Beam- Induced Etching Process
Yeo, Jeongho	Study Of Machine To Machine Overlay Error For Sub-60-Nm Memory Devices
Yoon, Fern	Stability Of HSQ Nano-Lines Defined By E-Beam Lithography
Yoon, Kwang-Sub	Full Field Imprint Masks Using Variable Shape Beam Pattern Generators
Yoshida, Hiroshi	Integration Of Electron Beam Lithography With Block Copolymer Self-Assembly For 10nm Scale Nanofabrication
Younkin, Todd	Improvement In Line Width Roughness (LWR) By Post-Processing
Yu, Zhaoning	Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies λ/12 Sub-wavelength Optical Lithography With A Smooth Superlens Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media
Yueh, Wang	Improvement In Line Width Roughness (LWR) By Post-Processing Single Component Molecular Resists With Covalently Bound Photoacids Next Generation Chemically Amplified Molecular Resists For E-Beam Lithography Based On Epoxide Cross-Linking Understanding The Effects Of Photoacid Distribution Homogeneity And Diffusivity On Lithography Performance In Polymer-Bound PAG Photoresists
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Zaitsev, S.	Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography
Zaitsev, Sergey	Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates Optimization Of Droplet Volume For UV-NIL
Zalkind, S.	Carbon Film Growth And Mitigation On Model Electron-Irradiated EUVL Mirror Capping Layers: TiO₂ And Ru
Zeiss, Carl	(Invited) Elemental Analysis With The Helium Ion Microscope
Zelsmann, Marc	Epoxy Silsesquioxane Resists For UV Nanoimprint Lithography Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities Comparison Of Monomer And Polymer Resists In Thermal Nanoimprint Lithography
Zhang, Feng	A Prototype Commercial System For Massively-Parallel Maskless Zone-Plate-Array Lithography (ZPAL)
Zhang, L	Tools For Resist Heating Analysis And Compensation For Electron Beam Tools
Zhang, Yanxia	Experiments Towards A High Brightness 100-Electron-Beam Source
Zhao, Lin	Generating Manhattan Patterns Via Cutting And Stitching Of Gratings
Zhao, Wei	Relief And Trench Formation On Chalcogenide Thin-Films Using Electron Beams
Zhao, Xiaomei	Imprinted Large-Scale High Density Polymer Nanopillars For Various Applications
Zhao, Yong	Spatial-Frequency Multiplication With Multilayer Interference Lithography
Zhong, Zhaohui	(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes
Zhou, Jianming	Enhancement Of Hyper-NA Imaging Through Selective TM Polarization
Zhou, Jing	Continuous Patterns With Height Gradients By Nanoimprint Lithography And Thermal Gradient Annealing
Zorzos, Anthony	The Use Of Ionic Liquid Ion Sources (ILIS) In FIB Applications
Zuckermann, Ronald	(Invited) DNA Directed Assembly Of Nanoparticles Linear Structure For Nanophotonics
Zurbuchen, Thomas H.	Plasma-Etch Fabrication Of High Aspect Ratio Freestanding Silicon Nanogratings As Deep UV Filters

EIPBN Abstracts

EIPBN 2008 Authors Index

A

B

C

D

E

F

G

H

I

J

K

L

M

N

O

P

Q

R

S

T

U

v

W

X

Y

Z